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    Ion implanting apparatus
    51.
    发明授权
    Ion implanting apparatus 失效
    离子注入装置

    公开(公告)号：US08153995B2

    公开(公告)日：2012-04-10

    申请号：US12545543

    申请日：2009-08-21

    Applicant: Masayoshi Hino

    Inventor： Masayoshi Hino

    IPC: H01J37/22 ,  H01J37/20

    CPC classification number: H01J37/3171 ,  H01J37/20 ,  H01J37/22 ,  H01J37/222 ,  H01J2237/202 ,  H01J2237/20292 ,  H01J2237/221 ,  H01J2237/226 ,  H01J2237/2482

    Abstract: An illuminating device includes: a light source which is disposed outside a vacuum chamber; a light guide which guides the light emitted from the light source, into the vacuum chamber; a light projecting portion which is fixed in the vacuum chamber, and which emits the light guided by the light guide; a light receiving portion which is attached to a support table of a holder driving device, and which receives the light emitted from the light projecting portion in a state where a holder is positioned in a notch detecting position; a light guide which guides the light received by the light receiving portion; and a light emitting device which is attached to the support table, and which irradiates an outer circumferential portion of a substrate with the light guided by the light guide.

    Abstract translation: 照明装置包括：设置在真空室外的光源; 将从光源发射的光引导到真空室中的导光体; 一个固定在真空室中并发射由光导引导的光的光投射部分; 光接收部，其安装在保持器驱动装置的支撑台上，并且在保持器位于切口检测位置的状态下接收从所述光投射部发射的光; 引导由光接收部接收的光的导光体; 以及发光装置，其附接到支撑台，并且利用由光导引导的光来照射基板的外周部。

    Laser Atom Probe and Laser Atom Probe Analysis Methods
    52.
    发明申请
    Laser Atom Probe and Laser Atom Probe Analysis Methods 审中-公开
    激光原子探针和激光原子探针分析方法

    公开(公告)号：US20120080596A1

    公开(公告)日：2012-04-05

    申请号：US13227505

    申请日：2011-09-08

    Applicant: Wilfried Vandervorst

    Inventor： Wilfried Vandervorst

    IPC: H01J37/26

    CPC classification number: H01J37/226 ,  H01J37/285 ,  H01J49/0004 ,  H01J2237/04 ,  H01J2237/05 ,  H01J2237/202 ,  H01J2237/248 ,  H01J2237/2855

    Abstract: A laser atom probe system and a method for analysing a specimen by laser atom probe tomography are disclosed. The system includes a specimen holder whereon a specimen to be analyzed may be mounted, the specimen having a tip shape. The system further includes a detector, an electrode arranged between the specimen holder and the detector, and a voltage source configured to apply a voltage difference between the specimen tip and the electrode. The system also includes at least one laser system configured to direct a laser beam laterally at the specimen tip and a tip shape monitoring means configured to detect and monitor the tip shape, and/or a means for altering and/or controlling one or more laser parameters of said laser beam(s) so as to maintain, restore or control said specimen tip shape.

    Abstract translation: 公开了一种激光原子探针系统和通过激光原子探针层析成像分析样品的方法。 该系统包括可以安装待分析样品的样品架，样品具有尖端形状。 所述系统还包括检测器，布置在所述检体保持器和检测器之间的电极，以及被配置为施加所述检测头和所述电极之间的电压差的电压源。 该系统还包括至少一个激光系统，其被配置为在激光束的侧面引导激光束，以及尖端形状监测装置，被配置为检测和监视尖端形状，和/或用于改变和/或控制一个或多个激光器 所述激光束的参数，以便维持，恢复或控制所述样品尖端形状。

    Ion implantation apparatus and a method
    54.
    发明授权
    Ion implantation apparatus and a method 有权
    离子注入装置及方法

    公开(公告)号：US07989784B2

    公开(公告)日：2011-08-02

    申请号：US12494270

    申请日：2009-06-30

    Applicant: Hilton Glavish ,  Geoffrey Ryding ,  Theodore H. Smick ,  Kenneth Harry Purser

    Inventor： Hilton Glavish ,  Geoffrey Ryding ,  Theodore H. Smick ,  Kenneth Harry Purser

    IPC: H01J37/317 ,  H01J37/20

    CPC classification number: H01J37/3171 ,  H01J37/05 ,  H01J37/08 ,  H01J37/20 ,  H01J2237/057 ,  H01J2237/061 ,  H01J2237/082 ,  H01J2237/166 ,  H01J2237/2001 ,  H01J2237/2006 ,  H01J2237/201 ,  H01J2237/202

    Abstract: A hydrogen ion implanter for the exfoliation of silicon from silicon wafers uses a large scan wheel carrying 50+ wafers around its periphery and rotating about an axis. In one embodiment, the axis of rotation of the wheel is fixed and a ribbon beam of hydrogen ions is directed down on a peripheral edge of the wheel. The ribbon beam extends over the full radial width of wafers on the wheel. The beam is generated by an ion source providing an extracted ribbon beam having at least 100 mm major cross-sectional diameter. The ribbon beam may be passed through a 90° bending magnet which bends the beam in the plane of the ribbon. The magnet provides intensity correction across the ribbon to compensate for the dependency on the radial distance from the wheel axis of the speed at which parts of the wafers pass through the ribbon beam.

    Abstract translation: 用于从硅晶片剥离硅的氢离子注入机使用大的扫描轮，围绕其周边承载50个以上的晶圆并围绕一个轴线旋转。 在一个实施例中，车轮的旋转轴线是固定的，并且带状的氢离子束被向下指向车轮的周缘。 带状束在轮上的晶片的整个径向宽度上延伸。 光束由离子源产生，提供具有至少100mm主横截面直径的抽出的带状束。 带状光束可以穿过将光束弯曲在色带平面中的90°弯曲磁体。 磁体在色带上提供强度校正，以补偿从轮轴的径向距离对晶片的一部分通过带状束的速度的依赖性。

    Ion Beam Processing Apparatus
    55.
    发明申请
    Ion Beam Processing Apparatus 失效
    离子束处理装置

    公开(公告)号：US20110121207A1

    公开(公告)日：2011-05-26

    申请号：US12031696

    申请日：2008-02-14

    Applicant: Adam Alexander Brailove

    Inventor： Adam Alexander Brailove

    IPC: B01J19/08 ,  G21K5/00

    CPC classification number: H01L21/67213 ,  H01J2237/2007 ,  H01J2237/202 ,  H01J2237/204 ,  H01J2237/31701 ,  H01L21/67201

    Abstract: An ion-cut machine and method for slicing silicon ingots into thin wafers for solar cell manufacturing is set forth, amongst other embodiments and applications. One embodiment comprises two carousels: first carousel (100) adapted for circulating workpieces (55) under ion beam (10) inside target vacuum chamber (30) while second carousel (80) is adapted for carrying implanted workpieces through a sequence of process stations that may include annealing (60), cleaving (70), slice output (42), ingot replacement (52), handle bonding, cleaning, etching and others. Workpieces are essentially swapped between carousels. In one embodiment, the swapping system comprises a high throughput load lock (200) disposed in the wall of the vacuum chamber (30), a vacuum swapper (110) swapping workpieces between first carousel (100) and load lock (200), and an atmospheric swapper (90) swapping workpieces between load lock (200) and second carousel (80).

    Abstract translation: 除了其他实施例和应用之外，阐述了一种将硅锭切割成用于太阳能电池制造的薄晶片的离子切割机和方法。 一个实施例包括两个转盘：第一转盘（100），适于在目标真空室（30）内部的离子束（10）周围循环工件（55），而第二转盘（80）适于通过一系列处理站运送植入的工件， 可以包括退火（60），切割（70），切片输出（42），锭替代（52），手柄接合，清洁，蚀刻等。 工件本质上在转盘之间交换。 在一个实施例中，交换系统包括设置在真空室（30）的壁中的高通量负载锁（200），在第一转盘（100）和负载锁（200）之间交换工件的真空交换器（110），以及 大气切换器（90）在装载锁（200）和第二转盘（80）之间交换工件。

    NANOROBOT MODULE, AUTOMATION AND EXCHANGE
    58.
    发明申请
    NANOROBOT MODULE, AUTOMATION AND EXCHANGE 审中-公开
    NANOROBOT模块，自动化和交换

    公开(公告)号：US20100140473A1

    公开(公告)日：2010-06-10

    申请号：US12596707

    申请日：2008-04-24

    Applicant: Volker Klocke

    Inventor： Volker Klocke

    IPC: G01B21/30 ,  G01B21/20 ,  G01B5/28 ,  G01Q70/00

    CPC classification number: G01Q10/02 ,  G01B21/04 ,  G01Q10/04 ,  G01Q30/04 ,  G01Q30/16 ,  G01Q30/20 ,  H01J37/20 ,  H01J2237/202 ,  H01J2237/2025 ,  H01J2237/20264 ,  H01J2237/20278 ,  H01J2237/20292 ,  H01J2237/204 ,  H01J2237/28

    Abstract: A nanorobot module with a measurement device for the measurement of spatial surface properties with a measurement range in the centimetre range and a resolution in the nanometre range, that can be arranged in a vacuum chamber, for example the vacuum chamber of a microscope. Along with this integration of the nanorobot module into a vacuum chamber, the disclosure further relates to the automation of the module in the chamber system, in particular the connection of the controller of the nanorobot system and the chamber system by the provision of an interface between both systems. Finally, the disclosure relates to a mechatronic exchange adapter for the flexible securing of nanorobot modules within a vacuum chamber, in particular the disclosure relates to an exchange adapter, which preferably in one process electrically connects a nanorobot module and mechanically secures it so that it is guided with high precision and without play.

    Abstract translation: 一种具有用于测量空间表面性质的测量装置的纳米机器人模块，其具有在厘米范围内的测量范围和在纳米范围内的分辨率，其可以布置在真空室中，例如显微镜的真空室中。 随着将纳米机器人模块集成到真空室中，本发明还涉及腔室系统中的模块的自动化，特别是通过提供纳米机器人系统的控制器与腔室系统之间的界面的连接 两个系统。 最后，本公开涉及一种用于在真空室内柔性固定纳米机架模块的机电一体式交换适配器，特别地，本公开涉及一种交换适配器，其优选地在一个过程中电连接纳米机架模块并机械地固定它，使得它是 引导精准，无间隙。

    Focused ion beam apparatus and method of preparing/observing sample
    60.
    发明授权
    Focused ion beam apparatus and method of preparing/observing sample 有权
    聚焦离子束装置及其制备/观察方法

    公开(公告)号：US07626165B2

    公开(公告)日：2009-12-01

    申请号：US11703292

    申请日：2007-02-07

    Applicant: Kouji Iwasaki

    Inventor： Kouji Iwasaki

    IPC: H01J37/26 ,  G01N13/10 ,  G01N23/22

    CPC classification number: G01N23/2251 ,  G01N23/2255 ,  H01J37/3056 ,  H01J2237/202 ,  H01J2237/31749

    Abstract: A focused ion beam apparatus includes a sample base for mounting a sample, a three axis stage capable of moving the sample base in three directions: along two axes on a horizontal face and a vertical axis, and a first focused ion beam barrel and a second focused ion beam barrel for irradiating the sample with focused ion beams, the first focused ion beam barrel and the second focused ion beam barrel being arranged such that directions of the focused ion beams are substantially opposed to each other in a plane view thereof and are inclined in substantial line symmetry with regard to the vertical axis in a side view thereof.

    Abstract translation: 聚焦离子束装置包括用于安装样品的样品基底，能够沿着三个方向移动样品基底的三轴台：沿着水平面和垂直轴上的两个轴，以及第一聚焦离子束筒和第二聚焦离子束筒 聚焦离子束筒，用于用聚焦离子束照射样品，第一聚焦离子束筒和第二聚焦离子束筒布置成使得聚焦离子束的方向在其平面视图中彼此基本相对，并且倾斜 在其侧视图中相对于垂直轴线呈大致线对称。

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