Recognition method of a mark provided on a semiconductor device
    7.
    发明授权
    Recognition method of a mark provided on a semiconductor device 失效
    提供在半导体器件上的标记的识别方法

    公开(公告)号:US06869819B2

    公开(公告)日:2005-03-22

    申请号:US10321629

    申请日:2002-12-18

    摘要: A high-contrast image recognition can be performed by recognizing an image of a recognition mark from a back surface of a wafer by a visible-light camera by irradiating a visible light from a circuit pattern surface of a silicon substrate. A thickness of the silicon substrate is set to 5 μm to 50 μm. A white or visible light having a wavelength equal to or less than 800 nm is irradiated onto the circuit-pattern forming surface of the substrate. A visible light that has transmitted through the silicon substrate is received by a visible-light camera on a side of a back surface of the silicon substrate. An image of a recognition mark formed on the circuit-pattern forming surface of the silicon substrate is recognized by the visible-light camera.

    摘要翻译: 通过从硅衬底的电路图案表面照射可见光,可以通过可见光照相机从晶片的背面识别识别标记的图像来执行高对比度图像识别。 将硅衬底的厚度设定为5μm至50μm。 将具有等于或小于800nm的波长的白色或可见光照射到基板的电路图案形成表面上。 通过硅衬底透射的可见光被可见光照相机接收在硅衬底背面的一侧上。 形成在硅衬底的电路图案形成表面上的识别标记的图像由可见光照相机识别。