公开(公告)号：US20090246892A1

公开(公告)日：2009-10-01

申请号：US12056627

申请日：2008-03-27

申请人： John J. Maloney ,  Wolfgang Sauter ,  Thomas A. Wassick ,  Jeffrey S. Zimmerman

发明人： John J. Maloney ,  Wolfgang Sauter ,  Thomas A. Wassick ,  Jeffrey S. Zimmerman

IPC分类号： H01L21/66 ,  H01L23/58 ,  H01L23/544

CPC分类号： H01L23/585 ,  H01L22/34 ,  H01L23/522 ,  H01L2924/0002 ,  H01L2924/00

摘要： The invention generally relates to a design structure of a circuit design, and more particularly to a design structure of a delamination sensor for use with low-k materials. A delamination sensor includes at least one first sensor formed in a layered semiconductor structure and a second sensor formed in the layered semiconductor structure. The at least one first sensor is structured and arranged to detect a defect, and the second sensor is structured and arranged to identify an interface where the defect exists.

摘要翻译： 本发明一般涉及一种电路设计的设计结构，更具体地说，涉及一种用于低k材料的分层传感器的设计结构。 分层传感器包括形成在层状半导体结构中的至少一个第一传感器和形成在层状半导体结构中的第二传感器。 所述至少一个第一传感器被构造和布置成检测缺陷，并且所述第二传感器被构造和布置成识别存在缺陷的界面。

公开(公告)号：US06682872B2

公开(公告)日：2004-01-27

申请号：US10056245

申请日：2002-01-22

申请人： Krishna G. Sachdev ,  Michael Berger ,  Rebecca Y. Gorrell ,  Gregg B. Monjeau ,  Bernadette H. Perry ,  Thomas A. Wassick

发明人： Krishna G. Sachdev ,  Michael Berger ,  Rebecca Y. Gorrell ,  Gregg B. Monjeau ,  Bernadette H. Perry ,  Thomas A. Wassick

IPC分类号： G03C500

CPC分类号： C08F290/048 ,  C08L13/00 ,  G03F7/033 ,  G03F7/038 ,  H05K3/287 ,  Y10S430/106 ,  Y10S430/114 ,  Y10T428/31583 ,  Y10T428/31587 ,  Y10T428/31935

摘要： Radiation-curable compositions are provided for use in the fabrication of electronic components as passivation coatings; for defect repair in ceramic and thin film products by micropassivation in high circuit density electronic modules to allow product recovery; as a solder mask in electronic assembly processes; for use as protective coatings on printed circuit board (PCB) circuitry and electronic devices against mechanical damage and corrosion from exposure to the environment. The compositions are solvent-free, radiation-curable, preferably uv-curable, containing a polymer binder, which is a pre-formed thermoplastic or elastomeric polymer/oligomer, a monofunctional and/or bifunctional acrylic monomer, a multifunctional (more than 2 reactive groups) acrylated/methacrylated monomer, and a photoinitiator, where all the constituents are mutually miscible forming a homogeneous viscous blend without the addition of an organic solvent. The compositions may also contain inorganic fillers and/or nanoparticle fillers.

摘要翻译： 提供可辐射固化的组合物用于制造电子部件作为钝化涂层; 通过在高电路密度电子模块中的微激活来对陶瓷和薄膜产品进行缺陷修复，以允许产品回收; 作为电子组装工艺中的焊接掩模; 用作印刷电路板（PCB）电路和电子设备上的保护涂层，防止暴露于环境中的机械损伤和腐蚀。 该组合物是无溶剂的，可辐射固化的，优选可紫外固化的，其包含聚合物粘合剂，其为预成型的热塑性或弹性体聚合物/低聚物，单官能和/或双官能丙烯酸单体，多官能（多于2个反应性 基团）丙烯酸酯化/甲基丙烯酸酯化的单体和光引发剂，其中所有组分是相互混溶的，而不加入有机溶剂形成均匀的粘稠共混物。 组合物还可以含有无机填料和/或纳米颗粒填料。

公开(公告)号：US06455331B2

公开(公告)日：2002-09-24

申请号：US09867364

申请日：2001-05-29

申请人： Roy Yu ,  Kamalesh S. Desai ,  Peter A. Franklin ,  Suryanarayana Kaja ,  Kimberley A. Kelly ,  Yeeling L. Lee ,  Arthur G. Merryman ,  Frank R. Morelli ,  Thomas A. Wassick

发明人： Roy Yu ,  Kamalesh S. Desai ,  Peter A. Franklin ,  Suryanarayana Kaja ,  Kimberley A. Kelly ,  Yeeling L. Lee ,  Arthur G. Merryman ,  Frank R. Morelli ,  Thomas A. Wassick

IPC分类号： H01L2100

CPC分类号： H01L21/485 ,  H05K3/225

摘要： A device repair process that includes removing a passivation polyimide layer. The passivation polyimide layer is removed using a first-half ash followed by a second-half ash. The device is rotated during the second-half ash. The device is then cleaned using sodium hydroxide (NaOH) and a subsequent light ash step is implemented. After the passivation polyimide layer is removed, a seed layer is deposited on the device. A photoresist is formed on the seed layer and bond sites are formed in the photoresist. Repair metallurgy is plated through the bond sites. The bond sites are plated by coupling the device to a fixture and applying the current for plating to the fixture. The contact between the device and the fixture is made though bottom surface metallurgy. After plating, the residual seed layer is removed and a laser delete process is implemented to disconnect and isolate the nets of the device.

摘要翻译： 包括去除钝化聚酰亚胺层的器件修复过程。 钝化聚酰亚胺层使用前半灰，然后是二分之一灰分除去。 该设备在后半段灰分期间旋转。 然后使用氢氧化钠（NaOH）清洁该装置，然后实施随后的轻灰步骤。 在去除钝化聚酰亚胺层之后，将晶种层沉积在器件上。 在种子层上形成光致抗蚀剂，并且在光致抗蚀剂中形成结合位点。 修复冶金通过焊接点进行电镀。 通过将设备耦合到固定装置并将电镀电镀施加到固定装置上来对接合部位进行电镀。 设备和夹具之间的接触是通过底部表面冶金制成的。 电镀后，去除残留的种子层，实施激光删除处理，以断开和隔离设备的网络。

公开(公告)号：US06248599B1

公开(公告)日：2001-06-19

申请号：US09452935

申请日：1999-12-02

申请人： Roy Yu ,  Kamalesh S. Desai ,  Peter A. Franklin ,  Suryanarayana Kaja ,  Kimberley A. Kelly ,  Yeeling L. Lee ,  Arthur G. Merryman ,  Frank R. Morelli ,  Thomas A. Wassick

发明人： Roy Yu ,  Kamalesh S. Desai ,  Peter A. Franklin ,  Suryanarayana Kaja ,  Kimberley A. Kelly ,  Yeeling L. Lee ,  Arthur G. Merryman ,  Frank R. Morelli ,  Thomas A. Wassick

IPC分类号： H01L2100

CPC分类号： H01L21/485

摘要： A device repair process that includes removing a passivation polyimide layer. The passivation polyimide layer is removed using a first-half ash followed by a second-half ash. The device is then cleaned using sodium hydroxide (NaOH) and a subsequent light ash step is implemented. After the passivation polyimide layer is removed, a seed layer is deposited on the device. A photoresist is formed on the seed layer and bond sites are formed in the photoresist. Repair metallurgy is plated through the bond sites. The bond sites are plated by coupling the device to a fixture and applying the current for plating to the fixture. The contact between the device and the fixture is made though bottom surface metallurgy. After plating, the residual seed layer is removed and a laser delete process is implemented to disconnect and isolate the nets of the device.

摘要翻译： 包括去除钝化聚酰亚胺层的器件修复过程。 钝化聚酰亚胺层使用前半灰，然后是二分之一灰分除去。 然后使用氢氧化钠（NaOH）清洁该装置，然后实施随后的轻灰步骤。 在去除钝化聚酰亚胺层之后，将晶种层沉积在器件上。 在种子层上形成光致抗蚀剂，并且在光致抗蚀剂中形成结合位点。 修复冶金通过焊接点进行电镀。 通过将设备耦合到固定装置并将电镀电镀施加到固定装置上来对接合部位进行电镀。 设备和夹具之间的接触是通过底部表面冶金制成的。 电镀后，去除残留的种子层，实施激光删除处理，以断开和隔离设备的网络。

公开(公告)号：US6048741A

公开(公告)日：2000-04-11

申请号：US962199

申请日：1997-10-31

申请人： Roy Yu ,  Kamalesh S. Desai ,  Peter A. Franklin ,  Suryanarayana Kaja ,  Kimberley A. Kelly ,  Yeeling L. Lee ,  Arthur G. Merryman ,  Frank R. Morelli ,  Thomas A. Wassick

发明人： Roy Yu ,  Kamalesh S. Desai ,  Peter A. Franklin ,  Suryanarayana Kaja ,  Kimberley A. Kelly ,  Yeeling L. Lee ,  Arthur G. Merryman ,  Frank R. Morelli ,  Thomas A. Wassick

IPC分类号： H01L21/48 ,  H05K3/22 ,  H01L21/00 ,  H01L21/44

CPC分类号： H01L21/485 ,  H05K3/225 ,  Y10S438/906 ,  Y10S438/94

摘要： A device repair process that includes removing a passivation polyimide layer. The passivation polyimide layer is removed using a first-half ash followed by a second-half ash. The device is rotated during the second-half ash. The device is then cleaned using sodium hydroxide (NaOH) and a subsequent light ash step is implemented. After the passivation polyimide layer is removed, a seed layer is deposited on the device. A photoresist is formed on the seed layer and bond sites are formed in the photoresist. Repair metallurgy is plated through the bond sites. The bond sites are plated by coupling the device to a fixture and applying the current for plating to the fixture. The contact between the device and the fixture is made though bottom surface metallurgy. After plating, the residual seed layer is removed and a laser delete process is implemented to disconnect and isolate the nets of the device.

摘要翻译： 包括去除钝化聚酰亚胺层的器件修复过程。 钝化聚酰亚胺层使用前半灰，然后是二分之一灰分除去。 该设备在后半段灰分期间旋转。 然后使用氢氧化钠（NaOH）清洁该装置，然后实施随后的轻灰步骤。 在去除钝化聚酰亚胺层之后，将晶种层沉积在器件上。 在种子层上形成光致抗蚀剂，并且在光致抗蚀剂中形成结合位点。 修复冶金通过焊接点进行电镀。 通过将设备耦合到固定装置并将电镀电镀施加到固定装置上来对接合部位进行电镀。 设备和夹具之间的接触是通过底部表面冶金制成的。 电镀后，去除残留的种子层，实施激光删除处理，以断开和隔离设备的网络。

公开(公告)号：US5543584A

公开(公告)日：1996-08-06

申请号：US843684

申请日：1992-02-28

申请人： Edward F. Handford ,  Joseph M. Harvilchuck ,  Mario J. Interrante ,  Raymond A. Jackson ,  Raj N. Master ,  Sudipta K. Ray ,  William E. Sablinski ,  Thomas A. Wassick

发明人： Edward F. Handford ,  Joseph M. Harvilchuck ,  Mario J. Interrante ,  Raymond A. Jackson ,  Raj N. Master ,  Sudipta K. Ray ,  William E. Sablinski ,  Thomas A. Wassick

IPC分类号： H01L21/3205 ,  H01L21/768 ,  H01L23/498 ,  H01L23/52 ,  H01L23/525 ,  H01L23/538 ,  H05K3/00 ,  H05K3/02 ,  H05K3/22 ,  H05K3/34 ,  H05K1/11

CPC分类号： H01L21/76892 ,  H01L23/49866 ,  H01L23/525 ,  H05K3/225 ,  H01L2924/0002 ,  H05K2201/10181 ,  H05K2201/10234 ,  H05K2201/1028 ,  H05K2201/10287 ,  H05K2203/0769 ,  H05K2203/107 ,  H05K2203/121 ,  H05K2203/173 ,  H05K2203/175 ,  H05K3/0017 ,  H05K3/027 ,  H05K3/34 ,  Y10T29/49124

摘要： The present invention relates generally to a new method of repairing electrical lines, and more particularly to repairing electrical lines having an opening at the module level with devices in place. Various methods and processes are used to repair this open or defective portion in an electrical conductor line. It could be repaired by securing a jumper wire or nugget across the open or the repair could be made by a deposition process, which includes but is not limited to filling the opening with a solder type material or inserting a solder coated electrical wire and heating the solder and allowing the solder to melt and repair the open. One of the attributes of this invention is the ability to repair on a substrate or module on which active components such as chips, and passive components such as pins, capacitors, etc. have been attached. The invention also allows repair of fine line patterns which are normally not repairable by conventional techniques.

摘要翻译： 本发明一般涉及一种修复电线的新方法，更具体地说，涉及在装置的适当位置修复具有模块级开口的电线。 使用各种方法和过程来修复电导体线中的这个开路或有缺陷的部分。 它可以通过将跨接线或熔核固定在整个开口处进行修复，或者可以通过沉积工艺进行修复，该沉积工艺包括但不限于用焊料型材料填充开口或插入焊料涂覆的电线并加热 焊接并允许焊料熔化并修复开路。 本发明的一个特征是在其上附着有诸如引脚，电容器等的诸如芯片和无源部件的有源部件的基板或模块上进行修复的能力。 本发明还允许修复通常不能通过常规技术修复的细线图案。

公开(公告)号：US08487447B2

公开(公告)日：2013-07-16

申请号：US13111283

申请日：2011-05-19

申请人： Mario J. Interrante ,  Gary LaFontant ,  Michael J. Shapiro ,  Thomas A. Wassick ,  Bucknell C. Webb

发明人： Mario J. Interrante ,  Gary LaFontant ,  Michael J. Shapiro ,  Thomas A. Wassick ,  Bucknell C. Webb

IPC分类号： H01L23/48 ,  H01L23/52 ,  H01L29/40

CPC分类号： H01L23/3171 ,  H01L23/481 ,  H01L24/05 ,  H01L24/06 ,  H01L24/13 ,  H01L24/16 ,  H01L25/0657 ,  H01L2224/02163 ,  H01L2224/0401 ,  H01L2224/05147 ,  H01L2224/05551 ,  H01L2224/0557 ,  H01L2224/05571 ,  H01L2224/05647 ,  H01L2224/0569 ,  H01L2224/06131 ,  H01L2224/06134 ,  H01L2224/13005 ,  H01L2224/13016 ,  H01L2224/13022 ,  H01L2224/13025 ,  H01L2224/13026 ,  H01L2224/13028 ,  H01L2224/131 ,  H01L2224/16145 ,  H01L2224/16146 ,  H01L2224/16225 ,  H01L2224/16227 ,  H01L2225/06513 ,  H01L2225/06517 ,  H01L2225/06541 ,  H01L2225/06565 ,  H01L2924/00014 ,  H01L2924/01006 ,  H01L2924/01023 ,  H01L2924/01029 ,  H01L2924/014 ,  H01L2924/15311 ,  H01L2924/049 ,  H01L2924/053 ,  H01L2224/05552

摘要： A semiconductor structure which includes a plurality of stacked semiconductor chips in a three dimensional configuration. There is a first semiconductor chip in contact with a second semiconductor chip. The first semiconductor chip includes a through silicon via (TSV) extending through the first semiconductor chip; an electrically conducting pad at a surface of the first semiconductor chip, the TSV terminating in contact at a first side of the electrically conducting pad; a passivation layer covering the electrically conducting pad, the passivation layer having a plurality of openings; and a plurality of electrically conducting structures formed in the plurality of openings and in contact with a second side of the electrically conducting pad, the contact of the plurality of electrically conducting structures with the electrically conducting pad being offset with respect to the contact of the TSV with the electrically conducting pad.

摘要翻译： 一种半导体结构，其包括三维结构中的多个层叠半导体芯片。 存在与第二半导体芯片接触的第一半导体芯片。 第一半导体芯片包括延伸穿过第一半导体芯片的贯穿硅通孔（TSV）; 在所述第一半导体芯片的表面处的导电焊盘，所述TSV终止于所述导电焊盘的第一侧接触; 覆盖所述导电焊盘的钝化层，所述钝化层具有多个开口; 以及形成在所述多个开口中并与所述导电垫的第二侧接触的多个导电结构，所述多个导电结构与所述导电垫的接触相对于所述TSV的接触而偏移 与导电垫。

公开(公告)号：US20120292779A1

公开(公告)日：2012-11-22

申请号：US13111283

申请日：2011-05-19

申请人： MARIO J. INTERRANTE ,  Gary LaFontant ,  Michael J. Shapiro ,  Thomas A. Wassick ,  Bucknell C. Webb

发明人： MARIO J. INTERRANTE ,  Gary LaFontant ,  Michael J. Shapiro ,  Thomas A. Wassick ,  Bucknell C. Webb

IPC分类号： H01L23/48 ,  H01L21/28

CPC分类号： H01L23/3171 ,  H01L23/481 ,  H01L24/05 ,  H01L24/06 ,  H01L24/13 ,  H01L24/16 ,  H01L25/0657 ,  H01L2224/02163 ,  H01L2224/0401 ,  H01L2224/05147 ,  H01L2224/05551 ,  H01L2224/0557 ,  H01L2224/05571 ,  H01L2224/05647 ,  H01L2224/0569 ,  H01L2224/06131 ,  H01L2224/06134 ,  H01L2224/13005 ,  H01L2224/13016 ,  H01L2224/13022 ,  H01L2224/13025 ,  H01L2224/13026 ,  H01L2224/13028 ,  H01L2224/131 ,  H01L2224/16145 ,  H01L2224/16146 ,  H01L2224/16225 ,  H01L2224/16227 ,  H01L2225/06513 ,  H01L2225/06517 ,  H01L2225/06541 ,  H01L2225/06565 ,  H01L2924/00014 ,  H01L2924/01006 ,  H01L2924/01023 ,  H01L2924/01029 ,  H01L2924/014 ,  H01L2924/15311 ,  H01L2924/049 ,  H01L2924/053 ,  H01L2224/05552

摘要： A semiconductor structure which includes a plurality of stacked semiconductor chips in a three dimensional configuration. There is a first semiconductor chip in contact with a second semiconductor chip. The first semiconductor chip includes a through silicon via (TSV) extending through the first semiconductor chip; an electrically conducting pad at a surface of the first semiconductor chip, the TSV terminating in contact at a first side of the electrically conducting pad; a passivation layer covering the electrically conducting pad, the passivation layer having a plurality of openings; and a plurality of electrically conducting structures formed in the plurality of openings and in contact with a second side of the electrically conducting pad, the contact of the plurality of electrically conducting structures with the electrically conducting pad being offset with respect to the contact of the TSV with the electrically conducting pad.

摘要翻译： 一种半导体结构，其包括三维结构中的多个层叠半导体芯片。 存在与第二半导体芯片接触的第一半导体芯片。 第一半导体芯片包括延伸穿过第一半导体芯片的贯穿硅通孔（TSV）; 在所述第一半导体芯片的表面处的导电焊盘，所述TSV终止于所述导电焊盘的第一侧接触; 覆盖所述导电焊盘的钝化层，所述钝化层具有多个开口; 以及形成在所述多个开口中并与所述导电垫的第二侧接触的多个导电结构，所述多个导电结构与所述导电垫的接触相对于所述TSV的接触而偏移 与导电垫。

公开(公告)号：US07294909B2

公开(公告)日：2007-11-13

申请号：US11099161

申请日：2005-04-05

申请人： Jon A. Casey ,  James G. Balz ,  Michael Berger ,  Jerome Cohen ,  Charles Hendricks ,  Richard Indyk ,  Mark LaPlante ,  David C. Long ,  Lori A. Maiorino ,  Arthur G. Merryman ,  Glenn A. Pomerantz ,  Robert A. Rita ,  Krystyna W. Semkow ,  Patrick E. Spencer ,  Brian R. Sundlof ,  Richard P. Surprenant ,  Donald R. Wall ,  Thomas A. Wassick ,  Kathleen M. Wiley

发明人： Jon A. Casey ,  James G. Balz ,  Michael Berger ,  Jerome Cohen ,  Charles Hendricks ,  Richard Indyk ,  Mark LaPlante ,  David C. Long ,  Lori A. Maiorino ,  Arthur G. Merryman ,  Glenn A. Pomerantz ,  Robert A. Rita ,  Krystyna W. Semkow ,  Patrick E. Spencer ,  Brian R. Sundlof ,  Richard P. Surprenant ,  Donald R. Wall ,  Thomas A. Wassick ,  Kathleen M. Wiley

IPC分类号： H01L27/148 ,  H01L29/768

CPC分类号： H05K3/225 ,  H01L21/4846 ,  H01L23/49811 ,  H01L2924/0002 ,  H01L2924/09701 ,  H01L2924/3011 ,  H05K1/0306 ,  H05K3/0029 ,  H05K3/4629 ,  H05K2203/173 ,  Y10T29/49124 ,  Y10T29/49135 ,  H01L2924/00

摘要： A multilayer ceramic repair process which provides a new electrical repair path to connect top surface vias. The repair path is established between a defective net and a redundant repair net contained within the multilayer ceramic substrate. The defective net and the repair net each terminate at surface vias of the substrate. A laser is used to form post fired circuitry on and in the substrate. This is followed by the electrical isolation of the defective net from the electrical repair structure and passivation of the electrical repair line.

摘要翻译： 一种多层陶瓷修复工艺，提供了一个新的电气修复路径，以连接顶面通孔。 修复路径是建立在有缺陷的网和包含在多层陶瓷基板内的冗余修复网之间。 有缺陷的网和修复网各自终止在基板的表面通孔处。 使用激光器在基板上和基板上形成点火电路。 之后是有缺陷的网络与电气修复结构的电气隔离和电气修复线路的钝化。

公开(公告)号：US5153408A

公开(公告)日：1992-10-06

申请号：US607969

申请日：1990-10-31

申请人： Edward F. Handford ,  Joseph M. Harvilchuck ,  Mario J. Interrante ,  Raymond A. Jackson ,  Raj N. Master ,  Sudipta K. Ray ,  William E. Sablinski ,  Thomas A. Wassick

发明人： Edward F. Handford ,  Joseph M. Harvilchuck ,  Mario J. Interrante ,  Raymond A. Jackson ,  Raj N. Master ,  Sudipta K. Ray ,  William E. Sablinski ,  Thomas A. Wassick

IPC分类号： H01L21/3205 ,  H01L21/768 ,  H01L23/498 ,  H01L23/52 ,  H01L23/525 ,  H01L23/538 ,  H05K3/00 ,  H05K3/02 ,  H05K3/22 ,  H05K3/34

CPC分类号： H01L21/76892 ,  H01L23/49866 ,  H01L23/525 ,  H05K3/225 ,  H01L2924/0002 ,  H05K2201/10181 ,  H05K2201/10234 ,  H05K2201/1028 ,  H05K2201/10287 ,  H05K2203/0769 ,  H05K2203/107 ,  H05K2203/121 ,  H05K2203/173 ,  H05K2203/175 ,  H05K3/0017 ,  H05K3/027 ,  H05K3/34 ,  Y10T29/49124

摘要： The present invention relates generally to a new method of repairing electrical lines, and more praticularly to repairing electrical lines having an open at the module level with devices in place. Various methods and processes are used to repair this open or defective portion in an electrical conductor line. It could be repaired by securing a jumper wire or nugget across the open or the repair could be made by a deposition process, which includes but is not limited to filling the open with a solder type material or inserting a solder coated electrical wire and heating the solder and allowing the solder to melt and repair the open. One of the attributes of this invention is the ability to repair on a substrate or module on which active components such as chips, and passive components such as pins, capacitors, etc. have been attached. The invention also allows repair of fine line patterns which are normally not repairable by conventional techniques.

摘要翻译： 本发明一般涉及一种修复电线的新方法，并且更具体地涉及在装置就位时修复在模块级具有开路的电线。 使用各种方法和过程来修复电导体线中的这个开路或有缺陷的部分。 它可以通过将跨接线或熔核固定在开口处进行修复，或者可以通过沉积工艺进行修复，该沉积工艺包括但不限于用焊料型材料填充开口或插入焊料涂覆的电线并加热 焊接并允许焊料熔化并修复开路。 本发明的一个特征是在其上附着有诸如引脚，电容器等的诸如芯片和无源部件的有源部件的基板或模块上进行修复的能力。 本发明还允许修复通常不能通过常规技术修复的细线图案。