公开(公告)号：US09768155B2

公开(公告)日：2017-09-19

申请号：US14745203

申请日：2015-06-19

Applicant: STATS ChipPAC, Ltd.

Inventor： Yaojian Lin ,  Kang Chen ,  Seung Wook Yoon

IPC: H01L25/00 ,  H01L21/768 ,  H01L23/522 ,  H01L23/31 ,  H01L23/498 ,  H01L21/56 ,  H01L23/538 ,  H01L23/552 ,  H01L21/683 ,  H01L25/065 ,  H01L25/10 ,  H01L23/00

CPC classification number: H01L25/50 ,  H01L21/56 ,  H01L21/561 ,  H01L21/568 ,  H01L21/6835 ,  H01L21/6836 ,  H01L21/76802 ,  H01L21/76877 ,  H01L23/3157 ,  H01L23/49816 ,  H01L23/49827 ,  H01L23/5226 ,  H01L23/5389 ,  H01L23/552 ,  H01L24/11 ,  H01L24/13 ,  H01L24/16 ,  H01L24/81 ,  H01L24/82 ,  H01L24/96 ,  H01L24/97 ,  H01L25/0655 ,  H01L25/0657 ,  H01L25/105 ,  H01L2221/68327 ,  H01L2221/68345 ,  H01L2221/68381 ,  H01L2223/54426 ,  H01L2224/03 ,  H01L2224/03002 ,  H01L2224/03003 ,  H01L2224/0346 ,  H01L2224/0401 ,  H01L2224/04105 ,  H01L2224/05552 ,  H01L2224/0557 ,  H01L2224/05571 ,  H01L2224/05611 ,  H01L2224/05624 ,  H01L2224/05639 ,  H01L2224/05644 ,  H01L2224/05647 ,  H01L2224/05655 ,  H01L2224/0613 ,  H01L2224/11 ,  H01L2224/1132 ,  H01L2224/11334 ,  H01L2224/1146 ,  H01L2224/12105 ,  H01L2224/13014 ,  H01L2224/13021 ,  H01L2224/13025 ,  H01L2224/131 ,  H01L2224/13111 ,  H01L2224/13113 ,  H01L2224/13116 ,  H01L2224/13124 ,  H01L2224/13139 ,  H01L2224/13144 ,  H01L2224/13147 ,  H01L2224/13155 ,  H01L2224/14104 ,  H01L2224/16145 ,  H01L2224/16225 ,  H01L2224/16237 ,  H01L2224/16238 ,  H01L2224/24137 ,  H01L2224/48091 ,  H01L2224/73253 ,  H01L2224/73259 ,  H01L2224/73265 ,  H01L2224/73267 ,  H01L2224/76155 ,  H01L2224/81 ,  H01L2224/81191 ,  H01L2224/81193 ,  H01L2224/81447 ,  H01L2224/81805 ,  H01L2224/82005 ,  H01L2224/92 ,  H01L2224/94 ,  H01L2224/96 ,  H01L2224/97 ,  H01L2225/06513 ,  H01L2225/06517 ,  H01L2225/06541 ,  H01L2225/06548 ,  H01L2225/1035 ,  H01L2225/1058 ,  H01L2924/00011 ,  H01L2924/00014 ,  H01L2924/01004 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01023 ,  H01L2924/01024 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01046 ,  H01L2924/01047 ,  H01L2924/01049 ,  H01L2924/01072 ,  H01L2924/01073 ,  H01L2924/01074 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/01322 ,  H01L2924/014 ,  H01L2924/09701 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/12043 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/14 ,  H01L2924/1433 ,  H01L2924/15311 ,  H01L2924/1532 ,  H01L2924/15331 ,  H01L2924/181 ,  H01L2924/1815 ,  H01L2924/18161 ,  H01L2924/18162 ,  H01L2924/19041 ,  H01L2924/19042 ,  H01L2924/19043 ,  H01L2924/30105 ,  H01L2924/3025 ,  H01L2924/3511 ,  H01L2224/82 ,  H01L2924/00 ,  H01L2924/00012

Abstract: A semiconductor device has an encapsulant deposited over a first surface of the semiconductor die and around the semiconductor die. A first insulating layer is formed over a second surface of the semiconductor die opposite the first surface. A conductive layer is formed over the first insulating layer. An interconnect structure is formed through the encapsulant outside a footprint of the semiconductor die and electrically connected to the conductive layer. The first insulating layer includes an optically transparent or translucent material. The semiconductor die includes a sensor configured to receive an external stimulus passing through the first insulating layer. A second insulating layer is formed over the first surface of the semiconductor die. A conductive via is formed through the first insulating layer outside a footprint of the semiconductor die. A plurality of stacked semiconductor devices is electrically connected through the interconnect structure.

公开(公告)号：US09607958B2

公开(公告)日：2017-03-28

申请号：US14512614

申请日：2014-10-13

Applicant: STATS ChipPAC, Ltd.

Inventor： Yaojian Lin ,  Pandi C. Marimuthu ,  Kang Chen

IPC: H01L23/00 ,  H01L23/31 ,  H01L23/29 ,  H01L21/56 ,  H01L23/538 ,  H01L23/498

CPC classification number: H01L24/14 ,  H01L21/561 ,  H01L21/565 ,  H01L21/568 ,  H01L23/291 ,  H01L23/3121 ,  H01L23/3135 ,  H01L23/49816 ,  H01L23/5389 ,  H01L24/03 ,  H01L24/05 ,  H01L24/11 ,  H01L24/13 ,  H01L24/19 ,  H01L24/20 ,  H01L2224/02351 ,  H01L2224/0236 ,  H01L2224/02372 ,  H01L2224/02379 ,  H01L2224/0345 ,  H01L2224/03462 ,  H01L2224/03464 ,  H01L2224/0348 ,  H01L2224/0361 ,  H01L2224/0391 ,  H01L2224/0401 ,  H01L2224/04105 ,  H01L2224/05548 ,  H01L2224/05552 ,  H01L2224/05557 ,  H01L2224/05567 ,  H01L2224/06181 ,  H01L2224/11334 ,  H01L2224/1146 ,  H01L2224/11849 ,  H01L2224/12105 ,  H01L2224/13008 ,  H01L2224/13022 ,  H01L2224/13023 ,  H01L2224/13024 ,  H01L2224/13111 ,  H01L2224/13113 ,  H01L2224/13124 ,  H01L2224/13139 ,  H01L2224/13144 ,  H01L2224/13147 ,  H01L2224/13155 ,  H01L2224/94 ,  H01L2924/00013 ,  H01L2924/01322 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/181 ,  H01L2924/1815 ,  H01L2924/18161 ,  H01L2924/20101 ,  H01L2924/00 ,  H01L2224/13099 ,  H01L2224/05099 ,  H01L2224/05599 ,  H01L2924/00014 ,  H01L2224/03 ,  H01L2224/11 ,  H01L2924/00012

Abstract: A semiconductor device has a semiconductor die with an encapsulant deposited over the semiconductor die. A first insulating layer having high tensile strength and elongation is formed over the semiconductor die and encapsulant. A first portion of the first insulating layer is removed by a first laser direct ablation to form a plurality of openings in the first insulating layer. The openings extend partially through the first insulating layer or into the encapsulant. A second portion of the first insulating layer is removed by a second laser direct ablation to form a plurality of trenches in the first insulating layer. A conductive layer is formed in the openings and trenches of the first insulating layer. A second insulating layer is formed over the conductive layer. A portion of the second insulating layer is removed by a third laser direct ablation. Bumps are formed over the conductive layer.

公开(公告)号：US09385102B2

公开(公告)日：2016-07-05

申请号：US13630912

申请日：2012-09-28

Applicant: STATS ChipPAC, Ltd.

Inventor： Yaojian Lin ,  Kang Chen ,  Yu Gu

IPC: H01L23/02 ,  H01L23/48 ,  H01L23/00 ,  H01L23/31 ,  H01L21/56 ,  H01L23/498

CPC classification number: H01L23/3128 ,  H01L21/4853 ,  H01L21/56 ,  H01L21/561 ,  H01L21/568 ,  H01L23/293 ,  H01L23/3114 ,  H01L23/3121 ,  H01L23/315 ,  H01L23/49811 ,  H01L23/49816 ,  H01L23/49833 ,  H01L24/19 ,  H01L24/20 ,  H01L24/96 ,  H01L24/97 ,  H01L2224/12105 ,  H01L2224/32225 ,  H01L2224/32245 ,  H01L2224/73267 ,  H01L2224/94 ,  H01L2224/97 ,  H01L2924/01322 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/15788 ,  H01L2924/181 ,  H01L2924/18162 ,  H01L2924/3511 ,  H01L2224/83 ,  H01L2924/00 ,  H01L2224/03

Abstract: A semiconductor device includes a semiconductor die. An encapsulant is formed around the semiconductor die. A build-up interconnect structure is formed over a first surface of the semiconductor die and encapsulant. A first supporting layer is formed over a second surface of the semiconductor die as a supporting substrate or silicon wafer disposed opposite the build-up interconnect structure. A second supporting layer is formed over the first supporting layer an includes a fiber enhanced polymer composite material comprising a footprint including an area greater than or equal to an area of a footprint of the semiconductor die. The semiconductor die comprises a thickness less than 450 micrometers (μm). The thickness of the semiconductor die is at least 1 μm less than a difference between a total thickness of the semiconductor device and a thickness of the build-up interconnect structure and the second supporting layer.

Abstract translation: 半导体器件包括半导体管芯。 在半导体管芯周围形成密封剂。 在半导体管芯和密封剂的第一表面上形成积聚互连结构。 第一支撑层形成在半导体管芯的第二表面上，作为与积聚互连结构相对设置的支撑衬底或硅晶片。 在第一支撑层上形成第二支撑层，包括纤维增强聚合物复合材料，其包括占地面积，该占地面积大于或等于半导体管芯的覆盖区域的面积。 半导体管芯的厚度小于450微米（μm）。 半导体管芯的厚度比半导体器件的总厚度和积层互连结构和第二支撑层的厚度之差小至少1μm。

公开(公告)号：US20160141238A1

公开(公告)日：2016-05-19

申请号：US15007518

申请日：2016-01-27

Applicant: STATS ChipPAC, Ltd.

Inventor： Seung Wook Yoon ,  Jose A. Caparas ,  Yaojian Lin ,  Pandi C. Marimuthu ,  Kang Chen ,  Xusheng Bao ,  Jianmin Fang

IPC: H01L23/498 ,  H01L21/768 ,  H01L21/311 ,  H01L25/10

CPC classification number: H01L23/49827 ,  H01L21/311 ,  H01L21/56 ,  H01L21/561 ,  H01L21/568 ,  H01L21/76804 ,  H01L23/3128 ,  H01L23/49811 ,  H01L23/49816 ,  H01L23/49838 ,  H01L24/19 ,  H01L24/96 ,  H01L24/97 ,  H01L25/105 ,  H01L2224/12105 ,  H01L2224/97 ,  H01L2225/1035 ,  H01L2225/1058 ,  H01L2924/01322 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/181 ,  H01L2924/3511 ,  H01L2924/00 ,  H01L2224/19 ,  H01L2924/00012

Abstract: A semiconductor device has a semiconductor die with an encapsulant deposited over and around the semiconductor die. An interconnect structure is formed over a first surface of the encapsulant. An opening is formed from a second surface of the encapsulant to the first surface of the encapsulant to expose a surface of the interconnect structure. A bump is formed recessed within the opening and disposed over the surface of the interconnect structure. A semiconductor package is provided. The semiconductor package is disposed over the second surface of the encapsulant and electrically connected to the bump. A plurality of interconnect structures is formed over the semiconductor package to electrically connect the semiconductor package to the bump. The semiconductor package includes a memory device. The semiconductor device includes a height less than 1 millimeter. The opening includes a tapered sidewall formed by laser direct ablation.

Abstract translation: 半导体器件具有沉积在半导体管芯上方和周围的具有密封剂的半导体管芯。 在密封剂的第一表面上形成互连结构。 开口由密封剂的第二表面形成到密封剂的第一表面以暴露互连结构的表面。 凸起凹陷形成在开口内并设置在互连结构的表面上。 提供半导体封装。 半导体封装设置在密封剂的第二表面上并电连接到凸块。 多个互连结构形成在半导体封装上，以将半导体封装电连接到凸块。 半导体封装包括存储器件。 半导体器件包括高度小于1毫米的半导体器件。 开口包括通过激光直接消融形成的锥形侧壁。

公开(公告)号：US09281259B2

公开(公告)日：2016-03-08

申请号：US14079273

申请日：2013-11-13

Applicant: STATS ChipPAC, Ltd.

Inventor： Yaojian Lin ,  Kang Chen ,  Jose Alvin Caparas ,  Glenn Omandam

IPC: H01L23/48 ,  H01L23/52 ,  H01L29/40 ,  H01L23/31 ,  H01L23/00 ,  H01L21/56

CPC classification number: H01L23/315 ,  H01L21/561 ,  H01L21/563 ,  H01L21/568 ,  H01L23/3114 ,  H01L23/3128 ,  H01L23/3135 ,  H01L24/19 ,  H01L24/20 ,  H01L24/96 ,  H01L2224/0401 ,  H01L2224/04105 ,  H01L2224/12105 ,  H01L2224/73265 ,  H01L2924/01322 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/181 ,  H01L2924/1815 ,  H01L2924/351 ,  H01L2924/3511 ,  H01L2924/00

Abstract: A semiconductor device has a semiconductor die mounted to a carrier. A first encapsulant is deposited over the semiconductor die and carrier. A stiffening support member can be disposed over the carrier around the semiconductor die. A plurality of channels or recesses is formed in the first encapsulant. The recesses can be formed by removing a portion of the first encapsulant. Alternatively, the recesses are formed in a chase mold having a plurality of extended surfaces. A second encapsulant can be deposited into the recesses of the first encapsulant. The carrier is removed and an interconnect structure is formed over the semiconductor die and first encapsulant. The thickness of the first encapsulant provides sufficient stiffness to reduce warpage while the recesses provide stress relief during formation of the interconnect structure. A portion of the first encapsulant and recesses are removed to reduce thickness of the semiconductor device.

Abstract translation: 半导体器件具有安装到载体上的半导体管芯。 第一密封剂沉积在半导体管芯和载体上。 加强支撑构件可以设置在半导体管芯周围的载体上。 在第一密封剂中形成多个通道或凹槽。 可以通过去除第一密封剂的一部分来形成凹部。 或者，凹部形成在具有多个延伸表面的追逐模具中。 可以将第二密封剂沉积到第一密封剂的凹部中。 移除载体并且在半导体管芯和第一密封剂上形成互连结构。 第一密封剂的厚度提供足够的刚度以减少翘曲，同时凹槽在形成互连结构期间提供应力释放。 去除第一密封剂和凹部的一部分以减小半导体器件的厚度。

公开(公告)号：US20160013148A1

公开(公告)日：2016-01-14

申请号：US14861040

申请日：2015-09-22

Applicant: STATS ChipPAC, Ltd.

Inventor： Yaojian Lin ,  Kang Chen

IPC: H01L23/00

CPC classification number: H01L24/19 ,  H01L21/561 ,  H01L21/565 ,  H01L21/568 ,  H01L23/3107 ,  H01L23/3121 ,  H01L23/3128 ,  H01L23/3135 ,  H01L23/49816 ,  H01L23/5389 ,  H01L23/552 ,  H01L24/11 ,  H01L24/96 ,  H01L24/97 ,  H01L25/0655 ,  H01L25/16 ,  H01L25/18 ,  H01L2224/0401 ,  H01L2224/05567 ,  H01L2224/12105 ,  H01L2224/13022 ,  H01L2224/131 ,  H01L2224/16227 ,  H01L2224/16237 ,  H01L2224/81005 ,  H01L2224/81191 ,  H01L2224/81815 ,  H01L2224/94 ,  H01L2224/97 ,  H01L2924/01029 ,  H01L2924/01322 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/15311 ,  H01L2924/181 ,  H01L2924/18162 ,  H01L2924/19105 ,  H01L2924/3511 ,  H01L2924/00 ,  H01L2224/11 ,  H01L2224/81 ,  H01L2224/03 ,  H01L2924/014

Abstract: A semiconductor device has a build-up interconnect structure including a first insulating layer with a first material and a second insulating layer with a second material. A first conductive layer is formed over the first insulating layer, and the second insulating layer is formed over the first conductive layer. An optional third insulating layer has the second material and is formed over the second insulating layer. A fourth insulating layer has the first material and is formed over the third insulating layer. The second, third, and fourth insulating layers are cured sequentially or simultaneously. The first material includes a greater tensile strength, elastic modulus, and CTE than the second material. The build-up interconnect structure is formed over a semiconductor wafer or semiconductor die in a reconstituted panel. Alternatively, the build-up interconnect structure is formed over a carrier and a semiconductor die is mounted over the build-up interconnect structure.

Abstract translation: 半导体器件具有包括具有第一材料的第一绝缘层和具有第二材料的第二绝缘层的堆积互连结构。 第一导电层形成在第一绝缘层上，第二绝缘层形成在第一导电层上。 可选的第三绝缘层具有第二材料并形成在第二绝缘层上。 第四绝缘层具有第一材料并形成在第三绝缘层上。 第二，第三和第四绝缘层依次或同时固化。 第一种材料比第二种材料具有更大的拉伸强度，弹性模量和CTE。 积层互连结构形成在重构面板中的半导体晶片或半导体晶片上。 或者，积累互连结构形成在载体上，半导体管芯安装在积层互连结构上。

公开(公告)号：US20150155248A1

公开(公告)日：2015-06-04

申请号：US14616942

申请日：2015-02-09

Applicant: STATS CHIPPAC, LTD.

Inventor： Yaojian Lin ,  Kang Chen ,  Jianmin Fang ,  Xia Feng

IPC: H01L23/00 ,  H01L21/768 ,  H01L23/28 ,  H01L21/56

CPC classification number: H01L23/49816 ,  H01L21/56 ,  H01L21/563 ,  H01L21/568 ,  H01L21/76802 ,  H01L21/76879 ,  H01L23/3114 ,  H01L23/3192 ,  H01L23/49822 ,  H01L23/5389 ,  H01L24/06 ,  H01L24/11 ,  H01L24/14 ,  H01L24/19 ,  H01L24/82 ,  H01L24/96 ,  H01L2223/5448 ,  H01L2224/0401 ,  H01L2224/04105 ,  H01L2224/12105 ,  H01L2224/48091 ,  H01L2224/73265 ,  H01L2224/94 ,  H01L2924/01004 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01029 ,  H01L2924/01032 ,  H01L2924/01033 ,  H01L2924/01047 ,  H01L2924/01049 ,  H01L2924/01073 ,  H01L2924/01075 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/01322 ,  H01L2924/014 ,  H01L2924/09701 ,  H01L2924/10329 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/15311 ,  H01L2924/181 ,  H01L2924/1815 ,  H01L2924/18162 ,  H01L2924/3511 ,  H01L2924/37001 ,  H01L2924/00014 ,  H01L2924/00 ,  H01L2224/03

Abstract: A semiconductor device comprises a semiconductor die including a conductive layer. A first insulating layer is formed over the semiconductor die and conductive layer. An encapsulant is disposed over the semiconductor die. A compliant island is formed over the first insulating layer. An interconnect structure is formed over the compliant island. An under bump metalization (UBM) is formed over the compliant island. The compliant island includes a diameter greater than 5 μm larger than a diameter of the UBM. An opening is formed in the compliant island over the conductive layer. A second insulating layer is formed over the first insulating layer and compliant island. A third insulating layer is formed over an interface between the semiconductor die and the encapsulant. An opening is formed in the third insulating layer over the encapsulant for stress relief.

Abstract translation: 半导体器件包括具有导电层的半导体管芯。 在半导体管芯和导电层上形成第一绝缘层。 密封剂设置在半导体管芯上。 在第一绝缘层上形成顺应性岛。 互连结构形成在柔性岛上。 凸块金属化（UBM）形成在柔性岛上。 柔性岛包括比UBM的直径大大于5μm的直径。 在导电层上的柔性岛中形成开口。 在第一绝缘层和顺应性岛上形成第二绝缘层。 在半导体管芯和密封剂之间的界面上形成第三绝缘层。 在密封剂上的第三绝缘层中形成开口以消除应力。

公开(公告)号：US20140252654A1

公开(公告)日：2014-09-11

申请号：US14284752

申请日：2014-05-22

Applicant: STATS CHIPPAC, LTD.

Inventor： Yaojian Lin ,  Kang Chen ,  Jianmin Fang ,  Xia Feng

IPC: H01L21/768 ,  H01L23/522

CPC classification number: H01L21/76879 ,  H01L21/563 ,  H01L21/568 ,  H01L23/3114 ,  H01L23/49816 ,  H01L23/5226 ,  H01L23/5389 ,  H01L24/18 ,  H01L24/19 ,  H01L24/82 ,  H01L24/96 ,  H01L2223/5448 ,  H01L2224/04105 ,  H01L2224/12105 ,  H01L2224/18 ,  H01L2224/48091 ,  H01L2224/73265 ,  H01L2924/01004 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01029 ,  H01L2924/01032 ,  H01L2924/01033 ,  H01L2924/01047 ,  H01L2924/01049 ,  H01L2924/01073 ,  H01L2924/01075 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/01322 ,  H01L2924/014 ,  H01L2924/09701 ,  H01L2924/10329 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/14 ,  H01L2924/15311 ,  H01L2924/181 ,  H01L2924/00014 ,  H01L2924/00 ,  H01L2924/00012

Abstract: A semiconductor wafer has a plurality of first semiconductor die. A first conductive layer is formed over an active surface of the die. A first insulating layer is formed over the active surface and first conductive layer. A repassivation layer is formed over the first insulating layer and first conductive layer. A via is formed through the repassivation layer to the first conductive layer. The semiconductor wafer is singulated to separate the semiconductor die. The semiconductor die is mounted to a temporary carrier. An encapsulant is deposited over the semiconductor die and carrier. The carrier is removed. A second insulating layer is formed over the repassivation layer and encapsulant. A second conductive layer is formed over the repassivation layer and first conductive layer. A third insulating layer is formed over the second conductive layer and second insulating layer. An interconnect structure is formed over the second conductive layer.

Abstract translation: 半导体晶片具有多个第一半导体管芯。 在模具的有效表面上形成第一导电层。 在有源表面和第一导电层上形成第一绝缘层。 在第一绝缘层和第一导电层上形成再钝化层。 通过再钝化层形成通孔至第一导电层。 单个半导体晶片以分离半导体管芯。 半导体管芯安装在临时载体上。 密封剂沉积在半导体管芯和载体上。 载体被移除。 在再钝化层和密封剂上形成第二绝缘层。 在再钝化层和第一导电层上形成第二导电层。 在第二导电层和第二绝缘层上形成第三绝缘层。 在第二导电层上形成互连结构。

公开(公告)号：US20140252573A1

公开(公告)日：2014-09-11

申请号：US14193267

申请日：2014-02-28

Applicant: STATS ChipPAC, Ltd.

Inventor： Yaojian Lin ,  Xu Sheng Bao ,  Kang Chen

IPC: H01L23/495 ,  H01L21/48

CPC classification number: H01L21/485 ,  H01L21/568 ,  H01L23/49816 ,  H01L23/49822 ,  H01L23/49827 ,  H01L23/49833 ,  H01L23/5389 ,  H01L24/19 ,  H01L24/97 ,  H01L2224/04105 ,  H01L2224/12105 ,  H01L2924/01322 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/181 ,  H01L2924/18162 ,  H01L2924/00 ,  H01L2924/00012

Abstract: A semiconductor device has a first conductive layer and a semiconductor die disposed adjacent to the first conductive layer. An encapsulant is deposited over the first conductive layer and semiconductor die. An insulating layer is formed over the encapsulant, semiconductor die, and first conductive layer. A second conductive layer is formed over the insulating layer. A first portion of the first conductive layer is electrically connected to VSS and forms a ground plane. A second portion of the first conductive layer is electrically connected to VDD and forms a power plane. The first conductive layer, insulating layer, and second conductive layer constitute a decoupling capacitor. A microstrip line including a trace of the second conductive layer is formed over the insulating layer and first conductive layer. The first conductive layer is provided on an embedded dummy die, interconnect unit, or modular PCB unit.

Abstract translation: 半导体器件具有邻近第一导电层设置的第一导电层和半导体管芯。 密封剂沉积在第一导电层和半导体管芯上。 绝缘层形成在密封剂，半导体管芯和第一导电层之上。 在绝缘层上形成第二导电层。 第一导电层的第一部分电连接到VSS并形成接地平面。 第一导电层的第二部分电连接到VDD并形成电源平面。 第一导电层，绝缘层和第二导电层构成去耦电容器。 在绝缘层和第一导电层上形成包括第二导电层的迹线的微带线。 第一导电层设置在嵌入的虚设裸片，互连单元或模块化PCB单元上。

公开(公告)号：US20140239496A1

公开(公告)日：2014-08-28

申请号：US14268316

申请日：2014-05-02

Applicant: STATS ChipPAC, Ltd.

Inventor： Yaojian Lin ,  Kang Chen

IPC: H01L23/00 ,  H01L23/522

CPC classification number: H01L23/562 ,  H01L21/561 ,  H01L23/3157 ,  H01L23/5226 ,  H01L24/03 ,  H01L24/05 ,  H01L24/11 ,  H01L24/13 ,  H01L24/14 ,  H01L2224/02125 ,  H01L2224/02165 ,  H01L2224/0345 ,  H01L2224/03452 ,  H01L2224/0346 ,  H01L2224/0391 ,  H01L2224/0401 ,  H01L2224/05552 ,  H01L2224/05557 ,  H01L2224/05559 ,  H01L2224/05567 ,  H01L2224/05611 ,  H01L2224/05624 ,  H01L2224/05639 ,  H01L2224/05644 ,  H01L2224/05647 ,  H01L2224/05655 ,  H01L2224/10126 ,  H01L2224/1132 ,  H01L2224/11334 ,  H01L2224/1145 ,  H01L2224/1146 ,  H01L2224/11849 ,  H01L2224/11901 ,  H01L2224/13022 ,  H01L2224/131 ,  H01L2224/13111 ,  H01L2224/13113 ,  H01L2224/13116 ,  H01L2224/13124 ,  H01L2224/13139 ,  H01L2224/13144 ,  H01L2224/13147 ,  H01L2224/13155 ,  H01L2924/01322 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/181 ,  H01L2924/00 ,  H01L2924/00012 ,  H01L2924/00014 ,  H01L2924/01082 ,  H01L2924/014

Abstract: A semiconductor device has a semiconductor die and first insulating layer formed over the semiconductor die. A plurality of first micro-vias can be formed in the first insulating layer. A conductive layer is formed in the first micro-openings and over the first insulating layer. A second insulating layer is formed over the first insulating layer and conductive layer. A portion of the second insulating layer is removed to expose the conductive layer and form a plurality of second micro-openings in the second insulating layer over the conductive layer. The second micro-openings can be micro-vias, micro-via ring, or micro-via slots. Removing the portion of the second insulating layer leaves an island of the second insulating layer over the conductive layer. A bump is formed over the conductive layer. A third insulating layer is formed in the second micro-openings over the bump. The second micro-openings provide stress relief.

Abstract translation: 半导体器件具有形成在半导体管芯上的半导体管芯和第一绝缘层。 可以在第一绝缘层中形成多个第一微通孔。 导电层形成在第一微孔中并在第一绝缘层之上。 在第一绝缘层和导电层上形成第二绝缘层。 去除第二绝缘层的一部分以暴露导电层并在导电层上的第二绝缘层中形成多个第二微孔。 第二微孔可以是微通孔，微通孔环或微通孔。 去除第二绝缘层的部分在导电层上留下第二绝缘层的岛。 在导电层上形成凸点。 在凸起上的第二微孔中形成第三绝缘层。 第二个微孔提供应力消除。