公开(公告)号：US20150021754A1

公开(公告)日：2015-01-22

申请号：US14509785

申请日：2014-10-08

Applicant: STATS CHIPPAC, LTD.

Inventor： Yaojian Lin ,  Pandi C. Marimuthu ,  Il Kwon Shim

IPC: H01L23/367 ,  H01L21/56 ,  H01L23/00 ,  H01L23/31

CPC classification number: H01L23/367 ,  H01L21/568 ,  H01L21/6835 ,  H01L23/16 ,  H01L23/3121 ,  H01L23/3128 ,  H01L23/42 ,  H01L23/49811 ,  H01L23/49822 ,  H01L23/5389 ,  H01L23/552 ,  H01L23/562 ,  H01L24/19 ,  H01L24/20 ,  H01L24/96 ,  H01L24/97 ,  H01L2224/0401 ,  H01L2224/04105 ,  H01L2224/12105 ,  H01L2224/16225 ,  H01L2224/20 ,  H01L2224/24195 ,  H01L2224/73267 ,  H01L2224/9222 ,  H01L2224/94 ,  H01L2224/97 ,  H01L2924/01004 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01047 ,  H01L2924/01073 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/01322 ,  H01L2924/014 ,  H01L2924/09701 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/14 ,  H01L2924/1433 ,  H01L2924/15174 ,  H01L2924/15311 ,  H01L2924/181 ,  H01L2924/18162 ,  H01L2924/19041 ,  H01L2924/19105 ,  H01L2924/30105 ,  H01L2924/3025 ,  H01L2924/3511 ,  H01L2224/48091 ,  H01L2924/00014 ,  H01L2924/00 ,  H01L2224/03 ,  H01L2224/19 ,  H01L2924/00012

Abstract: A semiconductor device has a first semiconductor die and an encapsulant deposited over the first semiconductor die. An interconnect structure is formed over the first semiconductor die and encapsulant. A thermal interface material is formed over the first semiconductor die and encapsulant. A stiffening layer is formed over the first semiconductor die and an edge portion of the encapsulant. Alternatively, an insulating layer is formed adjacent to the first semiconductor die and a stiffening layer is formed over the insulating layer. The stiffening layer includes metal, ferrite, ceramic, or semiconductor material. A heat spreader is disposed over the first semiconductor die and a central portion of the encapsulant. Openings are formed in the heat spreader. A recess is formed in the heat spreader along an edge of the heat spreader. A coefficient of thermal expansion (CTE) of the stiffening layer is less than a CTE of the heat spreader.

Abstract translation: 半导体器件具有沉积在第一半导体管芯上的第一半导体管芯和密封剂。 在第一半导体管芯和密封剂上形成互连结构。 在第一半导体管芯和密封剂上形成热界面材料。 在第一半导体管芯上形成加强层和密封剂的边缘部分。 或者，与第一半导体管芯相邻地形成绝缘层，并且在绝缘层上形成加强层。 加强层包括金属，铁氧体，陶瓷或半导体材料。 散热器设置在第一半导体管芯上方和密封剂的中心部分。 开口形成在散热器中。 散热器沿着散热器的边缘形成凹部。 加强层的热膨胀系数（CTE）小于散热器的CTE。

公开(公告)号：US08878359B2

公开(公告)日：2014-11-04

申请号：US13766493

申请日：2013-02-13

Applicant: STATS ChipPAC, Ltd.

Inventor： Yaojian Lin ,  Kang Chen ,  Jianmin Fang ,  Xia Feng ,  Xusheng Bao

IPC: H01L23/13 ,  H01L23/14 ,  H01L23/485 ,  H01L23/488 ,  H01L21/56 ,  H01L23/29 ,  H01L23/538 ,  H01L23/00 ,  H01L23/31 ,  H01L23/498

CPC classification number: H01L23/544 ,  H01L21/561 ,  H01L21/568 ,  H01L21/78 ,  H01L23/28 ,  H01L23/29 ,  H01L23/3128 ,  H01L23/49816 ,  H01L23/49827 ,  H01L23/5389 ,  H01L24/19 ,  H01L24/20 ,  H01L24/96 ,  H01L24/97 ,  H01L2224/0401 ,  H01L2224/04105 ,  H01L2224/05548 ,  H01L2224/11849 ,  H01L2224/12105 ,  H01L2224/13022 ,  H01L2224/13111 ,  H01L2224/13113 ,  H01L2224/13116 ,  H01L2224/13124 ,  H01L2224/13139 ,  H01L2224/13144 ,  H01L2224/13147 ,  H01L2224/13155 ,  H01L2224/14135 ,  H01L2224/221 ,  H01L2224/73265 ,  H01L2224/96 ,  H01L2924/01004 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01047 ,  H01L2924/01073 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/01322 ,  H01L2924/014 ,  H01L2924/09701 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/14 ,  H01L2924/181 ,  H01L2924/19041 ,  H01L2224/19 ,  H01L2924/00014 ,  H01L2924/00

Abstract: A plurality of semiconductor die is mounted to a temporary carrier. An encapsulant is deposited over the semiconductor die and carrier. A portion of the encapsulant is designated as a saw street between the die, and a portion of the encapsulant is designated as a substrate edge around a perimeter of the encapsulant. The carrier is removed. A first insulating layer is formed over the die, saw street, and substrate edge. A first conductive layer is formed over the first insulating layer. A second insulating layer is formed over the first conductive layer and first insulating layer. The encapsulant is singulated through the first insulating layer and saw street to separate the semiconductor die. A channel or net pattern can be formed in the first insulating layer on opposing sides of the saw street, or the first insulating layer covers the entire saw street and molding area around the semiconductor die.

Abstract translation: 多个半导体管芯安装到临时载体上。 密封剂沉积在半导体管芯和载体上。 密封剂的一部分被指定为模具之间的锯道，并且密封剂的一部分被指定为围绕密封剂的周边的基底边缘。 载体被移除。 在模具，锯条和基板边缘上形成第一绝缘层。 在第一绝缘层上形成第一导电层。 在第一导电层和第一绝缘层上形成第二绝缘层。 通过第一绝缘层和锯条将密封剂分离，以分离半导体管芯。 可以在锯条的相对侧的第一绝缘层中形成通道或网状图案，或者第一绝缘层覆盖整个锯条和半导体管芯周围的成型区域。

公开(公告)号：US20140183761A1

公开(公告)日：2014-07-03

申请号：US14070509

申请日：2013-11-02

Applicant: STATS ChipPAC, Ltd.

Inventor： Yaojian Lin ,  Pandi C. Marimuthu ,  Il Kwon Shim ,  Byung Joon Han

IPC: H01L23/28 ,  H01L21/56

CPC classification number: H01L24/96 ,  H01L21/561 ,  H01L21/568 ,  H01L23/3114 ,  H01L24/11 ,  H01L24/19 ,  H01L24/97 ,  H01L2224/04105 ,  H01L2224/1134 ,  H01L2224/12105 ,  H01L2224/16225 ,  H01L2224/48091 ,  H01L2224/73265 ,  H01L2224/73267 ,  H01L2924/01322 ,  H01L2924/10157 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/181 ,  H01L2924/18162 ,  H01L2924/3511 ,  H01L2924/00014 ,  H01L2924/00 ,  H01L2924/00012

Abstract: A semiconductor device includes a semiconductor die and an encapsulant deposited over and around the semiconductor die. A semiconductor wafer includes a plurality of semiconductor die and a base semiconductor material. A groove is formed in the base semiconductor material. The semiconductor wafer is singulated through the groove to separate the semiconductor die. The semiconductor die are disposed over a carrier with a distance of 500 micrometers (μm) or less between semiconductor die. The encapsulant covers a sidewall of the semiconductor die. A fan-in interconnect structure is formed over the semiconductor die while the encapsulant remains devoid of the fan-in interconnect structure. A portion of the encapsulant is removed from a non-active surface of the semiconductor die. The device is singulated through the encapsulant while leaving encapsulant disposed covering a sidewall of the semiconductor die. The encapsulant covering the sidewall includes a thickness of 50 μm or less.

Abstract translation: 半导体器件包括沉积在半导体管芯上方和周围的半导体管芯和密封剂。 半导体晶片包括多个半导体管芯和基底半导体材料。 在基底半导体材料中形成凹槽。 半导体晶片通过沟槽分离，以分离半导体管芯。 将半导体管芯设置在半导体管芯之间的距离为500微米（μm）以下的载体上。 密封剂覆盖半导体管芯的侧壁。 在半导体管芯上形成扇形互连结构，而密封剂保持没有扇形互连结构。 密封剂的一部分从半导体管芯的非活性表面去除。 通过密封剂将器件分离，同时留下覆盖半导体管芯侧壁的密封剂。 覆盖侧壁的密封剂的厚度为50μm以下。

公开(公告)号：US20140091454A1

公开(公告)日：2014-04-03

申请号：US13630912

申请日：2012-09-28

Applicant: STATS CHIPPAC, LTD.

Inventor： Yaojian Lin ,  Kang Chen ,  Yu Gu

IPC: H01L23/28 ,  H01L21/56

CPC classification number: H01L23/3128 ,  H01L21/4853 ,  H01L21/56 ,  H01L21/561 ,  H01L21/568 ,  H01L23/293 ,  H01L23/3114 ,  H01L23/3121 ,  H01L23/315 ,  H01L23/49811 ,  H01L23/49816 ,  H01L23/49833 ,  H01L24/19 ,  H01L24/20 ,  H01L24/96 ,  H01L24/97 ,  H01L2224/12105 ,  H01L2224/32225 ,  H01L2224/32245 ,  H01L2224/73267 ,  H01L2224/94 ,  H01L2224/97 ,  H01L2924/01322 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/15788 ,  H01L2924/181 ,  H01L2924/18162 ,  H01L2924/3511 ,  H01L2224/83 ,  H01L2924/00 ,  H01L2224/03

Abstract: A semiconductor device includes a semiconductor die. An encapsulant is formed around the semiconductor die. A build-up interconnect structure is formed over a first surface of the semiconductor die and encapsulant. A first supporting layer is formed over a second surface of the semiconductor die as a supporting substrate or silicon wafer disposed opposite the build-up interconnect structure. A second supporting layer is formed over the first supporting layer an includes a fiber enhanced polymer composite material comprising a footprint including an area greater than or equal to an area of a footprint of the semiconductor die. The semiconductor die comprises a thickness less than 450 micrometers (μm). The thickness of the semiconductor die is at least 1 μm less than a difference between a total thickness of the semiconductor device and a thickness of the build-up interconnect structure and the second supporting layer.

Abstract translation: 半导体器件包括半导体管芯。 在半导体管芯周围形成密封剂。 在半导体管芯和密封剂的第一表面上形成积聚互连结构。 第一支撑层形成在半导体管芯的第二表面上，作为与积聚互连结构相对设置的支撑衬底或硅晶片。 在第一支撑层上形成第二支撑层，包括纤维增强聚合物复合材料，其包括占地面积，该占地面积大于或等于半导体管芯的覆盖区域的面积。 半导体管芯的厚度小于450微米（μm）。 半导体管芯的厚度比半导体器件的总厚度和积层互连结构和第二支撑层的厚度之差小至少1μm。

公开(公告)号：US20140084424A1

公开(公告)日：2014-03-27

申请号：US14090036

申请日：2013-11-26

Applicant: STATS ChipPAC, Ltd.

Inventor： Yaojian Lin ,  Xia Feng ,  Kang Chen ,  Jianmin Fang

IPC: H01L23/00

CPC classification number: H01L23/562 ,  H01L23/3114 ,  H01L23/3157 ,  H01L23/585 ,  H01L24/03 ,  H01L24/05 ,  H01L24/13 ,  H01L24/16 ,  H01L24/19 ,  H01L24/20 ,  H01L2224/02311 ,  H01L2224/0239 ,  H01L2224/024 ,  H01L2224/0345 ,  H01L2224/03452 ,  H01L2224/03462 ,  H01L2224/03464 ,  H01L2224/0401 ,  H01L2224/04105 ,  H01L2224/05548 ,  H01L2224/05571 ,  H01L2224/05611 ,  H01L2224/05624 ,  H01L2224/05639 ,  H01L2224/05644 ,  H01L2224/05647 ,  H01L2224/05655 ,  H01L2224/12105 ,  H01L2224/16225 ,  H01L2224/73265 ,  H01L2924/00014 ,  H01L2924/01013 ,  H01L2924/01029 ,  H01L2924/01047 ,  H01L2924/01049 ,  H01L2924/01073 ,  H01L2924/01075 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/01322 ,  H01L2924/014 ,  H01L2924/10252 ,  H01L2924/10253 ,  H01L2924/10272 ,  H01L2924/10329 ,  H01L2924/10335 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/14 ,  H01L2924/1433 ,  H01L2924/14335 ,  H01L2924/1434 ,  H01L2924/181 ,  H01L2924/00015 ,  H01L2924/00 ,  H01L2224/05552

Abstract: A semiconductor wafer contains a plurality of semiconductor die separated by a saw street. A contact pad is formed over an active surface of the semiconductor die. A protective pattern is formed over the active surface of the semiconductor die between the contact pad and saw street of the semiconductor die. The protective pattern includes a segmented metal layer or plurality of parallel segmented metal layers. An insulating layer is formed over the active surface, contact pad, and protective pattern. A portion of the insulating layer is removed to expose the contact pad. The protective pattern reduces erosion of the insulating layer between the contact pad and saw street of the semiconductor die. The protective pattern can be angled at corners of the semiconductor die or follow a contour of the contact pad. The protective pattern can be formed at corners of the semiconductor die.

Abstract translation: 半导体晶片包含由锯条分隔开的多个半导体管芯。 在半导体管芯的有效表面上形成接触焊盘。 在半导体管芯的接触焊盘和锯条之间的半导体管芯的有源表面上形成保护图案。 保护图案包括分段金属层或多个平行的分段金属层。 在有源表面，接触焊盘和保护图案之上形成绝缘层。 去除绝缘层的一部分以露出接触垫。 保护图案减少了半导体管芯的接触焊盘和锯
路之间的绝缘层的侵蚀。 保护图案可以在半导体管芯的拐角处成角度，或者遵循接触焊盘的轮廓。 保护图案可以形成在半导体管芯的拐角处。

公开(公告)号：US20140077363A1

公开(公告)日：2014-03-20

申请号：US13832449

申请日：2013-03-15

Applicant: STATS CHIPPAC, LTD.

Inventor： Yaojian Lin ,  Kang Chen

IPC: H01L23/28 ,  H01L21/56

CPC classification number: H01L22/32 ,  H01L21/4853 ,  H01L21/486 ,  H01L21/56 ,  H01L21/565 ,  H01L21/78 ,  H01L22/12 ,  H01L22/14 ,  H01L22/20 ,  H01L23/28 ,  H01L23/3114 ,  H01L23/3121 ,  H01L23/3128 ,  H01L23/49811 ,  H01L23/49816 ,  H01L23/49822 ,  H01L23/49833 ,  H01L23/5383 ,  H01L23/5384 ,  H01L23/5386 ,  H01L23/5389 ,  H01L24/13 ,  H01L24/19 ,  H01L24/97 ,  H01L25/105 ,  H01L2224/13025 ,  H01L2224/16225 ,  H01L2224/32225 ,  H01L2224/48091 ,  H01L2224/73204 ,  H01L2224/73265 ,  H01L2224/73267 ,  H01L2224/81005 ,  H01L2224/92125 ,  H01L2224/92244 ,  H01L2225/1023 ,  H01L2225/1041 ,  H01L2225/1058 ,  H01L2924/01322 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1305 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/15311 ,  H01L2924/181 ,  H01L2924/19105 ,  H01L2924/19107 ,  H01L2924/00014 ,  H01L2924/00 ,  H01L2924/00012

Abstract: A semiconductor device has a substrate including first and second conductive layers formed over first and second opposing surfaces of the substrate. A plurality of wire studs or stud bumps is formed over the substrate. A semiconductor die is mounted to the substrate between the wire studs. A first encapsulant is deposited around the semiconductor die. A first interconnect structure is formed over the semiconductor die and first encapsulant. A second encapsulant is deposited over the substrate, semiconductor die, and first interconnect structure. The second encapsulant can be formed over a portion of the semiconductor die and side surface of the substrate. A portion of the second encapsulant is removed to expose the substrate and first interconnect structure. A second interconnect structure is formed over the second encapsulant and first interconnect structure and electrically coupled to the wire studs. A discrete semiconductor device can be formed on the interconnect structure.

Abstract translation: 半导体器件具有包括在衬底的第一和第二相对表面上形成的第一和第二导电层的衬底。 在衬底上形成多个线柱或柱形凸块。 将半导体管芯安装在线芯之间的基板上。 第一密封剂沉积在半导体管芯周围。 在半导体管芯和第一密封剂上形成第一互连结构。 第二密封剂沉积在衬底，半导体管芯和第一互连结构之上。 第二密封剂可以形成在半导体管芯的一部分和衬底的侧表面上。 去除第二密封剂的一部分以暴露衬底和第一互连结构。 第二互连结构形成在第二密封剂和第一互连结构上并且电耦合到线柱。 分立半导体器件可以形成在互连结构上。

公开(公告)号：US20130277851A1

公开(公告)日：2013-10-24

申请号：US13917982

申请日：2013-06-14

Applicant: STATS ChipPAC, Ltd.

Inventor： Yaojian Lin ,  Kang Chen ,  Yu Gu ,  Pandi Chelvam Marimuthu

IPC: H01L21/768 ,  H01L23/48

CPC classification number: H01L21/76802 ,  H01L21/561 ,  H01L21/568 ,  H01L23/3128 ,  H01L23/48 ,  H01L23/49811 ,  H01L23/49827 ,  H01L23/5389 ,  H01L24/19 ,  H01L24/96 ,  H01L24/97 ,  H01L2224/12105 ,  H01L2224/16225 ,  H01L2224/24155 ,  H01L2224/24195 ,  H01L2224/48091 ,  H01L2224/48247 ,  H01L2224/73265 ,  H01L2924/01322 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/15311 ,  H01L2924/181 ,  H01L2924/18162 ,  H01L2924/3511 ,  H01L2924/00014 ,  H01L2924/00 ,  H01L2924/00012

Abstract: A semiconductor device has a modular interconnect unit or interconnect structure disposed in a peripheral region of the semiconductor die. An encapsulant is deposited over the semiconductor die and interconnect structure. A first insulating layer is formed over the semiconductor die and interconnect structure. A plurality of openings is formed in the first insulating layer over the interconnect structure. The openings have a pitch of 40 micrometers. The openings include a circular shape, ring shape, cross shape, or lattice shape. A conductive layer is deposited over the first insulating layer. The conductive layer includes a planar surface. A second insulating layer is formed over the conductive layer. A portion of the encapsulant is removed to expose the semiconductor die and the interconnect structure. The modular interconnect unit includes a vertical interconnect structure. The modular interconnect unit forms part of an interlocking pattern around the semiconductor die.

Abstract translation: 半导体器件具有布置在半导体管芯的周边区域中的模块化互连单元或互连结构。 密封剂沉积在半导体管芯和互连结构上。 在半导体管芯和互连结构之上形成第一绝缘层。 在互连结构上的第一绝缘层中形成多个开口。 开口的间距为40微米。 开口包括圆形，环形，十字形或格子形状。 导电层沉积在第一绝缘层上。 导电层包括平坦表面。 在导电层上形成第二绝缘层。 去除一部分密封剂以露出半导体管芯和互连结构。 模块化互连单元包括垂直互连结构。 模块化互连单元形成围绕半导体管芯的互锁图案的一部分。

公开(公告)号：US20130147019A1

公开(公告)日：2013-06-13

申请号：US13766493

申请日：2013-02-13

Applicant: STATS ChipPAC, Ltd.

Inventor： Yaojian Lin ,  Kang Chen ,  Jianmin Fang ,  Xia Feng ,  Xusheng Bao

IPC: H01L23/29

CPC classification number: H01L23/544 ,  H01L21/561 ,  H01L21/568 ,  H01L21/78 ,  H01L23/28 ,  H01L23/29 ,  H01L23/3128 ,  H01L23/49816 ,  H01L23/49827 ,  H01L23/5389 ,  H01L24/19 ,  H01L24/20 ,  H01L24/96 ,  H01L24/97 ,  H01L2224/0401 ,  H01L2224/04105 ,  H01L2224/05548 ,  H01L2224/11849 ,  H01L2224/12105 ,  H01L2224/13022 ,  H01L2224/13111 ,  H01L2224/13113 ,  H01L2224/13116 ,  H01L2224/13124 ,  H01L2224/13139 ,  H01L2224/13144 ,  H01L2224/13147 ,  H01L2224/13155 ,  H01L2224/14135 ,  H01L2224/221 ,  H01L2224/73265 ,  H01L2224/96 ,  H01L2924/01004 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01047 ,  H01L2924/01073 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/01322 ,  H01L2924/014 ,  H01L2924/09701 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/14 ,  H01L2924/181 ,  H01L2924/19041 ,  H01L2224/19 ,  H01L2924/00014 ,  H01L2924/00

Abstract: A plurality of semiconductor die is mounted to a temporary carrier. An encapsulant is deposited over the semiconductor die and carrier. A portion of the encapsulant is designated as a saw street between the die, and a portion of the encapsulant is designated as a substrate edge around a perimeter of the encapsulant. The carrier is removed. A first insulating layer is formed over the die, saw street, and substrate edge. A first conductive layer is formed over the first insulating layer. A second insulating layer is formed over the first conductive layer and first insulating layer. The encapsulant is singulated through the first insulating layer and saw street to separate the semiconductor die. A channel or net pattern can be formed in the first insulating layer on opposing sides of the saw street, or the first insulating layer covers the entire saw street and molding area around the semiconductor die.

Abstract translation: 多个半导体管芯安装到临时载体上。 密封剂沉积在半导体管芯和载体上。 密封剂的一部分被指定为模具之间的锯道，并且密封剂的一部分被指定为围绕密封剂的周边的基底边缘。 载体被移除。 在模具，锯条和基板边缘上形成第一绝缘层。 在第一绝缘层上形成第一导电层。 在第一导电层和第一绝缘层上形成第二绝缘层。 通过第一绝缘层和锯条将密封剂分离，以分离半导体管芯。 可以在锯条的相对侧的第一绝缘层中形成通道或网状图案，或者第一绝缘层覆盖整个锯条和半导体管芯周围的成型区域。

公开(公告)号：US10204879B2

公开(公告)日：2019-02-12

申请号：US14861040

申请日：2015-09-22

Applicant: STATS ChipPAC, Ltd.

Inventor： Yaojian Lin ,  Kang Chen

IPC: H01L27/12 ,  H01L29/786 ,  H01L23/00 ,  H01L23/31 ,  H01L23/498 ,  H01L21/56 ,  H01L23/538 ,  H01L23/552 ,  H01L25/065 ,  H01L25/16 ,  H01L25/18

Abstract: A semiconductor device has a build-up interconnect structure including a first insulating layer with a first material and a second insulating layer with a second material. A first conductive layer is formed over the first insulating layer, and the second insulating layer is formed over the first conductive layer. An optional third insulating layer has the second material and is formed over the second insulating layer. A fourth insulating layer has the first material and is formed over the third insulating layer. The second, third, and fourth insulating layers are cured sequentially or simultaneously. The first material includes a greater tensile strength, elastic modulus, and CTE than the second material. The build-up interconnect structure is formed over a semiconductor wafer or semiconductor die in a reconstituted panel. Alternatively, the build-up interconnect structure is formed over a carrier and a semiconductor die is mounted over the build-up interconnect structure.

公开(公告)号：US09875973B2

公开(公告)日：2018-01-23

申请号：US13874150

申请日：2013-04-30

Applicant: STATS ChipPAC, Ltd.

Inventor： Yaojian Lin ,  Kang Chen ,  Yu Gu ,  Wei Meng ,  Chee Siang Ong

IPC: H01L21/56 ,  H01L23/00 ,  H01L23/31 ,  H01L23/498 ,  H01L23/538 ,  H01L23/29

CPC classification number: H01L23/562 ,  H01L21/56 ,  H01L21/561 ,  H01L21/565 ,  H01L21/568 ,  H01L23/29 ,  H01L23/3107 ,  H01L23/3121 ,  H01L23/3128 ,  H01L23/49816 ,  H01L23/5389 ,  H01L24/19 ,  H01L24/96 ,  H01L2224/04105 ,  H01L2224/12105 ,  H01L2924/01029 ,  H01L2924/01322 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/14 ,  H01L2924/181 ,  H01L2924/18162 ,  H01L2924/3511 ,  H01L2924/00

Abstract: A semiconductor device has a semiconductor die and encapsulant deposited over the semiconductor die. A first insulating layer is formed over the die and encapsulant. The first insulating layer is cured with multiple dwell cycles to enhance adhesion to the die and encapsulant. A first conductive layer is formed over the first insulating layer. A second insulating layer is formed over the first insulating layer and first conductive layer. The second insulating layer is cured with multiple dwell cycles to enhance adhesion to the first insulating layer and first conductive layer. A second conductive layer is formed over the second insulating layer and first conductive layer. A third insulating layer is formed over the second insulating layer and second conductive layer. The first, second, and third insulating layers have different CTE. The second insulating layer or third insulating layer is cured to a dense state to block moisture.