公开(公告)号：US20170004954A1

公开(公告)日：2017-01-05

申请号：US15045624

申请日：2016-02-17

Applicant: Kabushiki Kaisha Toshiba

Inventor： Haruko AKUTSU ,  Makiko KATANO ,  Akira KURAMOTO

IPC: H01J37/248 ,  H01J37/244 ,  H01J37/28 ,  H01J37/22

CPC classification number: H01J37/248 ,  G01N23/2251 ,  H01J37/20 ,  H01J37/222 ,  H01J37/244 ,  H01J37/28 ,  H01J37/285 ,  H01J2237/2007 ,  H01J2237/2801

Abstract: In accordance with an embodiment, an analytical apparatus includes a member, a voltage source connected to the member and a detecting section. The member has an inserting portion into which a sample holder supporting a sample is insertable and whose shape corresponds to a shape of the sample holder. The detecting section is configured to detect a substance to be emitted from the sample by field evaporation. The shape of the inserting portion in a cross section of a direction perpendicular to an inserting direction of the sample holder is a shape excluding a perfect circle.

Abstract translation: 根据实施例，分析装置包括构件，连接到构件的电压源和检测部。 构件具有插入部分，支撑样品的样品架可插入该插入部分中，并且其形状对应于样品架的形状。 检测部被配置为通过场蒸发来检测从样品发射的物质。 在垂直于样品架的插入方向的方向的横截面中的插入部分的形状是除了正圆之外的形状。

公开(公告)号：US09508527B2

公开(公告)日：2016-11-29

申请号：US14646159

申请日：2013-11-26

Applicant: Hitachi High-Technologies Corporation

Inventor： Yusuke Ominami ,  Takashi Ohshima ,  Sukehiro Ito

IPC: H01J37/26 ,  H01J37/16 ,  H01J37/28 ,  H01J37/20 ,  H01J37/244 ,  H01J37/22 ,  H01J37/18

CPC classification number: H01J37/16 ,  H01J37/18 ,  H01J37/20 ,  H01J37/228 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/2003 ,  H01J2237/2004 ,  H01J2237/2006 ,  H01J2237/2007 ,  H01J2237/201 ,  H01J2237/20235 ,  H01J2237/2445 ,  H01J2237/24455 ,  H01J2237/24475 ,  H01J2237/2608 ,  H01J2237/2801

Abstract: This charged particle beam device irradiates a primary charged particle beam generated from a charged particle microscope onto a sample arranged on a light-emitting member that makes up at least a part of a sample base, and, in addition to obtaining charged particle microscope images by the light-emitting member detecting charged particles transmitted through or scattered inside the sample, obtains optical microscope images by means of an optical microscope while the sample is still arranged on the sample platform.

Abstract translation: 该带电粒子束装置将由带电粒子显微镜产生的初级带电粒子束照射到构成至少一部分试样基底的发光部件上的试样上，除了通过以下方式获得带电粒子显微镜图像 检测通过或散射在样品内的带电粒子的发光部件在样品仍然配置在样品平台上的同时通过光学显微镜获得光学显微镜图像。

公开(公告)号：US20160189920A1

公开(公告)日：2016-06-30

申请号：US14978180

申请日：2015-12-22

Applicant: FEI Company

Inventor： David H. Narum ,  Milos Toth ,  Steven Randolph ,  Aurelien Philippe Jean Maclou Botman

IPC: H01J37/20 ,  H01J37/18 ,  H01J37/22 ,  H01J37/28

CPC classification number: H01J37/20 ,  C25D5/003 ,  C25D5/02 ,  C25D5/026 ,  C25D5/04 ,  C25D17/005 ,  C25D17/10 ,  C25D17/12 ,  C25D21/04 ,  C25D21/12 ,  H01J37/18 ,  H01J37/222 ,  H01J37/28 ,  H01J2237/182 ,  H01J2237/2003 ,  H01J2237/202 ,  H01J2237/2801

Abstract: A charge transfer mechanism is used to locally deposit or remove material for a small structure. A local electrochemical cell is created without having to immerse the entire work piece in a bath. The charge transfer mechanism can be used together with a charged particle beam or laser system to modify small structures, such as integrated circuits or micro-electromechanical system. The charge transfer process can be performed in air or, in some embodiments, in a vacuum chamber.

Abstract translation: 电荷转移机构用于局部沉积或去除小结构的材料。 产生局部电化学电池，而不必将整个工件浸入浴中。 电荷转移机构可以与带电粒子束或激光系统一起使用以修改小结构，例如集成电路或微机电系统。 电荷转移过程可以在空气中或在一些实施方案中在真空室中进行。

公开(公告)号：US20160172150A1

公开(公告)日：2016-06-16

申请号：US14964274

申请日：2015-12-09

Applicant: Hermes Microvision Inc.

Inventor： Shuai Li

IPC: H01J37/147 ,  H01J37/145 ,  H01J37/21 ,  H01J37/28

CPC classification number: H01J37/1478 ,  H01J37/145 ,  H01J37/21 ,  H01J37/28 ,  H01J2237/063 ,  H01J2237/1035 ,  H01J2237/12 ,  H01J2237/14 ,  H01J2237/1508 ,  H01J2237/1534 ,  H01J2237/1536 ,  H01J2237/2801 ,  H01J2237/2811

Abstract: A scanning electron microscope (SEM) with a swing objective lens (SOL) reduces the off-aberrations to enhance the image resolution, and extends the e-beam scanning angle. The scanning electron microscope comprises a charged particle source, an accelerating electrode, and a swing objective lens system including a pre-deflection unit, a swing deflection unit and an objective lens, all of them are rotationally symmetric with respect to an optical axis. The upper inner-face of the swing deflection unit is tilted an angle θ to the outer of the SEM and its lower inner-face is parallel to the optical axis. A distribution for a first and second focusing field of the swing objective lens is provided to limit the off-aberrations and can be performed by a single swing deflection unit. Preferably, the two focusing fields are overlapped by each other at least 80 percent.

Abstract translation: 具有摆动物镜（SOL）的扫描电子显微镜（SEM）减小了偏差以提高图像分辨率，并且扩展了电子束扫描角度。 扫描电子显微镜包括带电粒子源，加速电极和包括预偏转单元，摆动偏转单元和物镜的摆动物镜系统，它们都相对于光轴旋转对称。 摆动偏转单元的上内表面倾斜一角度; 到SEM的外侧，并且其下内表面平行于光轴。 提供了用于摆动物镜的第一和第二聚焦场的分布以限制偏差并且可以由单个摆动偏转单元执行。 优选地，两个聚焦场彼此重叠至少80％。

公开(公告)号：US20160104597A1

公开(公告)日：2016-04-14

申请号：US14787263

申请日：2014-04-14

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Yuta IMAI ,  Takashi OHSHIMA ,  Hideo MORISHITA

IPC: H01J37/073 ,  H01J37/145 ,  H01J37/28 ,  H01J37/20 ,  H01J29/48 ,  H01J27/02

CPC classification number: H01J37/073 ,  H01J27/02 ,  H01J27/26 ,  H01J29/481 ,  H01J37/06 ,  H01J37/063 ,  H01J37/08 ,  H01J37/145 ,  H01J37/20 ,  H01J37/28 ,  H01J2237/062 ,  H01J2237/06341 ,  H01J2237/06375 ,  H01J2237/0802 ,  H01J2237/1508 ,  H01J2237/2007 ,  H01J2237/2801

Abstract: The purpose of the present invention is to provide a charged particle gun using merely an electrostatic lens, said charged particle gun being relatively small and having less aberration, and to provide a field emission-type charged particle gun having high luminance even with a high current. This charged particle gun has: a charged particle source; an acceleration electrode that accelerates charged particles emitted from the charged particle source; a control electrode, which is disposed further toward the charged particle source side than the acceleration electrode, and which has a larger aperture diameter than the aperture diameter of the acceleration electrode; and a control unit that controls, on the basis of a potential applied to the acceleration electrode, a potential to be applied to the control electrode.

Abstract translation: 本发明的目的是提供一种仅使用静电透镜的带电粒子枪，所述带电粒子枪相对较小并且具有较小的像差，并且提供即使具有高电流也具有高亮度的场致发射型带电粒子枪 。 该带电粒子枪具有：带电粒子源; 加速电极，其加速从带电粒子源发射的带电粒子; 控制电极，其设置成比加速电极更加朝向带电粒子源侧，并且具有比加速电极的开口直径大的孔径; 以及控制单元，其基于对加速电极施加的电位控制施加到控制电极的电位。

公开(公告)号：US09287082B2

公开(公告)日：2016-03-15

申请号：US14616658

申请日：2015-02-07

Applicant: Hitachi High-Technologies Corporation

Inventor： Kenichi Morita ,  Sayaka Tanimoto ,  Makoto Sakakibara ,  Muneyuki Fukuda ,  Naomasa Suzuki ,  Kenji Obara

IPC: H01J37/141 ,  H01J37/28 ,  H01J37/26 ,  H01J37/22

CPC classification number: H01J37/141 ,  H01J37/222 ,  H01J37/243 ,  H01J37/261 ,  H01J37/265 ,  H01J2237/04922 ,  H01J2237/221 ,  H01J2237/2801 ,  H01J2237/2806 ,  H01J2237/2809 ,  H01J2237/2817

Abstract: A charged particle beam apparatus includes a charged particle beam source which irradiates a sample with a charged particle beam, an electromagnetic lens, a lens control electric source for controlling strength of a convergence effect of the electromagnetic lens; and a phase compensation circuit which is connected to the lens control electric source in parallel with the electromagnetic lens, and controls a lens current at the time of switching the strength of the convergence effect of the electromagnetic lens such that the lens current monotonically increases or monotonically decreases.

Abstract translation: 带电粒子束装置包括用带电粒子束照射样本的带电粒子束源，电磁透镜，用于控制电磁透镜的会聚效应的强度的透镜控制电源; 以及相位补偿电路，其与电磁透镜并联连接到透镜控制电源，并且在切换电磁透镜的会聚效果的强度时控制透镜电流，使得透镜电流单调增加或单调 减少

公开(公告)号：US09255339B2

公开(公告)日：2016-02-09

申请号：US13236587

申请日：2011-09-19

Applicant: Aurelien Philippe Jean Maclou Botman ,  Milos Toth ,  Steven Randolph ,  David H. Narum

Inventor： Aurelien Philippe Jean Maclou Botman ,  Milos Toth ,  Steven Randolph ,  David H. Narum

IPC: C25D5/04 ,  C25D5/02 ,  C25D17/12 ,  C25D21/04 ,  C25D21/12 ,  C25D5/00 ,  C25D17/00

CPC classification number: H01J37/20 ,  C25D5/003 ,  C25D5/02 ,  C25D5/026 ,  C25D5/04 ,  C25D17/005 ,  C25D17/10 ,  C25D17/12 ,  C25D21/04 ,  C25D21/12 ,  H01J37/18 ,  H01J37/222 ,  H01J37/28 ,  H01J2237/182 ,  H01J2237/2003 ,  H01J2237/202 ,  H01J2237/2801

Abstract: A charge transfer mechanism is used to locally deposit or remove material for a small structure. A local electrochemical cell is created without having to immerse the entire work piece in a bath. The charge transfer mechanism can be used together with a charged particle beam or laser system to modify small structures, such as integrated circuits or microelectromechanical system. The charge transfer process can be performed in air or, in some embodiments, in a vacuum chamber.

Abstract translation: 电荷转移机构用于局部沉积或去除小结构的材料。 产生局部电化学电池，而不必将整个工件浸入浴中。 电荷转移机构可以与带电粒子束或激光系统一起使用以修改诸如集成电路或微机电系统的小结构。 电荷转移过程可以在空气中或在一些实施方案中在真空室中进行。

公开(公告)号：US20150294833A1

公开(公告)日：2015-10-15

申请号：US14439628

申请日：2013-10-21

Applicant: Hitachi High-Technologies Corporation

Inventor： Muneyuki Fukuda ,  Naomasa Suzuki ,  Akira Ikegami ,  Hideto Dohi ,  Momoyo Enyama ,  Tomoyasu Shojo

IPC: H01J37/147 ,  H01J37/28 ,  H01J37/141

CPC classification number: H01J37/1478 ,  H01J37/141 ,  H01J37/147 ,  H01J37/28 ,  H01J2237/141 ,  H01J2237/1415 ,  H01J2237/1506 ,  H01J2237/2801

Abstract: In order to provide a charged particle beam apparatus capable of high resolution measurement of a sample at any inclination angle, a charged particle beam apparatus for detecting secondary charged particles (115) generated by irradiating a sample (114) with a primary charged particle beam (110) is provided with a beam tilt lens (113) having: a yoke magnetic path member (132) and a lens coil (134) to focus the primary charged particle beam (110) on the sample (114); and a solenoid coil (133) configured to arrange the upper end on the side surface of the yoke magnetic path member (132) and arrange the bottom end between the tip end of the pole piece of the yoke magnetic path member (132) and the sample (114) in order to arbitrarily tilt the primary charged particle beam (110) on the sample (114).

Abstract translation: 为了提供能够以任何倾斜角对样品进行高分辨率测量的带电粒子束装置，用于检测通过用一次带电粒子束（114）照射样品（114）而产生的二次带电粒子（115）的带电粒子束装置 110）设置有光束倾斜透镜（113），其具有：一个磁轭磁路部件（132）和一个用于将一次带电粒子束（110）聚焦在样本（114）上的透镜线圈; 以及螺线管线圈（133），其配置为将所述上端配置在所述磁轭磁路部件（132）的侧面，并将所述磁轭磁路部件（132）的极片的前端部与所述磁轭部件 样品（114），以便任意倾斜样品（114）上的初级带电粒子束（110）。

公开(公告)号：US20150255247A1

公开(公告)日：2015-09-10

申请号：US14482652

申请日：2014-09-10

Applicant: KABUSHIKI KAISHA TOSHIBA

Inventor： Takeshi MURAKAMI

IPC: H01J37/26 ,  H01J37/28

CPC classification number: H01J37/26 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/032 ,  H01J2237/24415 ,  H01J2237/2445 ,  H01J2237/2801

Abstract: In accordance with an embodiment, an analysis apparatus includes a secondary electron optical system, at least one detector, and a composition analysis unit. The secondary electron optical system includes a charged particle beam source and a lens. The charged particle beam source generates a charged particle beam and irradiates a sample with it. The lens controls a focal position and a trajectory of the charged particle beam using an electric field or a magnetic field. The detector detects a characteristic X-ray from the sample. The composition analysis unit analyzes a composition of a material constituting the sample from the detected characteristic X-ray. Each detector is arranged in such a manner that at least part of a detection surface thereof is placed on the same plane as an exit surface of the secondary electron optical system, or placed on the charged particle beam side of the same plane.

Abstract translation: 根据实施例，分析装置包括二次电子光学系统，至少一个检测器和组成分析单元。 二次电子光学系统包括带电粒子束源和透镜。 带电粒子束源产生带电粒子束并照射样品。 透镜使用电场或磁场控制带电粒子束的焦点位置和轨迹。 检测器检测来自样品的特征X射线。 组分分析单元从检测到的特征X射线分析构成样品的材料的组成。 每个检测器被布置成使得其检测表面的至少一部分被放置在与二次电子光学系统的出射表面相同的平面上，或者放置在同一平面的带电粒子束侧上。

公开(公告)号：US09082583B2

公开(公告)日：2015-07-14

申请号：US14405485

申请日：2013-05-30

Applicant: Hitachi High-Technologies Corporation

Inventor： Kazuhiro Koyama ,  Masahiro Akatsu

IPC: H01J37/20 ,  H01J37/26 ,  G21K5/08 ,  H01J37/28

CPC classification number: H01J37/20 ,  H01J37/28 ,  H01J2237/2007 ,  H01J2237/2008 ,  H01J2237/202 ,  H01J2237/28 ,  H01J2237/2801

Abstract: A sample holder is provided allowing for favorable observation of a cross-sectional sample using a retarding method. The sample holder includes: a sample placement member on which a first fixing member, a cross-sectional sample as an observation sample, and a second fixing member are placed in contact with each other, and inserted inside the electronic optical lens barrel of an electron microscope; and a voltage introduction means for introducing a voltage to the sample placement member. The sample placement member has a positioning section for positioning the first fixing member, the cross-sectional sample, and the second fixing member onto a placement position. A positioning section positions the first planar surface of the first fixing member and the second planar surface of the second fixing member which are disposed respectively adjacent to the observation surface of the cross-sectional sample, parallel to the observation surface at locations equidistant from the observation surface.

Abstract translation: 提供了一种样品保持器，允许使用延迟方法有利地观察截面样品。 样品架包括：样品放置构件，第一固定构件，作为观察样品的横截面样品和第二固定构件彼此接触并插入电子的电子光学镜筒内部 显微镜; 以及用于将电压引入样品放置构件的电压引入装置。 样品放置构件具有用于将第一固定构件，横截面样本和第二固定构件定位在放置位置上的定位部。 定位部将位于横截面样本的观察面附近分别配置的第一固定部件的第一平面和第二固定部件的第二平面配置成与观察面平行的观察面 表面。