公开(公告)号：US20230170191A1

公开(公告)日：2023-06-01

申请号：US17931916

申请日：2022-09-14

Applicant: NGK Insulators, Ltd.

Inventor： Seiya INOUE ,  Tatsuya KUNO ,  Ikuhisa MORIOKA

IPC: H01J37/32 ,  H01L21/683

CPC classification number: H01J37/32724 ,  H01L21/6833 ,  H01J2237/002 ,  H01J2237/2007

Abstract: A wafer placement table has a wafer placement surface that allows a wafer to be placed thereon. The wafer placement table includes a ceramic substrate having a built-in electrode, a cooling substrate including a refrigerant flow path, a metal joining layer that joins the ceramic substrate to the cooling substrate, and a plurality of small protrusions disposed on a reference plane of the wafer placement surface. The top surfaces of the small protrusions can support the lower surface of a wafer. The top surfaces of all the small protrusions are located on the same plane. In a flow path overlapping range of the wafer placement surface in which the wafer placement surface overlaps the refrigerant flow path in plan view, an area ratio of the small protrusions is minimized in a portion facing a most upstream portion of the refrigerant flow path.

公开(公告)号：US20230148026A1

公开(公告)日：2023-05-11

申请号：US17716853

申请日：2022-04-08

Applicant: SEMES CO., LTD.

Inventor： Seong Gil LEE ,  Myoung Sub NOH ,  Dong-Hun KIM ,  Young Je UM ,  Dong Sub OH ,  Jun Taek KOO ,  Wan Jae PARK

IPC: H01J37/32

CPC classification number: H01J37/32724 ,  H01J37/32422 ,  H01J37/32449 ,  H01J37/32834 ,  H01J2237/334 ,  H01J2237/2007

Abstract: A substrate treating method includes a temperature stabilizing step for stabilizing a temperature of the substrate to a process temperature in a treating space for treating a substrate, a pressure stabilizing step for stabilizing a pressure of a plasma space for generating a plasma and a pressure of the treating space to a process, the plasma space fluid communicating with the treating space, and a treating step for generating the plasma at the plasma space and treating the substrate using the plasma.

公开(公告)号：US20190170671A1

公开(公告)日：2019-06-06

申请号：US16147277

申请日：2018-09-28

Applicant: Hermes Microvision, Inc.

Inventor： Guochong WENG ,  Youjin WANG ,  Chiyan KUAN ,  Chung-Shih PAN

IPC: G01N23/2251 ,  H05F3/02 ,  H01J37/28 ,  H01J37/02 ,  H01J37/20

CPC classification number: G01N23/2251 ,  H01J37/026 ,  H01J37/20 ,  H01J37/28 ,  H01J2237/004 ,  H01J2237/0041 ,  H01J2237/0044 ,  H01J2237/2007 ,  H01J2237/2008 ,  H01J2237/202 ,  H01J2237/2448 ,  H01J2237/2602 ,  H01J2237/2811 ,  H01J2237/2813 ,  H05F3/02

Abstract: A structure for grounding an extreme ultraviolet mask (EUV mask) is provided to discharge the EUV mask during the inspection by an electron beam inspection tool. The structure for grounding an EUV mask includes at least one grounding pin to contact conductive areas on the EUV mask, wherein the EUV mask may have further conductive layer on sidewalls or/and back side. The inspection quality of the EUV mask is enhanced by using the electron beam inspection system because the accumulated charging on the EUV mask is grounded. The reflective surface of the EUV mask on a continuously moving stage is scanned by using the electron beam simultaneously. The moving direction of the stage is perpendicular to the scanning direction of the electron beam.

公开(公告)号：US20190013177A1

公开(公告)日：2019-01-10

申请号：US15753685

申请日：2015-08-21

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Yusuke OMINAMI ,  Akiko HISADA

IPC: H01J37/16 ,  H01J37/28 ,  H01J37/20 ,  H01J37/244

CPC classification number: H01J37/16 ,  H01J37/20 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/1825 ,  H01J2237/2003 ,  H01J2237/2007

Abstract: In order to observe a water-containing sample with excellent convenience under an air atmosphere or a gas atmosphere, or under a desired pressure, in the present invention, there is provided an observation support unit for observation by irradiating the sample disposed in a non-vacuum space separated by a diaphragm from an inner space of a charged particle optical lens barrel that generates a charged particle beam, with the charged particle beam. The observation support unit includes a main body portion for covering a hole portion that forms an observation region where the sample is observed, and the sample, and the observation support unit is directly mounted between the sample and the diaphragm, that is, on the sample.

公开(公告)号：US10043633B2

公开(公告)日：2018-08-07

申请号：US14994724

申请日：2016-01-13

Applicant: PROTOCHIPS, INC.

Inventor： John Damiano, Jr. ,  David P. Nackashi ,  Stephen E. Mick

IPC: G21K5/10 ,  H01J37/20 ,  H01J37/16 ,  H01J37/29 ,  H01J37/18 ,  H01J37/26

CPC classification number: H01J37/20 ,  H01J37/16 ,  H01J37/18 ,  H01J37/26 ,  H01J37/29 ,  H01J37/30 ,  H01J2237/2002 ,  H01J2237/2003 ,  H01J2237/2007

Abstract: A novel sample holder for specimen support devices for insertion in electron microscopes. The novel sample holder of the invention allows for the introduction of gases or liquids to specimens for in situ imaging, as well as electrical contacts for electrochemical or thermal experiments.

公开(公告)号：US20180096824A1

公开(公告)日：2018-04-05

申请号：US15700600

申请日：2017-09-11

Applicant: Panasonic Intellectual Property Management Co., Ltd.

Inventor： Tetsuhiro IWAI ,  Motoko HARA

IPC: H01J37/32 ,  B08B7/00

CPC classification number: H01J37/32495 ,  B08B7/0035 ,  H01J37/32183 ,  H01J37/32513 ,  H01J37/32715 ,  H01J2237/2007 ,  H01J2237/334

Abstract: A plasma processing apparatus comprises a base including an electrode body having a seat surface for setting a substrate held on a conveying carrier, and a platform for supporting the electrode body, and a lid configured to be moved up and down relative to the base, wherein the lid is moved down and appressed on the platform to define a closed space and a plasma is generated within the closed space to implement a plasma processing for the substrate set on the seat surface. The substrate is held on the holding sheet and set on the seat surface with the holding sheet therebetween. The plasma processing apparatus further comprises a guide being provided along a circumference of the electrode body for alignment of the frame, and a cover provided with the lid for covering at least the frame of the conveying carrier when the closed space is defined.

公开(公告)号：US20180053625A1

公开(公告)日：2018-02-22

申请号：US15510627

申请日：2016-11-11

Applicant: BEIJING UNIVERSITY OF TECHNOLOGY

Inventor： XIAODONG HAN ,  ZHIPENG LI ,  SHENGCHENG MAO ,  XIAODONG WANG ,  CHUNQIANG ZHUANG ,  JIANFEI ZHANG ,  QINGSONG DENG ,  YADI ZHAI ,  TAONAN ZHANG ,  ZE ZHANG

IPC: H01J37/20 ,  G01N23/02

CPC classification number: H01J37/20 ,  G01N23/02 ,  G01N2223/307 ,  G01N2223/32 ,  G01N2223/418 ,  H01J37/26 ,  H01J2237/2007 ,  H01J2237/206 ,  H01J2237/262

Abstract: A double-tilt in-situ nanoindentation platform for TEM (transmission electron microscope) belongs to the field of in-situ characterization of the mechanical property-microstructure relationship of materials at the nano- and atomic scale. The platform is consisted of adhesive area, support beams, bearing beams, sample loading stage and mini indenter. The overall structure of the platform is prepared by semiconductor microfabrication technology. The in-situ nanoindentation experiment can be driven by bimetallic strip, V-shaped electro-thermal beam, piezoelectric ceramics, electrostatic comb or shape memory alloys et. al. The sample is obtained by focused ion beam cutting. The integrated platform can be placed in the narrow space on the front end of the TEM sample holder, giving rise to the condition of double-axis tilt. The driving device drives the mini indenter to carry out in-situ nanoindentation, in-situ compression and in-situ bending and the like of the materials in TEM. The deformation process of material can be in-situ observed in sub angstrom, atomic and nano scale to study the deformation mechanism of material, which can further reveal the relationship of microstructure-mechanical properties of the material.

公开(公告)号：US20170301508A1

公开(公告)日：2017-10-19

申请号：US15165569

申请日：2016-05-26

Applicant: DONGFANG JINGYUAN ELECTRON LIMITED

Inventor： Weimin Ma ,  Weiqiang Sun

IPC: H01J37/20 ,  H01J37/28

CPC classification number: H01J37/20 ,  G03F1/86 ,  G03F7/7065 ,  H01J37/18 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/063 ,  H01J2237/18 ,  H01J2237/2002 ,  H01J2237/2007 ,  H01J2237/202 ,  H01J2237/20292 ,  H01J2237/24571 ,  H01J2237/2817 ,  H01L22/12

Abstract: Techniques for yield management in semiconductor inspection systems are described. According to one aspect of the present invention, an electron beam inspection system includes multiple stages or multiple chambers, where the chambers/stages (N≧2) are organized to form one or more paths for wafer/mask inspection. An inspection procedure in each chamber (or at each stage) is determined by its order in the path and the relative columns used. For a system with N chambers/stages, a maximum number of N wafers/masks can be processed simultaneously.

公开(公告)号：US20170207063A1

公开(公告)日：2017-07-20

申请号：US15131520

申请日：2016-04-18

Applicant: Varian Semiconductor Equipment Associates, Inc.

Inventor： Michael W. Osborne ,  David E. Suuronen ,  Julian G. Blake

IPC: H01J37/304 ,  H01L21/66 ,  H01J37/317 ,  H01L21/265

CPC classification number: H01J37/304 ,  H01J37/026 ,  H01J37/20 ,  H01J37/3171 ,  H01J2237/2007 ,  H01J2237/30405 ,  H01J2237/31703 ,  H01L21/265 ,  H01L22/14 ,  H01L22/20

Abstract: An ion implanter may include an electrostatic clamp to hold a substrate; a plasma flood gun generating a flux of electrons impinging upon the substrate; and a controller coupled to the plasma flood gun and including a component generating a control signal responsive to a measurement signal, the control signal to adjust operation of the plasma flood gun to a target operating level. At the target operating level the flux of electrons may comprise a stabilizing dose of electrons, the stabilizing concentration of electrons, the stabilizing concentration reducing a clamp current variation in the electrostatic clamp to a target value, the target value being less than a second value of clamp current variation when the plasma flood gun is not operating.

公开(公告)号：US09601305B2

公开(公告)日：2017-03-21

申请号：US14538332

申请日：2014-11-11

Applicant: Howard Hughes Medical Institute

Inventor： John H. Price ,  Dravida Bock

IPC: H01J37/20 ,  G01N1/28 ,  H01J37/26 ,  H01J37/02 ,  H01J37/18 ,  G01N35/00 ,  G01N1/32

CPC classification number: H01J37/20 ,  G01N1/32 ,  G01N35/00732 ,  H01J37/023 ,  H01J37/185 ,  H01J37/261 ,  H01J2237/2007 ,  H01J2237/201 ,  H01J2237/20278 ,  H01J2237/20285 ,  H01J2237/20292 ,  H01J2237/204 ,  H01J2237/26 ,  H01J2237/2602

Abstract: An electron microscope specimen sample holder including a thin sheet base member with a first surface and an opposing second surface, the first surface defining a seat and support surface for a specimen holding film held by the sample holder, the base member including an aperture through the second surface exposing the holding film held by the sample holder, and including a grip engagement zone defined at least on part of the first surface arranged to engage a gripping device, and wherein at least one of the first or second surface has machine readable structures formed thereon arranged in patterns embodying data that defines at least one predetermined characteristic of the sample holder.