Abstract:
An LED package structure for increasing heat-dissipating and light-emitting efficiency includes a substrate unit, an alloy unit, a light-emitting unit, a conductive unit and a package unit. The substrate unit has a substrate body, a first conductive pad, a second conductive pad and a chip-placing pad. The alloy unit has a Ni/Pd alloy formed on the chip-placing pad. The light-emitting unit has an LED chip positioned on the Ni/Pd alloy of the alloy unit by solidified solder ball or glue. The conductive unit has two conductive wires, and the LED chip is electrically connected to the first conductive pad and the second conductive pad by the two conductive wires, respectively. The package unit has a light-transmitting package gel body formed on the top surface of the substrate body in order to cover the light-emitting unit and the conductive unit.
Abstract:
A lead carrier provides support for a semiconductor device during manufacture. The lead carrier includes a temporary support member with multiple package sites. Each package site includes a die attach pad surrounded by a plurality of terminal pads. The pads are formed of a fusible fixing material on a lower portion. A chip is mounted upon the die attach pad and wire bonds extend from the chip to the terminal pads. The pads, chip and wire bonds are all encapsulated within a mold compound. The temporary support member can be heated above a melting temperature of the fusible fixing material and peeled away and then the individual package sites can be isolated from each other to provide completed packages including multiple surface mount joints for mounting within an electronics system board.
Abstract:
A semiconductor electronic device (1) is disclosed, which comprises a die (2) of semiconductor material and a support (3), the die (2) of semiconductor material including an integrated electronic circuit and a plurality of contact pads (6) associated with the electronic circuit and connected electrically to the support (3) by wire leads (4), each contact pad of said plurality of contact pads (6) comprising a lower layer (7) of copper, or alloys thereof; and an upper layer. Advantageously, the upper layer consists of: a first film (9) of nickel or alloys thereof, overlying the lower layer (7) of copper or alloys thereof; a second film of palladium or alloys thereof, overlying the first film (9) of nickel or alloys thereof; and optionally a third film (10) of gold or alloys thereof, overlying the second film of palladium or alloys thereof. Moreover, the layer or film (9, 10) are deposited by an electroless chemical process.
Abstract:
A semiconductor device such as a field-effect transistor, improved to reduce device resistance, comprises a die support structure which includes a die paddle integral with a first set of contacts and a second set of contacts that is electrically isolated from the first set, a semiconductor die having its lower surface positioned on, and electrically connected to, the die paddle, and a conductive layer on the upper surface of the die. At least one electrically conductive wire, preferably plural wires, extend laterally across the second surface of the semiconductor die, are in electrical contact with the conductive layer, and interconnect corresponding second leads on opposite sides of the die. The plural wires may be welded to contacts in succession by alternate ball and wedge bonds on each contacts. The conductive layer may be an aluminized layer on which is formed a thin layer a solderable material, such as tin. A solder is deposited on the tin layer, enmeshing the wires. The wires, which preferably are made of copper, then may be bonded to the electrically conductive layer by melting the solder paste, preferably by heating the support structure, allowing the solder to reflow and wet the wires, and then cool to produce a low resistance mass between the leads.
Abstract:
A semiconductor element (20) of the present invention includes a plurality of field effect transistors (90) and a schottky electrode (9a), and the schottky electrode (9a) is formed along an outer periphery of a region where the plurality of field effect transistors (90) are formed.
Abstract:
In a semiconductor device manufacturing method embodying the present invention for forming a rerouting layer (30), which has wirings (29) for electrically leading electrode terminals (23) and bonding pads (28), on a major surface side (20a) on which the electrode terminals (23) of a semiconductor element (20) are provided, the wirings (29) are formed thinner than the bonding pads (28).
Abstract:
To provide a metal base circuit board excellent in heat dissipation properties, which remarkably reduces malfunction time of a semiconductor which occurs when a hybrid integrated circuit is operated at a high frequency. A metal base circuit board to be use for a hybrid integrated circuit, comprising circuits provided on a metal plate via an insulating layer (A, B), a power semiconductor mounted on the circuit and a control semiconductor to control the power semiconductor, provided on the circuit, wherein a low capacitance portion is embedded under a circuit portion (pad portion) on which the control semiconductor is mounted, preferably, the low capacitance portion is made of a resin containing an inorganic filler and has a dielectric constant of from 2 to 9.
Abstract:
A semiconductor integrated circuit comprises contact pads located over active components, which are positioned to minimize the distance for power delivery between a selected pad and one or more corresponding active components, to which the power is to be delivered. This minimum distance further enhances dissipation of thermal energy released by the active components. More specifically, a semiconductor integrated circuit comprises a laterally organized power transistor, an array of power supply contact pads distributed over the transistor, means for providing a distributed, predominantly vertical current flow from the contact pads to the transistor, and means for connecting a power source to each of the contact pads. Positioning the power supply contact pads directly over the active power transistor further saves precious silicon real estate area. The means for vertical current flow include contact pads made of a stack of metal layers comprising refractory metals for adhesion, copper and nickel as stress-absorbing metals, and gold or palladium as bondable and solderable outermost metals. The means for connecting a power source include wire bonding and solder ball interconnection.
Abstract:
The specification describes a process for forming a barrier layer (21,22) on copper metallization (13) in semiconductor integrated circuits. The barrier layer is effective for both wire bond and solder bump interconnections. The barrier layer is Ti/Ni formed on the copper. Aluminum bond pads are formed on the barrier layer for wire bond interconnections and copper bond pads are formed on the barrier layer for solder bump interconnections.