摘要:
PROBLEM TO BE SOLVED: To solve a problem that, although there is a need to press a circumference region of an island or a hanging pin provided around the island by a clamper of a bonding device for preventing the floating of the island when ultrasonic wave bonding of a metal ribbon is performed, the island side cannot be pressed in the case that a sufficient circumference region of the island cannot be ensured or in the case that the hanging pin cannot be provided by miniaturization of the device.SOLUTION: A projection that projects on a lead side so as to have the same height as that of a lead end part, to a side opposite to a lead of an island. The projection and the lead end part are pressed simultaneously by a clamper. Thereby, floating of the island can be prevented even when neither hanging pin nor pressing region around the island is not provided.
摘要:
PROBLEM TO BE SOLVED: To provide a means for improving reliability of a semiconductor device. SOLUTION: A semiconductor chip 3 is mounted over a chip mounting portion 2 of a lead frame 41 via solder 11a. A metal plate 6 is arranged over a source pad electrode 3s of the semiconductor chip 3 and a lead portion 4a of a lead frame 41 via solder 11b, 11c. A solder reflow process is performed thereby to bond the semiconductor chip 3 over the chip mounting portion 2 with the solder 11a, and to bond the metal plate 6 to the source pad electrode 3a and the lead portion 4 with the solder 11b, 11c. The lead frame 41 is formed of a copper alloy, and thus has its softening temperature higher than the temperature of the solder reflow process. The metal plate 6 is formed of oxygen-free copper, and has its softening temperature lower than the temperature of the solder reflow process, whereby the metal plate 6 is softened in the solder reflow process. Thereafter, a gate pad electrode 3g of the semiconductor chip 3 is coupled to a lead portion 5a via a wire 7, a sealing resin portion 8 is formed, and then the lead frame 41 is cut. COPYRIGHT: (C)2010,JPO&INPIT
摘要:
PROBLEM TO BE SOLVED: To provide a semiconductor device that is high in performance and reliability by connecting a semiconductor chip, an insulation substrate and a cooling body (heat sink) without using solder. SOLUTION: A surface electrode 25 of the semiconductor chip 11 and a lead frame 43 are made of the same material. A tip part 44 of the lead frame 43 is formed into a projecting shape. The surface film 25 of the semiconductor chip and the lead frame 43 are faced each other while they are pressed and vibrated at an ultrasonic frequency. Thus, the same metals formed on the outermost surface (interface) are diffused each other and solderless, direct metal connection can be performed. COPYRIGHT: (C)2010,JPO&INPIT
摘要:
PROBLEM TO BE SOLVED: To provide a method of manufacturing a semiconductor device capable of excellently bonding a connection conductor 16 to lead terminals 13. SOLUTION: The method of manufacturing the semiconductor device 1 is configured so that lead terminals 13 formed on a lead frame 20 exhibiting an elongated plate shape and having one end solely supported in the longitudinal direction and an upper surface electrode 15 of a semiconductor chip 10 mounted on the lead frame 20 are connected by ultrasonic joining to a connection conductor 16 as a plate-like or strip-like connection conductor. The method comprises a step of pressing a part of the connection conductor 16 so that it contacts with the lead terminals 13, and a step of applying ultrasonic vibration in a direction substantially following the longitudinal direction in a plane crossing the pressing direction to the connection conductor 16 in a pressed state. COPYRIGHT: (C)2009,JPO&INPIT
摘要:
PROBLEM TO BE SOLVED: To provide a semiconductor device with high productivity. SOLUTION: Electrical connection in a semiconductor device 10 is made by a plurality of conductor plates, i. e. lead frames 23, 24, 25, 26 and 27. The lead frames 23, 24, 25, 26 and 27 are arranged three-dimensionally such that respective welding portions 23a, 23b, 23c, 24a, 24b, 24c, 25a, 25b, 26a, 26b, 27a and 27b are exposed toward a laser light source used in laser welding. Subsequently, laser welding is performed by irradiating laser light. In such semiconductor device and its manufacturing process, welding becomes convenient and reliable and thereby productivity of semiconductor device is improved. Furthermore, the lead frames 23, 24, 25, 26 and 27 have cooling effect and exhibit the function as a heat spreader. COPYRIGHT: (C)2008,JPO&INPIT
摘要:
PROBLEM TO BE SOLVED: To prevent a gate wiring from being damaged due to a metal film formation position shifted to a gate wiring side in a direct lead bonding semiconductor device. SOLUTION: The direct lead bonding semiconductor device includes a semiconductor substrate, a surface electrode provided on the surface of the semiconductor substrate, a gate wiring provided on the surface of the semiconductor substrate along with the surface electrode, a metal film provided on the surface electrode, and a lead terminal provided on the metal film. The gate wiring is covered with a polyimide membrane and the metal film extends over the polyimide membrane. COPYRIGHT: (C)2007,JPO&INPIT
摘要:
PROBLEM TO BE SOLVED: To enhance the reliability of the soldered junctions between a semiconductor chip and other component members and the reliability of the soldered junctions between component members except the semiconductor chip. SOLUTION: A thickness of a solder bonding layer 23 for bonding an electrode provided on the surface of a semiconductor chip 1 and lead frame 21 is made into a thickness of ≥ 100 μm. The thermal stress and the distortion generated in the solder bonding layer 23 due to the difference in the coefficients of linear expansion between the semiconductor chip 1 and the lead frame 21 are reduced. In addition, a thickness of the solder bonding layer for bonding a soldered junction between a heatsink and an insulating substrate and a soldered junction between the insulating substrate and the semiconductor chip 1 is made into a thickness of ≥ 100 μm, and the thermal stress and the distortion are reduced. When the heatsink is not bonded, a thickness of the solder bonding layer 23 for bonding the electrode provided on the surface of the semiconductor chip 1 and the lead frame 21 is made into a thickness of ≥ 50 μm. COPYRIGHT: (C)2005,JPO&NCIPI