SEMICONDUCTOR PACKAGE PICKER
    82.
    发明申请

    公开(公告)号:WO2006001564A1

    公开(公告)日:2006-01-05

    申请号:PCT/KR2004/003340

    申请日:2004-12-17

    发明人: JO, Yong-Chae

    IPC分类号: H01L21/50

    CPC分类号: H01L21/6838 H05K13/0408

    摘要: Disclosed is a semiconductor package picker. The semiconductor package picker does not seal a gap formed between a ball grid array (BGA) and a pad, but create strong negative pressure in the gap, thereby allowing the pad to pick up the semiconductor pad. The semiconductor package picker reliably picks up the BGA package even if the BGA is formed on an upper surface of the BGA package in addition to a bottom surface thereof.

    摘要翻译: 公开了一种半导体封装拾取器。 半导体封装拾取器不会密封形成在球栅阵列(BGA)和焊盘之间的间隙,而是在间隙中产生强负压,从而允许焊盘拾取半导体焊盘。 即使BGA形成在BGA封装的上表面以外,半导体封装拾取器可靠地拾取BGA封装。

    ENCAPSULATION OF MEMS DEVICES USING PILLAR-SUPPORTED CAPS
    83.
    发明申请
    ENCAPSULATION OF MEMS DEVICES USING PILLAR-SUPPORTED CAPS 审中-公开
    使用支撑CAPS的MEMS器件的封装

    公开(公告)号:WO2004055885A8

    公开(公告)日:2005-12-22

    申请号:PCT/US0339766

    申请日:2003-12-12

    申请人: IC MECHANICS INC

    摘要: This invention comprises a process for fabricating a MEMS microstructure in a sealed cavity wherein the etchant entry holes are created as a by-product of the fabrication process without an additional step to etch holes in the cap layer (20). The process involves extending the layers of sacrificial material (12, 16) past the horizontal boundaries of the cap layer (20). The cap layer (20) is supported by pillars (21) formed by a deposition in holes etched through the sacrificial layers (12,16), and the etchant entry holes are formed when the excess sacrificial material (12, 16) is etched away, leaving voids between the pillars (21) supporting the cap.

    摘要翻译: 本发明包括一种用于在密封空腔中制造MEMS微结构的方法,其中蚀刻剂入口孔作为制造工艺的副产品而产生,而没有额外的步骤来蚀刻盖层(20)中的孔。 该方法包括将牺牲材料层(12,16)延伸超过盖层(20)的水平边界。 盖层(20)由通过蚀刻通过牺牲层(12,16)蚀刻的孔中的沉积形成的柱支撑(21),并且当多余的牺牲材料(12,16)被蚀刻掉时形成蚀刻剂入口孔 在支撑盖子的支柱(21)之间留下空隙。

    APPARATUS AND METHOD FOR REMOVING SEMICONDUCTOR CHIP AND APPARATUS FOR FEEDING SEMICONDUCTOR CHIPS
    88.
    发明申请
    APPARATUS AND METHOD FOR REMOVING SEMICONDUCTOR CHIP AND APPARATUS FOR FEEDING SEMICONDUCTOR CHIPS 审中-公开
    用于去除半导体芯片的装置和方法以及用于馈送半导体芯片的装置

    公开(公告)号:WO2005024932A2

    公开(公告)日:2005-03-17

    申请号:PCT/JP2004/013281

    申请日:2004-09-07

    IPC分类号: H01L21/50

    摘要: While a vicinity of a bottom surface-side region of a pressure-sensitive adhesive sheet (3) corresponding to an adhesion region (R1) of a semiconductor chip (1) are sucked and held, a plurality of protruding portions (30) of a removing member (21) are brought into contact with the bottom surface of the semiconductor chip through the adhesive sheet at the region. Also, the adhesive sheet is sucked in between the respective protruding portions so as to change a surface bonding of the semiconductor chip to the adhesive sheet by adhesion to a point bonding, and further the removing member is moved along the bottom surface of the semiconductor chip so as to change a position of the point bonding and decrease bonding force to the adhesive sheet by the adhesion. Then, the semiconductor chip is removed from the adhesive sheet.

    摘要翻译: 在与半导体芯片(1)的粘合区域(R1)对应的粘合片(3)的底面侧区域附近被吸住并保持的情况下,将多个突起部(30) 移除部件(21)通过该区域的粘合片与半导体芯片的底面接触。 此外,粘合片被吸入各个突出部分之间,以便通过粘附到点粘合来改变半导体芯片与粘合片的表面粘合,并且还可以沿着半导体芯片的底面移动去除构件 从而通过粘合改变点粘合的位置并降低粘合力。 然后,将半导体芯片从粘合片上取出。

    ENCAPSULATION OF MEMS DEVICES USING PILLAR-SUPPORTED CAPS
    89.
    发明申请
    ENCAPSULATION OF MEMS DEVICES USING PILLAR-SUPPORTED CAPS 审中-公开
    使用支撑CAPS的MEMS器件的封装

    公开(公告)号:WO2004055885A3

    公开(公告)日:2004-09-16

    申请号:PCT/US0339766

    申请日:2003-12-12

    申请人: IC MECHANICS INC

    摘要: This invention comprises a process for fabricating a MEMS microstructure in a sealed cavity wherein the etchant entry holes are created as a by-product of the fabrication process without an additional step to etch holes in the cap layer (20). The process involves extending the layers of sacrificial material (12, 16) past the horizontal boundaries of the cap layer (20). The cap layer (20) is supported by pillars (21) formed by a deposition in holes etched through the sacrificial layers (12,16), and the etchant entry holes are formed when the excess sacrificial material (12, 16) is etched away, leaving voids between the pillars (21) supporting the cap.

    摘要翻译: 本发明包括一种用于在密封空腔中制造MEMS微结构的方法,其中蚀刻剂入口孔作为制造工艺的副产品而产生,而没有额外的步骤来蚀刻盖层(20)中的孔。 该方法包括将牺牲材料层(12,16)延伸超过盖层(20)的水平边界。 盖层(20)由通过蚀刻通过牺牲层(12,16)蚀刻的孔中的沉积形成的柱支撑(21),并且当多余的牺牲材料(12,16)被蚀刻掉时形成蚀刻剂入口孔 在支撑盖子的支柱(21)之间留下空隙。