SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF THE SAME
    92.
    发明申请
    SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF THE SAME 审中-公开
    半导体器件及其制造方法

    公开(公告)号:US20160343630A1

    公开(公告)日:2016-11-24

    申请号:US15108062

    申请日:2014-12-18

    摘要: A semiconductor device includes a metal member, a semiconductor element, a resin part, a primer layer, and a peel-off restraining part. The metal member has a surface that includes a semiconductor element mounting region and a resin close contact region that extends from the semiconductor element mounting region to an outer peripheral edge of the metal member. The semiconductor element is mounted on the semiconductor element mounting region. The resin part extends to a position outside a side surface of the metal member, and closely contacts with the resin close contact region, and collectively covers the semiconductor element and the metal member. The primer layer is disposed between the resin close contact region and the resin part. The peel-off restraining part is configured to restrain the metal member and the resin part from peeling from each other in the outer peripheral part of the resin close contact region.

    摘要翻译: 半导体器件包括金属部件,半导体元件,树脂部件,底漆层和剥离抑制部件。 金属构件具有包括从半导体元件安装区域延伸到金属构件的外周边缘的半导体元件安装区域和树脂紧密接触区域的表面。 半导体元件安装在半导体元件安装区域上。 树脂部分延伸到金属构件的侧表面外的位置,并且与树脂紧密接触区域紧密接触,并且共同地覆盖半导体元件和金属构件。 底漆层设置在树脂紧密接触区域和树脂部分之间。 剥离抑制部被构造成在树脂紧密接触区域的外周部分中抑制金属构件和树脂部件彼此剥离。

    Semiconductor device, related manufacturing method, and related electronic device
    95.
    发明授权
    Semiconductor device, related manufacturing method, and related electronic device 有权
    半导体器件,相关制造方法及相关电子器件

    公开(公告)号:US09425068B2

    公开(公告)日:2016-08-23

    申请号:US14738513

    申请日:2015-06-12

    发明人: Chao Zheng

    摘要: A method for manufacturing semiconductor device may include the following steps: performing an etching process to remove a sacrificial layer from a first composite structure, wherein the first composite structure includes a first substrate structure; performing a heat treatment to release a gas from the first composite structure; performing a cleaning process to remove an oxide layer from the first composite structure; and combining the first composite structure with a second composite structure that includes a second substrate structure and an electronic component positioned on the second substrate substructure, such that the first substrate structure is combined with the second substrate structure to form an enclosure structure that encloses the electronic component.

    摘要翻译: 制造半导体器件的方法可以包括以下步骤:执行蚀刻工艺以从第一复合结构去除牺牲层,其中第一复合结构包括第一衬底结构; 进行热处理以从第一复合结构释放气体; 执行清洁处理以从所述第一复合结构去除氧化物层; 以及将所述第一复合结构与包括第二基板结构和位于所述第二基板子结构上的电子部件的第二复合结构组合,使得所述第一基板结构与所述第二基板结构组合以形成封闭所述电子 零件。

    SEMICONDUCTOR DEVICE, RELATED MANUFACTURING METHOD, AND RELATED ELECTRONIC DEVICE
    97.
    发明申请
    SEMICONDUCTOR DEVICE, RELATED MANUFACTURING METHOD, AND RELATED ELECTRONIC DEVICE 有权
    半导体器件,相关制造方法及相关电子器件

    公开(公告)号:US20160035589A1

    公开(公告)日:2016-02-04

    申请号:US14738513

    申请日:2015-06-12

    发明人: Chao ZHENG

    摘要: A method for manufacturing semiconductor device may include the following steps: performing an etching process to remove a sacrificial layer from a first composite structure, wherein the first composite structure includes a first substrate structure; performing a heat treatment to release a gas from the first composite structure; performing a cleaning process to remove an oxide layer from the first composite structure; and combining the first composite structure with a second composite structure that includes a second substrate structure and an electronic component positioned on the second substrate substructure, such that the first substrate structure is combined with the second substrate structure to form an enclosure structure that encloses the electronic component.

    摘要翻译: 制造半导体器件的方法可以包括以下步骤:执行蚀刻工艺以从第一复合结构去除牺牲层,其中第一复合结构包括第一衬底结构; 进行热处理以从第一复合结构释放气体; 执行清洁处理以从所述第一复合结构去除氧化物层; 以及将所述第一复合结构与包括第二基板结构和位于所述第二基板子结构上的电子部件的第二复合结构组合,使得所述第一基板结构与所述第二基板结构组合以形成封闭所述电子 零件。