公开(公告)号：US09620430B2

公开(公告)日：2017-04-11

申请号：US13356173

申请日：2012-01-23

Applicant: Szu Wei Lu ,  Ying-Da Wang ,  Li-Chung Kuo ,  Jing-Cheng Lin

Inventor： Szu Wei Lu ,  Ying-Da Wang ,  Li-Chung Kuo ,  Jing-Cheng Lin

IPC: H01L21/78 ,  H01L23/31 ,  H01L23/00 ,  H01L21/56 ,  H01L25/065 ,  H01L27/06

CPC classification number: H01L25/0655 ,  H01L21/561 ,  H01L21/563 ,  H01L21/565 ,  H01L21/78 ,  H01L23/3135 ,  H01L23/3178 ,  H01L23/3185 ,  H01L24/05 ,  H01L24/06 ,  H01L24/11 ,  H01L24/13 ,  H01L24/14 ,  H01L24/16 ,  H01L24/32 ,  H01L24/73 ,  H01L24/83 ,  H01L24/92 ,  H01L24/94 ,  H01L24/97 ,  H01L25/0652 ,  H01L2224/0401 ,  H01L2224/05569 ,  H01L2224/0557 ,  H01L2224/06181 ,  H01L2224/11464 ,  H01L2224/13147 ,  H01L2224/13155 ,  H01L2224/1403 ,  H01L2224/14181 ,  H01L2224/16145 ,  H01L2224/16225 ,  H01L2224/16227 ,  H01L2224/32145 ,  H01L2224/32225 ,  H01L2224/73204 ,  H01L2224/83862 ,  H01L2224/83874 ,  H01L2224/92125 ,  H01L2224/93 ,  H01L2224/94 ,  H01L2224/97 ,  H01L2225/06513 ,  H01L2225/06541 ,  H01L2924/00014 ,  H01L2924/10156 ,  H01L2924/10253 ,  H01L2924/10271 ,  H01L2924/10272 ,  H01L2924/12042 ,  H01L2924/14 ,  H01L2924/1431 ,  H01L2924/1434 ,  H01L2924/15311 ,  H01L2924/157 ,  H01L2924/181 ,  H01L2924/18161 ,  H01L2924/3511 ,  H01L2224/81 ,  H01L2924/00012 ,  H01L2224/11 ,  H01L2924/00 ,  H01L2224/05552

Abstract: A method includes bonding a first and a second package component on a top surface of a third package component, and dispensing a polymer. The polymer includes a first portion in a space between the first and the third package components, a second portion in a space between the second and the third package components, and a third portion in a gap between the first and the second package components. A curing step is then performed on the polymer. After the curing step, the third portion of the polymer is sawed to form a trench between the first and the second package components.

公开(公告)号：US09391000B2

公开(公告)日：2016-07-12

申请号：US13445734

申请日：2012-04-12

Applicant: Cheng-Chieh Hsieh ,  Jing-Cheng Lin

Inventor： Cheng-Chieh Hsieh ,  Jing-Cheng Lin

IPC: H01L23/473 ,  H01L21/48

CPC classification number: H01L23/473 ,  H01L21/4882 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A method includes forming a first oxide layer on a surface of an integrated heat spreader, and forming a second oxide layer on top surfaces of fins, wherein the fins are parts of a heat sink. The integrated heat spreader is bonded to the heat sink through the bonding of the first oxide layer to the second oxide layer.

Abstract translation: 一种方法包括在集成散热器的表面上形成第一氧化物层，并且在翅片的顶表面上形成第二氧化物层，其中散热片是散热片的一部分。 集成散热器通过第一氧化物层与第二氧化物层的结合而结合到散热器。

公开(公告)号：US09219016B2

公开(公告)日：2015-12-22

申请号：US13247659

申请日：2011-09-28

Applicant: Jing-Cheng Lin ,  Po-Hao Tsai

Inventor： Jing-Cheng Lin ,  Po-Hao Tsai

IPC: H05K7/00 ,  H01L21/66 ,  H01L23/00 ,  H01L23/31

CPC classification number: H01L22/32 ,  H01L23/3192 ,  H01L24/11 ,  H01L24/13 ,  H01L24/16 ,  H01L24/81 ,  H01L2224/0401 ,  H01L2224/05024 ,  H01L2224/05027 ,  H01L2224/05166 ,  H01L2224/05572 ,  H01L2224/05647 ,  H01L2224/10126 ,  H01L2224/1146 ,  H01L2224/1147 ,  H01L2224/1182 ,  H01L2224/11823 ,  H01L2224/13022 ,  H01L2224/13082 ,  H01L2224/13083 ,  H01L2224/13111 ,  H01L2224/13113 ,  H01L2224/13118 ,  H01L2224/13139 ,  H01L2224/13144 ,  H01L2224/13147 ,  H01L2224/13155 ,  H01L2224/13157 ,  H01L2224/13164 ,  H01L2224/13565 ,  H01L2224/13566 ,  H01L2224/13578 ,  H01L2224/13644 ,  H01L2224/13655 ,  H01L2224/1369 ,  H01L2224/16148 ,  H01L2224/73204 ,  H01L2224/81193 ,  H01L2224/81815 ,  H01L2224/94 ,  H01L2924/00014 ,  H01L2924/181 ,  H01L2924/01029 ,  H01L2224/81 ,  H01L2224/05552 ,  H01L2924/00

Abstract: A work piece includes a first copper-containing pillar having a top surface and sidewalls, and a first protection layer on the sidewalls, and not over the top surface, of the first copper-containing pillar. A test pad includes a second copper-containing pillar having a top surface and sidewalls. The test pad is electrically coupled to the first copper-containing pillar. A second protection layer is disposed on the sidewalls, and not over the top surface, of the second copper-containing pillar. The first and the second protection layers include a compound of copper and a polymer, and are dielectric layers.

Abstract translation: 工件包括具有顶表面和侧壁的第一含铜柱，以及第一含铜柱的侧壁而不是顶表面上的第一保护层。 测试垫包括具有顶表面和侧壁的第二含铜柱。 测试垫电耦合到第一含铜柱。 第二保护层设置在第二含铜柱的侧壁上，而不是在顶表面上。 第一和第二保护层包括铜和聚合物的化合物，并且是电介质层。

公开(公告)号：US09159687B2

公开(公告)日：2015-10-13

申请号：US13572302

申请日：2012-08-10

Applicant: Jung-Hua Chang ,  Cheng-Lin Huang ,  Jing-Cheng Lin

Inventor： Jung-Hua Chang ,  Cheng-Lin Huang ,  Jing-Cheng Lin

IPC: H01L23/495 ,  H01L23/00 ,  H01L23/498

CPC classification number: H01L24/13 ,  H01L23/49816 ,  H01L24/11 ,  H01L2224/118 ,  H01L2224/13 ,  H01L2224/13016 ,  H01L2224/131 ,  H01L2224/1319 ,  H01L2924/01029 ,  H01L2924/014 ,  H01L2924/06 ,  H01L2924/0665 ,  H01L2924/15788 ,  H01L2924/37001 ,  H01L2924/00

Abstract: A solder bump structure for a ball grid array (BGA) includes at least one under bump metal (UBM) layer and a solder bump formed over the at least one UBM layer. The solder bump has a bump width and a bump height and the ratio of the bump height over the bump width is less than 1.

Abstract translation: 用于球栅阵列（BGA）的焊料凸块结构包括在至少一个UBM层上形成的至少一个下凸块金属（UBM）层和焊料凸块。 焊料凸块具有凸块宽度和凸块高度，并且凸块高度比凸块宽度的比值小于1。

公开(公告)号：US08975183B2

公开(公告)日：2015-03-10

申请号：US13370477

申请日：2012-02-10

Applicant: Jing-Cheng Lin

Inventor： Jing-Cheng Lin

IPC: H01L21/44

CPC classification number: H01L21/561 ,  H01L21/486 ,  H01L21/568 ,  H01L23/3128 ,  H01L23/49816 ,  H01L23/49822 ,  H01L23/49827 ,  H01L25/0655 ,  H01L2224/16227 ,  H01L2224/16235 ,  H01L2224/16237 ,  H01L2224/32225 ,  H01L2224/73204 ,  H01L2224/97 ,  H01L2924/15311 ,  H01L2924/157 ,  H01L2924/18161 ,  H01L2224/83 ,  H01L2224/81

Abstract: A method for forming a semiconductor structure. A semiconductor substrate including a plurality of dies mounted thereon is provided. The substrate includes a first portion proximate to the dies and a second portion distal to the dies. In some embodiments, the first portion may include front side metallization. The second portion of the substrate is thinned and a plurality of conductive through substrate vias (TSVs) is formed in the second portion of the substrate after the thinning operation. Prior to thinning, the second portion may not contain metallization. In one embodiment, the substrate may be a silicon interposer. Further back side metallization may be formed to electrically connect the TSVs to other packaging substrates or printed circuit boards.

Abstract translation: 一种形成半导体结构的方法。 提供了包括安装在其上的多个管芯的半导体基板。 衬底包括靠近模具的第一部分和远离模具的第二部分。 在一些实施例中，第一部分可以包括前侧金属化。 衬底的第二部分变薄，并且在变薄操作之后，在衬底的第二部分中形成多个导电贯通衬底通孔（TSV）。 在变薄之前，第二部分可以不包含金属化。 在一个实施例中，衬底可以是硅插入器。 可以形成另外的背侧金属化以将TSV电连接到其他封装基板或印刷电路板。

公开(公告)号：US08922004B2

公开(公告)日：2014-12-30

申请号：US12846260

申请日：2010-07-29

Applicant: Jing-Cheng Lin ,  Ya-Hsi Hwung ,  Hsin-Yu Chen ,  Po-Hao Tsai ,  Yan-Fu Lin ,  Cheng-Lin Huang ,  Fang Wen Tsai ,  Wen-Chih Chiou

Inventor： Jing-Cheng Lin ,  Ya-Hsi Hwung ,  Hsin-Yu Chen ,  Po-Hao Tsai ,  Yan-Fu Lin ,  Cheng-Lin Huang ,  Fang Wen Tsai ,  Wen-Chih Chiou

IPC: H01L23/48 ,  H01L23/488 ,  H01L23/00 ,  H01L25/065

CPC classification number: H01L24/11 ,  H01L23/488 ,  H01L24/13 ,  H01L24/16 ,  H01L24/73 ,  H01L24/81 ,  H01L24/92 ,  H01L24/94 ,  H01L25/0657 ,  H01L2224/0401 ,  H01L2224/05099 ,  H01L2224/05571 ,  H01L2224/05599 ,  H01L2224/10126 ,  H01L2224/10145 ,  H01L2224/1182 ,  H01L2224/11823 ,  H01L2224/1191 ,  H01L2224/13017 ,  H01L2224/13022 ,  H01L2224/13083 ,  H01L2224/13111 ,  H01L2224/13113 ,  H01L2224/13118 ,  H01L2224/13139 ,  H01L2224/13144 ,  H01L2224/13147 ,  H01L2224/13155 ,  H01L2224/13157 ,  H01L2224/13164 ,  H01L2224/13564 ,  H01L2224/13565 ,  H01L2224/1357 ,  H01L2224/13578 ,  H01L2224/13583 ,  H01L2224/13644 ,  H01L2224/13655 ,  H01L2224/13664 ,  H01L2224/1369 ,  H01L2224/16058 ,  H01L2224/16148 ,  H01L2224/32145 ,  H01L2224/32225 ,  H01L2224/73204 ,  H01L2224/81193 ,  H01L2224/81801 ,  H01L2224/81815 ,  H01L2224/92125 ,  H01L2224/94 ,  H01L2224/97 ,  H01L2225/06513 ,  H01L2225/06541 ,  H01L2924/00011 ,  H01L2924/0002 ,  H01L2924/01029 ,  H01L2924/01322 ,  H01L2924/01327 ,  H01L2924/014 ,  H01L2924/10253 ,  H01L2924/14 ,  H01L2924/37001 ,  H01L2924/00 ,  H01L2224/81 ,  H01L2224/16225 ,  H01L2924/00012 ,  H01L2224/16145 ,  H01L2924/00014 ,  H01L2924/01047 ,  H01L2224/05552 ,  H01L2224/81805

Abstract: A work piece includes a copper bump having a top surface and sidewalls. A protection layer is formed on the sidewalls, and not on the top surface, of the copper bump. The protection layer includes a compound of copper and a polymer, and is a dielectric layer.

Abstract translation: 工件包括具有顶表面和侧壁的铜凸块。 在铜凸块的侧壁而不是顶表面上形成保护层。 保护层包括铜和聚合物的化合物，并且是介电层。

公开(公告)号：US08871568B2

公开(公告)日：2014-10-28

申请号：US13345485

申请日：2012-01-06

Applicant: Ying-Ching Shih ,  Szu Wei Lu ,  Jing-Cheng Lin

Inventor： Ying-Ching Shih ,  Szu Wei Lu ,  Jing-Cheng Lin

IPC: H01L21/58 ,  H01L23/485 ,  H01L21/78

CPC classification number: H01L21/6835 ,  H01L21/561 ,  H01L21/568 ,  H01L23/3128 ,  H01L23/3185 ,  H01L23/49816 ,  H01L24/97 ,  H01L2221/68345 ,  H01L2221/68381 ,  H01L2224/16225 ,  H01L2224/16227 ,  H01L2224/32225 ,  H01L2224/73204 ,  H01L2224/81005 ,  H01L2224/81192 ,  H01L2224/83005 ,  H01L2224/97 ,  H01L2924/00014 ,  H01L2924/12042 ,  H01L2924/15311 ,  H01L2924/181 ,  H01L2924/18161 ,  H01L2224/81 ,  H01L2924/00 ,  H01L2224/0401 ,  H01L2224/83

Abstract: A method includes forming a dielectric layer over a substrate, forming an interconnect structure over the dielectric layer, and bonding a die to the interconnect structure. The substrate is then removed, and the dielectric layer is patterned. Connectors are formed at a surface of the dielectric layer, wherein the connectors are electrically coupled to the die.

Abstract translation: 一种方法包括在衬底上形成电介质层，在电介质层上形成互连结构，以及将管芯结合到互连结构。 然后去除衬底，并对电介质层进行图案化。 连接器形成在电介质层的表面，其中连接器电耦合到管芯。

公开(公告)号：US08828848B2

公开(公告)日：2014-09-09

申请号：US13328746

申请日：2011-12-16

Applicant: Jing-Cheng Lin ,  Ying-Da Wang ,  Li-Chung Kuo ,  Szu Wei Lu

Inventor： Jing-Cheng Lin ,  Ying-Da Wang ,  Li-Chung Kuo ,  Szu Wei Lu

IPC: H01L21/00

CPC classification number: H01L21/563 ,  H01L21/561 ,  H01L23/3128 ,  H01L24/94 ,  H01L24/97 ,  H01L2224/0401 ,  H01L2224/0557 ,  H01L2224/06181 ,  H01L2224/14181 ,  H01L2224/16145 ,  H01L2224/16225 ,  H01L2224/32145 ,  H01L2224/32225 ,  H01L2224/73204 ,  H01L2224/94 ,  H01L2224/97 ,  H01L2924/00014 ,  H01L2924/01322 ,  H01L2924/12042 ,  H01L2924/15311 ,  H01L2924/181 ,  H01L2924/18161 ,  H01L2224/81 ,  H01L2924/00 ,  H01L2224/05552

Abstract: A die having a ledge along a sidewall, and a method of forming the die, is provided. A method of packaging the die is also provided. A substrate, such as a processed wafer, is diced by forming a first notch having a first width, and then forming a second notch within the first notch such that the second notch has a second width less than the first width. The second notch extends through the substrate, thereby dicing the substrate. The difference in widths between the first width and the second width results in a ledge along the sidewalls of the dice. The dice may be placed on a substrate, e.g., an interposer, and underfill placed between the dice and the substrate. The ledge prevents or reduces the distance the underfill is drawn up between adjacent dice. A molding compound may be formed over the substrate.

Abstract translation: 提供具有沿侧壁的凸缘的模具和形成模具的方法。 还提供了一种包装模具的方法。 通过形成具有第一宽度的第一凹口，然后在第一凹口内形成第二凹槽，使得第二凹槽具有小于第一宽度的第二宽度，来切割诸如经处理晶片的基底。 第二凹口延伸穿过衬底，从而切割衬底。 第一宽度和第二宽度之间的宽度差导致沿着骰子的侧壁的凸缘。 骰子可以放置在基底上，例如插入物，以及放置在骰子和基底之间的底部填充物。 凸缘防止或减少底部填充物在相邻骰子之间的距离。 可以在基材上形成模塑料。

公开(公告)号：US08698308B2

公开(公告)日：2014-04-15

申请号：US13362913

申请日：2012-01-31

Applicant: Jing-Cheng Lin ,  Cheng-Lin Huang

Inventor： Jing-Cheng Lin ,  Cheng-Lin Huang

IPC: H01L29/40

CPC classification number: H01L24/16 ,  H01L21/56 ,  H01L21/563 ,  H01L23/3171 ,  H01L23/3192 ,  H01L23/49816 ,  H01L23/49894 ,  H01L24/02 ,  H01L24/05 ,  H01L24/11 ,  H01L24/13 ,  H01L24/81 ,  H01L24/83 ,  H01L2224/0239 ,  H01L2224/0401 ,  H01L2224/05008 ,  H01L2224/05166 ,  H01L2224/05181 ,  H01L2224/05187 ,  H01L2224/05572 ,  H01L2224/05624 ,  H01L2224/05639 ,  H01L2224/05644 ,  H01L2224/05647 ,  H01L2224/11849 ,  H01L2224/13005 ,  H01L2224/13012 ,  H01L2224/13023 ,  H01L2224/13024 ,  H01L2224/13082 ,  H01L2224/13083 ,  H01L2224/13111 ,  H01L2224/13113 ,  H01L2224/13116 ,  H01L2224/13139 ,  H01L2224/13147 ,  H01L2224/13155 ,  H01L2224/1601 ,  H01L2224/16225 ,  H01L2224/16227 ,  H01L2224/16238 ,  H01L2224/73204 ,  H01L2224/81011 ,  H01L2224/81193 ,  H01L2224/81801 ,  H01L2224/81815 ,  H01L2224/8191 ,  H01L2224/81911 ,  H01L2224/83104 ,  H01L2224/83855 ,  H01L2924/381 ,  H01L2924/3841 ,  H01L2924/01029 ,  H01L2924/01047 ,  H01L2924/01079 ,  H01L2924/01028 ,  H01L2924/01074 ,  H01L2924/04941 ,  H01L2924/04953 ,  H01L2924/00014

Abstract: The mechanisms for forming bump structures enable forming bump structures between a chip and a substrate eliminating or reducing the risk of solder shorting, flux residue and voids in underfill. A lower limit can be established for a α ratio, defined by dividing the total height of copper posts in a bonded bump structure divided by the standoff of the bonded bump structure, to avoid shorting. A lower limit may also be established for standoff the chip package to avoid flux residue and underfill void formation. Further, aspect ratio of a copper post bump has a lower limit to avoid insufficient standoff and a higher limit due to manufacturing process limitation. By following proper bump design and process guidelines, yield and reliability of chip packages may be increases.

Abstract translation: 用于形成凸块结构的机构能够在芯片和基板之间形成凸块结构，消除或降低焊料短路，焊剂残留物和底部填充物中的空隙的风险。 可以通过将粘合凸块结构中的铜柱的总高度除以接合的凸块结构的间隙来限定的α比来限定下限，以避免短路。 也可以建立一个下限以排除芯片封装以避免焊剂残留和底部填充空隙形成。 此外，由于制造工艺限制，铜柱凸起的纵横比具有下限以避免不足的间隙和更高的极限。 通过遵循适当的凸块设计和工艺指南，芯片封装的产量和可靠性可能会增加。

公开(公告)号：US08653658B2

公开(公告)日：2014-02-18

申请号：US13308162

申请日：2011-11-30

Applicant: Jing-Cheng Lin ,  Po-Hao Tsai

Inventor： Jing-Cheng Lin ,  Po-Hao Tsai

IPC: H01L23/498 ,  H01L21/50 ,  H01L21/768

CPC classification number: H01L24/11 ,  H01L21/486 ,  H01L21/563 ,  H01L23/147 ,  H01L23/49811 ,  H01L23/49816 ,  H01L23/49827 ,  H01L24/13 ,  H01L24/14 ,  H01L24/16 ,  H01L25/0655 ,  H01L2224/0401 ,  H01L2224/05022 ,  H01L2224/05124 ,  H01L2224/05147 ,  H01L2224/05166 ,  H01L2224/05572 ,  H01L2224/05582 ,  H01L2224/05647 ,  H01L2224/1146 ,  H01L2224/1147 ,  H01L2224/1184 ,  H01L2224/119 ,  H01L2224/1308 ,  H01L2224/13083 ,  H01L2224/13111 ,  H01L2224/13113 ,  H01L2224/13116 ,  H01L2224/13147 ,  H01L2224/13155 ,  H01L2224/1401 ,  H01L2224/1403 ,  H01L2224/16238 ,  H01L2224/32225 ,  H01L2224/73204 ,  H01L2924/00014 ,  H01L2924/351 ,  H01L2924/014 ,  H01L2924/01047 ,  H01L2224/05552 ,  H01L2924/00

Abstract: The mechanisms for forming bump structures reduce variation of standoffs between chips and package substrates. By planarizing the solder layer on bump structures on chips and/or substrates after plating, the heights of bump structures are controlled to minimize variation due to within die and within wafer locations, pattern density, die size, and process variation. As a result, the standoffs between chips and substrates are controlled to be more uniform. Consequently, underfill quality is improved.

Abstract translation: 用于形成凸块结构的机构减少了芯片和封装衬底之间的间隙的变化。 通过在电镀后对芯片和/或基板上的凸块结构上的焊料层进行平坦化，可以控制凸块结构的高度，以最小化晶片内部以及晶片位置，图案密度，晶粒尺寸和工艺变化中的变化。 结果，芯片和基板之间的间隔被控制得更均匀。 因此，底部填充质量得到改善。