Abstract:
Some embodiments include a capacitive chip having a plurality of capacitive units. The individual capacitive units include alternating electrode layers and dielectric layers in a capacitor stack. The capacitor stack extends across an undulating topography. The undulating topography has peaks and valleys with the peaks being elevationally offset relative to the valleys by a distance within a range of from about 30 microns to about 100 microns. The capacitor stack includes at least about 10 total layers. Some embodiments include apparatuses and multi-chip modules having capacitor chips.
Abstract:
A chip-stack interposer structure including a passive device is described, including an interposing layer, a capacitor, a first contact and a second contact. The capacitor is embedded in or disposed on the interposing layer, including a first electrode, a second electrode and a dielectric layer between the first and the second electrodes. The first contact is connected with the first electrode. The second contact is connected with the second electrode. The first electrode and the second electrode are disposed at the same side of the interposing layer or at different sides of the interposing layer.
Abstract:
An objective is to provide a component-incorporated wiring substrate capable of solving a problem caused by an increase in length of wiring lines that connect a component and a capacitor. A component-incorporated wiring substrate 10 includes a core substrate 11, a first capacitor 301, a wiring laminate portion 31, and a second capacitor 101. An accommodation hole portion 90 of the core substrate 11 accommodates the first capacitor 101 therein, and a component-mounting region 20 is set on a surface 39 of the wiring laminate portion 31. The second capacitor 101 has electrode layers 102, 103 and a dielectric layer 104. The second capacitor 101 is embedded in the wiring laminate portion 31 in such a state that first main surfaces 105, 107 and second main surfaces 106, 108 are in parallel with the surface 39 of the wiring laminate portion 31, and is disposed between the first capacitor 301 and the component-mounting region 20.
Abstract:
A printed wiring board semiconductor package or PWB power core comprising singulated capacitors embedded on multiple layers of the printed wiring board semiconductor package wherein at least a part of each embedded capacitor lies within the die shadow and wherein the embedded, singulated capacitors comprise at least a first electrode and a second electrode. The first electrodes and second electrodes of the embedded singulated capacitors are interconnected to the Vcc (power) terminals and the Vss (ground) terminals respectively of a semiconductor device. The size of the embedded capacitors are varied to produce different self-resonant frequencies and their vertical placements within the PWB semiconductor package are used to control the inherent inductance of the capacitor-semiconductor electrical interconnections so that customized resonant frequencies of the embedded capacitors can be achieved with low impedance.
Abstract:
A method for manufacturing a printed wiring board includes forming an uncalcined layer containing a raw ceramic material on a first metal layer, firing the uncalcined layer formed on the first metal layer such that a high dielectric constant layer having a ceramic body calcined in a sheet form is formed on the first metal layer, forming a second metal layer on the high dielectric constant layer on the opposite side of the high dielectric constant layer with respect to the first metal layer such that a layered capacitor having the high dielectric constant layer and first and second layer electrodes sandwiching the high dielectric constant layer is formed, and disposing the layered capacitor in a main body.
Abstract:
A method for manufacturing a printed-circuit board including: a capacitive element forming step of embedding a capacitive element in a substrate resin layer inside a substrate that includes a plurality of wiring layers laminated with the substrate resin layer interposed in between, the capacitive element forming step including forming a lower electrode using a conductive layer on one of the plurality of wiring layers, or using one of the plurality of wiring layers; forming a crystalline metal oxide-containing capacitor dielectric film at a temperature at or below a heat-resistant temperature of the substrate resin layer, and at or above room temperature; and forming an upper electrode on an upper surface of the capacitor dielectric film on the side opposite to the lower electrode.
Abstract:
A process for forming a laminate with capacitance and the laminate formed thereby. The process includes the steps of providing a substrate and laminating a conductive foil on the substrate wherein the foil has a dielectric. A conductive layer is formed on the dielectric. The conductive foil is treated to electrically isolate a region of conductive foil containing the conductive layer from additional conductive foil. A cathodic conductive couple is made between the conductive layer and a cathode trace and an anodic conductive couple is made between the conductive foil and an anode trace.
Abstract:
A substrate-incorporated capacitor includes a first electrode extending in a predetermined direction, a dielectric layer arranged on the first electrode, a second electrode arranged on the dielectric layer and facing the first electrode through the dielectric layer, wherein the second electrode includes an end projecting from the dielectric layer in the predetermined direction, and an electrode layer spaced apart from the first electrode in the predetermined direction. The end of the second electrode is connected to the electrode layer in the predetermined direction. The electrode layer includes a surface that is flush with a surface of the first electrode.
Abstract:
A printed wiring board includes an insulating layer and a capacitor including a ceramic high dielectric layer being interposed between a first and a second electrode, and a semiconductor device mounting pad, including a first and a second pad, formed on an outermost resin insulating layer of the resin insulating layers. An underfill which covers an area larger than that of the high dielectric layer is formed, when the underfill covered area is projected along a lamination direction of the resin insulating layers to a face on which the high dielectric layer is formed. The capacitor is located immediately beneath the underfill covered area.
Abstract:
A process for forming a laminate with capacitance and the laminate formed thereby. The process includes the steps of providing a substrate and laminating a conductive foil on the substrate wherein the foil has a dielectric. A conductive layer is formed on the dielectric. The conductive foil is treated to electrically isolate a region of conductive foil containing the conductive layer from additional conductive foil. A cathodic conductive couple is made between the conductive layer and a cathode trace and an anodic conductive couple is made between the conductive foil and an anode trace.