公开(公告)号：US10214823B2

公开(公告)日：2019-02-26

申请号：US14775016

申请日：2014-03-11

申请人： United Technologies Corporation

发明人： Rhonda R. Willigan ,  Lei Chen ,  Mark R. Jaworowski

IPC分类号： B32B3/18 ,  C25D3/44 ,  C25D3/66 ,  C25D5/44 ,  C23C18/16 ,  C23C18/54 ,  C25F3/00 ,  C25F5/00 ,  B32B15/01 ,  C23C18/31 ,  C23F1/00 ,  C25F3/02

摘要： A coated metal component includes an aluminum alloy substrate and a protective aluminum coating on a substrate. An interfacial boundary layer between the coating and substrate enhances coating adhesion. The boundary layer includes isolated regions of copper or tin produced by a double zincating process. The protective aluminum coating exhibits improved adhesion and is formed by electrodeposition in an ionic liquid.

公开(公告)号：US20180298496A1

公开(公告)日：2018-10-18

申请号：US15487615

申请日：2017-04-14

申请人： Hamilton Sundstrand Corporation

发明人： Blair A. Smith ,  Tianli Zhu ,  Patrick Louis Clavette ,  Michael A. Kryzman ,  Kevin M. Rankin ,  Mark R. Jaworowski ,  Georgios S. Zafiris ,  Bart Antonie van Hassel ,  Tahany Ibrahim El-Wardany

IPC分类号： C23C18/16 ,  C23C18/32 ,  C23C18/42 ,  C23C18/50 ,  C25D3/56 ,  C25D3/48 ,  C25D3/46 ,  C25D3/44 ,  C25D3/34 ,  C25D3/30 ,  C25D3/26 ,  C25D3/22 ,  C25D3/12 ,  C25D3/04 ,  C25D3/54 ,  C25D5/12 ,  C25D7/00 ,  C25D9/04

摘要： A non-line-of-sight (NLOS) coating process is provided for a substrate having first and second transverse surfaces where the second surface lacks a LOS for depositional processing. The NLOS coating process includes electroplating or electroless plating a crack-resistant interlayer coating to at least the second surface and applying a wear-resistant coating to the crack-resistant interlayer coating by electrolytic or electroless plating.

公开(公告)号：US10087540B2

公开(公告)日：2018-10-02

申请号：US14624254

申请日：2015-02-17

申请人： HONEYWELL INTERNATIONAL INC.

发明人： Gangmin Cao ,  Jingkang Lv ,  James Piascik

IPC分类号： C25D3/66 ,  C25D3/44 ,  C25D5/48 ,  C25D5/50

摘要： Ionic liquid aluminum electroplating solutions are provided. The ionic liquid aluminum electroplating solution comprises an ionic liquid, an aluminum salt, and an effective amount of propylene carbonate. Methods for producing an aluminum coating on a substrate are also provided. Processes for electroplating aluminum or an aluminum alloy from an ionic liquid aluminum electroplating solution are also provided.

公开(公告)号：US09991519B2

公开(公告)日：2018-06-05

申请号：US14917807

申请日：2015-02-19

申请人： Hitachi Metals, Ltd.

发明人： Atsushi Okamoto ,  Junichi Matsuda

IPC分类号： H01M4/66 ,  C25D1/04 ,  C25D3/44 ,  H01G11/68 ,  H01G11/86 ,  H01M10/0525 ,  H01G11/70 ,  H01G11/84 ,  H01G9/045

CPC分类号： H01M4/661 ,  C25D1/04 ,  C25D3/44 ,  H01G9/045 ,  H01G9/055 ,  H01G11/68 ,  H01G11/70 ,  H01G11/84 ,  H01G11/86 ,  H01M10/0525 ,  Y02E60/13 ,  Y02T10/7022

摘要： An object of the present invention is to provide an electrolytic aluminum foil having no significant difference in properties between one surface and the other surface thereof, and also a method for producing the same. Another object is to provide a current collector for an electrical storage device using the electrolytic aluminum foil, an electrode for an electrical storage device, and an electrical storage device. An electrolytic aluminum foil of the present invention as a means for achieving the object is characterized in that both surfaces of the foil have L* values of 86.00 or more in the L*a*b* color space (SCI method). The electrolytic aluminum foil of the present invention can be produced, for example, employing a method for producing an electrolytic aluminum foil, which comprises applying a current between a cathode drum partially immersed in a plating solution and an anode plate immersed in the plating solution to form an aluminum film on the surface of the cathode drum, and then separating, from the cathode drum, the aluminum film raised from the liquid surface by rotating the cathode drum, and in which the dew point of a treatment atmosphere at the time of the separation of the aluminum film from the cathode drum to give an electrolytic aluminum foil is controlled to be −50.0° C. or less.

公开(公告)号：US09850592B2

公开(公告)日：2017-12-26

申请号：US14804398

申请日：2015-07-21

申请人： RESEARCH & BUSINESS FOUNDATION SUNGKYUNKWAN UNIVERSITY

发明人： Su-Jeong Suh ,  Young-Il Song ,  Jung-Ho Park ,  Jung-Kab Park ,  Tae-Yoo Kim ,  Hwa-Jin Son ,  Jin-Ha Shin ,  Mi-Ri Lee ,  Jungwoo Lee ,  Changhyoung Lee ,  Younglae Cho ,  Seung-Bin Baeg ,  Byung-Wook Ahn ,  Sook-Young Yun

IPC分类号： C25D15/00 ,  C25D3/38 ,  B05B7/00 ,  C25D3/54 ,  C25D3/48 ,  C25D3/46 ,  C25D3/20 ,  C25D3/12 ,  C25D3/44

CPC分类号： C25D15/00 ,  B05B7/0006 ,  C25D3/12 ,  C25D3/20 ,  C25D3/38 ,  C25D3/44 ,  C25D3/46 ,  C25D3/48 ,  C25D3/54

摘要： Provided is a method of forming a complex plating film using multi-layer graphene metal particles. The method of forming the plating film may include preparing a powder with a metal particle structure coated with multi-layer graphene, and forming a plating film by adding the powder to a plating solution through electric plating.

公开(公告)号：US20170197270A1

公开(公告)日：2017-07-13

申请号：US15370635

申请日：2016-12-06

申请人： Rolls-Royce Corporation

发明人： Quinlan Yee Shuck ,  Jacque Sue Bader

IPC分类号： B23K1/00 ,  B23K35/02 ,  F16B5/08 ,  B23K35/32 ,  C25D3/44 ,  B23K1/19 ,  B23K35/28

CPC分类号： B23K1/0008 ,  B23K1/0002 ,  B23K1/0018 ,  B23K1/0056 ,  B23K1/008 ,  B23K1/08 ,  B23K1/19 ,  B23K1/206 ,  B23K35/001 ,  B23K35/002 ,  B23K35/0233 ,  B23K35/0244 ,  B23K35/286 ,  B23K35/325 ,  B23K2101/001 ,  B23K2103/10 ,  B23K2103/14 ,  C22C14/00 ,  C25D3/44 ,  C25D3/665 ,  C25D5/022 ,  C25D5/18 ,  C25D5/42 ,  C25D5/44 ,  F16B5/08

摘要： In some examples, the disclosure describes a technique that includes covering a joint surface of a first part including a titanium aluminum (TiAl) alloy with a braze material including aluminum, where covering the joint surface includes at least one of electroplating the braze material on the joint surface, hot dipping the braze material on the joint surface, or positioning a foil of the braze material adjacent to the joint surface, positioning a second part including a titanium alloy in contact with the first part to define a joint region, where the joint region includes the braze material interposed between the second part and the joint surface of the first part, and heating the joint region to at least partially melt the braze material to form a braze joint connecting the first part to the second part.

公开(公告)号：US20170145584A1

公开(公告)日：2017-05-25

申请号：US15415246

申请日：2017-01-25

申请人： Fabric8Labs, Inc.

发明人： David Morgan Wirth ,  David Forest Pain ,  Jeffrey William Herman

IPC分类号： C25D21/12 ,  C25D3/12 ,  C25D3/46 ,  C25D3/24 ,  C25D3/20 ,  B33Y70/00 ,  C25D9/02 ,  C25D5/10 ,  C25D5/04 ,  B33Y10/00 ,  B33Y30/00 ,  B33Y50/02 ,  C25D3/40 ,  C25D3/44

CPC分类号： C25D1/003 ,  B33Y10/00 ,  B33Y30/00 ,  B33Y50/02 ,  B33Y70/00 ,  C25D3/12 ,  C25D3/20 ,  C25D3/22 ,  C25D3/24 ,  C25D3/38 ,  C25D3/40 ,  C25D3/44 ,  C25D3/46 ,  C25D5/04 ,  C25D5/10 ,  C25D9/02 ,  C25D15/00 ,  C25D17/12 ,  C25D21/12

摘要： An apparatus for stereo-electrochemical deposition of metal layers consisting of an array of anodes, a cathode, a positioning system, a fluid handling system for an electrolytic solution, communications circuitry, control circuitry and software control. The anodes are electrically operated to promote deposition of metal layers in any combination on the cathode to fabricate a structure.

公开(公告)号：US20160204289A1

公开(公告)日：2016-07-14

申请号：US15079359

申请日：2016-03-24

申请人： Meng Tao ,  Wen-Cheng Sun ,  Xiaofei Han

发明人： Meng Tao ,  Wen-Cheng Sun ,  Xiaofei Han

IPC分类号： H01L31/0224 ,  C25D3/44 ,  C25D7/12

CPC分类号： H01L31/022458 ,  C25D3/44 ,  C25D3/665 ,  C25D5/50 ,  C25D7/12 ,  C25D7/126 ,  H01L31/022425 ,  H01L31/1864 ,  Y02E10/50 ,  Y02P70/521

摘要： Electroplating of aluminum may be utilized to form electrodes for solar cells. In contrast to expensive silver electrodes, aluminum allows for reduced cell cost and addresses the problem of material scarcity. In contrast to copper electrodes which typically require barrier layers, aluminum allows for simplified cell structures and fabrication steps. In the solar cells, point contacts may be utilized in the backside electrodes for increased efficiency. Solar cells formed in accordance with the present disclosure enable large-scale and cost-effective deployment of solar photovoltaic systems.

摘要翻译： 铝的电镀可用于形成太阳能电池的电极。 与昂贵的银电极相比，铝允许降低电池成本并解决材料短缺的问题。 与通常需要阻挡层的铜电极相反，铝允许简化的电池结构和制造步骤。 在太阳能电池中，可以在背面电极中使用点接触以提高效率。 根据本公开形成的太阳能电池能够大规模和成本有效地部署太阳能光伏系统。

公开(公告)号：US09382634B2

公开(公告)日：2016-07-05

申请号：US14381753

申请日：2013-02-27

申请人： HITACHI METALS, LTD.

发明人： Atsushi Okamoto ,  Junichi Matsuda

IPC分类号： C25D3/44 ,  C25D3/66 ,  C25D1/04 ,  H01G11/68 ,  H01G11/84 ,  H01M4/66 ,  H01M10/0525

CPC分类号： C25D3/44 ,  C25D1/04 ,  C25D3/665 ,  H01G11/68 ,  H01G11/84 ,  H01M4/661 ,  H01M10/0525 ,  Y02E60/13 ,  Y02T10/7011 ,  Y02T10/7022

摘要： An object of the present invention is to provide a method for preparing a plating solution for aluminum electroplating useful for the production of a high-ductility, high-purity aluminum foil at a high film formation rate, etc., which is an easy-to-handle plating solution that does not solidify and allows for an electroplating treatment even at 25° C. The present invention as a means for achieving the object is characterized in that in a preparation of a plating solution containing at least (1) a dialkyl sulfone, (2) an aluminum halide, and (3) a nitrogen-containing compound, the blending proportions of the dialkyl sulfone, the aluminum halide, and the nitrogen-containing compound are such that per 10 mol of the dialkyl sulfone, the aluminum halide is 3.5+n to 4.2+n mol, and the nitrogen-containing compound is n mol (wherein n is 0.001 to 2.0 mol). In addition, a plating solution for aluminum electroplating prepared by the method of the present invention allows for an electroplating treatment with high aluminum deposition efficiency relative to the current flow, and is thus advantageous in that electricity usage can be reduced, resulting in excellent economic efficiency.

摘要翻译： 本发明的目的是提供一种用于制备用于制备高成膜速率等的高延展性，高纯度铝箔的铝电镀用溶液的方法，该方法易于制备 即使在25℃下也不固化并允许进行电镀处理的手提电镀液。作为实现该目的的手段的本发明的特征在于，在制备含有至少（1）二烷基砜 ，（2）卤化铝和（3）含氮化合物，二烷基砜，卤化铝和含氮化合物的配合比例使得每10摩尔二烷基砜，卤化铝 为3.5 + n〜4.2 + n摩尔，含氮化合物为n摩尔（n为0.001〜2.0摩尔）。 此外，通过本发明的方法制备的用于电镀铝的电镀溶液允许相对于电流流动具有高的铝沉积效率的电镀处理，因此有利的是可以减少电力使用，从而获得优异的经济效率 。

公开(公告)号：US09322108B2

公开(公告)日：2016-04-26

申请号：US14392013

申请日：2013-07-24

申请人： University of Southampton

发明人： Gillian Reid ,  Philip Nigel Bartlett ,  Andrew Lee Hector

IPC分类号： C25D3/00 ,  C25D3/02 ,  C25D7/12 ,  H01L45/00 ,  C25D5/02 ,  C25D3/34 ,  C25D3/32 ,  C25D3/30 ,  C25D3/26 ,  C25D3/36 ,  C25D3/60 ,  H01L21/02 ,  C25D3/44 ,  C25D3/54 ,  C25D3/56 ,  C25D5/18 ,  C25D9/08

CPC分类号： C25D7/12 ,  C25D3/02 ,  C25D3/26 ,  C25D3/30 ,  C25D3/32 ,  C25D3/34 ,  C25D3/36 ,  C25D3/44 ,  C25D3/54 ,  C25D3/56 ,  C25D3/60 ,  C25D5/02 ,  C25D5/18 ,  C25D9/08 ,  H01L21/02381 ,  H01L21/02491 ,  H01L21/02549 ,  H01L21/02628 ,  H01L45/06 ,  H01L45/1253 ,  H01L45/144 ,  H01L45/1608 ,  H01L45/1683

摘要： A process for the electrochemical deposition of a semiconductor material, which process comprises: (i) providing a non-aqueous solvent; (ii) providing at least one precursor salt which forms a source of the constituent elements within the semiconductor material to be deposited; and (iii) electrodepositing the semiconductor material onto an electrode substrate using the precursor salt in the non-aqueous solvent, characterized in that: (iv) the semiconductor material is a p-block or a post-transition metal semiconductor material containing at least one p-block element or post-transition metal; and (v) the non-aqueous solvent is a halocarbon non-aqueous solvent.

摘要翻译： 一种用于半导体材料的电化学沉积的方法，该方法包括：（i）提供非水溶剂; （ii）提供至少一种在待沉积的半导体材料内形成组成元素源的前体盐; 以及（iii）使用所述前体盐在所述非水溶剂中将所述半导体材料电沉积到电极基板上，其特征在于：（iv）所述半导体材料是含有至少一个的p块或后过渡金属半导体材料 p-块元素或过渡后金属; 和（v）非水溶剂是卤代烃非水溶剂。