Multilayer electrical interconnect fabrication with few process steps
    111.
    发明授权
    Multilayer electrical interconnect fabrication with few process steps 失效
    多层电气互连制造,具有很少的工艺步骤

    公开(公告)号:US5118385A

    公开(公告)日:1992-06-02

    申请号:US705843

    申请日:1991-05-28

    Abstract: Method for making a multilayer electrical interconnect with stacked pillars between layers using a minimal number of conventional process steps. The method includes sputtering a chromium/copper/titanium trilayer on a dielectric base, depositing a patterned mask on the trilayer, etching the exposed trilayer, removing the mask, depositing a layer of polyimide over the unetched copper, forming a via in the polyimide above the copper, electrolessly plating nickel into the via, and polishing the interconnect to form a planar top surface.

    Abstract translation: 使用最少数量的常规工艺步骤在层之间制造具有堆叠柱的多层电互连的方法。 该方法包括在电介质基底上溅射铬/铜/钛三叠层,在三层上沉积图案化掩模,蚀刻暴露的三层,去除掩模,在未蚀刻的铜上沉积聚酰亚胺层,在上述聚酰亚胺中形成通孔 铜,无电镀镍到通孔中,并且研磨互连以形成平坦的顶表面。

    Method of patterning electroless plated metal on a polymer substrate
    112.
    发明授权
    Method of patterning electroless plated metal on a polymer substrate 失效
    在聚合物基材上构图化学镀金属的方法

    公开(公告)号:US4981715A

    公开(公告)日:1991-01-01

    申请号:US494897

    申请日:1990-03-13

    Abstract: A method is described for patterning electroless plated metal on a polymer substrate. A substrate is first coated with a polymer suitable for complexing noble metal compounds. The substrate is then complexed with a noble metal compound, such as containing palladium, selectively irradiated to form the desired conductor pattern, and then etched so that the desired pattern remains. The substrate is subsequently placed in an electroless plating bath to form a metal pattern. Alternatively, before applying the noble metal compound, a substrate immersed in a polymer solution suitable for complexing a noble metal compound can be selectively irradiated to selectively deposit polymer on the substrate, followed by applying a noble metal compound and an electroless plating bath.

    Abstract translation: 描述了一种在聚合物基底上构图化学镀金属的方法。 首先用适合于络合贵金属化合物的聚合物涂覆基材。 然后将衬底与贵金属化合物(例如含有钯)复合,选择性地照射以形成所需的导体图案,然后蚀刻,使得所需图案保留。 然后将衬底放置在化学镀浴中以形成金属图案。 或者,在应用贵金属化合物之前,可以选择性地照射浸渍在适于配合贵金属化合物的聚合物溶液中的基板,以选择性地将聚合物沉积在基板上,然后涂覆贵金属化合物和化学镀浴。

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