公开(公告)号：US07067820B2

公开(公告)日：2006-06-27

申请号：US10829002

申请日：2004-04-21

Applicant: Bart Buijsse

Inventor： Bart Buijsse

IPC: H01J49/06

CPC classification number: H01J37/26 ,  H01J37/145 ,  H01J2237/10

Abstract: Particle-optical apparatus are normally embodied with a magnetic or electrostatic lens so as to focus a beam 1 of charged particles onto a sample 8. It is desirable to be able to use these apparatus at different beam energies. It is, however, undesirable that the focus position 9 of the beam, as a result hereof, should shift with respect to the sample 8. Use of a permanent-magnetic material 6 in a magnetic lens has advantages as regards compact construction, but is normally avoided because it is not easily possible to adjust the lens power to match varying beam energies. The invention shows how it is possible to keep constant the focus position 9, independent of the energy of the particles in the beam 1, by combining a magnetic lens—that has been furnished with permanent-magnetic material—with an electrostatic lens. The electrostatic lens is embodied in that case as an accelerating lens.

Abstract translation: 通常使用磁性或静电透镜来实现粒子光学装置，以将带电粒子束1聚焦到样品8上。 希望能够以不同的光束能量使用这些装置。 然而，不希望的是，梁的聚焦位置9作为其结果应该相对于样品8移动。 在磁性透镜中使用永磁材料6具有紧凑结构的优点，但是通常避免了因为不容易调整透镜功率以匹配变化的光束能量。 本发明通过组合具有永久磁性材料的磁性透镜与静电透镜组合，可以不依赖于光束1中的颗粒的能量而保持聚焦位置9的恒定。 在这种情况下，静电透镜被体现为加速透镜。

公开(公告)号：US20180172885A1

公开(公告)日：2018-06-21

申请号：US15898048

申请日：2018-02-15

Applicant: TRILUMINA CORP.

Inventor： Richard F. CARSON ,  John R. JOSEPH ,  Mial E. WARREN ,  Thomas A. WILCOX

IPC: G02B3/00 ,  H01S5/42 ,  H01S5/00 ,  G02B1/14 ,  G02B7/00 ,  H01J37/32 ,  B01J8/00

CPC classification number: G02B3/0012 ,  B01J8/00 ,  B01J2208/00008 ,  G02B1/14 ,  G02B3/0018 ,  G02B3/0025 ,  G02B3/0037 ,  G02B3/0043 ,  G02B3/0056 ,  G02B7/005 ,  H01J37/32009 ,  H01J2237/10 ,  H01J2237/334 ,  H01S5/005 ,  H01S5/423

Abstract: Embodiments comprise a system created through fabricating a lens array through which lasers are emitted. The lens array may be fabricated in the semiconductor substrate used for fabricating the lasers or may be a separate substrate of other transparent material that would be aligned to the lasers. In some embodiments, more lenses may be produced than will eventually be used by the lasers. The inner portion of the substrate may be formed with the lenses that will be used for emitting lasers, and the outer portion of the substrate may be formed with lenses that will not be used for emitting lasers—rather, through etching these additional lenses, the inner lenses may be created with a higher quality.

公开(公告)号：US20170299781A1

公开(公告)日：2017-10-19

申请号：US15133094

申请日：2016-04-19

Applicant: TRILUMINA CORP.

Inventor： Richard F. CARSON ,  John R. JOSEPH ,  Mial E. WARREN ,  Thomas A. WILCOX

IPC: G02B3/00 ,  H01S5/00 ,  G02B1/14 ,  G02B7/00 ,  H01J37/32 ,  H01S5/42 ,  B01J8/00

CPC classification number: G02B3/0012 ,  B01J8/00 ,  B01J2208/00008 ,  G02B1/14 ,  G02B3/0018 ,  G02B3/0025 ,  G02B3/0037 ,  G02B3/0043 ,  G02B3/0056 ,  G02B7/005 ,  H01J37/32009 ,  H01J2237/10 ,  H01J2237/334 ,  H01S5/005 ,  H01S5/423

Abstract: Embodiments comprise a system created through fabricating a lens array through which lasers are emitted. The lens array may be fabricated in the semiconductor substrate used for fabricating the lasers or may be a separate substrate of other transparent material that would be aligned to the lasers. In some embodiments, more lenses may be produced than will eventually be used by the lasers. The inner portion of the substrate may be formed with the lenses that will be used for emitting lasers, and the outer portion of the substrate may be formed with lenses that will not be used for emitting lasers—rather, through etching these additional lenses, the inner lenses may be created with a higher quality.

公开(公告)号：US20160126058A1

公开(公告)日：2016-05-05

申请号：US14891494

申请日：2014-03-12

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Yusuke OMINAMI ,  Taku SAKAZUME ,  Sukehiro ITO

IPC: H01J37/22 ,  H01J37/26 ,  H01J37/20 ,  H01J37/10

CPC classification number: H01J37/22 ,  G01N23/046 ,  G01N2223/3307 ,  G01N2223/418 ,  H01J37/10 ,  H01J37/20 ,  H01J37/222 ,  H01J37/244 ,  H01J37/26 ,  H01J37/261 ,  H01J37/28 ,  H01J2237/047 ,  H01J2237/10 ,  H01J2237/221 ,  H01J2237/226 ,  H01J2237/2443 ,  H01J2237/2445 ,  H01J2237/24578 ,  H01J2237/2611 ,  H01J2237/2802

Abstract: An electron microscope has a large depth of focus in comparison with an optical microscope. Thus, information is superimposed on one image in the direction of depth. Therefore, it is necessary to accurately specify the three-dimensional position and density of a structure in a specimen so as to observe the three-dimensional structure of the interior of the specimen by using the electron microscope. Furthermore, a specimen that is observed with the optical microscope on a slide glass is not put into a TEM device of the related art. Thus, performing three-dimensional internal structure observation with the electron microscope on a location that is observed with the optical microscope requires very cumbersome preparation of the specimen. By controlling a vector parameter that defines the interrelationship between a primary charged particle beam and the specimen and by irradiation with the primary charged particle beam with a plurality of different vector parameters, images of transmitted charged particles of the specimen that correspond to each of the vector parameters are obtained. Irradiation with the primary charged particle beam is performed on the specimen that is arranged either directly or through a predetermined member on a detector which detects charged particles transmitted through or scattered by the interior of the specimen.

Abstract translation: 与光学显微镜相比，电子显微镜具有较大的聚焦深度。 因此，信息在深度方向上叠加在一个图像上。 因此，必须准确地确定试样中的结构的三维位置和密度，以便通过电子显微镜观察试样内部的三维结构。 此外，用幻灯片玻璃上的光学显微镜观察的样品没有放入现有技术的TEM器件中。 因此，在用光学显微镜观察的位置上用电子显微镜进行三维内部结构观察需要非常繁琐的样品制备。 通过控制限定初级带电粒子束和样本之间的相互关系的矢量参数以及通过用多个不同矢量参数照射初级带电粒子束的样本的透射带电粒子对应于每个矢量的图像 获得参数。 对于直接或通过检测器上的预定部件布置的试样进行照射，该检测器检测通过样本内部传播或散射的带电粒子。

公开(公告)号：US09263232B2

公开(公告)日：2016-02-16

申请号：US14395263

申请日：2013-04-11

Applicant: Hitachi High-Technologies Corporation

Inventor： Yusuke Ominami ,  Shinsuke Kawanishi ,  Tomohisa Ohtaki ,  Masahiko Ajima ,  Sukehiro Ito

IPC: H01J37/26 ,  G21K5/04 ,  H01J37/16 ,  H01J37/18 ,  H01J37/28 ,  H01J37/09 ,  H01J37/10 ,  H01J37/147

CPC classification number: H01J37/261 ,  H01J37/09 ,  H01J37/10 ,  H01J37/147 ,  H01J37/16 ,  H01J37/18 ,  H01J37/28 ,  H01J2237/0245 ,  H01J2237/043 ,  H01J2237/063 ,  H01J2237/10 ,  H01J2237/162 ,  H01J2237/164 ,  H01J2237/2003 ,  H01J2237/2448 ,  H01J2237/2602 ,  H01J2237/2605

Abstract: A charged particle beam device (1) includes a charged particle optical lens barrel (10), a support housing (20) equipped with the charged particle optical lens barrel (10) thereon, and an insertion housing (30) inserted in the support housing (20). A first aperture member (15) is disposed in the vicinity of the center of the magnetic field of an objective lens, and a second aperture member (15) is disposed so as to externally close an opening part provided at the upper side of the insertion housing (30). Further, when a primary charged particle beam (12) is irradiated to a sample (60) arranged under the lower side of the second aperture member (31), secondary charged particles thus emitted are detected by a detector (16).

Abstract translation: 带电粒子束装置（1）包括带电粒子光学透镜镜筒（10），在其上装有带电粒子光学透镜镜筒（10）的支撑壳体（20）和插入支撑壳体 （20）。 第一孔径构件（15）设置在物镜的磁场的中心附近，并且第二孔径构件（15）设置成外部封闭设置在插入件的上侧的开口部分 住房（30）。 此外，当将初级带电粒子束（12）照射到布置在第二孔径构件（31）的下侧下方的样品（60）时，由检测器（16）检测如此发射的二次带电粒子。

公开(公告)号：US09171694B2

公开(公告)日：2015-10-27

申请号：US14532805

申请日：2014-11-04

Applicant: KLA-Tencor Corporation

Inventor： Christopher Sears

IPC: H01J37/147 ,  H01J37/141 ,  H01J37/12 ,  H01J37/153 ,  H01J37/10

CPC classification number: H01J37/1472 ,  H01J37/10 ,  H01J37/1471 ,  H01J37/153 ,  H01J2237/10 ,  H01J2237/1508 ,  H01J2237/1516 ,  H01J2237/2448 ,  H01J2237/2449 ,  H01J2237/2602 ,  H01J2237/28

Abstract: An electron beam device for inspecting a target substrate or specimen thereon includes a beam separator with an asymmetric quadrupole electrostatic deflector for improving field uniformity for a single direction of deflection. The asymmetric quadrupole electrostatic deflector includes two orthogonal electrode plates spanning roughly 60 degrees and two electrode plates spanning roughly 120 degrees, the two latter plates defining a unidirectional deflection field. The device generates a primary electron beam and focuses the primary electron beam along an optical axis into the target substrate. Secondary electrons detected at the target substrate are focused into a secondary electron beam. The beam separator with asymmetric quadrupole electrostatic deflector deflects the secondary electron beam away from the axis of the primary electron beam in the direction of deflection and into a detector array.

Abstract translation: 用于检查目标衬底或样本的电子束装置包括具有不对称四极静电偏转器的光束分离器，用于改善单个偏转方向的场均匀性。 不对称四极静电偏转器包括跨越大约60度的两个正交电极板和跨越大约120度的两个电极板，后两个板限定单向偏转场。 器件产生一次电子束，并将一次电子束沿光轴聚焦到目标衬底中。 在目标衬底处检测到的二次电子被聚焦成二次电子束。 具有不对称四极静电偏转器的光束分离器使二次电子束在偏转方向上偏离一次电子束的轴线并且进入检测器阵列。

公开(公告)号：US09142386B2

公开(公告)日：2015-09-22

申请号：US13833668

申请日：2013-03-15

Applicant: NISSIN ION EQUIPMENT CO., LTD.

Inventor： Sami K Hahto ,  Nariaki Hamamoto ,  Tetsuya Igo

IPC: H01J37/317 ,  H01J37/30

CPC classification number: H01J37/3171 ,  H01J37/3007 ,  H01J2237/047 ,  H01J2237/10 ,  H01J2237/24542 ,  H01J2237/30472

Abstract: In some aspects, an ion implantation system is disclosed that includes an ion source for generating a ribbon ion beam and at least one corrector device for adjusting the current density of the ribbon ion beam along its longitudinal dimension to ensure that the current density profile exhibits a desired uniformity. The ion implantation system can further include other components, such as an analyzer magnet, and electrostatic bend and focusing lenses, to shape and steer the ion beam to an end station for impingement on a substrate. In some embodiments, the present teachings allows the generation of a nominally one-dimensional ribbon beam with a longitudinal size greater than the diameter of a substrate in which ions are implanted with a high degree of longitudinal profile uniformity.

Abstract translation: 在一些方面，公开了一种离子注入系统，其包括用于产生带状离子束的离子源和用于调节带状离子束沿其纵向尺寸的电流密度的至少一个校正器装置，以确保电流密度分布呈现 所需均匀度。 离子注入系统还可以包括其它组件，例如分析器磁体，以及静电弯曲和聚焦透镜，以将离子束成形和转向终端站以冲击衬底。 在一些实施例中，本发明允许产生具有大于其中注入离子的衬底的直径的纵向尺寸的标称一维带状束，并具有高度的纵向轮廓均匀性。

公开(公告)号：US20150144788A1

公开(公告)日：2015-05-28

申请号：US14564921

申请日：2014-12-09

Applicant: Hermes Microvision Inc.

Inventor： Zhongwei Chen ,  Jack Jau ,  Weiming Ren ,  Chiyan Kuan ,  Yixiang Wang ,  Xiaoli Guo ,  Feng Cao

IPC: H01J37/26 ,  H01J37/22 ,  H01J37/28

CPC classification number: H01J37/261 ,  H01J37/226 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/063 ,  H01J2237/10 ,  H01J2237/24475 ,  H01J2237/24495 ,  H01J2237/24528 ,  H01J2237/2801 ,  H01J2237/2804 ,  H01J2237/2806 ,  H01J2237/2814

Abstract: The present invention provides a dual-beam apparatus which employs the dark-field e-beam inspection method to inspect small particles on a surface of a sample such as wafer and mask with high throughput. The dual beam apparatus comprises two single-beam dark-field units placed in a same vacuum chamber and in two different orientations. The two single-beam dark-field units can perform the particle inspection separately or almost simultaneously by means of the alternately-scanning way. The invention also proposes a triple-beam apparatus for both inspecting and reviewing particles on a sample surface within the same vacuum chamber. The triple-beam apparatus comprises one foregoing dual-beam apparatus performing the particle inspection and one high-resolution SEM performing the particle review.

Abstract translation: 本发明提供一种双光束装置，其采用暗场电子束检查方法以高生产量检查诸如晶片和掩模的样品表面上的小颗粒。 双光束装置包括放置在相同真空室中并具有两个不同取向的两个单光束暗场单元。 两个单光束暗场单元可以通过交替扫描方式分别或几乎同时进行粒子检测。 本发明还提出了一种用于检查和检查在相同真空室内的样品表面上的颗粒的三光束装置。 三光束装置包括执行颗粒检查的一个前述双光束装置和执行颗粒检查的一个高分辨率SEM。

公开(公告)号：US20150136980A1

公开(公告)日：2015-05-21

申请号：US14509402

申请日：2014-10-08

Applicant: JEOL Ltd.

Inventor： Hirofumi Iijima

IPC: H01J37/21 ,  H01J37/22 ,  H01J37/26

CPC classification number: H01J37/21 ,  H01J37/226 ,  H01J37/26 ,  H01J37/263 ,  H01J37/265 ,  H01J2237/0492 ,  H01J2237/10 ,  H01J2237/1534 ,  H01J2237/2007 ,  H01J2237/21 ,  H01J2237/2602 ,  H01J2237/2614

Abstract: An image acquisition method and system for use in transmission electron microscopy and capable of providing information about a wide range of frequency range. The method is initiated with setting at least one of the spherical aberration coefficient and chromatic aberration coefficient of the imaging system of the microscope to suppress attenuation of a contrast transfer function due to an envelope function. Then, an image is obtained by the imaging system placed in defocus conditions.

Abstract translation: 一种用于透射电子显微镜的图像采集方法和系统，能够提供有关宽范围频率范围的信息。 通过设置显微镜的成像系统的球面像差系数和色差系数中的至少一个来开始该方法，以抑制由于包络函数引起的对比度传递函数的衰减。 然后，通过放置在散焦条件下的成像系统获得图像。

公开(公告)号：US20150136978A1

公开(公告)日：2015-05-21

申请号：US14533494

申请日：2014-11-05

Applicant: JEOL Ltd.

Inventor： Tomohiro Mihira

IPC: H01J37/304 ,  H01J37/21 ,  H01J37/30

CPC classification number: H01J37/304 ,  H01J37/21 ,  H01J37/28 ,  H01J37/3005 ,  H01J2237/0492 ,  H01J2237/08 ,  H01J2237/10 ,  H01J2237/21 ,  H01J2237/216 ,  H01J2237/2448 ,  H01J2237/30472 ,  H01J2237/31749

Abstract: A focused ion beam system is offered which can make a focal adjustment without relying on the structure of a sample while suppressing damage to the sample to a minimum. Also, a method of making this focal adjustment is offered. The focused ion beam system has an ion source for producing an ion beam, a lens system for focusing the beam onto the sample, a detector for detecting secondary electrons emanating from the sample, and a controller for controlling the lens system. The controller is operative to provide control such that the sample is irradiated with the ion beam without scanning the beam and that a focus of the ion beam is varied by varying the intensity of the objective lens during the ion beam irradiation. Also, the controller measures the intensity of a signal indicating secondary electrons emanating from the sample while the intensity of the objective lens is being varied. Furthermore, the controller makes a focal adjustment of the ion beam on the basis of the intensity of the objective lens obtained when the measured intensity of the signal indicating secondary electrons is minimal.

Abstract translation: 提供了一种聚焦离子束系统，可以在不依赖于样品结构的情况下进行焦点调整，同时将样品的损伤抑制在最小。 此外，提供了进行该焦点调整的方法。 聚焦离子束系统具有用于产生离子束的离子源，用于将光束聚焦到样品上的透镜系统，用于检测从样品发出的二次电子的检测器，以及用于控制透镜系统的控制器。 控制器可操作以提供控制，使得样品被离子束照射而不扫描光束，并且通过在离子束照射期间改变物镜的强度来改变离子束的焦点。 此外，控制器测量当物镜的强度变化时指示从样品发出的二次电子的信号的强度。 此外，控制器基于当指示二次电子的信号的测量强度最小时获得的物镜的强度，对离子束进行焦点调整。