Manufacturing method of semiconductor device and semiconductor device
    37.
    发明专利
    Manufacturing method of semiconductor device and semiconductor device 审中-公开
    半导体器件和半导体器件的制造方法

    公开(公告)号:JP2010123676A

    公开(公告)日:2010-06-03

    申请号:JP2008294635

    申请日:2008-11-18

    Abstract: PROBLEM TO BE SOLVED: To provide a manufacturing method that prevents a connection failure from occurring resulting from the suck-up of backup solder to a solder bump side when the solder bump at a semiconductor chip side and the backup solder at a package board side are simultaneously heat-dissolved so as to connect the semiconductor chip and a package board. SOLUTION: The same material is used for a semiconductor bump 11 and for backup solder 21. The ratio r2/r1 of an aperture radius (UBM diameter) r1 where the solder bump 11 is in contact with the semiconductor chip 10 and the solder resist aperture radius (SRO diameter) r2 where the backup solder 21 is in contact with the package base board 20 is made to be 0.8 or greater and 1.2 or smaller. At this time, the height h1 of the solder bump 11 is made higher than the height h2 of the backup solder 21. Furthermore, the solder quantity of the solder bump 11 and that of the backup solder 21 are determined so as to satisfy "the curvature radius R2 of the backup solder" ≥ "the curvature radius R1 of the solder bump 11". Furthermore, the solder resist aperture radius (SRO diameter) r2 with which the backup solder 21 is in contact is equal to or greater than the height h2 of the backup solder 21. COPYRIGHT: (C)2010,JPO&INPIT

    Abstract translation: 要解决的问题:提供一种制造方法,其防止当在半导体芯片侧的焊料凸块和在封装处的备用焊料时将备用焊料吸附到焊料凸块侧而发生连接故障 板侧同时被热溶解,以便连接半导体芯片和封装板。 解决方案:半导体凸块11和备用焊料21使用相同的材​​料。焊料凸块11与半导体芯片10接触的孔径半径(UBM直径)r1的比r2 / r1和 备用焊料21与封装基板20接触的阻焊孔径半径(SRO直径)r2为0.8以上且1.2以下。 此时,焊料凸块11的高度h1高于备用焊料21的高度h2。此外,焊料凸块11和备用焊料21的焊料量被确定为满足“ 备用焊料的曲率半径R2“≥”焊料凸块11“的曲率半径R1”。 此外,备用焊料21与其接触的阻焊孔径半径(SRO直径)r2等于或大于备用焊料21的高度h2。版权所有(C)2010,JPO&INPIT

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