Method of manufacturing semiconductor device
    54.
    发明专利
    Method of manufacturing semiconductor device 有权
    制造半导体器件的方法

    公开(公告)号:JP2010245290A

    公开(公告)日:2010-10-28

    申请号:JP2009092319

    申请日:2009-04-06

    摘要: PROBLEM TO BE SOLVED: To provide a semiconductor chip which is mounted in three dimensions at low cost by improving transfer technique. SOLUTION: A method of manufacturing the semiconductor chip including a through-electrode 4 penetrating a semiconductor layer 3 and an integrated circuit 7 includes the steps of: preparing a first substrate 1 including a separation layer 2 and the semiconductor layer 3 formed on the separation layer; forming the integrated circuit in the semiconductor layer; forming, in the semiconductor layer, a hole or groove 4 having a depth that does not reach the separation layer; filling the hole or the groove with an electrical conductor; bonding a second substrate 11 to the semiconductor layer to form a bonded structure; separating the bonded structure at the separation layer to prepare the second substrate to which the semiconductor layer is transferred; and removing at least a portion of the back surface side of the semiconductor layer exposed by the separation to expose the bottom of the electrical conductor. COPYRIGHT: (C)2011,JPO&INPIT

    摘要翻译: 要解决的问题:提供通过改进转印技术以低成本安装在三维中的半导体芯片。 解决方案:一种制造半导体芯片的方法,该半导体芯片包括穿透半导体层3和集成电路7的贯通电极4,包括以下步骤:制备包括分离层2和形成在第一基板1上的半导体层3的第一基板1 分离层; 在半导体层中形成集成电路; 在半导体层中形成具有未到达分离层的深度的孔或槽4; 用电导体填充孔或槽; 将第二基板11接合到半导体层以形成接合结构; 在分离层分离结合结构,制备半导体层转移到其上的第二基板; 以及去除通过分离暴露的半导体层的背面侧的至少一部分,以露出电导体的底部。 版权所有(C)2011,JPO&INPIT