Abstract:
For a suppressed breakage after a flip chip connection of a semiconductor device using a low-permittivity insulation film and a lead-free solder together, with an enhanced production yield, bump electrodes (2) are heated by a temperature profile having, after a heating up to a melting point of the bump electrodes (2) or more, a cooling in which a temperature within a range of 190 to 210° C. is kept for an interval of time within a range of 3 to 15 minutes, and a condition is met, such that 1.4
Abstract:
A power semiconductor module is disclosed. One embodiment includes a multilayer substrate having a plurality of metal layers and a plurality of ceramic layers, where the ceramic layers are located between the metal layers.
Abstract:
A stacked mounting structure includes at least two substrates namely a first substrate on which a first protruding electrode is formed and a second substrate on which a second protruding electrode is formed, and an intermediate substrate which is disposed between the first substrate and the second substrate, and which connects the first substrate and the second substrate by leaving a predetermined gap between the first substrate and the second substrate. Mounted components are disposed in the gap between the first substrate and the second substrate. The first protruding electrode and the second protruding electrode are connected in an opening which is provided in the intermediate substrate.
Abstract:
PROBLEM TO BE SOLVED: To provide a manufacturing method that prevents a connection failure from occurring resulting from the suck-up of backup solder to a solder bump side when the solder bump at a semiconductor chip side and the backup solder at a package board side are simultaneously heat-dissolved so as to connect the semiconductor chip and a package board. SOLUTION: The same material is used for a semiconductor bump 11 and for backup solder 21. The ratio r2/r1 of an aperture radius (UBM diameter) r1 where the solder bump 11 is in contact with the semiconductor chip 10 and the solder resist aperture radius (SRO diameter) r2 where the backup solder 21 is in contact with the package base board 20 is made to be 0.8 or greater and 1.2 or smaller. At this time, the height h1 of the solder bump 11 is made higher than the height h2 of the backup solder 21. Furthermore, the solder quantity of the solder bump 11 and that of the backup solder 21 are determined so as to satisfy "the curvature radius R2 of the backup solder" ≥ "the curvature radius R1 of the solder bump 11". Furthermore, the solder resist aperture radius (SRO diameter) r2 with which the backup solder 21 is in contact is equal to or greater than the height h2 of the backup solder 21. COPYRIGHT: (C)2010,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a method for manufacturing a semiconductor device and a semiconductor device, which suppresses breakdown after flip-chip connection of a semiconductor device, using a lead-free solder and a low dielectric constant insulating film, and improves the yield in production with high reliability. SOLUTION: A step where a bump electrode 2 and a precoat 35 are formed of a tin and copper alloy, and an electrode pad 13 of a semiconductor 1 and an electrode pad 33 of an interposer substrate 3 are connected via the bump electrode 2, by heating and melting the bump electrode 2, wherein the bump electrode 2 is heated in a temperature profile, where a temperature of 190 to 210°C is kept for 3 to 15 minutes at the time of lowering the temperature after the bump electrode 2 is heated to the meting temperature of the bump electrode 2 or higher. The condition of 1.4 b a a , and that of the electrode pad 13 is as L b . COPYRIGHT: (C)2009,JPO&INPIT
Abstract translation:要解决的问题:提供一种半导体器件和半导体器件的制造方法,其使用无铅焊料和低介电常数绝缘膜来抑制半导体器件的倒装芯片连接之后的击穿,以及 以高可靠性提高生产产量。 解决方案:凸块电极2和预涂层35由锡和铜合金形成的步骤,半导体1的电极焊盘13和内插基片3的电极焊盘33经由突起电极 如图2所示,通过对突起电极2进行加热熔融,其中凸起电极2在降低凸点电极后的温度时保持温度为190〜210℃的温度分布3〜15分钟的温度分布 2被加热到凸块电极2的温度或更高。 如果电极焊盘33的直径为L a SB>,则满足1.4 b SB> a SB> <1.6的条件, 的电极焊盘13为L b SB>。 版权所有(C)2009,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To prevent part of a bump electrode from locally generating large stresses, with respect to a semiconductor device, wherein a first terminal electrode formed on a semiconductor chip and a second terminal electrode formed on a wiring board are connected each other via the bump electrode. SOLUTION: In the semiconductor device 100, an insulating resin layer 43 containing a conductive particle 44 is disposed between electrode pads 12, 22 and the bump electrode 30, and the conductive particle 44 having a direct contact with the pads 12, 22 and the bump electrode 30 is so resilient that is deformed flat between the electrode pads 12, 22 and the bump electrode 30. COPYRIGHT: (C)2008,JPO&INPIT