Method for Producing a Semiconductor Device
    4.
    发明申请
    Method for Producing a Semiconductor Device 有权
    制造半导体器件的方法

    公开(公告)号:US20120289023A1

    公开(公告)日:2012-11-15

    申请号:US13365774

    申请日:2012-02-03

    IPC分类号: H01L21/762

    摘要: A method for producing a semiconductor device having a sidewall insulation includes providing a semiconductor body having a first side and a second side lying opposite the first side. At least one first trench is at least partly filled with insulation material proceeding from the first side in the direction toward the second side into the semiconductor body. The at least one first trench is produced between a first semiconductor body region for a first semiconductor device and a second semiconductor body region for a second semiconductor device. An isolating trench extends from the first side of the semiconductor body in the direction toward the second side of the semiconductor body between the first and second semiconductor body regions in such a way that at least part of the insulation material of the first trench adjoins at least a sidewall of the isolating trench. The second side of the semiconductor body is partly removed as far as the isolating trench.

    摘要翻译: 一种制造具有侧壁绝缘体的半导体器件的方法包括提供具有第一侧和与第一侧相对的第二侧的半导体本体。 至少一个第一沟槽至少部分地填充有绝缘材料,该绝缘材料从朝向第二侧的方向的第一侧进入半导体本体。 在第一半导体器件的第一半导体体区域和第二半导体器件的第二半导体本体区域之间产生至少一个第一沟槽。 隔离沟槽从半导体本体的第一侧沿第一和第二半导体主体区域之间的半导体本体的第二侧的方向延伸,使得第一沟槽的绝缘材料的至少一部分至少邻接 隔离沟槽的侧壁。 半导体主体的第二面部分地被去除到隔离沟槽的一侧。