公开(公告)号：US20150165084A1

公开(公告)日：2015-06-18

申请号：US14632221

申请日：2015-02-26

Applicant: Global Plasma Solutions, LLC

Inventor： Charles Houston WADDELL ,  Joseph Anton CHRISTIANSEN

IPC: A61L9/22 ,  H01J27/02

CPC classification number: A61L9/22 ,  A61L2209/16 ,  B01D46/0032 ,  B01D46/521 ,  B03C3/011 ,  B03C3/04 ,  B03C3/155 ,  B03C3/41 ,  B03C3/82 ,  F01N3/0892 ,  F02M27/04 ,  F02M27/042 ,  F02M35/0205 ,  F02M35/0217 ,  F16M13/02 ,  F24F3/166 ,  F24F2003/1682 ,  H01J27/022 ,  H01J27/028 ,  H01J37/08 ,  H01J37/16 ,  H01J37/3002 ,  H01T23/00

Abstract: The present invention provides methods and systems for an ion generator device that includes a base, a first and second pair of spaced-apart, opposed sidewalls projecting from the base to collectively form an interior storage compartment and to define an upper edge, a top portion engaged to the upper edge, at least one high voltage wire extending from the device, and a power supply for providing a voltage to the high voltage wire for producing ions.

Abstract translation: 本发明提供了一种用于离子发生器装置的方法和系统，其包括底座，从基座突出的第一和第二对间隔开的相对侧壁，以共同形成内部储存室并限定上边缘，顶部 接合到上边缘，从装置延伸的至少一个高压电线和用于向高压线提供电压以产生离子的电源。

公开(公告)号：US09024282B2

公开(公告)日：2015-05-05

申请号：US13791141

申请日：2013-03-08

Applicant: Varian Semiconductor Equipment Associates, Inc.

Inventor： Svetlana B. Radovanov ,  Ludovic Godet ,  Anthony Renau ,  Xianfeng Lu

IPC: G21K5/00 ,  H01L21/265

CPC classification number: H01L21/2658 ,  H01J37/08 ,  H01J37/3171 ,  H01J2237/0812 ,  H01J2237/0827 ,  H01J2237/303 ,  H01L21/26593

Abstract: An apparatus for hydrogen and helium implantation is disclosed. The apparatus includes a plasma source system to generate helium ions and hydrogen molecular ions comprising H3+ ions. The apparatus further includes a substrate chamber adjacent the plasma source system and in communication with the plasma source system via one or more apertures, an extraction system to extract the hydrogen molecular ions and helium ions from the plasma source system, and an acceleration system to accelerate extracted helium and hydrogen molecular ions to a predetermined energy and direct the extracted helium ions and hydrogen molecular ions to a substrate.

Abstract translation: 公开了一种用于氢和氦注入的装置。 该装置包括产生氦离子的等离子体源系统和包含H3 +离子的氢分子离子。 该装置还包括与等离子体源系统相邻并且经由一个或多个孔与等离子体源系统连通的衬底室，从等离子体源系统提取氢分子离子和氦离子的提取系统以及加速系统 将提取的氦和氢分子离子提取到预定的能量，并将提取的氦离子和氢分子离子引导到基底。

公开(公告)号：US09024273B2

公开(公告)日：2015-05-05

申请号：US12763652

申请日：2010-04-20

Applicant: Ludovic Godet ,  Svetlana Radovanov ,  Christopher R. Hatem

Inventor： Ludovic Godet ,  Svetlana Radovanov ,  Christopher R. Hatem

IPC: H01J37/08 ,  H01J37/317

CPC classification number: H01J37/3171 ,  H01J37/08

Abstract: An apparatus that generates molecular ions and methods to generate molecular ions are disclosed. At least a first species is ionized in an ion source. The first species ions and/or first species combine to form molecular ions. These molecular ions may be transported to a second chamber, which may be an arc chamber or diffusion chamber, and are extracted. The molecular ions may have a larger atomic mass than the first species or first species ions. A second species also may be ionized with the first species to form molecular ions. In one instance, the first and second species are both molecules.

Abstract translation: 公开了一种产生分子离子的装置和产生分子离子的方法。 至少第一种在离子源中离子化。 第一种离子和/或第一种结合形成分子离子。 这些分子离子可以被输送到可以是电弧室或扩散室的第二室，并被提取。 分子离子可以具有比第一种或第一种离子更大的原子质量。 第二种也可以用第一种离子化形成分子离子。 在一种情况下，第一种和第二种都是分子。

公开(公告)号：US08993982B2

公开(公告)日：2015-03-31

申请号：US13941708

申请日：2013-07-15

Applicant: Bryan Barnard

Inventor： Bryan Barnard

IPC: H01J49/10 ,  H01J27/02 ,  H01J23/06 ,  H01J37/317 ,  H01J37/08

CPC classification number: H01J37/08 ,  H01J2237/006 ,  H01J2237/057 ,  H01J2237/0812 ,  H01J2237/0827

Abstract: A switchable ion gun switchable between a cluster mode setting for producing an ion beam substantially comprising ionised gas clusters and an atomic mode setting for producing an ion beam substantially comprising ionised gas atoms, comprising: a source chamber having a first gas inlet; a gas expansion nozzle for producing gas clusters in the presence of gas atoms by expansion of a gas from the source chamber through the nozzle; an ionisation chamber for ionising the gas clusters and gas atoms; wherein the ionisation chamber has a second gas inlet for admitting gas directly into the ionisation chamber to form ionised gas atoms; and a variable mass selector for mass selecting the ionised gas clusters and ionised gas atoms to produce an ion beam variable between substantially comprising ionised gas clusters and substantially comprising ionised gas atoms.

Abstract translation: 一种可切换的离子枪，其可在用于产生基本上包含电离气体团的离子束的簇模式设置和用于产生基本上包含电离气体原子的离子束的原子模式设置之间切换，包括：源室，具有第一气体入口; 气体膨胀喷嘴，用于通过从源室通过喷嘴膨胀气体而在气体存在的情况下产生气体团; 用于电离气团和气原子的电离室; 其中所述电离室具有用于将气体直接引入所述电离室中以形成电离气体原子的第二气体入口; 以及可变质量选择器，用于质量选择电离气体团簇和电离气体原子，以产生基本上包含电离气体团簇并且基本上包含电离气体原子的离子束可变。

公开(公告)号：US08963100B2

公开(公告)日：2015-02-24

申请号：US13654509

申请日：2012-10-18

Applicant: Anto Yasaka ,  Fumio Aramaki ,  Yasuhiko Sugiyama ,  Tomokazu Kozakai ,  Osamu Matsuda

Inventor： Anto Yasaka ,  Fumio Aramaki ,  Yasuhiko Sugiyama ,  Tomokazu Kozakai ,  Osamu Matsuda

IPC: H01J37/08 ,  G21K5/04 ,  H01J37/305

CPC classification number: H01J27/024 ,  H01J27/26 ,  H01J37/08 ,  H01J37/3056 ,  H01J2237/0807 ,  H01J2237/182

Abstract: A focused ion beam apparatus has an ion source chamber in which is disposed an emitter for emitting ions. A gas supply unit supplies nitrogen gas to the ion source chamber so that the nitrogen gas adsorbs on the surface of the emitter, and the gas supply unit maintains the pressure in the ion source chamber in the range 1.0×10−6 Pa to 1.0×10−2 Pa. An extracting electrode is spaced from the emitter, and a voltage is applied to the extracting electrode to ionize the adsorbed nitrogen gas and extract nitrogen ions in the form of an ion beam. A temperature control unit controls the temperature of the emitter.

Abstract translation: 聚焦离子束装置具有离子源室，其中设置有用于发射离子的发射极。 气体供给单元向离子源室供给氮气，使得氮气吸附在发射体的表面，气体供给单元将离子源室内的压力维持在1.0×10 -6 Pa〜1.0× 10-2Pa。提取电极与发射极间隔开，电压施加到提取电极，使吸附的氮气离子化，并以离子束的形式提取氮离子。 温度控制单元控制发射器的温度。

公开(公告)号：US20150020735A1

公开(公告)日：2015-01-22

申请号：US14341450

申请日：2014-07-25

Applicant: Peter F. Vandermeulen

Inventor： Peter F. Vandermeulen

IPC: H01J37/32

CPC classification number: H01J37/32229 ,  C23C16/511 ,  C23C16/513 ,  H01J37/05 ,  H01J37/08 ,  H01J37/32192 ,  H01J37/32201 ,  H01J37/3244 ,  H01J37/32669 ,  H01J2237/057 ,  H01J2237/0817 ,  H01J2237/3323 ,  H01P3/12 ,  H01P3/127 ,  H01Q21/0043

Abstract: This application is directed to an apparatus for creating microwave radiation patterns for an object detection system. The apparatus includes a waveguide conduit having first slots at one side of the conduit and corresponding second slots at an opposite side of the conduit. The waveguide conduit is coupled to a microwave source for transmitting microwaves from the microwave source through the plurality of first slots. A plunger is moveably positioned in the waveguide conduit from one end thereof. The plunger allows the waveguide conduit to be tuned to generally optimize the power of the microwaves exiting the first slots. Secondary plungers are each fitted in one of the second slots to independently tune or detune microwave emittance through a corresponding first slot.

公开(公告)号：US08927942B2

公开(公告)日：2015-01-06

申请号：US14124408

申请日：2012-06-05

Applicant: Jacques Gierak ,  Nicolas Allemandou ,  Klaus Hasselbach ,  Jean-Paul Leggeri ,  Guillaume Donnier-Valentin ,  Stephen Purcell ,  Pauline Gavand

Inventor： Jacques Gierak ,  Nicolas Allemandou ,  Klaus Hasselbach ,  Jean-Paul Leggeri ,  Guillaume Donnier-Valentin ,  Stephen Purcell ,  Pauline Gavand

IPC: H01J27/00 ,  H01J37/08 ,  H01J27/02 ,  H01J27/22 ,  H01J3/18 ,  H01J3/26 ,  H01J37/05 ,  H01J37/317

CPC classification number: H01J37/08 ,  H01J3/18 ,  H01J3/26 ,  H01J27/022 ,  H01J27/024 ,  H01J27/22 ,  H01J37/05 ,  H01J37/317 ,  H01J37/3174 ,  H01J2237/0807 ,  H01J2237/0815 ,  H01J2237/0827

Abstract: A ion source comprises: a chamber, an injection to inject matter into the chamber, wherein said matter comprises at least a first species, a tip with an apex located in the chamber, wherein the apex has a surface made of a metallic second species, a generator to generate ions of said species, and a regulation system adapted to set operative conditions of the chamber to alternatively generate ions from the gaseous first species, and ions from the non-gaseous metallic second species.

Abstract translation: 离子源包括：腔室，用于将物质注入到腔室中的注射器，其中所述物质包括至少第一物质，具有位于所述腔室中的顶点的尖端，其中所述顶点具有由金属第二物质制成的表面， 用于产生所述物质的离子的发生器，以及调节系统，其适于设置所述腔室的操作条件以交替地从所述气态第一物质产生离子，以及从所述非气态金属第二物质产生离子。

公开(公告)号：US20140346353A1

公开(公告)日：2014-11-27

申请号：US14366564

申请日：2012-12-19

Applicant: UNIVERSITEIT ANTWERPEN

Inventor： Johan Verbeeck ,  Gustaaf Van Tendeloo

IPC: H01J37/04 ,  H01J37/26

CPC classification number: H01J37/04 ,  H01J3/02 ,  H01J3/021 ,  H01J37/06 ,  H01J37/08 ,  H01J37/256 ,  H01J37/261 ,  H01J2237/06383 ,  H01J2237/2614

Abstract: A device for imparting an orbital angular momentum to a charged particle wave propagating along a beam axis in a charged particle beam generating apparatus is described. The device comprises a support element having a target region adapted for transmitting a charged particle wave propagating along a beam axis and an induction means for inducing a magnetic flux along an elongated profile having a free end portion located in the target region and the induction means is adapted for providing a magnetic flux in the elongated profile in order to induce an angular gradient, relative to the beam axis, of the phase of the charged particle wave when transmitted through the target region. A corresponding method is also disclosed, as well as the use thereof in electron microscopy.

Abstract translation: 描述了一种用于对带电粒子束产生装置中沿着光束轴传播的带电粒子波进行轨道角动量的装置。 该装置包括支撑元件，该支撑元件具有适于传输沿着光束轴传播的带电粒子波的目标区域和用于沿着具有位于目标区域中的自由端部分的细长轮廓感应磁通量的感应装置，并且感应装置是 适于在细长轮廓中提供磁通量，以便当透射通过目标区域时引起带电粒子波相位相对于光束轴的角度梯度。 还公开了相应的方法，以及其在电子显微镜中的应用。

公开(公告)号：US20140326896A1

公开(公告)日：2014-11-06

申请号：US14338132

申请日：2014-07-22

Applicant: Entegris, Inc.

Inventor： Robert Kaim ,  Joseph D. Sweeney ,  Anthony M. Avila ,  Richard S. Ray

IPC: H01J37/08 ,  H01J37/30

CPC classification number: H01L21/2225 ,  F17C7/00 ,  H01J37/08 ,  H01J37/3002 ,  H01J37/3171 ,  H01J2237/022 ,  H01J2237/304 ,  H01L21/223 ,  H01L21/26506 ,  Y02E60/321 ,  Y10T428/13

Abstract: An ion implantation system and process, in which the performance and lifetime of the ion source of the ion implantation system are enhanced, by utilizing isotopically enriched dopant materials, or by utilizing dopant materials with supplemental gas(es) effective to provide such enhancement.

Abstract translation: 通过利用同位素富集的掺杂剂材料，或通过利用具有有效提供这种增强作用的补充气体的掺杂剂材料，离子注入系统和工艺，离子注入系统的离子源的性能和寿命得到增强。

公开(公告)号：US20140326877A1

公开(公告)日：2014-11-06

申请号：US14271298

申请日：2014-05-06

Applicant: FEI Company

Inventor： Brian Roberts Routh, JR.

IPC: H01J37/26 ,  G01T1/28 ,  H01J37/30

CPC classification number: H01J37/285 ,  G01T1/28 ,  H01J27/16 ,  H01J37/05 ,  H01J37/077 ,  H01J37/08 ,  H01J37/10 ,  H01J37/1471 ,  H01J37/265 ,  H01J37/30 ,  H01J37/304 ,  H01J37/305 ,  H01J37/3056 ,  H01J2237/0817 ,  H01J2237/24415 ,  H01J2237/2445 ,  H01J2237/24475 ,  H01J2237/2448 ,  H01J2237/31749

Abstract: A single column charged particle source with user selectable configurations operates in ion-mode for FIB operations or electron mode for SEM operations. Equipped with an x-ray detector, energy dispersive x-ray spectroscopy analysis is possible. A user can selectively configure the source to prepare a sample in the ion-mode or FIB mode then essentially flip a switch selecting electron-mode or SEM mode and analyze the sample using EDS or other types of analysis.

Abstract translation: 具有用户可选择配置的单列带电粒子源以离子模式进行FIB操作或SEM操作的电子模式。 配备了X射线检测器，可进行能量色散X射线光谱分析。 用户可以选择性地配置源以在离子模式或FIB模式下准备样品，然后基本上翻转开关选择电子模式或SEM模式，并使用EDS或其他类型的分析来分析样品。