Method of manufacturing a semiconductor structure having a wafer through-contact and a corresponding semiconductor structure
    46.
    发明申请
    Method of manufacturing a semiconductor structure having a wafer through-contact and a corresponding semiconductor structure 审中-公开
    制造具有晶片通孔接触和相应的半导体结构的半导体结构的方法

    公开(公告)号:US20070032059A1

    公开(公告)日:2007-02-08

    申请号:US11195462

    申请日:2005-08-02

    IPC分类号: H01L21/44

    CPC分类号: H01L21/76898

    摘要: A method of manufacturing a semiconductor structure having a wafer through-contact and a corresponding semiconductor structure This invention provides a method of manufacturing a semiconductor structure having a wafer through-contact and a corresponding semiconductor structure. The method comprises the steps of: providing a semiconductor wafer (1) having a bulk region (1a) and an active region (1b); forming a plurality of contact trenches (5a-5f) in said semiconductor wafer (1) which extend from an upper surface (O) of said active region (1b) into said bulk region (1a); forming a first dielectric isolation layer (8) on the sidewalls and the bottoms of said contact trenches (5a-5f); providing a first conductive filling (10) in said plurality of contact trenches (5a-5f); forming an aligned via (V) in said semiconductor wafer (1) which extends from a backside (B) of said bulk region (1a) into said plurality of contact trenches (5a-5f) and exposes the conductive filling (10) of said plurality of contact trenches (5a-5f); providing a second dielectric isolation layer (15) on the sidewall of said via (V); and providing a second conductive filling (20) in said via (V) which contacts the exposed conductive filling (10) of said plurality of contact trenches (5a-5f) thus forming said wafer through-contact.

    摘要翻译: 一种制造具有晶片通孔接触和相应的半导体结构的半导体结构的方法本发明提供一种制造具有晶片通孔接触和相应的半导体结构的半导体结构的方法。 该方法包括以下步骤:提供具有体区(1a)和有源区(1b)的半导体晶片(1); 在所述半导体晶片(1)中形成从所述有源区(1b)的上表面(O)延伸到所述体区(1a)中的多个接触沟槽(5a-5f); 在所述接触沟槽(5a-5f)的侧壁和底部上形成第一介电隔离层(8); 在所述多个接触沟槽(5a-5f)中提供第一导电填料(10); 在所述半导体晶片(1)中形成对准的通孔(V),所述半导体晶片从所述主体区域(1a)的背面(B)延伸到所述多个接触沟槽(5a-5f)中并且暴露所述导电填料 )所述多个接触沟槽(5a-5f)中; 在所述通孔(V)的侧壁上提供第二介电隔离层(15); 以及在所述通孔(V)中提供与所述多个接触沟槽(5a-5f)的暴露的导电填料(10)接触从而形成所述晶片通过接触的第二导电填料(20)。