Methods and structures for electronic probing arrays
    14.
    发明授权
    Methods and structures for electronic probing arrays 失效
    电子探测阵列的方法和结构

    公开(公告)号:US06690186B2

    公开(公告)日:2004-02-10

    申请号:US09999615

    申请日:2001-10-24

    Inventor: Joseph Fjelstad

    CPC classification number: G01R1/07342 G01R1/0491 G01R1/06727 G01R3/00

    Abstract: A probe card for testing an electrical element such as a semiconductor wafer or a printed wiring board includes a substrate with circuitry thereon, an encapsulant layer overlying the substrate and a multiplicity of leads extending upwardly from the substrate through the encapsulant layer to terminals, the terminals projecting above the encapsulant layer. The probe card can be engaged with the electronic element so that the tips of the leads bear on the contact pads of the electronic element, and so that the leads and encapsulant layer deform to accommodate irregularities in the electronic element or probe card. The card can be made by providing the substrate, a sacrificial layer and leads extending between the sacrificial layer and substrate, moving the substrate and sacrificial layer away from one another to deform the leads and injecting a curable material around the leads to form the encapsulant layer.

    Abstract translation: 用于测试诸如半导体晶片或印刷线路板的电气元件的探针卡包括其上具有电路的衬底,覆盖衬底的密封剂层和从衬底通过密封剂层向上延伸到端子的多个引线,端子 突出在密封剂层上方。 探针卡可以与电子元件接合,使得引线的尖端承载在电子元件的接触垫上,并且使得引线和密封剂层变形以适应电子元件或探针卡中的不规则。 可以通过提供衬底,牺牲层和在牺牲层和衬底之间延伸的引线来制造该卡,使衬底和牺牲层彼此远离地移动以使引线变形并且在引线周围注入可固化材料以形成密封层 。

    Method of manufacturing connection components using a plasma patterned mask
    16.
    发明授权
    Method of manufacturing connection components using a plasma patterned mask 有权
    使用等离子体图案化掩模制造连接部件的方法

    公开(公告)号:US06518160B1

    公开(公告)日:2003-02-11

    申请号:US09245227

    申请日:1999-02-05

    Abstract: A connection component is made by providing an assembly comprising a base layer of a dielectric material, a metal layer overlying the base layer, and a top layer of a plasma-etchable material overlying the metal layer; forming openings in the top layer to produce a top layer mask; and forming first conductive elements from the metal layer by removing metal from regions of the metal layer aligned with the openings in the top layer mask. This method may be used to form a connection component having vias or bond windows formed therein for connection with other elements of a microelectronic device and conductive elements may be formed on either or both sides of the base layer.

    Abstract translation: 通过提供包括电介质材料的基底层,覆盖在基底层上的金属层和覆盖在金属层上的等离子体可蚀刻材料的顶层的组件来制造连接部件; 在顶层中形成开口以产生顶层掩模; 以及通过从与顶层掩模中的开口对准的金属层的区域中去除金属,从金属层形成第一导电元件。 该方法可以用于形成具有形成在其中的通孔或接合窗口的连接部件,用于与微电子器件的其它元件连接,并且可以在基底层的一侧或两侧上形成导电元件。

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