Abstract:
The disclosure relates to semiconductor structures and, more particularly, to barrier structures for underfill blockout regions uses in phonotics chip packaging and methods of manufacture. The structure includes a substrate with a plurality of solder connections and at least one optical fiber interface disposed within at least one cavity of the substrate. The structure further includes a barrier structure formed about the cavity which is structured to prevent underfill material from degrading an optical coupling of the optical fiber.
Abstract:
The present invention relates generally to integrated circuit (IC) chip packaging, and more particularly, to a structure and method of forming a glass interposer having thermally conductive vias in addition to electrically conductive vias. The thermally conductive vias help dissipate heat from one or more IC chips, through the glass interposer, into an organic carrying, and then, into an underlying substrate where it can be dissipated.
Abstract:
Device structures for a bipolar junction transistor and methods for fabricating such device structures. An emitter structure is formed that has a semiconductor layer with a top surface defining a recess and a sacrificial layer comprised of a disposable material in the recess. A contact opening is formed that extends through one or more first dielectric layers to the sacrificial layer. After the contact opening is formed, the sacrificial layer is removed from the recess. Alternatively, the layer in the recess may be comprised of a non-disposable material that may occupy the recess at the time that a contact is formed in the contact opening.
Abstract:
A semiconductor structure with an interconnect level above a substrate and including a conductive pad and a metallic structure, such as a base of a crackstop. A first dielectric layer is above the conductive pad and above the metallic structure. A first opening in the first dielectric layer is aligned with and exposes the conductive pad and a second opening is aligned with and exposes the metallic structure. A metallic liner lines the first opening and the second opening and is on the top surface of the first dielectric layer. A second dielectric layer is above the metallic liner and a third dielectric layer is above the second dielectric layer. A third opening exposes a portion of the metal liner above the conductive pad and a copper plug and pedestal are in the third opening on the exposed portion of the metal liner.
Abstract:
A test wafer is disclosed with a first side configured to have integrated circuits formed thereon and a second side with a test structure formed thereon. The test wafer can include electrical test structures embedded in the second side of the wafer. An electrical test of the test wafer can be performed after handling by a tool used in a wafer manufacturing process to determine if the tool caused a defect on the second side of the wafer. The test structure can include a blanket layer disposed on the second side of the wafer. The test wafer can then be exposed to a wet etch and inspected thereafter for the presence of an ingress path caused from the etch chemistry. The presence of an ingress path is an indication that the tool used prior to the wet etch caused a defect in the wafer.
Abstract:
The disclosure relates to semiconductor structures and, more particularly, to waveguide structures used in phonotics chip packaging and methods of manufacture. The structure includes: a first die comprising photonics functions including a waveguide structure; a second die bonded to the first die and comprising CMOS logic functions; and an optical fiber optically coupled to the waveguide structure and positioned within a cavity formed in the second die.
Abstract:
A design structure for an integrated radio frequency (RF) filter on a backside of a semiconductor substrate includes: a device on a first side of a substrate; a radio frequency (RF) filter on a backside of the substrate; and at least one substrate conductor extending from the front side of the substrate to the backside of the substrate and electrically coupling the RF filter to the device.
Abstract:
The disclosure relates to semiconductor structures and, more particularly, to barrier structures for underfill blockout regions uses in phonotics chip packaging and methods of manufacture. The structure includes a substrate with a plurality of solder connections and at least one optical fiber interface disposed within at least one cavity of the substrate. The structure further includes a barrier structure formed about the cavity which is structured to prevent underfill material from degrading an optical coupling of the optical fiber.
Abstract:
An apparatus and method for leak detection of coolant gas from a chuck. The apparatus includes a chuck having a top surface and configured to clamp a substrate to the top surface, the chuck having one or more recessed regions in the top surface, the recessed regions configured to allow a cooling gas to contact a backside of the substrate; a cooling gas inlet and a cooling gas outlet connected to the one or more recessed regions; a first measurement device connected to the cooling gas inlet and configured to measure a first amount of cooling gas entering the cooling gas inlet and a second measurement device connected to the cooling gas outlet and configured to measure a second amount of cooling gas exiting from the cooling gas outlet; and a controller configured to determine a difference between the first amount of cooling gas and the second amount of cooling gas.
Abstract:
“Thick line dies” that, during manufacture, avoid locating an upstanding edge of a photoresist layer (for example, the edge of a dry film photoresist layer) on top of a “discontinuity.” In this way solder does not flow into the mechanical interface between the photoresist layer and the layer under the photoresist layer in the vicinity of an upstanding edge of the photoresist layer.