公开(公告)号：US10192796B2

公开(公告)日：2019-01-29

申请号：US13832205

申请日：2013-03-15

Applicant: STATS ChipPAC, Ltd.

Inventor： Yaojian Lin ,  Kang Chen

IPC: H01L23/48 ,  H01L23/52 ,  H01L29/40 ,  H01L21/66 ,  H01L21/56 ,  H01L23/498 ,  H01L23/28 ,  H01L23/00 ,  H01L25/10 ,  H01L23/31 ,  H01L21/48 ,  H01L21/78 ,  H01L23/538

Abstract: A semiconductor device has a substrate with first and second conductive layers formed over first and second opposing surfaces of the substrate. A plurality of bumps is formed over the substrate. A semiconductor die is mounted to the substrate between the bumps. An encapsulant is deposited over the substrate and semiconductor die. A portion of the bumps extends out from the encapsulant. A portion of the encapsulant is removed to expose the substrate. An interconnect structure is formed over the encapsulant and semiconductor die and electrically coupled to the bumps. A portion of the substrate can be removed to expose the first or second conductive layer. A portion of the substrate can be removed to expose the bumps. The substrate can be removed and a protection layer formed over the encapsulant and semiconductor die. A semiconductor package is disposed over the substrate and electrically connected to the substrate.

公开(公告)号：US10049964B2

公开(公告)日：2018-08-14

申请号：US14061244

申请日：2013-10-23

Applicant: STATS ChipPAC, Ltd.

Inventor： Il Kwon Shim ,  Yaojian Lin ,  Pandi C. Marimuthu ,  Kang Chen ,  Yu Gu

IPC: H01L23/00 ,  H01L23/498 ,  H01L23/48 ,  H01L23/31 ,  H01L21/56 ,  H01L25/10 ,  H01L25/00 ,  H01L23/538

Abstract: A semiconductor device has a semiconductor package and an interposer disposed over the semiconductor package. The semiconductor package has a first semiconductor die and a modular interconnect unit disposed in a peripheral region around the first semiconductor die. A second semiconductor die is disposed over the interposer opposite the semiconductor package. An interconnect structure is formed between the interposer and the modular interconnect unit. The interconnect structure is a conductive pillar or stud bump. The modular interconnect unit has a core substrate and a plurality of vertical interconnects formed through the core substrate. A build-up interconnect structure is formed over the first semiconductor die and modular interconnect unit. The vertical interconnects of the modular interconnect unit are exposed by laser direct ablation. An underfill is deposited between the interposer and semiconductor package. A total thickness of the semiconductor package and build-up interconnect structure is less than 0.4 millimeters.

公开(公告)号：US09978700B2

公开(公告)日：2018-05-22

申请号：US14305640

申请日：2014-06-16

Applicant: STATS ChipPAC, Ltd.

Inventor： Yaojian Lin

IPC: H01L23/31 ,  H01L21/56 ,  H01L23/00

CPC classification number: H01L24/03 ,  H01L21/561 ,  H01L21/568 ,  H01L23/3128 ,  H01L23/3135 ,  H01L23/315 ,  H01L24/19 ,  H01L24/20 ,  H01L24/96 ,  H01L24/97 ,  H01L2221/101 ,  H01L2224/04105 ,  H01L2224/12105 ,  H01L2224/94 ,  H01L2924/13091 ,  H01L2924/18162 ,  H01L2924/3511 ,  H01L2924/00 ,  H01L2224/03

Abstract: A semiconductor device has a semiconductor die and an encapsulant deposited over the semiconductor die. A first insulating layer is formed over a first surface of the encapsulant and an active surface of the semiconductor die. A second insulating layer is formed over a second surface of the encapsulant opposite the first surface. A conductive layer is formed over the first insulating layer. The conductive layer includes a line-pitch or line-spacing of less than 5 μm. The active surface of the semiconductor die is recessed within the encapsulant. A third insulating layer is formed over the semiconductor die including a surface of the third insulating layer coplanar with a surface of the encapsulant. The second insulating layer is formed prior to forming the conductive layer. A trench is formed in the first insulating layer. The conductive layer is formed within the trench.

公开(公告)号：US09941207B2

公开(公告)日：2018-04-10

申请号：US14971627

申请日：2015-12-16

Applicant: STATS ChipPAC, Ltd.

Inventor： Yaojian Lin

IPC: H01L23/528 ,  H01L21/66 ,  H01L21/768 ,  H01L21/78 ,  H01L23/31 ,  H01L25/16 ,  H01L25/00 ,  H01L23/00 ,  H01L23/498 ,  H01L21/683 ,  H01L21/56 ,  H01L23/544

CPC classification number: H01L23/528 ,  H01L21/561 ,  H01L21/6835 ,  H01L21/6836 ,  H01L21/76895 ,  H01L21/78 ,  H01L22/14 ,  H01L22/20 ,  H01L23/3107 ,  H01L23/49811 ,  H01L23/49816 ,  H01L23/49822 ,  H01L23/49827 ,  H01L23/5389 ,  H01L23/544 ,  H01L24/81 ,  H01L24/83 ,  H01L24/96 ,  H01L24/97 ,  H01L25/16 ,  H01L25/50 ,  H01L2221/68327 ,  H01L2221/68331 ,  H01L2221/68359 ,  H01L2221/68372 ,  H01L2221/68381 ,  H01L2223/54433 ,  H01L2223/54486 ,  H01L2224/03334 ,  H01L2224/04105 ,  H01L2224/11 ,  H01L2224/12105 ,  H01L2224/19 ,  H01L2224/32225 ,  H01L2224/73253 ,  H01L2224/73267 ,  H01L2224/81005 ,  H01L2224/81191 ,  H01L2224/81192 ,  H01L2224/81815 ,  H01L2224/83005 ,  H01L2224/94 ,  H01L2224/96 ,  H01L2224/97 ,  H01L2924/15311 ,  H01L2924/19104 ,  H01L2924/19105 ,  H01L2924/19106 ,  H01L2924/3511 ,  H01L2924/37001 ,  H01L2224/03 ,  H01L2224/83 ,  H01L2224/81 ,  H01L2924/00014

Abstract: A method of making a semiconductor device comprising the steps of providing a first manufacturing line, providing a second manufacturing line, and forming a first redistribution interconnect structure using the first manufacturing line while forming a second redistribution interconnect structure using the second manufacturing line. The method further includes the steps of testing a first unit of the first redistribution interconnect structure to determine a first known good unit (KGU), disposing a known good semiconductor die (KGD) over the first KGU of the first redistribution interconnect structure, and dicing the first KGU and KGD from the first redistribution interconnect structure. The method further includes the steps of testing a unit of the second redistribution interconnect structure to determine a second KGU of the second redistribution interconnect structure and disposing first KGU of the first redistribution interconnect structure and the KGD over the second KGU of the second redistribution interconnect structure.

公开(公告)号：US09893017B2

公开(公告)日：2018-02-13

申请号：US15089151

申请日：2016-04-01

Applicant: STATS ChipPAC, Ltd.

Inventor： Il Kwon Shim ,  Pandi C. Marimuthu ,  Yaojian Lin

IPC: H01L23/538 ,  H01L21/48 ,  H01L25/10 ,  H01L21/56 ,  H01L21/683 ,  H01L23/31 ,  H01L23/00 ,  H01L25/16

CPC classification number: H01L23/5389 ,  H01L21/486 ,  H01L21/561 ,  H01L21/568 ,  H01L21/6835 ,  H01L23/3128 ,  H01L23/5384 ,  H01L24/16 ,  H01L24/19 ,  H01L24/20 ,  H01L24/29 ,  H01L24/32 ,  H01L24/45 ,  H01L24/48 ,  H01L24/73 ,  H01L24/83 ,  H01L24/85 ,  H01L24/92 ,  H01L24/97 ,  H01L25/105 ,  H01L25/16 ,  H01L2221/68327 ,  H01L2221/6834 ,  H01L2221/68345 ,  H01L2221/68359 ,  H01L2221/68381 ,  H01L2224/0401 ,  H01L2224/04042 ,  H01L2224/04105 ,  H01L2224/12105 ,  H01L2224/16227 ,  H01L2224/24195 ,  H01L2224/2919 ,  H01L2224/2929 ,  H01L2224/2939 ,  H01L2224/32225 ,  H01L2224/45147 ,  H01L2224/48091 ,  H01L2224/48227 ,  H01L2224/73227 ,  H01L2224/73265 ,  H01L2224/73267 ,  H01L2224/83 ,  H01L2224/83005 ,  H01L2224/83192 ,  H01L2224/85 ,  H01L2224/85005 ,  H01L2224/92164 ,  H01L2224/92244 ,  H01L2224/92247 ,  H01L2224/94 ,  H01L2224/97 ,  H01L2225/1035 ,  H01L2225/1041 ,  H01L2225/1058 ,  H01L2924/00012 ,  H01L2924/15311 ,  H01L2924/181 ,  H01L2924/19041 ,  H01L2924/19042 ,  H01L2924/19043 ,  H01L2924/19105 ,  H01L2924/3025 ,  H01L2924/3511 ,  H01L2224/03 ,  H01L2924/00014 ,  H01L2924/00 ,  H01L2224/32245 ,  H01L2224/48247

Abstract: A semiconductor device comprises a first conductive layer formed on a carrier over an insulating layer. A portion of the insulating layer is removed prior to forming the first conductive layer. A first semiconductor die is disposed over the first conductive layer. A discrete electrical component is disposed over the first conductive layer adjacent to the first semiconductor die. A first encapsulant is deposited over the first conductive layer and first semiconductor layer. A conductive pillar is formed through the first encapsulant between the first conductive layer and second conductive layer. A second encapsulant is deposited around the first encapsulant, first conductive layer, and first semiconductor die. A second conductive layer is formed over the first semiconductor die, first encapsulant, and second encapsulant opposite the first conductive layer. The carrier is removed after forming the second conductive layer. A semiconductor package is mounted to the first conductive layer.

公开(公告)号：US09818734B2

公开(公告)日：2017-11-14

申请号：US14624136

申请日：2015-02-17

Applicant: STATS ChipPAC, Ltd.

Inventor： Yaojian Lin ,  Kang Chen

IPC: H01L25/065 ,  H01L25/00 ,  H01L23/31 ,  H01L23/498 ,  H01L21/56 ,  H01L23/00 ,  H01L25/10 ,  H01L23/552 ,  H01L21/66 ,  H01L23/538

CPC classification number: H01L25/50 ,  H01L21/56 ,  H01L21/568 ,  H01L22/12 ,  H01L22/14 ,  H01L22/20 ,  H01L23/3121 ,  H01L23/3128 ,  H01L23/3192 ,  H01L23/49811 ,  H01L23/49816 ,  H01L23/49822 ,  H01L23/49833 ,  H01L23/5383 ,  H01L23/5389 ,  H01L23/552 ,  H01L24/03 ,  H01L24/05 ,  H01L24/11 ,  H01L24/13 ,  H01L24/16 ,  H01L24/19 ,  H01L24/20 ,  H01L24/29 ,  H01L24/32 ,  H01L24/96 ,  H01L24/97 ,  H01L25/105 ,  H01L2224/03 ,  H01L2224/0345 ,  H01L2224/03452 ,  H01L2224/03462 ,  H01L2224/03464 ,  H01L2224/0401 ,  H01L2224/04105 ,  H01L2224/05567 ,  H01L2224/05573 ,  H01L2224/0558 ,  H01L2224/05611 ,  H01L2224/05624 ,  H01L2224/05639 ,  H01L2224/05644 ,  H01L2224/05647 ,  H01L2224/05655 ,  H01L2224/1132 ,  H01L2224/11334 ,  H01L2224/1134 ,  H01L2224/1145 ,  H01L2224/11462 ,  H01L2224/11464 ,  H01L2224/11849 ,  H01L2224/11901 ,  H01L2224/12105 ,  H01L2224/13022 ,  H01L2224/13111 ,  H01L2224/13113 ,  H01L2224/13116 ,  H01L2224/13124 ,  H01L2224/13139 ,  H01L2224/13144 ,  H01L2224/13147 ,  H01L2224/13155 ,  H01L2224/16225 ,  H01L2224/16237 ,  H01L2224/19 ,  H01L2224/24227 ,  H01L2224/2929 ,  H01L2224/29298 ,  H01L2224/32225 ,  H01L2224/48091 ,  H01L2224/73104 ,  H01L2224/73204 ,  H01L2224/73253 ,  H01L2224/73265 ,  H01L2224/73267 ,  H01L2224/81005 ,  H01L2224/83 ,  H01L2224/83005 ,  H01L2224/83191 ,  H01L2224/92125 ,  H01L2224/92244 ,  H01L2224/94 ,  H01L2224/97 ,  H01L2225/1023 ,  H01L2225/1035 ,  H01L2225/1041 ,  H01L2225/1058 ,  H01L2924/00014 ,  H01L2924/01082 ,  H01L2924/01322 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1305 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/141 ,  H01L2924/143 ,  H01L2924/1433 ,  H01L2924/14335 ,  H01L2924/1434 ,  H01L2924/1461 ,  H01L2924/153 ,  H01L2924/15311 ,  H01L2924/15321 ,  H01L2924/1533 ,  H01L2924/15331 ,  H01L2924/157 ,  H01L2924/181 ,  H01L2924/19041 ,  H01L2924/19042 ,  H01L2924/19043 ,  H01L2924/19105 ,  H01L2924/19107 ,  H01L2924/3025 ,  H01L2924/3511 ,  H01L2924/00 ,  H01L2924/00012 ,  H01L2224/11 ,  H01L2224/81 ,  H01L2224/27 ,  H01L2224/82

Abstract: A semiconductor device has a first build-up interconnect structure formed over a substrate. The first build-up interconnect structure includes an insulating layer and conductive layer formed over the insulating layer. A vertical interconnect structure and semiconductor die are disposed over the first build-up interconnect structure. The semiconductor die, first build-up interconnect structure, and substrate are disposed over a carrier. An encapsulant is deposited over the semiconductor die, first build-up interconnect structure, and substrate. A second build-up interconnect structure is formed over the encapsulant. The second build-up interconnect structure electrically connects to the first build-up interconnect structure through the vertical interconnect structure. The substrate provides structural support and prevents warpage during formation of the first and second build-up interconnect structures. The substrate is removed after forming the second build-up interconnect structure. A portion of the insulating layer is removed exposing the conductive layer for electrical interconnect with subsequently stacked semiconductor devices.

公开(公告)号：US09685350B2

公开(公告)日：2017-06-20

申请号：US14193267

申请日：2014-02-28

Applicant: STATS ChipPAC, Ltd.

Inventor： Yaojian Lin ,  Xu Sheng Bao ,  Kang Chen

IPC: H01L23/48 ,  H01L21/48 ,  H01L23/00 ,  H01L23/498 ,  H01L23/538 ,  H01L21/56

CPC classification number: H01L21/485 ,  H01L21/568 ,  H01L23/49816 ,  H01L23/49822 ,  H01L23/49827 ,  H01L23/49833 ,  H01L23/5389 ,  H01L24/19 ,  H01L24/97 ,  H01L2224/04105 ,  H01L2224/12105 ,  H01L2924/01322 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/181 ,  H01L2924/18162 ,  H01L2924/00 ,  H01L2924/00012

Abstract: A semiconductor device has a first conductive layer and a semiconductor die disposed adjacent to the first conductive layer. An encapsulant is deposited over the first conductive layer and semiconductor die. An insulating layer is formed over the encapsulant, semiconductor die, and first conductive layer. A second conductive layer is formed over the insulating layer. A first portion of the first conductive layer is electrically connected to VSS and forms a ground plane. A second portion of the first conductive layer is electrically connected to VDD and forms a power plane. The first conductive layer, insulating layer, and second conductive layer constitute a decoupling capacitor. A microstrip line including a trace of the second conductive layer is formed over the insulating layer and first conductive layer. The first conductive layer is provided on an embedded dummy die, interconnect unit, or modular PCB unit.

公开(公告)号：US09620413B2

公开(公告)日：2017-04-11

申请号：US14097534

申请日：2013-12-05

Applicant: STATS ChipPAC, Ltd.

Inventor： Thomas J. Strothmann ,  Damien M. Pricolo ,  Il Kwon Shim ,  Yaojian Lin ,  Heinz-Peter Wirtz ,  Seung Wook Yoon ,  Pandi C. Marimuthu

IPC: H01L21/78 ,  H01L23/28 ,  H01L23/522 ,  H01L23/31 ,  H01L23/00 ,  H01L21/56 ,  H01L23/498

CPC classification number: H01L21/78 ,  H01L21/561 ,  H01L21/568 ,  H01L21/6836 ,  H01L23/28 ,  H01L23/3114 ,  H01L23/3135 ,  H01L23/49816 ,  H01L23/522 ,  H01L24/12 ,  H01L24/19 ,  H01L24/73 ,  H01L24/96 ,  H01L24/97 ,  H01L2221/68327 ,  H01L2224/0401 ,  H01L2224/04105 ,  H01L2224/12105 ,  H01L2224/16225 ,  H01L2224/32225 ,  H01L2224/48227 ,  H01L2224/73265 ,  H01L2224/951 ,  H01L2224/97 ,  H01L2924/01322 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/15311 ,  H01L2924/181 ,  H01L2924/3511 ,  H01L2224/81 ,  H01L2924/00012 ,  H01L2224/83 ,  H01L2224/85 ,  H01L2924/00

Abstract: A semiconductor device has a carrier with a fixed size. A plurality of first semiconductor die is singulated from a first semiconductor wafer. The first semiconductor die are disposed over the carrier. The number of first semiconductor die on the carrier is independent from the size and number of first semiconductor die singulated from the first semiconductor wafer. An encapsulant is deposited over and around the first semiconductor die and carrier to form a reconstituted panel. An interconnect structure is formed over the reconstituted panel while leaving the encapsulant devoid of the interconnect structure. The reconstituted panel is singulated through the encapsulant. The first semiconductor die are removed from the carrier. A second semiconductor die with a size different from the size of the first semiconductor die is disposed over the carrier. The fixed size of the carrier is independent of a size of the second semiconductor die.

公开(公告)号：US09385052B2

公开(公告)日：2016-07-05

申请号：US13832118

申请日：2013-03-15

Applicant: STATS ChipPAC, Ltd.

Inventor： Yaojian Lin ,  Kang Chen

IPC: H01L21/66 ,  H01L21/56 ,  H01L23/498 ,  H01L23/28 ,  H01L23/00 ,  H01L25/10 ,  H01L23/31 ,  H01L23/538

CPC classification number: H01L22/32 ,  H01L21/4853 ,  H01L21/486 ,  H01L21/56 ,  H01L21/565 ,  H01L21/78 ,  H01L22/12 ,  H01L22/14 ,  H01L22/20 ,  H01L23/28 ,  H01L23/3114 ,  H01L23/3121 ,  H01L23/3128 ,  H01L23/49811 ,  H01L23/49816 ,  H01L23/49822 ,  H01L23/49833 ,  H01L23/5383 ,  H01L23/5384 ,  H01L23/5386 ,  H01L23/5389 ,  H01L24/13 ,  H01L24/19 ,  H01L24/97 ,  H01L25/105 ,  H01L2224/13025 ,  H01L2224/16225 ,  H01L2224/32225 ,  H01L2224/48091 ,  H01L2224/73204 ,  H01L2224/73265 ,  H01L2224/73267 ,  H01L2224/81005 ,  H01L2224/92125 ,  H01L2224/92244 ,  H01L2225/1023 ,  H01L2225/1041 ,  H01L2225/1058 ,  H01L2924/01322 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1305 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/15311 ,  H01L2924/181 ,  H01L2924/19105 ,  H01L2924/19107 ,  H01L2924/00014 ,  H01L2924/00 ,  H01L2924/00012

Abstract: A semiconductor device has a first interconnect structure formed over the carrier. A semiconductor die is disposed over the first interconnect structure after testing the first interconnect structure to be known good. The semiconductor die in a known good die. A vertical interconnect structure, such as a bump or stud bump, is formed over the first interconnect structure. A discrete semiconductor device is disposed over the first interconnect structure or the second interconnect structure. An encapsulant is deposited over the semiconductor die, first interconnect structure, and vertical interconnect structure. A portion of the encapsulant is removed to expose the vertical interconnect structure. A second interconnect structure is formed over the encapsulant and electrically connected to the vertical interconnect structure. The first interconnect structure or the second interconnect structure includes an insulating layer with an embedded glass cloth, glass cross, filler, or fiber.

Abstract translation: 半导体器件具有形成在载体上的第一互连结构。 在测试第一互连结构之后，将半导体管芯设置在第一互连结构上以使其已知良好。 半导体芯片在一个已知的好的芯片中。 在第一互连结构上形成垂直互连结构，例如凸块或凸块凸块。 分立半导体器件设置在第一互连结构或第二互连结构上。 密封剂沉积在半导体管芯，第一互连结构和垂直互连结构之上。 去除一部分密封剂以露出垂直互连结构。 第二互连结构形成在密封剂上并电连接到垂直互连结构。 第一互连结构或第二互连结构包括具有嵌入的玻璃布，玻璃交叉，填充物或纤维的绝缘层。

公开(公告)号：US09337141B2

公开(公告)日：2016-05-10

申请号：US13622280

申请日：2012-09-18

Applicant: STATS ChipPAC, Ltd.

Inventor： Yaojian Lin ,  Haijing Cao ,  Qing Zhang

IPC: H01L21/44 ,  H01L21/4763 ,  H01L21/20 ,  H01L23/522 ,  H01L23/64 ,  H01L23/00 ,  H01L49/02

CPC classification number: H01L23/5227 ,  H01L23/645 ,  H01L24/03 ,  H01L24/05 ,  H01L24/48 ,  H01L28/10 ,  H01L2224/02166 ,  H01L2224/04042 ,  H01L2224/056 ,  H01L2224/451 ,  H01L2224/48463 ,  H01L2924/00014 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01014 ,  H01L2924/01022 ,  H01L2924/01023 ,  H01L2924/01024 ,  H01L2924/01028 ,  H01L2924/01029 ,  H01L2924/0103 ,  H01L2924/01047 ,  H01L2924/0105 ,  H01L2924/01073 ,  H01L2924/01074 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/01083 ,  H01L2924/014 ,  H01L2924/14 ,  H01L2924/00 ,  H01L2224/45099

Abstract: A semiconductor device has a substrate with an inductor formed on its surface. First and second contact pads are formed on the substrate. A passivation layer is formed over the substrate and first and second contact pads. A protective layer is formed over the passivation layer. The protective layer is removed over the first contact pad, but not from the second contact pad. A conductive layer is formed over the first contact pad. The conductive layer is coiled on the surface of the substrate to produce inductive properties. The formation of the conductive layer involves use of a wet etchant. The second contact pad is protected from the wet etchant by the protective layer. The protective layer is removed from the second contact pad after forming the conductive layer over the first contact pad. An external connection is formed on the second contact pad.

Abstract translation: 半导体器件具有在其表面上形成有电感器的基板。 第一和第二接触垫形成在基板上。 在衬底和第一和第二接触焊盘之上形成钝化层。 在钝化层上形成保护层。 保护层在第一接触垫上移除，但不从第二接触垫移除。 导电层形成在第一接触焊盘上。 导电层被卷绕在基板的表面上以产生电感性质。 导电层的形成涉及使用湿蚀刻剂。 第二接触垫被保护层从湿蚀刻剂保护。 在第一接触垫上形成导电层之后，从第二接触焊盘去除保护层。 在第二接触垫上形成外部连接。