摘要:
Structures and methods of forming stacked chips are disclosed. In one embodiment, a first chip is disposed over a second chip, a top surface of the first and the second chip includes active circuitry. A first through substrate via is disposed within the first chip, the first through substrate via includes a protruding tip projecting below a bottom surface of the first chip, the bottom surface being opposite the top surface. A second through substrate via is disposed on the second chip, the second through substrate via including an opening, wherein the first protruding tip of the first chip is disposed within the opening of the second chip.
摘要:
A stacked die package includes a substrate or interposer board that includes a contact area on a top surface and landing pads surrounding the contact area. Solder pads are disposed on an opposite side of the substrate. The solder pads are electrically connected with the landing pads by inner board wiring. A reconstituted die, which includes a die surrounded by a frame, is mounted over the substrate. A top die is mounted over the reconstituted die. Both the reconstituted die and the top die are electrically connected to the substrate, e.g., by wire bonds.
摘要:
The present invention relates to semiconductor devices. According to the present invention a semiconductor device is described, comprising: a substrate for carrying a semiconductor chip on a first surface of said substrate; said semiconductor chip being punctually attached to said substrate on said first surface of said substrate via a single attachment point; and means for protecting said semiconductor chip on said first surface of said substrate at least protecting said semiconductor chip laterally.
摘要:
A semiconductor device has a semiconductor substrate, at least a first and second rewiring device on a first surface of the semiconductor substrate for the provision of an electrical contact-connection of the semiconductor substrate, and a tapering, continuous opening from a first surface to a second, opposite surface of the semiconductor substrate. At least a third and fourth rewiring device is disposed on the second surface of the semiconductor substrate and a patterned metallization on the side areas of the opening for the separate contact-connection of the first and at least the second rewiring device.
摘要:
A first reconstituted wafer is formed, followed by a first redistribution layer. In parallel, a second reconstituted wafer is formed. The second reconstituted wafer is diced along a gap such that individualized embedded chips are formed having tilted sidewalls defining an angle of more than 90 degrees with respect to the active surface of the reconstituted wafer. The embedded chips are placed with the backside on an active surface of the first reconstituted wafer on the first redistribution layer. Afterwards, a second redistribution layer is formed on the active surface of the embedded chips and tilted sidewalls wherein the second redistribution layer connects contact pads of the second chips with the first redistribution layer.
摘要:
A method of manufacturing a semiconductor structure having a wafer through-contact and a corresponding semiconductor structure This invention provides a method of manufacturing a semiconductor structure having a wafer through-contact and a corresponding semiconductor structure. The method comprises the steps of: providing a semiconductor wafer (1) having a bulk region (1a) and an active region (1b); forming a plurality of contact trenches (5a-5f) in said semiconductor wafer (1) which extend from an upper surface (O) of said active region (1b) into said bulk region (1a); forming a first dielectric isolation layer (8) on the sidewalls and the bottoms of said contact trenches (5a-5f); providing a first conductive filling (10) in said plurality of contact trenches (5a-5f); forming an aligned via (V) in said semiconductor wafer (1) which extends from a backside (B) of said bulk region (1a) into said plurality of contact trenches (5a-5f) and exposes the conductive filling (10) of said plurality of contact trenches (5a-5f); providing a second dielectric isolation layer (15) on the sidewall of said via (V); and providing a second conductive filling (20) in said via (V) which contacts the exposed conductive filling (10) of said plurality of contact trenches (5a-5f) thus forming said wafer through-contact.
摘要:
A stacked die package includes a substrate or interposer board that includes a contact area on a top surface and landing pads surrounding the contact area. Solder pads are disposed on an opposite side of the substrate. The solder pads are electrically connected with the landing pads by inner board wiring. A reconstituted die, which includes a die surrounded by a frame, is mounted over the substrate. A top die is mounted over the reconstituted die. Both the reconstituted die and the top die are electrically connected to the substrate, e.g., by wire bonds.
摘要:
The present invention provides a method for fabricating semiconductor circuit modules having the following steps: application of a patterned connection layer to a transfer substrate, application of active circuit devices and/or passive circuit devices with contact areas pointing toward the patterned connection layer, connection of the circuit devices to one another by means of a filler at least between the circuit devices, removal of the transfer substrate, and application of electrical connection devices for selective contact connection of the contact area of the circuit devices to one another.
摘要:
The invention relates to an electronic device and a method for producing it having external area contacts and having a rewiring structure and also having a semiconductor chip, which has contact areas, the external area contacts being electrically connected to the contact areas at least by means of the rewiring structure, and the external area contacts and/or the rewiring structure having chemically or galvanically selectively deposited metal.
摘要:
The present invention relates to a semiconductor device which provides a shortest possible connection between two semiconductor components 10a and 10b arranged in a manner lying opposite on a substrate 2. The two semiconductor components 10a and 10b are in each case arranged with their chip contact-connection regions 11a and 11b facing the substrate 2. A vertical through-plating device 20 connects the two chip contact-connection regions 11a and 11b.