公开(公告)号：US20150294893A1

公开(公告)日：2015-10-15

申请号：US14441524

申请日：2013-11-11

申请人： CENTROTHERM THERMAL SOLUTIONS GMBH & CO. KG

发明人： Johann Georg Reichart ,  Wilhelm Kegel ,  Günther Kummer ,  Reinhold Obst ,  Wilfried Lerch

IPC分类号： H01L21/683 ,  H01L21/02 ,  C23C16/458 ,  C23C16/48 ,  C23C16/455 ,  C23C16/50

CPC分类号： H01L21/6838 ,  C23C16/45544 ,  C23C16/458 ,  C23C16/48 ,  C23C16/50 ,  H01L21/02271 ,  H01L21/0262 ,  H01L21/67115 ,  H01L21/68742 ,  H01L21/6875

摘要： A substrate holder having a plate element for receiving a substrate. The plate element comprises at least one recess in a first side of the plate element as well as a plurality of spacers in the at least one recess, at least one opening, which is fluidly connected to the recess and which may be connected to an external gas delivery/exhaust unit, at least one notch or channel, which radially surrounds the recess, at least one opening, which is fluidly connected to the notch or channel and may be connected to an external gas delivery/exhaust unit, a circumferential web, which radially surrounds the recess and is located between the recess and the notch or channel, and circumferential contact surfaces for the substrate, wherein a first circumferential contact surface is formed on the upper side of the web and radially surrounds the recess, such that a substrate abutting against the first contact surface forms an enclosed chamber with the recess, and a second circumferential contact surface, which radially surrounds the notch or channel.

摘要翻译： 一种具有用于接收衬底的板元件的衬底保持器。 板元件包括在板元件的第一侧中的至少一个凹部以及至少一个凹部中的多个间隔件，至少一个开口，其流体地连接到凹部，并且可以连接到外部 气体输送/排气单元，至少一个凹口或通道，其径向地围绕凹部，至少一个开口，其流体地连接到凹口或通道并且可以连接到外部气体输送/排出单元，周向腹板， 其径向地围绕所述凹部并且位于所述凹部和所述凹口或通道之间以及所述基底的周向接触表面，其中在所述腹板的上侧上形成有第一圆周接触表面并且径向包围所述凹部，使得基底 邻接第一接触表面形成具有凹部的封闭室，以及径向包围缺口或通道的第二周向接触表面。

公开(公告)号：US20150292085A1

公开(公告)日：2015-10-15

申请号：US14646004

申请日：2013-11-18

申请人： OSRAM OLED GmbH

发明人： Richard Baisl ,  Michael Popp

IPC分类号： C23C16/455 ,  C23C16/48 ,  C23C16/04

CPC分类号： C23C16/45525 ,  C23C16/042 ,  C23C16/45536 ,  C23C16/48 ,  H01L31/0203 ,  H01L31/0445 ,  H01L51/0021 ,  H01L51/56 ,  H01L2933/0025 ,  Y02E10/50

摘要： The invention relates to a method for producing at least one layer (1) on a surface area (2) of an optoelectronic component (100, 101, 102, 103, 104, 105) comprising a functional layer sequence (41) with an active area which is suitable to produce or to detect the light when the optoelectronic component is in operation. Said method consists of the following steps: introducing the surface area (2) into a coating chamber (10); depositing the at least one layer (1) according to a flash-light supported atomic layer deposition method in which the surface area (2) is exposed to at least one gaseous first initial material (21) or at least one gaseous first initial material (21) and subsequently a gaseous second initial material (22) to form the at least one layer (1), and molecules of the first and/or second initial material (21, 22), which are absorbed on the surface area, are exposed to at least one flash of light, the molecules absorbed on the surface area being split.

摘要翻译： 本发明涉及一种用于在光电子部件（100,101,102,103,104,105）的表面区域（2）上产生至少一个层（1）的方法，所述光电子部件（100,101,102,103,104,105）包括具有活性的功能层序列（41） 该区域适合于在光电子部件运行时产生或检测光。 所述方法包括以下步骤：将表面积（2）引入涂覆室（10）中; 根据闪光支持的原子层沉积方法沉积所述至少一层（1），其中表面积（2）暴露于至少一种气态第一初始材料（21）或至少一种气态第一初始材料 21）和随后的气态第二初始材料（22）以形成所述至少一个层（1），并且被吸收在表面区域上的第一和/或第二初始材料（21,22）的分子被暴露 至少一次闪光，吸收在表面区域上的分子被分裂。

公开(公告)号：US20150128860A1

公开(公告)日：2015-05-14

申请号：US14401261

申请日：2013-05-24

申请人： Soitec

发明人： Claudio Canizares ,  Ding Ding

IPC分类号： C23C16/48 ,  C30B25/08 ,  C23C16/52

CPC分类号： C23C16/48 ,  C23C16/52 ,  C30B25/08 ,  C30B25/16 ,  Y10T29/49

摘要： Deposition chambers (102) for use with deposition systems (100) include a chamber wall (112) comprising a transparent material. The chamber wall may include an outer metrology window (122) surface extending from and at least partially circumscribed by an outer major surface of the wall, and an inner metrology window surface extending from and at least partially circumscribed by an inner major surface of the wall. The window surfaces may be oriented at angles to the major surfaces. Deposition systems include such chambers. Methods include the formation of such deposition chambers. The depositions systems and chambers may be used to perform in-situ metrology.

摘要翻译： 用于沉积系统（100）的沉积室（102）包括包含透明材料的室壁（112）。 腔室壁可以包括从壁的外主表面延伸并且至少部分地由外壁的外表面延伸的外计量窗（122）表面，以及从壁的内主表面延伸并且至少部分地由壁的内主表面延伸的内计量窗表面 。 窗表面可以与主表面成角度定向。 沉积系统包括这样的室。 方法包括形成这样的沉积室。 沉积系统和室可用于执行原位测量。

公开(公告)号：US20150114291A1

公开(公告)日：2015-04-30

申请号：US14584226

申请日：2014-12-29

申请人： ULVAC, Inc.

发明人： Kazuhiko SAITOU ,  Masayuki IIJIMA ,  Takayoshi HIRONO ,  Kenji NAKAMORI

IPC分类号： C23C16/48 ,  C23C16/455 ,  C23C16/52

CPC分类号： C23C16/48 ,  B05D1/60 ,  B05D3/06 ,  B05D2252/02 ,  C23C14/12 ,  C23C14/228 ,  C23C14/24 ,  C23C14/246 ,  C23C14/562 ,  C23C16/4401 ,  C23C16/4409 ,  C23C16/455 ,  C23C16/52 ,  C23C16/545

摘要： The present invention is to provide a technology for forming an organic compound film having a uniform thickness on a film at a high film formation speed while transporting the film in a vacuum chamber. In a vacuum chamber, a film reeled out from a mother roll is transported in contact with a center roller and an organic compound film is formed on the film. A vapor emission device disposed in a film deposition chamber provided in the vacuum chamber and having a vapor emission unit which emits and blows a vapor of an organic compound monomer to a film on the center roller, and an energy ray-emitting device for irradiating an organic compound monomer layer formed on the center roller with an energy ray so as to cure the organic compound layer are provided. The vapor emission device and the film deposition chamber are respectively connected to fifth and third vacuum evacuation devices which are independently controllable; and the pressure in the vapor emission device is set to be larger than the pressure in the film deposition chamber. The difference between the pressure in the vapor emission device and the pressure in the film deposition chamber is set to be constant.

摘要翻译： 本发明提供一种在真空室中输送薄膜的同时以高成膜速度在膜上形成具有均匀厚度的有机化合物膜的技术。 在真空室中，从母辊卷出的膜与中心辊接触地输送，并且在膜上形成有机化合物膜。 一种蒸气发射装置，其设置在设置在所述真空室中的成膜室中，并具有将有机化合物单体的蒸气发射并吹送到所述中心辊上的膜的蒸气发射单元，以及用于照射 提供了形成在中心辊上的能量射线以固化有机化合物层的有机化合物单体层。 蒸汽发射装置和成膜室分别连接到可独立控制的第五和第三抽真空装置; 并且蒸气发射装置中的压力被设定为大于成膜室中的压力。 蒸汽发射装置中的压力与成膜室中的压力之间的差设定为恒定。

公开(公告)号：US09017636B2

公开(公告)日：2015-04-28

申请号：US13705778

申请日：2012-12-05

申请人： Fujitsu Limited

发明人： Yuji Awano ,  Noriyoshi Shimizu ,  Shintaro Sato

IPC分类号： H01L21/768 ,  B82Y40/00 ,  B82Y10/00 ,  B82Y30/00 ,  C01B31/02 ,  C23C14/22 ,  C23C16/04 ,  C23C16/26 ,  H01L23/532 ,  H01L29/06 ,  H01L51/00 ,  H01L51/05 ,  H01L29/775

CPC分类号： H01L51/0002 ,  B82Y10/00 ,  B82Y30/00 ,  B82Y40/00 ,  C01B32/16 ,  C01B32/162 ,  C01B2202/36 ,  C23C14/221 ,  C23C14/228 ,  C23C16/04 ,  C23C16/26 ,  C23C16/463 ,  C23C16/48 ,  H01L21/768 ,  H01L21/76867 ,  H01L21/76876 ,  H01L21/76879 ,  H01L23/53276 ,  H01L29/0673 ,  H01L29/0676 ,  H01L29/775 ,  H01L51/0048 ,  H01L51/0558 ,  H01L2221/1094 ,  H01L2924/0002 ,  Y10S977/843 ,  H01L2924/00

摘要： A deposition method of fine particles, includes the steps of irradiating a fine particle beam formed by size-classified fine particles to an irradiated subject under a vacuum state, and depositing the fine particles on a bottom part of a groove structure formed at the irradiated subject.

摘要翻译： 细颗粒的沉积方法包括以下步骤：在真空状态下将经尺寸分级的微粒形成的细粒子束照射到被照射的被检体上，并将微粒沉积在形成于被照射对象的槽结构的底部 。

公开(公告)号：US20150064364A1

公开(公告)日：2015-03-05

申请号：US14379018

申请日：2013-02-14

申请人： Dow Corning Corporation

发明人： Binh Nguyen ,  Michael Telgenhoff

IPC分类号： C23C16/452 ,  C23C16/448 ,  H01J37/34 ,  C23C16/50 ,  C23C14/35 ,  C23C16/44 ,  C23C16/48

CPC分类号： C23C16/452 ,  C23C14/35 ,  C23C16/24 ,  C23C16/44 ,  C23C16/448 ,  C23C16/48 ,  C23C16/50 ,  H01J37/3405

摘要： A method of forming a metalloid-containing material comprises the step of preparing a hydrometalloid compound in a low volume on-demand reactor. The method further comprises the step of feeding the hydrometalloid compound prepared in the microreactor to a deposition apparatus. Additionally, the method comprises the step of forming the metalloid-containing material from the hydrometalloid compound via the deposition apparatus. A deposition system for forming the metalloid-containing material comprises at least one low volume on-demand reactor coupled to and in fluid communication with a deposition apparatus.

摘要翻译： 形成含类准金属的材料的方法包括在低体积按需反应器中制备水硬脂化合物的步骤。 该方法还包括将在微反应器中制备的湿法油脂化合物进料到沉积设备的步骤。 另外，该方法包括通过沉积装置从硫酸盐化合物形成含准金属的材料的步骤。 用于形成含准金属的材料的沉积系统包括至少一个与沉积设备耦合并流体连通的低容量按需反应器。

公开(公告)号：US08877076B2

公开(公告)日：2014-11-04

申请号：US13777128

申请日：2013-02-26

申请人： Dainippon Screen Mfg. Co., Ltd.

发明人： Sei Negoro ,  Ryo Muramoto ,  Toyohide Hayashi ,  Koji Hashimoto ,  Yasuhiko Nagai

IPC分类号： B44C1/22 ,  H01L21/311 ,  H01L21/02 ,  H01L21/306 ,  H01L21/67

CPC分类号： H01L21/67023 ,  C23C16/46 ,  C23C16/48 ,  C23C16/481 ,  C23C16/482 ,  H01L21/0206 ,  H01L21/02282 ,  H01L21/30604 ,  H01L21/31111 ,  H01L21/6708

摘要： A substrate treatment apparatus is used for treating a major surface of a substrate with a chemical liquid. The substrate treatment apparatus includes: a substrate holding unit which holds the substrate; a chemical liquid supplying unit having a chemical liquid nozzle which supplies the chemical liquid onto the major surface of the substrate held by the substrate holding unit; a heater having an infrared lamp to be located in opposed relation to the major surface of the substrate held by the substrate holding unit to heat the chemical liquid supplied onto the major surface of the substrate by irradiation with infrared radiation emitted from the infrared lamp, the heater having a smaller diameter than the substrate; and a heater moving unit which moves the heater along the major surface of the substrate held by the substrate holding unit.

摘要翻译： 基板处理装置用于用化学液体处理基板的主表面。 基板处理装置包括：保持基板的基板保持单元; 化学液体供给单元，其具有将所述化学液体供给到由所述基板保持单元保持的所述基板的主表面上的化学液体喷嘴; 具有红外灯的加热器，所述加热器具有与由所述基板保持单元保持的所述基板的主表面相对的关系，以通过从所述红外灯发射的红外线照射来加热供应到所述基板的主表面上的所述化学液体， 加热器的直径比基板小; 以及加热器移动单元，其沿着由基板保持单元保持的基板的主表面移动加热器。

公开(公告)号：US20140272195A1

公开(公告)日：2014-09-18

申请号：US14217055

申请日：2014-03-17

申请人： MCALISTER TECHNOLOGIES, LLC

发明人： Roy Edward McAlister

IPC分类号： C23C16/48

CPC分类号： C23C16/48 ,  B82Y30/00 ,  B82Y40/00 ,  C01B32/16 ,  C01B32/186 ,  C23C16/0263 ,  C23C16/26 ,  C23C16/342 ,  H01M4/88 ,  H01M8/04007 ,  Y02P70/56

摘要： Methods, systems, and devices are disclosed for precision fabrication of nanoscale materials and devices. In one aspect, a method to manufacture a nanoscale structure include a process to dissociate a feedstock substance including a gas or a vapor into constituents, in which the constituents include individual atoms and/or molecules. The method includes a process to deposit the constituents on a surface at a particular location. The method includes a process to grow layers layer by layer using two or more particle and/or energy beams to form a material structure, in which the energy beams include at least one of a laser beam or an atomic particle beam.

摘要翻译： 公开了用于纳米尺度材料和器件的精密制造的方法，系统和装置。 在一个方面，制造纳米尺度结构的方法包括将包括气体或蒸气的原料物质分解成组分的方法，其中组分包括各自的原子和/或分子。 该方法包括将成分沉积在特定位置的表面上的过程。 该方法包括使用两个或更多个粒子和/或能量束一层一层地生长层以形成材料结构的过程，其中能量束包括激光束或原子粒子束中的至少一个。

公开(公告)号：US20140093654A1

公开(公告)日：2014-04-03

申请号：US13915468

申请日：2013-06-11

申请人： Honda Patents & Technologies North America, LLC ,  The Board of Trustees of the Leland Stanford Junior University

发明人： Timothy P. Holme ,  Andrei Iancu ,  Hee Joon Jung ,  Michael C. Langston ,  Munekazu Motoyama ,  Friedrich B. Prinz ,  Takane Usui ,  Hitoshi Iwadate ,  Neil Dasgupta ,  Cheng-Chieh Chao

IPC分类号： C23C16/48

CPC分类号： C23C16/482 ,  B82Y10/00 ,  B82Y20/00 ,  C23C16/48 ,  C23C16/483 ,  C23C16/486 ,  C23C16/487 ,  H01L21/02532 ,  H01L21/02568 ,  H01L21/02601 ,  H01L21/02603 ,  H01L21/0262 ,  H01L31/035209 ,  H01L31/035218 ,  H01L31/035227 ,  H01L31/035236 ,  H01L31/18 ,  Y10S977/762 ,  Y10S977/773 ,  Y10S977/774

摘要： A method of fabricating quantum confinements is provided. The method includes depositing, using a deposition apparatus, a material layer on a substrate, where the depositing includes irradiating the layer, before a cycle, during a cycle, and/or after a cycle of the deposition to alter nucleation of quantum confinements in the material layer to control a size and/or a shape of the quantum confinements. The quantum confinements can include quantum wells, nanowires, or quantum dots. The irradiation can be in-situ or ex-situ with respect to the deposition apparatus. The irradiation can include irradiation by photons, electrons, or ions. The deposition is can include atomic layer deposition, chemical vapor deposition, MOCVD, molecular beam epitaxy, evaporation, sputtering, or pulsed-laser deposition.

摘要翻译： 提供了一种制造量子限制的方法。 该方法包括使用沉积设备沉积衬底上的材料层，其中沉积包括在循环之前，循环期间和/或在沉积循环之后照射该层，以改变在该沉积中的量子限制的成核 材料层以控制量子限制的尺寸和/或形状。 量子限制可以包括量子阱，纳米线或量子点。 相对于沉积设备，照射可以就地或离位。 照射可以包括光子，电子或离子的照射。 沉积可以包括原子层沉积，化学气相沉积，MOCVD，分子束外延，蒸发，溅射或脉冲激光沉积。

公开(公告)号：US20140014742A1

公开(公告)日：2014-01-16

申请号：US13864362

申请日：2013-04-17

申请人： OMNIPROBE, INC.

发明人： Rocky Kruger ,  Aaron Smith ,  Cheryl Hartfield

IPC分类号： G01N1/28

CPC分类号： H01J37/08 ,  C23C16/448 ,  C23C16/48 ,  C23C16/52 ,  C23C16/56 ,  G01N1/28 ,  H01J37/02 ,  H01J2237/006 ,  H01J2237/317 ,  Y10T137/0329 ,  Y10T137/0352

摘要： A gas injection system for an energetic-beam instrument having a vacuum chamber. The system has a cartridge containing a chemical serving as a source for an output gas to be delivered into the vacuum chamber. The cartridge has a reservoir containing the chemical, which rises to a fill line having a level defined by an amount of the chemical present in the reservoir at a given time. An outlet from the reservoir is coupled to an output passage through an outlet valve and configured so that when the system is tilted the outlet remains above the level of the fill line. Embodiments include isolation valves allowing the cartridge to be disconnected without destroying system vacuum.

摘要翻译： 一种用于具有真空室的能量束仪器的气体注入系统。 该系统具有一个包含化学物质的药筒，作为输出气体的来源，被输送到真空室中。 药筒具有容纳化学物质的储存器，其在给定时间上升到具有由储存器中存在的化学物质量限定的水平的填充管线。 来自储存器的出口通过出口阀联接到输出通道，并且构造成使得当系统倾斜时，出口保持在填充线的水平面上方。 实施例包括隔离阀，允许筒被断开而不破坏系统真空。