Interposer Having a Defined Through Via Pattern
    1.
    发明申请
    Interposer Having a Defined Through Via Pattern 有权
    具有通过图案定义的插值器

    公开(公告)号:US20130292830A1

    公开(公告)日:2013-11-07

    申请号:US13463474

    申请日:2012-05-03

    IPC分类号: H01L23/485 H05K1/11 G06F17/50

    摘要: A structure includes a substrate having a plurality of balls, a semiconductor chip, and an interposer electrically connecting the substrate and the semiconductor chip. The interposer includes a first side, a second side opposite the first side, at least one first exclusion zone extending through the interposer above each ball of the plurality of balls, at least one active through via extending from the first side of the interposer to the second side of the interposer, wherein the at least one active through via is formed outside the at least one first exclusion zone and wherein no active through vias are formed within the at least one first exclusion zone, and at least one dummy through via extending from the first side of the interposer to the second side of the interposer, wherein the at least one dummy through via is formed within the at least one first exclusion zone.

    摘要翻译: 一种结构包括具有多个球的衬底,半导体芯片和电连接衬底和半导体芯片的插入器。 所述插入器包括第一侧,与所述第一侧相对的第二侧,至少一个第一排除区域,所述至少一个第一排除区域延伸穿过所述多个球的每个球上方的所述插入器,至少一个主动通孔,其从所述插入件的第一侧延伸到 其中所述至少一个活性通孔形成在所述至少一个第一排除区域的外部,并且其中在所述至少一个第一排除区域内没有形成活性通孔,以及至少一个虚拟通孔, 所述插入器的第一侧到所述插入件的第二侧,其中所述至少一个虚拟通孔形成在所述至少一个第一排除区域内。

    Interposer having a defined through via pattern
    2.
    发明授权
    Interposer having a defined through via pattern 有权
    内插器具有定义的通孔图案

    公开(公告)号:US08664768B2

    公开(公告)日:2014-03-04

    申请号:US13463474

    申请日:2012-05-03

    摘要: A structure includes a substrate having a plurality of balls, a semiconductor chip, and an interposer electrically connecting the substrate and the semiconductor chip. The interposer includes a first side, a second side opposite the first side, at least one first exclusion zone extending through the interposer above each ball of the plurality of balls, at least one active through via extending from the first side of the interposer to the second side of the interposer, wherein the at least one active through via is formed outside the at least one first exclusion zone and wherein no active through vias are formed within the at least one first exclusion zone, and at least one dummy through via extending from the first side of the interposer to the second side of the interposer, wherein the at least one dummy through via is formed within the at least one first exclusion zone.

    摘要翻译: 一种结构包括具有多个球的衬底,半导体芯片和电连接衬底和半导体芯片的插入器。 所述插入器包括第一侧,与所述第一侧相对的第二侧,至少一个第一排除区域,所述至少一个第一排除区域延伸穿过所述多个球的每个球上方的所述插入器,至少一个主动通孔,其从所述插入件的第一侧延伸到 其中所述至少一个活性通孔形成在所述至少一个第一排除区域的外部,并且其中在所述至少一个第一排除区域内没有形成活性通孔,以及至少一个虚拟通孔, 所述插入器的第一侧到所述插入件的第二侧,其中所述至少一个虚拟通孔形成在所述至少一个第一排除区域内。

    METHODS AND APPARATUS FOR HEAT SPREADER ON SILICON
    6.
    发明申请
    METHODS AND APPARATUS FOR HEAT SPREADER ON SILICON 有权
    有机硅热交换器的方法与装置

    公开(公告)号:US20130270686A1

    公开(公告)日:2013-10-17

    申请号:US13444558

    申请日:2012-04-11

    IPC分类号: H01L23/34 H01L21/60

    摘要: Apparatus and methods for forming a heat spreader on a substrate to release heat for a semi-conductor package are disclosed. The apparatus comprises a substrate. A dielectric layer is formed next to the substrate and in contact with a surface of the substrate. A heat spreader is formed next to the substrate and in contact with another surface of the substrate. A passivation layer is formed next to the dielectric layer. A connection pad is placed on top of the passivation layer. The substrate may comprise additional through-silicon-vias. The contact surface between the substrate and the heat spreader may be a scraggy surface. The packaging method further proceeds to connect a chip to the connection pad by way of a connection device such as a solder ball or a bump.

    摘要翻译: 公开了一种用于在基板上形成散热器以释放用于半导体封装的热量的装置和方法。 该装置包括基板。 在基板的旁边形成介电层,与基板的表面接触。 散热器形成在基板的旁边并与基板的另一个表面接触。 在电介质层的旁边形成钝化层。 连接焊盘放置在钝化层的顶部。 衬底可以包括另外的通硅通孔。 基板和散热器之间的接触表面可能是肮脏的表面。 包装方法还进一步通过诸如焊球或凸块的连接装置将芯片连接到连接焊盘。

    Methods and apparatus for heat spreader on silicon
    8.
    发明授权
    Methods and apparatus for heat spreader on silicon 有权
    散热器在硅上的方法和装置

    公开(公告)号:US09236322B2

    公开(公告)日:2016-01-12

    申请号:US13444558

    申请日:2012-04-11

    IPC分类号: H01L23/34 H01L23/367

    摘要: Apparatus and methods for forming a heat spreader on a substrate to release heat for a semi-conductor package are disclosed. The apparatus comprises a substrate. A dielectric layer is formed next to the substrate and in contact with a surface of the substrate. A heat spreader is formed next to the substrate and in contact with another surface of the substrate. A passivation layer is formed next to the dielectric layer. A connection pad is placed on top of the passivation layer. The substrate may comprise additional through-silicon-vias. The contact surface between the substrate and the heat spreader may be a scraggy surface. The packaging method further proceeds to connect a chip to the connection pad by way of a connection device such as a solder ball or a bump.

    摘要翻译: 公开了一种用于在基板上形成散热器以释放用于半导体封装的热量的装置和方法。 该装置包括基板。 在基板的旁边形成介电层,与基板的表面接触。 散热器形成在基板的旁边并与基板的另一个表面接触。 在电介质层的旁边形成钝化层。 连接焊盘放置在钝化层的顶部。 衬底可以包括另外的通硅通孔。 基板和散热器之间的接触表面可能是肮脏的表面。 包装方法还进一步通过诸如焊球或凸块的连接装置将芯片连接到连接焊盘。