High-speed semiconductor device and method for manufacturing the same
    7.
    发明授权
    High-speed semiconductor device and method for manufacturing the same 失效
    高速半导体器件及其制造方法

    公开(公告)号:US08217466B2

    公开(公告)日:2012-07-10

    申请号:US11990491

    申请日:2006-08-01

    IPC分类号: H01L21/70

    摘要: Disclosed is a semiconductor device wherein the switching speed of a transistor is increased. Specifically disclosed is a semiconductor device comprising a semiconductor layer formed on a part of an insulating layer, a first transistor formed on a lateral face of the semiconductor layer and having a first gate insulating film, a first gate electrode and two first impurity layers forming a source and a drain, and a second transistor formed on another lateral face of the semiconductor layer and having a second gate insulating film, a second gate electrode and two second impurity layers forming a source and a drain.

    摘要翻译: 公开了一种半导体器件,其中晶体管的开关速度增加。 具体公开了一种半导体器件,包括形成在绝缘层的一部分上的半导体层,形成在半导体层的侧面上的第一晶体管,并具有第一栅极绝缘膜,第一栅电极和两个第一杂质层, 源极和漏极,以及形成在所述半导体层的另一个侧面上并具有第二栅极绝缘膜,第二栅极电极和形成源极和漏极的两个第二杂质层的第二晶体管。

    Semiconductor Device and Manufacturing Method Thereof
    9.
    发明申请
    Semiconductor Device and Manufacturing Method Thereof 失效
    半导体器件及其制造方法

    公开(公告)号:US20090096029A1

    公开(公告)日:2009-04-16

    申请号:US11990491

    申请日:2006-08-01

    IPC分类号: H01L27/088 H01L21/336

    摘要: Disclosed is a semiconductor device wherein the switching speed of a transistor is increased. Specifically disclosed is a semiconductor device comprising a semiconductor layer formed on a part of an insulating layer, a first transistor formed on a lateral face of the semiconductor layer and having a first gate insulating film, a first gate electrode and two first impurity layers forming a source and a drain, and a second transistor formed on another lateral face of the semiconductor layer and having a second gate insulating film, a second gate electrode and two second impurity layers forming a source and a drain.

    摘要翻译: 公开了一种半导体器件,其中晶体管的开关速度增加。 具体公开了一种半导体器件,包括形成在绝缘层的一部分上的半导体层,形成在半导体层的侧面上的第一晶体管,并具有第一栅极绝缘膜,第一栅电极和两个第一杂质层, 源极和漏极,以及形成在所述半导体层的另一个侧面上并具有第二栅极绝缘膜,第二栅极电极和形成源极和漏极的两个第二杂质层的第二晶体管。