Methods for Forming Silicon-Based Hermetic Thermal Solutions
    63.
    发明申请
    Methods for Forming Silicon-Based Hermetic Thermal Solutions 有权
    形成硅基密封热解决方案的方法

    公开(公告)号:US20130270690A1

    公开(公告)日:2013-10-17

    申请号:US13445734

    申请日:2012-04-12

    CPC classification number: H01L23/473 H01L21/4882 H01L2924/0002 H01L2924/00

    Abstract: A method includes forming a first oxide layer on a surface of an integrated heat spreader, and forming a second oxide layer on top surfaces of fins, wherein the fins are parts of a heat sink. The integrated heat spreader is bonded to the heat sink through the bonding of the first oxide layer to the second oxide layer.

    Abstract translation: 一种方法包括在集成散热器的表面上形成第一氧化物层,并且在翅片的顶表面上形成第二氧化物层,其中散热片是散热片的一部分。 集成散热器通过第一氧化物层与第二氧化物层的结合而结合到散热器。

    Multiple-gate transistors with reverse T-shaped fins
    69.
    发明授权
    Multiple-gate transistors with reverse T-shaped fins 有权
    具有反向T形翅片的多栅极晶体管

    公开(公告)号:US08455321B2

    公开(公告)日:2013-06-04

    申请号:US13294526

    申请日:2011-11-11

    CPC classification number: H01L29/785 H01L29/1054 H01L29/165 H01L29/66795

    Abstract: A method of forming an integrated circuit structure includes forming a first insulation region and a second insulation region in a semiconductor substrate and facing each other; and forming an epitaxial semiconductor region having a reversed T-shape. The epitaxial semiconductor region includes a horizontal plate including a bottom portion between and adjoining the first insulation region and the second insulation region, and a fin over and adjoining the horizontal plate. The bottom of the horizontal plate contacts the semiconductor substrate. The method further includes forming a gate dielectric on a top surface and at least top portions of sidewalls of the fin; and forming a gate electrode over the gate dielectric.

    Abstract translation: 形成集成电路结构的方法包括:在半导体衬底中形成第一绝缘区域和第二绝缘区域并彼此面对; 以及形成具有反向T形的外延半导体区域。 外延半导体区域包括水平板,该水平板包括在第一绝缘区域和第二绝缘区域之间并邻接第一绝缘区域之间的底部,以及在水平板上并邻接的鳍状物。 水平板的底部接触半导体衬底。 该方法还包括在鳍的顶表面和至少顶部的顶部形成栅电介质; 以及在所述栅极电介质上形成栅电极。

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