Semiconductor device, and thin film capacitor
    57.
    发明授权
    Semiconductor device, and thin film capacitor 有权
    半导体器件和薄膜电容器

    公开(公告)号:US06524905B2

    公开(公告)日:2003-02-25

    申请号:US09903316

    申请日:2001-07-11

    IPC分类号: H01L218242

    摘要: A semiconductor device provided with a thin film capacitor having a small equivalent series inductance is provided, which can be operated at a high frequency range and contributes to size reduction of the electronic devices. The semiconductor device comprises a device formed on a silicon substrate 1a, interlayer insulating films 3a, 3b, and 3c, wiring blocks including a power source wire block and a ground wire block, and a thin film capacitor 14 formed on an uppermost insulating layer. The thin film capacitor 14 comprises a lower electrode 6 connected to the ground wire block 4e through a contact 5d, an upper electrode 8 which is connected to the power source wire block 4d through a contact 5d, and which extends above the lower electrode 6, and a dielectric layer 7 which is inserted between the lower and the upper electrodes.

    摘要翻译: 提供了具有小等效串联电感的薄膜电容器的半导体器件,其可以在高频范围下操作并且有助于电子器件的尺寸减小。 半导体器件包括形成在硅衬底1a,层间绝缘膜3a,3b和3c上的器件,包括电源线块和接地线块的布线块,以及形成在最上层绝缘层上的薄膜电容器14。 薄膜电容器14包括通过接触件5d连接到接地线块4e的下电极6,通过接触件5d连接到电源线块4d并且在下电极6上方延伸的上电极8, 以及插入在下电极和上电极之间的电介质层7。

    Method of manufacturing thin film capacitor
    58.
    发明授权
    Method of manufacturing thin film capacitor 失效
    制造薄膜电容器的方法

    公开(公告)号:US06225133B1

    公开(公告)日:2001-05-01

    申请号:US08299407

    申请日:1994-09-01

    IPC分类号: H01L2100

    摘要: After an interlayer insulating film is deposited on a silicon substrate, a contact hole or contact holes is or are formed at a desired position(s) and, then, after a polysilicon layer is deposited and the contact hole(s) is (are) embedded, the surface of the polysilicon layer is flattened by chemical and mechanical polishing using at least one of piperazine or colloidal silica slurry, and a barrier metal film 4 and a highly dielectric thin film 5 are deposited and processed to a desired size. Finally, an Al/TiN film 6 adapted for the upper electrode is formed. The leak current of the thin film capacitor which is obtained according to this method can be greatly reduced.

    摘要翻译: 在硅衬底上沉积层间绝缘膜之后,在期望的位置形成或形成接触孔或接触孔,然后在沉积多晶硅层并且接触孔之后, 通过使用哌嗪或胶体二氧化硅浆料中的至少一种的化学和机械抛光使多晶硅层的表面平坦化,并且将阻挡金属膜4和高电介质薄膜5沉积并加工成所需的尺寸。 最后,形成适用于上电极的Al / TiN膜6。 根据该方法获得的薄膜电容器的漏电流可以大大降低。

    Functional element built-in substrate and wiring substrate
    60.
    发明授权
    Functional element built-in substrate and wiring substrate 有权
    功能元件内置基板和布线基板

    公开(公告)号:US08929090B2

    公开(公告)日:2015-01-06

    申请号:US13574455

    申请日:2011-01-07

    摘要: An object of the present invention is to propose a functional element built-in substrate which enables an electrode terminal of a functional element to be well connected to the back surface on the side opposite to the electrode terminal of the functional element, and which can be miniaturized. According to the present invention, there is provided a functional element built-in substrate including a functional element provided with an electrode terminal on one surface side of the functional element, and a wiring substrate including a laminated structure in which the functional element is embedded so that the electrode terminal of the functional element faces the front surface side of the structure, and which is formed at least in a side surface region of the functional element by laminating a plurality of wiring insulating layers each including a wiring, the functional element built-in substrate being featured in that the electrode terminal and the back surface side of the wiring substrate are electrically connected to each other through the wiring of the laminated structure, and in that, in a pair of the wiring insulating layers included in the laminated structure and that are in contact with each other, the cross-sectional shape of the wiring in each of the wiring insulating layers, which cross-sectional shape is taken along the plane perpendicular to the extension direction of the wiring in the wiring insulating layer, has a relationship that the cross-sectional area of the wiring in the back surface side wiring insulating layer is larger than the cross-sectional area of the wiring in the front surface side wiring insulating layer.

    摘要翻译: 本发明的目的是提出一种功能元件内置基板,其使功能元件的电极端子能够良好地连接到与功能元件的电极端子相反的一侧的背面,并且其可以是 小型化。 根据本发明,提供了一种功能元件内置基板,其包括在功能元件的一个表面侧上设置有电极端子的功能元件,以及包括功能元件嵌入其中的层叠结构的布线基板 所述功能元件的电极端子面向所述结构的前表面侧,并且通过层叠多个布线绝缘层而形成在所述功能元件的至少侧面区域中,所述多个布线绝缘层包括布线, 其特征在于,布线基板的电极端子和背面侧通过层叠结构的布线电连接,并且其中,在层叠结构中包括的一对布线绝缘层和 彼此接触,每个布线绝缘中的布线的横截面形状 与布线绝缘层中的配线的延伸方向垂直的平面截取的截面形状的层具有这样的关系:背面侧配线绝缘层中的布线的截面积大于 表面侧配线绝缘层中的配线的截面积。