Laser cleaning process for semiconductor material and the like
    1.
    发明授权
    Laser cleaning process for semiconductor material and the like 失效
    半导体材料的激光清洗工艺等

    公开(公告)号:US06494217B2

    公开(公告)日:2002-12-17

    申请号:US09768107

    申请日:2001-01-23

    IPC分类号: B08B704

    摘要: A laser cleaning process is disclosed for cleaning the surface of materials, such as semiconductor wafers and the like, which process can be performed at atmospheric pressure. The process includes the steps of providing a structure with a surface having undesirable contaminant particles thereon, wetting the surface with a liquid including reactive or non-reactive liquids, and irradiating the surface using photon energy with sufficient energy to remove the wetting liquid and the undesirable material.

    摘要翻译: 公开了用于清洁诸如半导体晶片等的材料的表面的激光清洗工艺,该工艺可以在大气压下进行。 该方法包括以下步骤:提供具有其上不期望的污染物颗粒的表面的结构,用包含反应性或非反应性液体的液体润湿表面,并且使用具有足够能量的光子能量照射表面以除去润湿液体和不期望的 材料。

    MRAM with pinned ends
    2.
    发明授权
    MRAM with pinned ends 失效
    MRAM带固定端

    公开(公告)号:US5748524A

    公开(公告)日:1998-05-05

    申请号:US701355

    申请日:1996-09-23

    IPC分类号: G11C11/15 G11C11/16 G11C11/56

    摘要: A multi-layer magnetic memory cell is provided, with magnetic end vectors adjacent the ends of the cell pinned in a fixed direction. To pin the magnetic end vectors, a magnetic field is applied to an end of at least one of the layers of magnetic material in the cell to move the magnetic end vectors in the magnetic material at the end of the cell into a fixed direction. Pinning material is then disposed adjacent to the end to maintain the magnetic end vectors in the magnetic material at the end of the cell in the fixed direction.

    摘要翻译: 提供了一个多层磁存储单元,其磁端向量靠近固定在固定方向上的单元端。 为了固定磁端向量,在单元中至少一层磁性材料的一端施加磁场,使磁性材料端端的磁端矢量移动到固定方向。 然后将钉扎材料设置成与端部相邻,以将磁端向量保持在固定方向上的电池端部的磁性材料中。

    Apparatus and method for patterning a surface
    3.
    发明授权
    Apparatus and method for patterning a surface 失效
    用于图案化表面的装置和方法

    公开(公告)号:US5725788A

    公开(公告)日:1998-03-10

    申请号:US608022

    申请日:1996-03-04

    摘要: An apparatus (95) and method for patterning a surface of an article (30), the apparatus (95) including a large-area stamp (50) for forming a self-assembled monolayer (36) (SAM) of a molecular species (38) on the surface (34) of a layer (32) of resist material, which is formed on the surface of the article (30). The large-area stamp (50) includes a layer (52) of an elastomer and has, embedded within it, mechanical structures (68, 80) which stiffen the large-area stamp (50) and deform it to control the stamped patterns. The method includes the steps of: forming a layer (32) of resist material is on the surface of the article (30), utilizing the large-area stamp (50) to form the SAM (36) on the surface (34) of the layer (32) of resist material, etching the layer (32) of resist material, and thereafter etching or plating the surface of the article (30).

    摘要翻译: 一种用于对制品(30)的表面进行图案化的装置(95)和方法,所述装置(95)包括用于形成分子种类的自组装单层(36)(SAM)的大面积印模(50) 38)形成在制品(30)的表面上的抗蚀剂材料层(32)的表面(34)上。 大面积邮票(50)包括弹性体层(52),并且内嵌有机械结构(68,80),其加强大面积印模(50)并使其变形以控制冲压图案。 该方法包括以下步骤:在制品(30)的表面上形成抗蚀剂材料层(32),利用大面积印模(50)在表面(34)上形成SAM(36) 抗蚀剂材料层(32),蚀刻抗蚀剂材料层(32),然后蚀刻或电镀制品(30)的表面。

    Method for improving the efficiency of solar cells having imperfections
    5.
    发明授权
    Method for improving the efficiency of solar cells having imperfections 失效
    提高具有缺陷的太阳能电池效率的方法

    公开(公告)号:US4343830A

    公开(公告)日:1982-08-10

    申请号:US206422

    申请日:1980-11-13

    摘要: Method and apparatus for minimizing the deleterious effects of structural imperfections in polycrystalline silicon solar cells uses a high pressure plasma system. The high pressure plasma system is used to introduce atomic hydrogen into the polycrystalline silicon substrates or into polycrystalline silicon solar cells. The silicon can be subjected to the hydrogenation either before or after it has a junction. The high pressure plasma system includes a high pressure chamber having a first and a second auxiliary chamber coupled to the high pressure chamber.

    摘要翻译: 用于最小化多晶硅太阳能电池中结构缺陷的有害影响的方法和装置使用高压等离子体系统。 高压等离子体系统用于将原子氢引入多晶硅衬底或多晶硅太阳能电池中。 硅可以在其具有连接点之前或之后进行氢化。 高压等离子体系统包括具有联接到高压室的第一和第二辅助室的高压室。

    Differential etching of silicon nitride
    6.
    发明授权
    Differential etching of silicon nitride 失效
    差示蚀刻氮化硅

    公开(公告)号:US4956314A

    公开(公告)日:1990-09-11

    申请号:US357844

    申请日:1989-05-30

    摘要: A method for differentially etching silicon nitride, preferably formed in a hydrogen free environment, wherein hydrogen is implanted into various regions of the silicon nitride. The silicon nitride may then be etched by a number of different etchants, some of which will etch the implanted regions appreciably faster and others which will etch the non-implanted regions more quickly. This method is especially useful in the fabrication of self-aligned gate devices.

    摘要翻译: 用于差异蚀刻氮化硅的方法,优选在无氢环境中形成,其中将氢注入到氮化硅的各个区域中。 氮化硅然后可以被许多不同的蚀刻剂蚀刻,其中一些蚀刻剂将蚀刻蚀刻注入区域的速度更快,而其它蚀刻剂将更快地蚀刻非注入区域。 该方法在自对准栅极器件的制造中特别有用。

    Dopant predeposition from high pressure plasma source
    7.
    发明授权
    Dopant predeposition from high pressure plasma source 失效
    掺杂剂从高压等离子体源预沉积

    公开(公告)号:US4382099A

    公开(公告)日:1983-05-03

    申请号:US314609

    申请日:1981-10-26

    摘要: A method is provided for predepositing dopant material on semiconductor substrates. The semiconductor substrates are positioned within a high pressure plasma reactor apparatus. A high pressure rf plasma is generated in the apparatus at a pressure of about one atmosphere or greater. Dopant materials such as B.sub.2 H.sub.6, PH.sub.3, or AsH.sub.3 are introduced to the plasma and form ionized species of the dopant. The plasma and the ionized species are directed to the surface of the semiconductor substrates whereon a uniform layer of the dopant is deposited.

    摘要翻译: 提供了一种用于在半导体衬底上预先沉积掺杂剂材料的方法。 半导体衬底位于高压等离子体反应器装置内。 在大约一个大气压或更大的压力下,在装置中产生高压rf等离子体。 将诸如B 2 H 6,PH 3或AsH 3的掺杂材料引入到等离子体中并形成掺杂剂的离子化物质。 等离子体和电离物质被引导到半导体衬底的表面,其中淀积了均匀的掺杂剂层。

    Process for forming self-supporting semiconductor film
    8.
    发明授权
    Process for forming self-supporting semiconductor film 失效
    用于形成自支撑半导体膜的工艺

    公开(公告)号:US4370288A

    公开(公告)日:1983-01-25

    申请号:US207845

    申请日:1980-11-18

    摘要: A process is provided for forming a self-supporting semiconductor film or ribbon. A TESS substrate is prepared from a substrate of refractory material having an expansion coefficient different from the expansion coefficient of the semiconductor material. A colloidal suspension of graphite is applied to the substrate to form a thin layer of loosely adherent graphite particles. Over this layer of graphite is deposited a layer of the semiconductor material, the deposition occurring at an elevated temperature. Upon cooling from the deposition temperature, the differential thermal expansion coefficience causes the shearing at the graphite layer and therefore provides for the easy removal of the semiconductor layer from the substrate.

    摘要翻译: 提供了一种用于形成自支撑半导体膜或带的工艺。 从具有与半导体材料的膨胀系数不同的膨胀系数的耐火材料的基材制备TESS基材。 将石墨的胶体悬浮液施加到基底上以形成松散粘附的石墨颗粒的薄层。 在该层石墨上淀积一层半导体材料,沉积在升高的温度下发生。 在从沉积温度冷却时,不同的热膨胀系数导致在石墨层处的剪切,因此提供了从衬底中容易地去除半导体层。

    Enhanced probe for gathering data from semiconductor devices
    9.
    发明授权
    Enhanced probe for gathering data from semiconductor devices 失效
    用于从半导体器件收集数据的增强型探针

    公开(公告)号:US06703258B2

    公开(公告)日:2004-03-09

    申请号:US10187526

    申请日:2002-07-02

    IPC分类号: H01L2100

    摘要: An enhanced conductive probe that facilitates the gathering of data and a method of fabricating the probe. The probe includes an amplifier fabricated to define the probe tip. More particularly, the probe structure is defined by an amplifier formed as one of a metal oxide semiconductor (MOS) transistor, a bipolar amplifier, or a metal semiconductor field effect transistor (MESFET), thereby providing for the amplification of the input signal and improved signal to noise ratio during operation of the probe tip.

    摘要翻译: 促进数据收集的增强导电探针和制造探针的方法。 该探头包括一个制造用于限定探头尖端的放大器。 更具体地,探针结构由形成为金属氧化物半导体(MOS)晶体管,双极放大器或金属半导体场效应晶体管(MESFET)之一的放大器限定,从而提供输入信号的放大和改进 探针尖端运行期间的信噪比。

    Apparatus for providing surface images and method for making the
apparatus
    10.
    发明授权
    Apparatus for providing surface images and method for making the apparatus 失效
    用于提供表面图像的装置和用于制造该装置的方法

    公开(公告)号:US5772325A

    公开(公告)日:1998-06-30

    申请号:US560600

    申请日:1995-11-20

    摘要: A probe (10) is formed to provide a topographical and thermal image of a semiconductor device. The probe (10) is made from a first ribbon of material (11) and a second ribbon of material (12) which forms a thermocouple junction (13). A probe tip (15) is then attached to the thermocouple junction (13) with an epoxy (14). In an alternate embodiment of the present invention, a probe (20) has a point region (17) which is formed by bending a portion of the thermocouple junction (13) and coating the point region (17) is coated with a thermally conductive material. An optical signal is then reflected off a planar portion of the first ribbon of material (11), the second ribbon of material (12), or the thermocouple junction (13) so the motion of the probe (10,20) can be monitored by an optical detector.

    摘要翻译: 形成探针(10)以提供半导体器件的形貌和热图像。 探针(10)由形成热电偶接头(13)的第一材料带(11)和第二材料带(12)制成。 然后用环氧树脂(14)将探针尖端(15)附接到热电偶接头(13)。 在本发明的替代实施例中,探针(20)具有通过弯曲热电偶接合部分(13)的一部分并且涂覆点区域(17)而形成的点区域(17),其中涂覆有导热材料 。 然后,光信号从第一材料带(11)的平面部分,第二材料带(12)或热电偶结(13)反射,使得可以监测探针(10,20)的运动 通过光学检测器。