Semiconductor device having protection film with recess

    公开(公告)号:US09947752B2

    公开(公告)日:2018-04-17

    申请号:US15601180

    申请日:2017-05-22

    Inventor: Akitaka Soeno

    Abstract: A semiconductor device may include a semiconductor substrate, a first metal film covering a surface of the semiconductor substrate; a protection film covering a peripheral portion of a surface of the first metal film; and a second metal film covering a range extending across a center portion of the surface of the first metal film and a surface of the protection film, wherein a recess may be provided in the surface of the protection film, and a part of the second metal film may be in contact with an inner surface of the recess.

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