MITIGATION OF DETRIMENTAL BREAKDOWN OF A HIGH DIELECTRIC CONSTANT METAL-INSULATOR-METAL CAPACITOR IN A CAPACITOR BANK
    11.
    发明申请
    MITIGATION OF DETRIMENTAL BREAKDOWN OF A HIGH DIELECTRIC CONSTANT METAL-INSULATOR-METAL CAPACITOR IN A CAPACITOR BANK 有权
    电容器中高介电常数金属绝缘体 - 金属电容器的绝缘断开的缓解

    公开(公告)号:US20120126364A1

    公开(公告)日:2012-05-24

    申请号:US12953624

    申请日:2010-11-24

    IPC分类号: H01L23/52 H01L21/98

    摘要: An IC capacitor bank includes a plurality of high-k metal-insulator-metal (MIM) capacitors connected to a pair of conductive traces. A fusible trace located on an end of one of the pair of conductive traces forms a capacitor column connected between supply lines, such that failure of a dielectric in the MIM capacitors causes the fusible trace to at least partially open thereby limiting a fault current in the capacitor column. Additionally, a method of manufacturing an IC capacitor bank includes providing a plurality of high-k metal-insulator-metal (MIM) capacitors connected to a pair of conductive traces and locating a fusible trace on an end of the pair of conductive traces to form a capacitor column that is connected between supply lines, such that failure of a dielectric in the MIM capacitors causes the fusible trace to at least partially open thereby limiting a fault current in the capacitor column.

    摘要翻译: IC电容器组包括连接到一对导电迹线的多个高k金属 - 绝缘体金属(MIM)电容器。 位于一对导电迹线之一的端部上的可熔痕迹形成连接在电源线之间的电容器柱,使得MIM电容器中的电介质的故障导致可熔痕迹至少部分地断开,由此限制了在 电容柱。 此外,制造IC电容器组的方法包括提供连接到一对导电迹线的多个高k金属 - 绝缘体金属(MIM)电容器,并且在一对导电迹线的端部上定位可熔迹线以形成 连接在电源线之间的电容器柱,使得MIM电容器中的电介质的故障导致可熔痕迹至少部分地打开,从而限制电容器柱中的故障电流。

    Semiconductor device and method of manufacturing the same
    14.
    发明授权
    Semiconductor device and method of manufacturing the same 有权
    半导体装置及其制造方法

    公开(公告)号:US08153506B2

    公开(公告)日:2012-04-10

    申请号:US13100679

    申请日:2011-05-04

    IPC分类号: H01L21/98

    摘要: It is provided a contacting method when a plurality of films to be peeled are laminating. Reduction of total layout area, miniaturization of a module, weight reduction, thinning, narrowing a frame of a display device, or the like can be realized by sequentially laminating a plurality of films to be peeled which are once separately formed over a plastic film or the like. Moreover, reliable contact having high degree of freedom is realized by forming each layer having a connection face of a conductive material and by patterning with the use of a photomask having the same pattern.

    摘要翻译: 当要剥离的多个薄膜层叠时,提供接触方法。 通过在塑料薄膜上依次层叠多个被剥离的薄膜,可以一次分开形成,可以实现总布局面积的减小,模块的小型化,减轻重量,变薄,缩小显示装置的框架等 类似。 此外,通过形成具有导电材料的连接面的各层,并通过使用具有相同图案的光掩模进行图案化,实现了高自由度的可靠接触。

    Method for picking up semiconductor chips from a wafer table and method for mounting semiconductor chips on a substrate
    15.
    发明授权
    Method for picking up semiconductor chips from a wafer table and method for mounting semiconductor chips on a substrate 有权
    从晶片台拾取半导体芯片的方法以及将半导体芯片安装在基板上的方法

    公开(公告)号:US08133823B2

    公开(公告)日:2012-03-13

    申请号:US12247986

    申请日:2008-10-08

    IPC分类号: H01L21/98

    摘要: The invention relates to a method for picking up semiconductor chips from a wafer table and, optionally, their mounting on a substrate by means of a pick-and-place system. The position and orientation of the semiconductor chip to be mounted next are determined by means of a first camera and made available in the form of positional data relating to a first system of coordinates. The position and orientation of the substrate place on which the semiconductor chip will be mounted are determined by means of a second camera and made available in the form of positional data relating to a second system of coordinates. The conversion of coordinates of the first or second system of coordinates into coordinates of motion of the pick-and-place system occurs by means of two fixed mapping functions and two changeable correction vectors. The correction vectors are readjusted on the occurrence of a predetermined event.

    摘要翻译: 本发明涉及一种用于从晶片台拾取半导体芯片的方法,并且可选地,通过拾取和放置系统将其安装在基板上。 接下来要安装的半导体芯片的位置和取向通过第一相机确定,并以与第一坐标系相关的位置数据的形式提供。 通过第二相机确定半导体芯片将要安装的基板位置的位置和取向,并以与第二坐标系相关的位置数据的形式提供。 通过两个固定映射函数和两个可更改的校正向量,将第一或第二坐标系坐标转换为拾取和放置系统的运动坐标。 在发生预定事件时重新调整校正矢量。

    WAVELENGTH VARIABLE LASER AND A MANUFACTURING METHOD THEREOF
    17.
    发明申请
    WAVELENGTH VARIABLE LASER AND A MANUFACTURING METHOD THEREOF 审中-公开
    波长可变激光器及其制造方法

    公开(公告)号:US20120027041A1

    公开(公告)日:2012-02-02

    申请号:US13256665

    申请日:2010-03-08

    申请人: Hiroyuki Yamazaki

    发明人: Hiroyuki Yamazaki

    IPC分类号: H01S5/026 H01L21/98

    摘要: A wavelength variable laser includes: a substrate on which an optical coupler is formed as a planar optical waveguide; a DFB array part arranged on the substrate and having DFB laser elements respectively supply optical signals to the optical coupler; and an SOA part arranged on the substrate and having an SOA element configured to amplify an optical signal outputted from the optical coupler. The DFB array part and the SOA part are respectively formed in chips having a same lamination structure to each other. A wavelength variable laser and a modulator integrated wavelength variable laser with high yield ratio can be provided.

    摘要翻译: 波长可变激光器包括:其上形成有光耦合器作为平面光波导的基板; 布置在基板上并具有DFB激光元件的DFB阵列部分分别向光耦合器提供光信号; 以及布置在所述基板上并且具有被配置为放大从所述光耦合器输出的光信号的SOA元件的SOA部件。 DFB阵列部分和SOA部分分别以彼此具有相同层压结构的芯片形成。 可以提供波长可变激光器和具有高屈服比的调制器集成波长可变激光器。