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公开(公告)号:JP5900602B2
公开(公告)日:2016-04-06
申请号:JP2014500861
申请日:2012-10-01
申请人: 日立化成株式会社
CPC分类号: C09J11/06 , B23K35/3613 , B23K35/3618 , B23K35/362 , C08K5/092 , C09J163/00 , H01L21/563 , H01L23/295 , H01L24/11 , H01L24/27 , H01L24/29 , H01L24/32 , H01L24/73 , H01L24/81 , H01L24/83 , H01L24/92 , H01L25/0657 , H05K3/305 , H01L2224/03825 , H01L2224/0401 , H01L2224/051 , H01L2224/05111 , H01L2224/05116 , H01L2224/05139 , H01L2224/05144 , H01L2224/05147 , H01L2224/05155 , H01L2224/05575 , H01L2224/0558 , H01L2224/056 , H01L2224/05611 , H01L2224/05616 , H01L2224/05639 , H01L2224/05644 , H01L2224/05647 , H01L2224/05655 , H01L2224/11825 , H01L2224/13025 , H01L2224/131 , H01L2224/13111 , H01L2224/13116 , H01L2224/13139 , H01L2224/13144 , H01L2224/13147 , H01L2224/13155 , H01L2224/13575 , H01L2224/1358 , H01L2224/136 , H01L2224/13611 , H01L2224/13639 , H01L2224/13644 , H01L2224/13647 , H01L2224/13655 , H01L2224/16145 , H01L2224/16148 , H01L2224/16225 , H01L2224/16227 , H01L2224/16238 , H01L2224/17181 , H01L2224/271 , H01L2224/27416 , H01L2224/27436 , H01L2224/27848 , H01L2224/2919 , H01L2224/2929 , H01L2224/29386 , H01L2224/29387 , H01L2224/2939 , H01L2224/32145 , H01L2224/32225 , H01L2224/33181 , H01L2224/73104 , H01L2224/81011 , H01L2224/81121 , H01L2224/81191 , H01L2224/81193 , H01L2224/81203 , H01L2224/8121 , H01L2224/81815 , H01L2224/81895 , H01L2224/81907 , H01L2224/831 , H01L2224/83191 , H01L2224/83203 , H01L2224/83855 , H01L2224/83862 , H01L2224/9205 , H01L2224/92122 , H01L2224/92125 , H01L2224/94 , H01L2225/06513 , H01L2225/06517 , H01L2225/06541 , H01L24/03 , H01L24/05 , H01L24/13 , H01L24/16 , H01L24/17 , H01L24/33 , H01L24/94 , H01L2924/0665 , H01L2924/07802 , H01L2924/10253 , H05K2201/0367 , H05K2201/10977 , H05K3/3436 , Y02P70/613
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公开(公告)号:JP2015012005A
公开(公告)日:2015-01-19
申请号:JP2013133772
申请日:2013-06-26
发明人: HATADA IZUHO , OTORII SUGURU , OKA SHUICHI , YANAGAWA SHUSAKU
CPC分类号: H01L23/552 , H01L23/13 , H01L23/3157 , H01L23/49838 , H01L24/05 , H01L24/13 , H01L24/799 , H01L24/98 , H01L29/0657 , H01L2224/02331 , H01L2224/0235 , H01L2224/0401 , H01L2224/05008 , H01L2224/05023 , H01L2224/05111 , H01L2224/05124 , H01L2224/05139 , H01L2224/05144 , H01L2224/05147 , H01L2224/05155 , H01L2224/05166 , H01L2224/05169 , H01L2224/05184 , H01L2224/05548 , H01L2224/05552 , H01L2224/05568 , H01L2224/05583 , H01L2224/05611 , H01L2224/05655 , H01L2224/05666 , H01L2224/05669 , H01L2224/05684 , H01L2224/0603 , H01L2224/0612 , H01L2224/131 , H01L2224/16225 , H01L2224/16238 , H01L2224/17106 , H01L2924/00014 , H01L2924/00012 , H01L2924/014
摘要: 【課題】故障した半導体素子を除去する際に、周囲に実装されている正常な半導体素子が故障してしまったり、正常な半導体素子までが除去されてしまう。【解決手段】基板側電極が配置されたベース基板と、基板側電極にはんだを介して電気的に接続されたチップ側電極を有し下面側に光吸収層が形成された半導体素子とを備えた。これにより、レーザ光を上方から照射した際に光吸収層で発生する熱を利用してはんだを溶解させ、故障した半導体素子のみを除去するようにした。【選択図】図4
摘要翻译: 要解决的问题:为了解决当去除故障的半导体元件时,安装在周边的普通半导体元件断裂或正常半导体元件与故障半导体元件一起被去除的问题。解决方案:半导体器件包括: 其上配置有基板侧电极的基底基板; 以及半导体元件,其具有通过焊料与基板侧电极电连接的芯片侧电极,并且在下表面侧设置有光吸收层。 利用这种构造,当从上方照射激光时,利用在光吸收层处产生的热量来熔化焊料,并且仅去除故障半导体元件。
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3.Semiconductor device and method for forming power mosfet having silicide layer of interconnection structure and low profile bump 审中-公开
标题翻译: 用于形成具有互连结构和低剖面二氧化硅层的功率MOSFET的半导体器件和方法公开(公告)号:JP2012256885A
公开(公告)日:2012-12-27
申请号:JP2012121518
申请日:2012-05-29
发明人: SAMUEL J ANDERSON , DAVID N OKADA
IPC分类号: H01L21/3205 , H01L21/28 , H01L21/336 , H01L21/768 , H01L23/522 , H01L29/417 , H01L29/78
CPC分类号: H01L23/485 , H01L21/28518 , H01L21/76895 , H01L23/4824 , H01L24/03 , H01L24/05 , H01L24/11 , H01L24/13 , H01L29/456 , H01L29/665 , H01L29/7835 , H01L2224/03464 , H01L2224/0401 , H01L2224/05022 , H01L2224/05027 , H01L2224/05094 , H01L2224/05096 , H01L2224/05111 , H01L2224/05124 , H01L2224/05139 , H01L2224/05144 , H01L2224/05155 , H01L2224/05558 , H01L2224/05562 , H01L2224/05572 , H01L2224/05573 , H01L2224/05611 , H01L2224/05624 , H01L2224/05639 , H01L2224/05644 , H01L2224/05647 , H01L2224/05655 , H01L2224/11312 , H01L2224/1132 , H01L2224/1147 , H01L2224/11849 , H01L2224/13006 , H01L2224/13109 , H01L2224/13111 , H01L2224/13113 , H01L2224/13116 , H01L2224/13124 , H01L2224/13139 , H01L2224/13144 , H01L2224/13147 , H01L2224/13155 , H01L2224/16225 , H01L2224/16227 , H01L2224/94 , H01L2924/00014 , H01L2924/01322 , H01L2924/12041 , H01L2924/12042 , H01L2924/1306 , H01L2924/13091 , H01L2924/181 , H01L2224/03 , H01L2224/11 , H01L2924/01082 , H01L2924/00 , H01L2224/05552
摘要: PROBLEM TO BE SOLVED: To provide a semiconductor device consisting of a power MOSFET including a silicide layer of interconnection structure and a low profile bump in which inter-bump short circuit is prevented, and to provide a manufacturing method therefor.SOLUTION: A source region 160 and a drain region 170 are provided on a substrate, and a silicide layer 174 is arranged on the source region and the drain region. A first interconnection layer 194 is formed on the silicide layer, and a first runner 196 to be connected with the source region and a second runner 198 to be connected with the drain region are arranged. A second interconnection layer 214 is formed on the first interconnection layer, and includes a third runner 216 to be connected with the first runner, and a fourth runner 218 to be connected with the second runner. A third interconnection layer 234 is formed and connected electrically with a source pad 236 and a source bump 240.
摘要翻译: 要解决的问题:提供一种由包括互连结构的硅化物层的功率MOSFET和防止突起间短路的低轮廓凸起组成的半导体器件,并提供其制造方法。 解决方案:源极区160和漏极区170设置在衬底上,并且硅化物层174布置在源极区和漏极区上。 第一互连层194形成在硅化物层上,并且与源极区域连接的第一流道196和与漏极区域连接的第二流道198布置。 第二互连层214形成在第一互连层上,并且包括与第一流道连接的第三流道216和与第二流道连接的第四流道218。 第三互连层234形成并与源极焊盘236和源极突起240电连接。版权所有:(C)2013,JPO和INPIT
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公开(公告)号:JP2012520568A
公开(公告)日:2012-09-06
申请号:JP2011554061
申请日:2010-02-10
申请人: マイクロン テクノロジー, インク.
发明人: ジアーン,トーンビー , リー,ジン
IPC分类号: H01L23/12 , H01L21/3205 , H01L21/768 , H01L23/522 , H01L25/10 , H01L25/11 , H01L25/18 , H05K3/46
CPC分类号: H01L21/76898 , H01L21/6836 , H01L24/16 , H01L24/96 , H01L25/0657 , H01L25/50 , H01L2221/68359 , H01L2221/68372 , H01L2221/68381 , H01L2224/02372 , H01L2224/0401 , H01L2224/05008 , H01L2224/05025 , H01L2224/05111 , H01L2224/05118 , H01L2224/05124 , H01L2224/05139 , H01L2224/05144 , H01L2224/05147 , H01L2224/05155 , H01L2224/05164 , H01L2224/05166 , H01L2224/05169 , H01L2224/05171 , H01L2224/05178 , H01L2224/0518 , H01L2224/05181 , H01L2224/05184 , H01L2224/0557 , H01L2224/05611 , H01L2224/05644 , H01L2224/05664 , H01L2224/13025 , H01L2224/16145 , H01L2224/16146 , H01L2224/27416 , H01L2224/83102 , H01L2224/92125 , H01L2225/06513 , H01L2225/06527 , H01L2225/06541 , H01L2924/00014 , H01L2924/0002 , H01L2924/01006 , H01L2924/01013 , H01L2924/01019 , H01L2924/01024 , H01L2924/01029 , H01L2924/0103 , H01L2924/01033 , H01L2924/01042 , H01L2924/01046 , H01L2924/01047 , H01L2924/01057 , H01L2924/01073 , H01L2924/01074 , H01L2924/01077 , H01L2924/01078 , H01L2924/01079 , H01L2924/01082 , H01L2924/014 , H01L2924/12042 , H01L2924/14 , H01L2924/15311 , H01L2924/3511 , H01L2224/05552 , H01L2924/00 , H01L2924/013
摘要: 半導体構成部品(90)を製造する方法が、回路面(54)と、裏面(56)と、導電性ビア(58)とを有する半導体基板(52)を提供するステップと、導電性ビア(58)の端子部分(76)を露出するために、基板(52)の一部分を裏面(56)から除去するステップと、端子部分(76)を封入するポリマー層(78)を裏面(56)に堆積するステップと、次いで、ポリマー層(78)および端子部分(76)の端部を平坦化して、ポリマー層(78)に埋め込まれた自己整合導体を形成するステップとを含む。 導電性ビア(58)に電気的に接触させて、端子接点(86)や裏面再分配導体(88)等の追加の裏面要素を形成することもできる。 半導体構成部品(90)は、半導体基板(52)と、導電性ビア(58)と、およびポリマー層(78)に埋め込まれた裏面導体とを有する。 積重ね半導体構成部品(96)が、電気的に互いに通じる位置の整合した導電性ビア(58)を有する複数の構成部品(90-1、90-2、90-3)を有する。
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公开(公告)号:JP4993893B2
公开(公告)日:2012-08-08
申请号:JP2005295103
申请日:2005-10-07
申请人: イーピーワークス カンパニー リミテッド
发明人: 金在俊
IPC分类号: H01L23/12 , H01L21/3205 , H01L21/768 , H01L23/522
CPC分类号: H01L23/3114 , H01L23/525 , H01L24/10 , H01L24/13 , H01L27/14618 , H01L27/14632 , H01L27/14687 , H01L2224/05001 , H01L2224/05008 , H01L2224/05022 , H01L2224/05023 , H01L2224/05024 , H01L2224/05027 , H01L2224/05111 , H01L2224/05124 , H01L2224/05144 , H01L2224/05147 , H01L2224/05155 , H01L2224/05567 , H01L2224/05568 , H01L2224/05647 , H01L2224/05655 , H01L2224/05666 , H01L2224/05671 , H01L2224/05684 , H01L2224/13 , H01L2224/13099 , H01L2924/01005 , H01L2924/01006 , H01L2924/01013 , H01L2924/01015 , H01L2924/01016 , H01L2924/01019 , H01L2924/01022 , H01L2924/01024 , H01L2924/01029 , H01L2924/01033 , H01L2924/0104 , H01L2924/01047 , H01L2924/01049 , H01L2924/01074 , H01L2924/01078 , H01L2924/01079 , H01L2924/01082 , H01L2924/014 , H01L2924/14 , H01L2924/00 , H01L2924/00014
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公开(公告)号:JPWO2009066430A1
公开(公告)日:2011-03-31
申请号:JP2009542468
申请日:2008-11-13
申请人: パナソニック株式会社
发明人: 義行 井手 , 義行 井手 , 亀井 英徳 , 英徳 亀井 , 米倉 勇 , 勇 米倉 , 邦彦 小原 , 邦彦 小原 , 中原 光一 , 光一 中原 , 浩二 中津 , 浩二 中津 , 嘉郎 遠矢 , 嘉郎 遠矢 , 北園 俊郎 , 俊郎 北園 , 俊秀 前田 , 俊秀 前田 , 小屋 賢一 , 賢一 小屋 , 白幡 孝洋 , 孝洋 白幡
CPC分类号: H01L33/60 , H01L24/97 , H01L33/54 , H01L2224/04042 , H01L2224/05111 , H01L2224/05155 , H01L2224/05169 , H01L2224/05573 , H01L2224/0558 , H01L2224/05624 , H01L2224/05639 , H01L2224/05666 , H01L2224/13 , H01L2224/14 , H01L2224/16225 , H01L2224/32245 , H01L2224/45144 , H01L2224/48091 , H01L2224/48247 , H01L2224/73265 , H01L2224/97 , H01L2924/12035 , H01L2924/12042 , H01L2924/181 , H01L2924/00014 , H01L2924/00 , H01L2924/00012
摘要: 【課題】半導体発光素子からの光は全方向に進む。そのため、照明方向以外に進む光は有効に利用できない。半導体発光素子の側面に傾斜面をつけ、そこに反射層を形成する手段は提案されているものの、エッチングなどの方法で傾斜面をつけるため、加工に時間がかかる、傾斜面の制御が困難といった課題があった。【解決手段】半導体発光素子をサブマウントに配設し、封止材で封止した後、隣接する半導体発光素子の間に溝加工を施す。できた溝に反射材を充填し、射光面を研磨し、切り分けることで、側面に反射層が形成された半導体発光装置を得ることができる。
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公开(公告)号:JP2011054978A
公开(公告)日:2011-03-17
申请号:JP2010228990
申请日:2010-10-08
发明人: CHOI WON-KYOUNG , MOON CHANG-YOUL , SON YOON-CHUL , KIM YOUNG-HO , ROH HEE-RA , OH CHANG-YUL
IPC分类号: H05K3/24 , B23K1/20 , B23K101/42 , H05K1/09 , H05K3/34
CPC分类号: B23K1/0016 , B23K35/262 , B23K35/282 , B23K2201/42 , H01L24/11 , H01L2224/05001 , H01L2224/0501 , H01L2224/05011 , H01L2224/05023 , H01L2224/05111 , H01L2224/05118 , H01L2224/05139 , H01L2224/05147 , H01L2224/05568 , H01L2224/05572 , H01L2224/05573 , H01L2224/05611 , H01L2224/05639 , H01L2224/05647 , H01L2224/1134 , H05K3/244 , H05K3/3463 , Y10T428/12493 , H01L2924/00014 , H01L2924/0103 , H01L2924/01029 , H01L2924/01028 , H01L2924/01047
摘要: PROBLEM TO BE SOLVED: To provide a soldered structure in which structure characteristics are improved by intervening in interfacial reaction in the case of soldering high reactive Zn.
SOLUTION: The soldered structure includes a coupling layer containing Zn and Pb-free solder that coupling-reacts with the coupling layer. Then, the coupling layer has a multiple layer structure in which at least one material layer formed by a predetermined material and a Zn layer are sequentially laminated; and the Zn layer is located at the uppermost position on the Pb-free solder side of the multiple layer.
COPYRIGHT: (C)2011,JPO&INPIT摘要翻译: 要解决的问题:提供在焊接高反应性Zn的情况下通过介入界面反应来提高结构特征的焊接结构。 解决方案:焊接结构包括耦合与耦合层反应的含有无铅和无铅焊料的耦合层。 然后,耦合层具有多层结构,其中由预定材料和Zn层形成的至少一个材料层依次层叠; 并且Zn层位于多层的无铅焊料侧的最上位置。 版权所有(C)2011,JPO&INPIT
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公开(公告)号:JP2010212575A
公开(公告)日:2010-09-24
申请号:JP2009059185
申请日:2009-03-12
申请人: Casio Computer Co Ltd , カシオ計算機株式会社
发明人: WAKIZAKA SHINJI
IPC分类号: H01L23/12
CPC分类号: H01L24/11 , H01L24/03 , H01L24/05 , H01L24/13 , H01L24/14 , H01L2224/0401 , H01L2224/05001 , H01L2224/05022 , H01L2224/05023 , H01L2224/05027 , H01L2224/05082 , H01L2224/05111 , H01L2224/05124 , H01L2224/05147 , H01L2224/05553 , H01L2224/05555 , H01L2224/05571 , H01L2224/05647 , H01L2224/0603 , H01L2224/06131 , H01L2224/1132 , H01L2224/11472 , H01L2224/11849 , H01L2224/13013 , H01L2224/13014 , H01L2224/13023 , H01L2224/131 , H01L2224/1403 , H01L2224/14131 , H01L2224/94 , H01L2924/00013 , H01L2924/01006 , H01L2924/01013 , H01L2924/01029 , H01L2924/01033 , H01L2924/01082 , H01L2924/014 , H01L2924/14 , H01L2924/19041 , H01L2924/00014 , H01L2224/11 , H01L2924/01014 , H01L2224/13099 , H01L2224/05099 , H01L2224/13599 , H01L2224/05599 , H01L2224/29099 , H01L2224/29599
摘要: PROBLEM TO BE SOLVED: To provide a method for manufacturing a semiconductor device which forms solder bumps only on columnar electrodes by printing solder paste layers on the columnar electrodes by being shifted, suppresses generation of a void in the solder bump, and reduces a planar size.
SOLUTION: Solder paste layers 12a are printed on all columnar electrodes 10 arranged in a matrix-like form by being respectively shifted in appropriate directions instead of being printed by being shifted in the same direction. For instance, in a semiconductor device formation region surrounded by dicing streets 22, the solder paste layers 12a printed corresponding to the columnar electrodes 10 nearest to the right and left dicing streets 22 are printed at positions shifted to the center side in the horizontal direction of the semiconductor device formation region. Thereby, the solder paste layers 12a can be prevented from protruding to the outside of the dicing streets 22, and the planar size of the semiconductor device can be reduced.
COPYRIGHT: (C)2010,JPO&INPIT摘要翻译: 要解决的问题:提供一种制造半导体器件的方法,该半导体器件仅在柱状电极上形成焊料凸块,通过移动在柱状电极上印刷焊膏层,抑制焊料凸块中的空隙的产生,并且减小 平面尺寸 解决方案:焊膏层12a印刷在以矩阵状形式布置的所有柱状电极10上,通过分别在适当的方向上偏移而不是通过沿相同方向移动来印刷。 例如,在由切割街道22围绕的半导体器件形成区域中,对应于最靠近右侧和右侧切割街道22的柱状电极10印刷的焊膏层12a被印刷在向水平方向的中心侧移动的位置 半导体器件形成区域。 由此,可以防止焊膏层12a向切割街道22的外侧突出,能够降低半导体装置的平面尺寸。 版权所有(C)2010,JPO&INPIT
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公开(公告)号:JP2010514217A
公开(公告)日:2010-04-30
申请号:JP2009542877
申请日:2007-12-17
发明人: 仁誉 遠藤
CPC分类号: H01L23/5389 , H01L21/4853 , H01L21/4857 , H01L23/50 , H01L2224/05111 , H01L2224/05124 , H01L2224/05139 , H01L2224/05144 , H01L2224/05147 , H01L2224/05155 , H01L2224/05548 , H01L2224/05573 , H01L2224/13012 , H01L2224/13015 , H01L2224/82039 , H01L2224/82047 , H01L2924/01078 , H01L2924/01079 , H01L2924/01322 , H05K1/0231 , H05K1/188 , H05K3/243 , H05K3/328 , H05K3/4652 , H05K2201/0355 , H05K2201/0367 , H05K2201/10636 , H05K2203/0369 , H05K2203/0384 , Y02P70/611 , Y10T29/49144 , H01L2924/00012 , H01L2924/00014
摘要: 複数の配線層用相互接続エレメント(100)は、相互接続エレメント(100)の第1の露出配線層(120)と第2の露出配線層(122)との間に埋め込まれたコンデンサ(110)又は他の電気部品を備えている。 内部配線層(124)及び(126)が、それぞれのコンデンサ(110)の露出面の間に設けられ、これらの内部配線層は、それぞれ誘電体層(114)及び(116)によってコンデンサ(110)から電気的に絶縁されている。 導電性バイア(132)は、2つの内部配線層(124、126)の間の導電性接続を行う。 また、複数の配線層用相互接続エレメントを製造する方法も提供される。
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公开(公告)号:JP2007305955A
公开(公告)日:2007-11-22
申请号:JP2006268342
申请日:2006-09-29
申请人: Toshiba Corp , 株式会社東芝
IPC分类号: H01L23/12
CPC分类号: H01L23/3128 , H01L21/568 , H01L21/6835 , H01L21/76898 , H01L25/0657 , H01L25/50 , H01L2221/6834 , H01L2221/68345 , H01L2224/05001 , H01L2224/05009 , H01L2224/05111 , H01L2224/05144 , H01L2224/05147 , H01L2224/05155 , H01L2224/05164 , H01L2224/05166 , H01L2224/05169 , H01L2224/05171 , H01L2224/05548 , H01L2224/05568 , H01L2224/05644 , H01L2224/05647 , H01L2224/05655 , H01L2224/12105 , H01L2224/13025 , H01L2224/24226 , H01L2224/73267 , H01L2225/06513 , H01L2225/06517 , H01L2225/06524 , H01L2225/06541 , H01L2924/01019 , H01L2924/01046 , H01L2924/01078 , H01L2924/01079 , H01L2924/15311 , H01L2924/00014
摘要: PROBLEM TO BE SOLVED: To provide a semiconductor device that simplifies a manufacturing process compared to that of the prior art and reduces its production cost. SOLUTION: The semiconductor device comprises: a semiconductor substrate 1 having an electrode pad formed on a front side 2; a through hole 5 extending from a back side 3 of the semiconductor substrate 1 to a metal bump 4 formed on the electrode pad; an insulating resin 6 formed to cover an inner wall of the through hole 5; a feedthrough electrode 9 that is formed within the through hole 5 in a state of being insulated from the semiconductor substrate 1 by the insulating resin 6 and has a conductor 8 electrically connecting the electrode pad and the back side of the semiconductor substrate 1; a semiconductor chip 10 mounted on the back side 3 of the semiconductor substrate 1 in such a manner that the back sides face each other; and a wiring 15 electrically connecting the feedthrough electrode 9 and the electrode 11 formed on the semiconductor chip 10. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译: 要解决的问题:提供一种与现有技术相比简化制造工艺的半导体器件,并降低其制造成本。 解决方案:半导体器件包括:半导体衬底1,其具有形成在正面2上的电极焊盘; 从半导体衬底1的背面3延伸到形成在电极焊盘上的金属凸块4的通孔5; 形成为覆盖通孔5的内壁的绝缘树脂6; 通过绝缘树脂6与半导体衬底1绝缘的状态下形成在通孔5内的馈通电极9,并且具有将电极焊盘与半导体衬底1的背面电连接的导体8; 安装在半导体基板1的背面3上的半导体芯片10,使得背面彼此面对; 以及将导通电极9和形成在半导体芯片10上的电极11电连接的布线15.版权所有(C)2008,JPO&INPIT
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