High-reflection submount for light-emitting diode package and fabrication method thereof
    2.
    发明授权
    High-reflection submount for light-emitting diode package and fabrication method thereof 有权
    发光二极管封装的高反射基座及其制造方法

    公开(公告)号:US08778707B2

    公开(公告)日:2014-07-15

    申请号:US14024564

    申请日:2013-09-11

    申请人: Xintec Inc.

    IPC分类号: H01L21/00

    摘要: A method for fabricating a silicon submount for LED packaging. A silicon substrate is provided. A reflection layer is formed on the silicon substrate. Portions of the reflection layer and the silicon substrate are removed to form openings. A wafer backside grinding process is carried out to thin the silicon substrate thereby turning the openings into through silicon vias. An insulating layer is then deposited to cover the reflection layer and the silicon substrate. A seed layer is formed on the insulating layer. A resist pattern is then formed on the seed layer. A metal layer is formed on the seed layer not covered by the resist pattern. The resist pattern is then stripped. The seed layer not covered by the metal layer is then removed.

    摘要翻译: 一种用于制造用于LED封装的硅基座的方法。 提供硅衬底。 在硅衬底上形成反射层。 去除反射层和硅衬底的部分以形成开口。 进行晶片背面研磨处理以使硅衬底变薄,从而将开口转变成通过硅通孔。 然后沉积绝缘层以覆盖反射层和硅衬底。 种子层形成在绝缘层上。 然后在种子层上形成抗蚀剂图案。 在未被抗蚀剂图案覆盖的种子层上形成金属层。 然后剥离抗蚀剂图案。 然后除去未被金属层覆盖的籽晶层。

    Semiconductor structure having stage difference surface and manufacturing method thereof
    6.
    发明授权
    Semiconductor structure having stage difference surface and manufacturing method thereof 有权
    具有台阶差的半导体结构及其制造方法

    公开(公告)号:US09275963B2

    公开(公告)日:2016-03-01

    申请号:US14199640

    申请日:2014-03-06

    申请人: XINTEC INC.

    IPC分类号: H01L23/00 H01L23/31 H01L21/78

    摘要: A semiconductor structure includes a wafer, at least one nonmetal oxide layer, a pad, a passivation layer, an isolation layer, and a conductive layer. The wafer has a first surface, a second surface, a third surface, a first stage difference surface connected between the second and third surfaces, and a second stage difference surface connected between the first and third surfaces. The nonmetal oxide layer is located on the first surface of the wafer. The pad is located on the nonmetal oxide layer and electrically connected to the wafer. The passivation layer is located on the nonmetal oxide layer. The isolation layer is located on the passivation layer, nonmetal oxide layer, the first, second and third surfaces of the wafer, and the first and second stage difference surfaces of the wafer. The conductive layer is located on the isolation layer and electrically contacts the pad.

    摘要翻译: 半导体结构包括晶片,至少一个非金属氧化物层,焊盘,钝化层,隔离层和导电层。 晶片具有连接在第二和第三表面之间的第一表面,第二表面,第三表面,第一阶段差异表面以及连接在第一和第三表面之间的第二阶段差异表面。 非金属氧化物层位于晶片的第一表面上。 垫位于非金属氧化物层上并电连接到晶片。 钝化层位于非金属氧化物层上。 隔离层位于钝化层,非金属氧化物层,晶片的第一,第二和第三表面以及晶片的第一和第二级差分表面上。 导电层位于隔离层上并电接触焊盘。