摘要:
PROBLEM TO BE SOLVED: To provide a semiconductor device and a manufacturing method, which can improve yield of the semiconductor device.SOLUTION: A semiconductor device 10 having a chip laminate 14 including laminated first and second semiconductor chips 35, 36-1, 36-2, 36-3, 36-4, comprises: semiconductor substrates 41, 61; circuit element layers 42, 62 provided on first surfaces 41a, 61a of the semiconductor substrates 41, 61, respectively; first surface insulation layers 47, 65 provided on surfaces of the circuit element layers 42, 62, respectively; first rear face insulation layers 49, 64 provided on second surfaces 41b, 61b of the semiconductor substrates 41, 61, respectively; second rear face insulation layers 51, 66 provided on surfaces opposite to surfaces contacting the semiconductor substrates 41, 61, respectively, among surfaces of the first rear insulation layers 49, 64 and including insulation substances different from those of the first rear face insulation layers 49, 64; and through electrodes penetrating the semiconductor substrates 41, 61, respectively.
摘要:
PROBLEM TO BE SOLVED: To provide a semiconductor device that can be manufactured in low cost, can easily be stacked, and has high reliability, and to provide a semiconductor package in which a plurality of such semiconductor devices are stacked.SOLUTION: A semiconductor device comprises a substrate including wiring. At least one first-surface-side semiconductor chip is mounted on a first surface of the substrate and is electrically connected to the wiring. First-surface-side metal balls are provided on the first surface of the substrate and are electrically connected to the first-surface-side semiconductor chip via the wiring. A first-surface-side resin seals the wiring on the first surface of the substrate, the first-surface-side semiconductor chip, and the first-surface-side metal balls. The top of the first-surface-side metal balls protrude and are exposed from the surface of the first-surface-side resin.
摘要:
PROBLEM TO BE SOLVED: To detect a touch position with high accuracy even if a touch area protrudes from an electrode area. SOLUTION: A shape of the touch area is assumed to be a circle, for example. In regard to an overlapped area of the touch area circle with an electrode area 6, a width in an X-direction (overlapped width X46) and a width in a Y-direction (overlapped width Y47) are obtained from sensor measurement values. When the overlapped width X46 differs from the overlapped width Y47, it is decided that the touch area protrudes from the electrode area, and calculation is made by regarding a center position of the touch area circle as a touch position. COPYRIGHT: (C)2011,JPO&INPIT
摘要:
PROBLEM TO BE SOLVED: To provide a semiconductor chip which is mounted in three dimensions at low cost by improving transfer technique. SOLUTION: A method of manufacturing the semiconductor chip including a through-electrode 4 penetrating a semiconductor layer 3 and an integrated circuit 7 includes the steps of: preparing a first substrate 1 including a separation layer 2 and the semiconductor layer 3 formed on the separation layer; forming the integrated circuit in the semiconductor layer; forming, in the semiconductor layer, a hole or groove 4 having a depth that does not reach the separation layer; filling the hole or the groove with an electrical conductor; bonding a second substrate 11 to the semiconductor layer to form a bonded structure; separating the bonded structure at the separation layer to prepare the second substrate to which the semiconductor layer is transferred; and removing at least a portion of the back surface side of the semiconductor layer exposed by the separation to expose the bottom of the electrical conductor. COPYRIGHT: (C)2011,JPO&INPIT
摘要:
PROBLEM TO BE SOLVED: To suppress curving of a semiconductor device, having a semiconductor element built in an insulating layer, near the semiconductor element. SOLUTION: The semiconductor device 50 includes the semiconductor element 1 including a semiconductor substrate 2, an insulating layer 10 in which the semiconductor element 1 is buried, and a wiring structure 20, a portion of which is connected to the semiconductor element 1. The semiconductor substrate 2 has one or a plurality of openings 3 formed, as a means of reducing the amount of curving of the semiconductor element 1, at least on one principal surface side of the semiconductor substrate 2. COPYRIGHT: (C)2011,JPO&INPIT