公开(公告)号：US20150136978A1

公开(公告)日：2015-05-21

申请号：US14533494

申请日：2014-11-05

Applicant: JEOL Ltd.

Inventor： Tomohiro Mihira

IPC: H01J37/304 ,  H01J37/21 ,  H01J37/30

CPC classification number: H01J37/304 ,  H01J37/21 ,  H01J37/28 ,  H01J37/3005 ,  H01J2237/0492 ,  H01J2237/08 ,  H01J2237/10 ,  H01J2237/21 ,  H01J2237/216 ,  H01J2237/2448 ,  H01J2237/30472 ,  H01J2237/31749

Abstract: A focused ion beam system is offered which can make a focal adjustment without relying on the structure of a sample while suppressing damage to the sample to a minimum. Also, a method of making this focal adjustment is offered. The focused ion beam system has an ion source for producing an ion beam, a lens system for focusing the beam onto the sample, a detector for detecting secondary electrons emanating from the sample, and a controller for controlling the lens system. The controller is operative to provide control such that the sample is irradiated with the ion beam without scanning the beam and that a focus of the ion beam is varied by varying the intensity of the objective lens during the ion beam irradiation. Also, the controller measures the intensity of a signal indicating secondary electrons emanating from the sample while the intensity of the objective lens is being varied. Furthermore, the controller makes a focal adjustment of the ion beam on the basis of the intensity of the objective lens obtained when the measured intensity of the signal indicating secondary electrons is minimal.

Abstract translation: 提供了一种聚焦离子束系统，可以在不依赖于样品结构的情况下进行焦点调整，同时将样品的损伤抑制在最小。 此外，提供了进行该焦点调整的方法。 聚焦离子束系统具有用于产生离子束的离子源，用于将光束聚焦到样品上的透镜系统，用于检测从样品发出的二次电子的检测器，以及用于控制透镜系统的控制器。 控制器可操作以提供控制，使得样品被离子束照射而不扫描光束，并且通过在离子束照射期间改变物镜的强度来改变离子束的焦点。 此外，控制器测量当物镜的强度变化时指示从样品发出的二次电子的信号的强度。 此外，控制器基于当指示二次电子的信号的测量强度最小时获得的物镜的强度，对离子束进行焦点调整。

公开(公告)号：US20150102237A1

公开(公告)日：2015-04-16

申请号：US14551264

申请日：2014-11-24

Applicant: Varian Semiconductor Equipment Associates, Inc.

Inventor： Kevin M. Daniels ,  Russell J. Low ,  Nicholas P.T. Bateman ,  Benjamin B. Riordon

IPC: C23C14/04 ,  H01J37/317 ,  C23C14/48

CPC classification number: C23C14/042 ,  C23C14/48 ,  H01J37/3171 ,  H01J2237/08 ,  H01J2237/303 ,  H01J2237/31711 ,  H01L21/266

Abstract: Herein, an improved technique for processing a substrate is disclosed. In one particular exemplary embodiment, the technique may be achieved using a mask for processing the substrate. The mask may be incorporated into a substrate processing system such as, for example, an ion implantation system. The mask may comprise one or more first apertures disposed in a first row; and one or more second apertures disposed in a second row, each row extending along a width direction of the mask, wherein the one or more first apertures and the one or more second apertures are non-uniform.

Abstract translation: 本文中公开了一种用于处理衬底的改进技术。 在一个特定的示例性实施例中，可以使用用于处理衬底的掩模来实现该技术。 掩模可以并入基板处理系统中，例如离子注入系统。 掩模可以包括设置在第一排中的一个或多个第一孔; 以及设置在第二排中的一个或多个第二孔，每排沿着所述掩模的宽度方向延伸，其中所述一个或多个第一孔和所述一个或多个第二孔是不均匀的。

公开(公告)号：US20140354138A1

公开(公告)日：2014-12-04

申请号：US14263970

申请日：2014-04-28

Applicant: COLORADO STATE UNIVERSITY RESEARCH FOUNDATION

Inventor： Lauren P. Rand ,  John D. Williams ,  Rafael A. Martinez

IPC: H01J1/02

CPC classification number: H01J1/025 ,  F03H1/0068 ,  H01J1/14 ,  H01J27/08 ,  H01J27/146 ,  H01J2237/08

Abstract: The use of the electride form of 12CaO-7Al2O3, or C12A7, as a low work function electron emitter in a hollow cathode discharge apparatus is described. No heater is required to initiate operation of the present cathode, as is necessary for traditional hollow cathode devices. Because C12A7 has a fully oxidized lattice structure, exposure to oxygen does not degrade the electride. The electride was surrounded by a graphite liner since it was found that the C12A7 electride converts to it's eutectic (CA+C3A) form when heated (through natural hollow cathode operation) in a metal tube.

Abstract translation: 描述了在空心阴极放电装置中使用12CaO-7Al2O3或C12A7的电子形式作为低功函电子发射体。 根据传统的空心阴极器件的需要，不需要加热器来启动本阴极的操作。 因为C12A7具有完全氧化的晶格结构，所以暴露于氧气不会降低电极。 电极被石墨衬垫包围，因为发现当在金属管中加热（通过天然空心阴极操作）时，C12A7电致转变成它的共晶（CA + C3A）形式。

公开(公告)号：US20140291543A1

公开(公告)日：2014-10-02

申请号：US14229038

申请日：2014-03-28

Applicant: SEN Corporation

Inventor： Masateru Sato ,  Hiroshi Matsushita

IPC: H01J37/08 ,  H01J37/317 ,  H01J37/30

CPC classification number: H01J37/3171 ,  H01J37/248 ,  H01J2237/032 ,  H01J2237/036 ,  H01J2237/038 ,  H01J2237/08

Abstract: An insulation structure of high voltage electrodes includes an insulator having an exposed surface and a conductor portion, which includes a joint region in contact with the insulator, and a heat-resistant portion provided, along at least part of an edge of the joint region, in such a manner as to be adjacent to the exposed surface of the insulator. The heat-resistant portion is formed of an electrically conductive material whose melting point is higher than that of the conductor portion. The heat-resistant portion may be so provided as to have a gap between the insulator and the exposed surface.

Abstract translation: 高电压电极的绝缘结构包括具有暴露表面的绝缘体和导体部分，导体部分包括与绝缘体接触的接合区域，以及沿着接合区域的边缘的至少一部分设置的耐热部分， 以与绝缘体的暴露表面相邻的方式。 耐热部由熔点高于导体部的导电性材料形成。 耐热部分可以设置成在绝缘体和暴露表面之间具有间隙。

公开(公告)号：US08742373B2

公开(公告)日：2014-06-03

申请号：US12965419

申请日：2010-12-10

Applicant: Svetlana Radovanov ,  Ludovic Godet ,  Christopher R. Hatem

Inventor： Svetlana Radovanov ,  Ludovic Godet ,  Christopher R. Hatem

IPC: H01J37/32

CPC classification number: H01J37/32412 ,  C23C14/06 ,  C23C14/345 ,  C23C14/3485 ,  C23C14/48 ,  C23C14/54 ,  H01J37/08 ,  H01J37/3171 ,  H01J37/32357 ,  H01J37/32422 ,  H01J37/32449 ,  H01J37/32623 ,  H01J2237/08 ,  H01J2237/0815 ,  H01J2237/0827 ,  H01J2237/31701

Abstract: A plasma is formed from one or more gases in a plasma chamber using at least a first power and a second power. A first ion species is generated at said first power and a second ion species is generated at said second power. In one embodiment, the first ion species and second ion species are implanted into a workpiece at two different energies using at least a first bias voltage and a second bias voltage. This may enable implantation to two different depths. These ion species may be atomic ions or molecular ions. The molecular ions may be larger than the gases used to form the plasma.

Abstract translation: 使用至少第一功率和第二功率在等离子体室中的一种或多种气体形成等离子体。 在所述第一功率下产生第一离子种类，并且在所述第二功率下产生第二离子种类。 在一个实施例中，使用至少第一偏置电压和第二偏置电压将第一离子种类和第二离子种类以两种不同的能量注入到工件中。 这可以使植入到两个不同的深度。 这些离子种类可以是原子离子或分子离子。 分子离子可能大于用于形成等离子体的气体。

公开(公告)号：US08735847B2

公开(公告)日：2014-05-27

申请号：US12277818

申请日：2008-11-25

Applicant: Helmut Banzhof ,  Juergen Frosien ,  Dieter Winkler

Inventor： Helmut Banzhof ,  Juergen Frosien ,  Dieter Winkler

IPC: G21K1/08

CPC classification number: H01J37/04 ,  H01J37/28 ,  H01J2237/0473 ,  H01J2237/0475 ,  H01J2237/0492 ,  H01J2237/08 ,  H01J2237/0807

Abstract: A method of operating a focused ion beam device having a gas field ion source is described. According to some embodiments, the method includes emitting an ion beam from a gas field ion source, providing an ion beam column ion beam energy in the ion beam column which is higher than the final beam energy, decelerating the ion beam for providing a final beam energy on impingement of the ion beam on the specimen of 1 keV to 4 keV, and imaging the specimen.

Abstract translation: 描述了具有气体场离子源的聚焦离子束装置的操作方法。 根据一些实施例，该方法包括从气体场离子源发射离子束，在离子束列中提供高于最终光束能量的离子束柱离子束能量，使离子束减速以提供最终光束 将离子束撞击在1keV至4keV的样品上的能量，并对样品进行成像。

公开(公告)号：US08648354B2

公开(公告)日：2014-02-11

申请号：US13722857

申请日：2012-12-20

Applicant: Diamond Microwave Devices Limited

Inventor： Christopher John Howard Wort ,  Geoffrey Alan Scarsbrook ,  Ian Friel ,  Richard Stuart Balmer

IPC: H01L29/15

CPC classification number: C01B32/28 ,  C23C16/27 ,  C23C16/274 ,  C23C16/278 ,  C30B25/105 ,  C30B25/20 ,  C30B29/04 ,  G01N21/87 ,  G01N21/95 ,  G01N27/308 ,  G01N2201/0636 ,  H01J37/321 ,  H01J2237/08 ,  H01J2237/3341 ,  H01L21/02104 ,  H01L21/02376 ,  H01L21/02527 ,  H01L21/02579 ,  H01L21/0262 ,  H01L21/02634 ,  H01L21/041 ,  H01L29/045 ,  H01L29/1602 ,  H01L29/167 ,  H01L29/36 ,  Y10T428/24355

Abstract: Electronic field effect devices, and methods of manufacture of these electronic field effect devices are disclosed. In particular, there is disclosed an electronic field effect device which has improved electrical properties due to the formation of a highly mobile two-dimensional charge-carrier gas in a simple structure formed from diamond in combination with polar materials.

Abstract translation: 公开了电子场效应装置及这些电子场效应装置的制造方法。 特别地，公开了一种电子场效应器件，其由于由金刚石与极性材料组合形成的简单结构中形成高度移动的二维电荷载体气体而具有改善的电性能。

公开(公告)号：US20140037945A1

公开(公告)日：2014-02-06

申请号：US13982686

申请日：2012-01-30

Applicant: Tadatomo Suga ,  Akira Yamauchi ,  Ryuichi Kondou ,  Yoshiie Matsumoto

Inventor： Tadatomo Suga ,  Akira Yamauchi ,  Ryuichi Kondou ,  Yoshiie Matsumoto

IPC: B32B38/08 ,  B32B7/04

CPC classification number: B32B38/08 ,  B23K1/20 ,  B23K20/24 ,  B23K2101/36 ,  B32B7/04 ,  H01J37/317 ,  H01J2237/08 ,  H01J2237/202 ,  H01J2237/3165 ,  H01L21/02046 ,  H01L21/2007 ,  H01L21/302 ,  H01L21/67092 ,  H01L21/67115 ,  H01L21/76251 ,  H01L23/147 ,  H01L23/5252 ,  H01L2924/0002 ,  Y10T428/265 ,  Y10T428/31678 ,  H01L2924/00

Abstract: [Problem] To provide a substrate bonding technique having a wide range of application. [Solution] A silicon thin film is formed on a bonding surface, and the interface with the substrate is surface-treated using energetic particles/metal particles.

Abstract translation: [问题]提供具有广泛应用的基板接合技术。 [解决方案]在接合表面上形成硅薄膜，并且使用高能粒子/金属颗粒对与基板的界面进行表面处理。

公开(公告)号：US08471452B2

公开(公告)日：2013-06-25

申请号：US12305848

申请日：2007-06-29

Applicant: Mervyn Howard Davis ,  Andrew James Timothy Holmes

Inventor： Mervyn Howard Davis ,  Andrew James Timothy Holmes

IPC: H01J27/02

CPC classification number: H01J37/04 ,  H01J27/024 ,  H01J37/3056 ,  H01J2237/04735 ,  H01J2237/08 ,  H05H15/00

Abstract: An apparatus (200) for accelerating an ion beam comprising: a) a first electrode (202) having a proximal side and a distal side and having at least one aperture (201) therethrough, the wall of the aperture being shaped such that the radius of the aperture on the distal side of the first electrode is greater than that on the proximal side of the electrode; b) a second electrode (204) located such that it is adjacent to but spaced from the distal side of the first electrode and having at least one aperture therethrough; and c) a third electrode (206) located such that it is adjacent to and spaced from the second electrode and having at least one aperture therethrough, said at least one apertures in each electrode being aligned with corresponding apertures in the other electrodes; wherein the electrodes are arranged such that there is a potential difference between the first and second electrodes and a potential difference between the second and third electrodes.

Abstract translation: 一种用于加速离子束的装置（200），包括：a）具有近侧和远侧的第一电极（202），并且具有穿过其中的至少一个孔（201），孔的壁成形为使得半径 在第一电极的远侧上的孔径大于电极的近侧上的孔径; b）第二电极（204），其定位成使得其与第一电极的远侧相邻但间隔开并且具有穿过其中的至少一个孔; 以及c）第三电极（206），其定位成使得其与所述第二电极相邻并间隔开并且具有穿过其中的至少一个孔，每个电极中的所述至少一个孔与其它电极中的相应孔对齐; 其中所述电极被布置成使得在所述第一和第二电极之间存在电位差和所述第二和第三电极之间的电位差。

公开(公告)号：US08461525B2

公开(公告)日：2013-06-11

申请号：US13198640

申请日：2011-08-04

Applicant: Alexander Henstra

Inventor： Alexander Henstra

IPC: H01J3/26 ,  H01J40/00

CPC classification number: H01J37/05 ,  H01J3/027 ,  H01J3/04 ,  H01J37/063 ,  H01J2237/045 ,  H01J2237/057 ,  H01J2237/061 ,  H01J2237/08 ,  H01J2237/15 ,  H01J2237/1534

Abstract: A particle source in which energy selection occurs by sending a beam of electrically charged particles eccentrically through a lens so that energy dispersion will occur in an image formed by the lens. By projecting this image onto a slit in an energy selecting diaphragm, it is possible to allow only particles in a limited portion of the energy spectrum to pass. Consequently, the passed beam will have a reduced energy spread. The energy dispersed spot is imaged on the slit by a deflector. When positioning the energy dispersed spot on the slit, central beam is deflected from the axis to such an extent that it is stopped by the energy selecting diaphragm. Hereby reflections and contamination resulting from this beam in the region after the diaphragm are avoided. Also electron-electron interaction resulting from the electrons from the central beam interacting with the energy filtered beam in the area of deflector is avoided.

Abstract translation: 通过使透过透镜偏心地发送带电粒子的束使能量分散发生在由透镜形成的图像中而发生能量选择的粒子源。 通过将该图像投影到能量选择隔膜的狭缝上，可以仅允许能谱范围的有限部分中的粒子通过。 因此，通过的光束将具有减小的能量扩展。 能量分散点通过偏转器在狭缝上成像。 当将能量分散点定位在狭缝上时，中心束从轴线偏转到其被能量选择隔膜停止的程度。 因此避免了在隔膜之后的区域中由该光束产生的反射和污染。 避免了来自中心束的电子的电子 - 电子相互作用，与偏转器区域中的能量过滤光束相互作用。