SCHOTTKY BARRIER DIODE
    3.
    发明申请

    公开(公告)号:US20180151756A1

    公开(公告)日:2018-05-31

    申请号:US15823206

    申请日:2017-11-27

    Applicant: ROHM CO., LTD.

    Inventor: Hiroki YAMAMOTO

    Abstract: A Schottky barrier diode includes a semiconductor layer having a major surface, a diode region of a first conductivity type formed in a surface layer portion of the semiconductor layer, a first conductivity type impurity region formed in the surface layer portion of the semiconductor layer and electrically connected to the diode region, a first electrode layer formed on the major surface of the semiconductor layer and forming a Schottky junction with the diode region, a second electrode layer formed on the major surface of the semiconductor layer and forming an ohmic junction with the first conductivity type impurity region, and a contact electrode layer formed on a peripheral region of the major surface of the semiconductor layer surrounding the first electrode layer so as to be electrically connected to the diode region via the semiconductor layer and being electrically connected to the second electrode layer.

    DISCRETE CAPACITOR AND MANUFACTURING METHOD THEREOF
    6.
    发明申请
    DISCRETE CAPACITOR AND MANUFACTURING METHOD THEREOF 有权
    离散电容器及其制造方法

    公开(公告)号:US20150280016A1

    公开(公告)日:2015-10-01

    申请号:US14668384

    申请日:2015-03-25

    Applicant: ROHM CO., LTD.

    Inventor: Hiroki YAMAMOTO

    CPC classification number: H01L27/0805 H01L28/60 H01L29/66181 H01L29/94

    Abstract: A discrete capacitor of the present invention includes a substrate having a front surface portion, an impurity diffusion layer formed on the front surface portion of the substrate, an oxide film formed on the substrate and having a first opening to selectively expose the impurity diffusion layer, a dielectric film formed on the impurity region having been exposed from the oxide film, and a first electrode opposed to the impurity diffusion layer with the dielectric film therebetween, wherein the impurity concentration on the front surface portion of the impurity diffusion layer is 5×1019 cm−3 or more.

    Abstract translation: 本发明的分立电容器包括:具有表面部分的基板,形成在基板的前表面部分上的杂质扩散层;形成在基板上的氧化膜,并具有用于选择性地暴露杂质扩散层的第一开口; 形成在从该氧化膜露出的杂质区域上的电介质膜和与该杂质扩散层相对的该杂质扩散层的第一电极,其中该杂质扩散层前表面部分的杂质浓度为5×1019 cm -3以上。

    BIDIRECTIONAL ZENER DIODE
    7.
    发明申请
    BIDIRECTIONAL ZENER DIODE 有权
    双向ZENER二极管

    公开(公告)号:US20150255628A1

    公开(公告)日:2015-09-10

    申请号:US14635627

    申请日:2015-03-02

    Applicant: ROHM CO., LTD.

    Inventor: Hiroki YAMAMOTO

    Abstract: A bidirectional Zener diode of the present invention includes a semiconductor substrate of a first conductivity type, a first electrode and a second electrode which are defined on the semiconductor substrate, and a plurality of diffusion regions of a second conductivity type, which are defined at intervals from one another on a surface portion of the semiconductor substrate, to define p-n junctions with the semiconductor substrate, and the plurality of diffusion regions include diode regions which are electrically connected to the first electrode and the second electrode, and pseudo-diode regions which are electrically isolated from the first electrode and the second electrode.

    Abstract translation: 本发明的双向齐纳二极管包括限定在半导体衬底上的第一导电类型的半导体衬底,第一电极和第二电极以及间隔限定的多个第二导电类型的扩散区 在所述半导体衬底的表面部分上彼此定义与所述半导体衬底的pn结,并且所述多个扩散区域包括电连接到所述第一电极和所述第二电极的二极管区域,以及伪二极管区域, 与第一电极和第二电极电隔离。

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