Replacement emitter for reduced contact resistance
    3.
    发明授权
    Replacement emitter for reduced contact resistance 有权
    替代发射器,降低接触电阻

    公开(公告)号:US09425269B1

    公开(公告)日:2016-08-23

    申请号:US14747604

    申请日:2015-06-23

    Abstract: Device structures for a bipolar junction transistor and methods for fabricating such device structures. An emitter structure is formed that has a semiconductor layer with a top surface defining a recess and a sacrificial layer comprised of a disposable material in the recess. A contact opening is formed that extends through one or more first dielectric layers to the sacrificial layer. After the contact opening is formed, the sacrificial layer is removed from the recess. Alternatively, the layer in the recess may be comprised of a non-disposable material that may occupy the recess at the time that a contact is formed in the contact opening.

    Abstract translation: 双极结型晶体管的器件结构及其制造方法。 形成发射体结构,其具有半导体层,其具有限定凹部的顶表面和在凹部中由一次性材料构成的牺牲层。 形成了延伸穿过一个或多个第一介电层到牺牲层的接触开口。 在形成接触开口之后,从凹部移除牺牲层。 或者,凹部中的层可以由在接触开口中形成接触时可能占据凹部的非一次性材料构成。

    Semiconductor test wafer and methods for use thereof
    5.
    发明授权
    Semiconductor test wafer and methods for use thereof 有权
    半导体测试晶片及其使用方法

    公开(公告)号:US09257352B2

    公开(公告)日:2016-02-09

    申请号:US13835358

    申请日:2013-03-15

    CPC classification number: H01L22/34

    Abstract: A test wafer is disclosed with a first side configured to have integrated circuits formed thereon and a second side with a test structure formed thereon. The test wafer can include electrical test structures embedded in the second side of the wafer. An electrical test of the test wafer can be performed after handling by a tool used in a wafer manufacturing process to determine if the tool caused a defect on the second side of the wafer. The test structure can include a blanket layer disposed on the second side of the wafer. The test wafer can then be exposed to a wet etch and inspected thereafter for the presence of an ingress path caused from the etch chemistry. The presence of an ingress path is an indication that the tool used prior to the wet etch caused a defect in the wafer.

    Abstract translation: 公开了一种测试晶片,其第一侧被配置为具有形成在其上的集成电路,以及形成有测试结构的第二侧。 测试晶片可以包括嵌入晶片第二侧的电测试结构。 测试晶片的电气测试可以在通过晶片制造过程中使用的工具处理之后进行,以确定工具是否在晶片的第二侧引起缺陷。 测试结构可以包括布置在晶片的第二侧上的覆盖层。 然后可以将测试晶片暴露于湿蚀刻,然后检查是否存在由蚀刻化学物质引起的入口路径。 进入路径的存在表示在湿蚀刻之前使用的工具导致晶片中的缺陷。

    Method and apparatus for detecting foreign material on a chuck
    9.
    发明授权
    Method and apparatus for detecting foreign material on a chuck 有权
    用于检测卡盘上异物的方法和装置

    公开(公告)号:US09508578B2

    公开(公告)日:2016-11-29

    申请号:US14171874

    申请日:2014-02-04

    CPC classification number: H01L21/67288 G01F1/76 H01L21/00 H01L21/67109

    Abstract: An apparatus and method for leak detection of coolant gas from a chuck. The apparatus includes a chuck having a top surface and configured to clamp a substrate to the top surface, the chuck having one or more recessed regions in the top surface, the recessed regions configured to allow a cooling gas to contact a backside of the substrate; a cooling gas inlet and a cooling gas outlet connected to the one or more recessed regions; a first measurement device connected to the cooling gas inlet and configured to measure a first amount of cooling gas entering the cooling gas inlet and a second measurement device connected to the cooling gas outlet and configured to measure a second amount of cooling gas exiting from the cooling gas outlet; and a controller configured to determine a difference between the first amount of cooling gas and the second amount of cooling gas.

    Abstract translation: 一种用于从卡盘泄漏检测冷却剂气体的装置和方法。 该装置包括具有顶表面并被配置为将基板夹持到顶表面的卡盘,卡盘在顶表面中具有一个或多个凹陷区域,凹陷区域被配置为允许冷却气体接触基板的背面; 连接到所述一个或多个凹陷区域的冷却气体入口和冷却气体出口; 连接到冷却气体入口并被配置成测量进入冷却气体入口的第一量的冷却气体的第一测量装置和连接到冷却气体出口的第二测量装置,其被配置成测量从冷却出口排出的第二量的冷却气体 气体出口; 以及控制器,被配置为确定所述第一冷却气体量与所述第二冷却气体量之间的差。

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