公开(公告)号：US20150179398A1

公开(公告)日：2015-06-25

申请号：US14581728

申请日：2014-12-23

Applicant: Mapper Lithography IP B.V.

Inventor： Paul IJmert Scheffers ,  Jan Andries Meijer ,  Carel Ferdinand Daudey

IPC: H01J37/22 ,  H01J37/20

CPC classification number: H01J37/22 ,  H01J37/20 ,  H01J37/244 ,  H01J37/3177 ,  H01J2237/10 ,  H01J2237/202 ,  H01J2237/2443 ,  H01J2237/24507

Abstract: The invention relates to a charged particle lithography system for transferring a pattern onto a target, said system comprising:a target positioning device comprising a target holder having a first side for holding the target,a charged particle optical unit for generating a charged particle beam, modulating said charged particle beam, and directing said charged particle beam towards the first side of the target holder, anda sensor assembly comprising a converter element for converting charged particles which impinge on said converter element into light, wherein the converter element is arranged on said target positioning device, a light sensor for detecting the light, wherein the light sensor is arranged at a distance from said target positioning device, and a light optical lens which is arranged between the converter element and the light sensor for directing light originating from said converter element to said sensor.

Abstract translation: 本发明涉及一种用于将图案转印到目标上的带电粒子光刻系统，所述系统包括：目标定位装置，包括具有用于保持靶的第一侧的靶保持器，用于产生带电粒子束的带电粒子光学单元， 调制所述带电粒子束，并将所述带电粒子束引向所述目标保持器的第一侧;以及传感器组件，其包括用于将撞击在所述转换器元件上的带电粒子转换成光的转换器元件，其中所述转换器元件布置在所述 目标定位装置，用于检测光的光传感器，其中所述光传感器布置在距所述目标定位装置一定距离处;以及光学透镜，布置在所述转换器元件和所述光传感器之间，用于引导源自所述转换器的光 元件到所述传感器。

公开(公告)号：US20150144785A1

公开(公告)日：2015-05-28

申请号：US14532805

申请日：2014-11-04

Applicant: KLA-Tencor Corporation

Inventor： Christopher Sears

IPC: H01J37/147 ,  H01J37/10 ,  H01J37/153

CPC classification number: H01J37/1472 ,  H01J37/10 ,  H01J37/1471 ,  H01J37/153 ,  H01J2237/10 ,  H01J2237/1508 ,  H01J2237/1516 ,  H01J2237/2448 ,  H01J2237/2449 ,  H01J2237/2602 ,  H01J2237/28

Abstract: An electron beam device for inspecting a target substrate or specimen thereon includes a beam separator with an asymmetric quadrupole electrostatic deflector for improving field uniformity for a single direction of deflection. The asymmetric quadrupole electrostatic deflector includes two orthogonal electrode plates spanning roughly 60 degrees and two electrode plates spanning roughly 120 degrees, the two latter plates defining a unidirectional deflection field. The device generates a primary electron beam and focuses the primary electron beam along an optical axis into the target substrate. Secondary electrons detected at the target substrate are focused into a secondary electron beam. The beam separator with asymmetric quadrupole electrostatic deflector deflects the secondary electron beam away from the axis of the primary electron beam in the direction of deflection and into a detector array.

Abstract translation: 用于检查目标衬底或样本的电子束装置包括具有不对称四极静电偏转器的光束分离器，用于改善单个偏转方向的场均匀性。 不对称四极静电偏转器包括跨越大约60度的两个正交电极板和跨越大约120度的两个电极板，后两个板限定单向偏转场。 器件产生一次电子束，并将一次电子束沿光轴聚焦到目标衬底中。 在目标衬底处检测到的二次电子被聚焦成二次电子束。 具有不对称四极静电偏转器的光束分离器使二次电子束在偏转方向上偏离一次电子束的轴线并且进入检测器阵列。

公开(公告)号：US20150136979A1

公开(公告)日：2015-05-21

申请号：US14407117

申请日：2013-04-12

Applicant: Hitachi High-Technologies Corporation

Inventor： Ichiro Tachibana ,  Naomasa Suzuki

IPC: H01J37/21 ,  H01J37/26 ,  H01J37/147 ,  H01J37/10

CPC classification number: H01J37/21 ,  H01J37/10 ,  H01J37/147 ,  H01J37/263 ,  H01J37/28 ,  H01J37/3178 ,  H01J2237/04756 ,  H01J2237/0492 ,  H01J2237/063 ,  H01J2237/10 ,  H01J2237/15 ,  H01J2237/21 ,  H01J2237/244 ,  H01J2237/2602 ,  H01J2237/281

Abstract: When a signal electron is detected by energy selection by combining and controlling retarding and boosting for observation of a deep hole, etc., the only way for focus adjustment is to use a change in magnetic field of an objective lens. However, since responsiveness of the change in magnetic field is poor, throughput reduces. A charged particle beam device includes: an electron source configured to generate a primary electron beam; an objective lens configured to focus the primary electron beam; a deflector configured to deflect the primary electron beam; a detector configured to detect a secondary electron or a reflection electron generated from a sample by irradiation of the primary electron beam; an electrode having a hole through which the primary electron beam passes; a voltage control power supply configured to apply a negative voltage to the electrode; and a retarding voltage control power supply configured to generate an electric field, which decelerates the primary electron beam, on the sample by applying the negative voltage to the sample, wherein the charged particle beam device performs focus adjustment while an offset between the voltage applied to the electrode and the voltage applied to the sample is being kept constant.

Abstract translation: 当通过组合并控制用于观察深孔等的延迟和升压来进行能量选择来检测信号电子时，聚焦调整的唯一方式是使用物镜的磁场变化。 然而，由于磁场变化的响应性差，吞吐量降低。 带电粒子束装置包括：电子源，被配置为产生一次电子束; 配置成聚焦一次电子束的物镜; 偏转器，被配置为偏转所述一次电子束; 检测器，被配置为通过一次电子束的照射来检测从样品产生的二次电子或反射电子; 具有一次电子束通过的孔的电极; 电压控制电源，被配置为向所述电极施加负电压; 以及延迟电压控制电源，被配置为通过向样本施加负电压来产生使样品上的一次电子束减速的电场，其中带电粒子束装置执行焦点调整，同时施加到 施加到样品的电极和电压保持恒定。

公开(公告)号：US20150064888A1

公开(公告)日：2015-03-05

申请号：US14468844

申请日：2014-08-26

Applicant: SEN Corporation

Inventor： Takanori Yagita ,  Mitsuaki Kabasawa ,  Haruka Sasaki

IPC: H01J37/24 ,  H01J37/10 ,  H01L21/265 ,  H01J37/317

CPC classification number: H01J37/243 ,  H01J37/3171 ,  H01J2237/047 ,  H01J2237/10 ,  H01J2237/30472

Abstract: An ion implantation apparatus includes a beam parallelizing unit and a third power supply unit. The beam parallelizing unit includes an acceleration lens, and a deceleration lens disposed adjacent to the acceleration lens in an ion beam transportation direction. The third power supply unit operates the beam parallelizing unit under one of a plurality of energy settings. The plurality of energy settings includes a first energy setting suitable for transport of a low energy ion, and a second energy setting suitable for transport of a high energy ion beam. The third power supply unit is configured to generate a potential difference in at least the acceleration lens under the second energy setting, and generate a potential difference in at least the deceleration lens under the first energy setting. A curvature of the deceleration lens is smaller than a curvature of the acceleration lens.

Abstract translation: 离子注入装置包括光束并联单元和第三电源单元。 光束并行化单元包括加速透镜和在离子束输送方向上与加速透镜相邻设置的减速透镜。 第三电源单元在多个能量设置之一下操作光束并联单元。 多个能量设置包括适于运输低能量离子的第一能量设定和适于运输高能离子束的第二能量设定。 第三电源单元被配置为在第二能量设定下至少在加速透镜中产生电位差，并且在第一能量设定下产生至少减速透镜的电位差。 减速透镜的曲率小于加速度透镜的曲率。

公开(公告)号：US20140150723A1

公开(公告)日：2014-06-05

申请号：US14096735

申请日：2013-12-04

Applicant: SEN Corporation

Inventor： Mitsuaki Kabasawa ,  Kazuhiro Watanabe ,  Hitoshi Ando ,  Kouji Inada ,  Tatsuya Yamada

IPC: C23C14/48

CPC classification number: H01J37/32412 ,  H01J37/3007 ,  H01J37/3171 ,  H01J2237/057 ,  H01J2237/10

Abstract: An ion implantation apparatus includes: a plurality of units for accelerating an ion beam generated in an ion source; and a plurality of units for adjusting a scan beam and implanting ions into a wafer. A horizontal U-shaped folder type beamline having opposite long straight portions includes the plurality of units for adjusting the scan beam in a long straight portion to have substantially the same length as the ion source and the plurality of units for accelerating the ion beam.

Abstract translation: 离子注入装置包括：用于加速在离子源中产生的离子束的多个单元; 以及用于调整扫描光束并将离子注入晶片的多个单元。 具有相对的长直线部分的水平U形折叠型光束线包括多个单元，用于将长直线部分中的扫描光束调整为具有与离子源大致相同的长度和用于加速离子束的多个单元。

公开(公告)号：US20120145894A1

公开(公告)日：2012-06-14

申请号：US12966906

申请日：2010-12-13

Applicant: Sean X. WU ,  Kini VIVEKANAND

Inventor： Sean X. WU ,  Kini VIVEKANAND

IPC: G01N23/00

CPC classification number: H01J37/222 ,  H01J37/06 ,  H01J37/265 ,  H01J37/285 ,  H01J37/292 ,  H01J2237/10 ,  H01J2237/202 ,  H01J2237/2813 ,  H01J2237/2817 ,  H01L22/12

Abstract: One embodiment relates to a method of automated inspection of scattered hot spot areas on a manufactured substrate using an electron beam apparatus. A stage holding the substrate is moved along a swath path so as to move a field of view of the electron beam apparatus such that the moving field of view covers a target area on the substrate. Off-axis imaging of the hot spot areas within the moving field of view is performed. A number of hot spot areas within the moving field of view may be determined, and the speed of the stage movement may be adjusted based on the number of hot spot areas within the moving field of view. Another embodiment relates to an electron beam apparatus for inspecting scattered areas on a manufactured substrate. Other embodiments, aspects and features are also disclosed.

Abstract translation: 一个实施例涉及一种使用电子束装置自动检查制造的衬底上的散射热点区域的方法。 保持基板的台阶沿着条带路径移动，以便移动电子束装置的视野，使得移动视场覆盖基板上的目标区域。 执行移动视野内的热点区域的离轴成像。 可以确定运动视场内的多个热点区域，并且可以基于运动视场内的热点区域的数量来调整平台运动的速度。 另一实施例涉及一种用于检查制造的基板上的散射区域的电子束装置。 还公开了其它实施例，方面和特征。

公开(公告)号：US20100102225A1

公开(公告)日：2010-04-29

申请号：US12653013

申请日：2009-12-07

Applicant: Keisuke Itou ,  Toshimichi Iwai

Inventor： Keisuke Itou ,  Toshimichi Iwai

IPC: G01N23/00 ,  G21K1/08

CPC classification number: H01J37/28 ,  G01B15/00 ,  H01J37/20 ,  H01J37/266 ,  H01J2237/0041 ,  H01J2237/10

Abstract: A charged particle beam inspection apparatus includes: an electron gun emitting an electron beam; first and second condenser lenses used to focus the electron beam; a beam control panel disposed between the first and second condenser lenses; and a control unit performing stabilizing processing in which excitation currents respectively supplied to the first condenser lens and the second condenser lens are set to have predetermined values, thereby the current amount of the electron beam passing through an opening of the beam control panel is regulated so that the electron beam to be emitted onto the sample has a larger current amount than that at a measurement, and then the electron beam is emitted onto the sample for a predetermined time period. After the stabilizing processing, the control unit sets the values of the excitation currents back to values for the measurement in order to measure dimensions of the sample, the excitation currents respectively supplied to the first and second condenser lenses.

Abstract translation: 带电粒子束检查装置包括：发射电子束的电子枪; 用于聚焦电子束的第一和第二聚光透镜; 设置在第一和第二聚光透镜之间的光束控制面板; 以及执行稳定处理的控制单元，其中分别提供给第一聚光透镜和第二聚光透镜的激励电流被设置为具有预定值，从而将通过光束控制面板的开口的电子束的电流量调节为 要发射到样品上的电子束具有比测量时更大的电流量，然后电子束在样品上发射预定时间段。 在稳定处理之后，控制单元将激励电流的值设置为测量值，以便测量样品的尺寸，分别提供给第一和第二聚光透镜的激励电流。

公开(公告)号：US20070023673A1

公开(公告)日：2007-02-01

申请号：US11483804

申请日：2006-07-10

Applicant: Carlo Salvesen ,  Ralf Degenhardt

Inventor： Carlo Salvesen ,  Ralf Degenhardt

IPC: H01J1/50

CPC classification number: H01J37/153 ,  H01J37/1413 ,  H01J37/145 ,  H01J2237/10 ,  H01J2237/1508 ,  Y10T29/4902

Abstract: An electric-magnetic field-generating element and a multipole element comprising a plurality of these field-generating elements providing for a stable charged particle beam are described. For some embodiments, the electric-magnetic field-generating element includes a pole piece, a yoke to which the pole piece is attached, at least one coil, a vacuum-tight container accommodating the coil(s), and a holder adapted to hold the vacuum-tight container such that the vacuum-tight container is spaced from the pole piece and the yoke.

Abstract translation: 描述了包括提供稳定的带电粒子束的多个这些场产生元件的电磁场产生元件和多极元件。 对于一些实施例，电磁场产生元件包括极片，连接有极片的磁轭，至少一个线圈，容纳线圈的真空密封容器和适于保持 真空密封容器使得真空密封容器与极靴和轭架间隔开。

公开(公告)号：US09927558B2

公开(公告)日：2018-03-27

申请号：US15133094

申请日：2016-04-19

Applicant: TRILUMINA CORP.

Inventor： Richard F. Carson ,  John R. Joseph ,  Mial E. Warren ,  Thomas A. Wilcox

IPC: G02B3/00 ,  G02B1/14 ,  H01J37/32 ,  H01S5/42 ,  H01S5/00 ,  G02B7/00 ,  B01J8/00

CPC classification number: G02B3/0012 ,  B01J8/00 ,  B01J2208/00008 ,  G02B1/14 ,  G02B3/0018 ,  G02B3/0025 ,  G02B3/0037 ,  G02B3/0043 ,  G02B3/0056 ,  G02B7/005 ,  H01J37/32009 ,  H01J2237/10 ,  H01J2237/334 ,  H01S5/005 ,  H01S5/423

Abstract: Embodiments comprise a system created through fabricating a lens array through which lasers are emitted. The lens array may be fabricated in the semiconductor substrate used for fabricating the lasers or may be a separate substrate of other transparent material that would be aligned to the lasers. In some embodiments, more lenses may be produced than will eventually be used by the lasers. The inner portion of the substrate may be formed with the lenses that will be used for emitting lasers, and the outer portion of the substrate may be formed with lenses that will not be used for emitting lasers—rather, through etching these additional lenses, the inner lenses may be created with a higher quality.

公开(公告)号：US09837245B2

公开(公告)日：2017-12-05

申请号：US14657234

申请日：2015-03-13

Applicant: Ho Seob Kim ,  Byeng Jin Kim ,  Do Jin Seong

Inventor： Ho Seob Kim ,  Byeng Jin Kim ,  Do Jin Seong

IPC: G21K5/10 ,  H01J37/26 ,  H01J37/20 ,  H01J37/10 ,  H02N2/00 ,  H02N2/02

CPC classification number: H01J37/261 ,  H01J37/10 ,  H01J37/20 ,  H01J37/28 ,  H01J2237/10 ,  H01J2237/20207 ,  H01J2237/20228 ,  H01J2237/20235 ,  H01J2237/20264 ,  H01J2237/2602 ,  H02N2/006 ,  H02N2/026

Abstract: Disclosed herein is a micro stage using a piezoelectric element that can be reliably operated even in a vacuum environment. In a particle column requiring a high precision, for example, a microelectronic column, the micro stage can be used as a stage with micro or nano degree precision for alignment of parts of the column, or for moving a sample, and so on.