CHIP SCALE PACKAGE STRUCTURE AND MANUFACTURING METHOD THEREOF
    18.
    发明申请
    CHIP SCALE PACKAGE STRUCTURE AND MANUFACTURING METHOD THEREOF 有权
    芯片尺寸包装结构及其制造方法

    公开(公告)号:US20140225237A1

    公开(公告)日:2014-08-14

    申请号:US14172832

    申请日:2014-02-04

    Applicant: XINTEC INC.

    Abstract: A chip scale package structure includes a chip, a dam unit, a board body, a plurality of first conductors, an encapsulating glue, a plurality of first conductive layers, an isolation layer, and a plurality of first electrodes. The dam unit is disposed on the surface of the chip. The board body is located on the dam unit. The first conductors are respectively in electrical contact with the conductive pads of the chip. The encapsulating glue covers the surface of the chip, and the board body and the first conductors are packaged in the encapsulating glue. The first conductive layers are located on the surface of the encapsulating glue opposite to the chip and respectively in electrical contact with the first conductors. The isolation layer is located on the encapsulating glue and the first conductive layers. The first electrodes are respectively in electrical contact with the first conductive layers.

    Abstract translation: 芯片级封装结构包括芯片,堤坝单元,板体,多个第一导体,封装胶,多个第一导电层,隔离层和多个第一电极。 大坝单元设置在芯片的表面上。 板体位于坝体上。 第一导体分别与芯片的导电焊盘电接触。 封装胶覆盖芯片的表面,并且板体和第一导体封装在封装胶中。 第一导电层位于与芯片相对的封装胶的表面上,分别与第一导体电接触。 隔离层位于封装胶和第一导电层上。 第一电极分别与第一导电层电接触。

    POWER MOSFET PACKAGE
    19.
    发明申请
    POWER MOSFET PACKAGE 有权
    功率MOSFET封装

    公开(公告)号:US20130193520A1

    公开(公告)日:2013-08-01

    申请号:US13828537

    申请日:2013-03-14

    Applicant: Xintec Inc.

    Abstract: A power MOSFET package includes a semiconductor substrate having opposite first and second surfaces, having a first conductivity type, and forming a drain region, a doped region extending downward from the first surface and having a second conductivity type, a source region in the doped region and having the first conductivity type, a gate overlying or buried under the first surface, wherein a gate dielectric layer is between the gate and the semiconductor substrate, a first conducting structure overlying the semiconductor substrate, having a first terminal, and electrically connecting the drain region, a second conducting structure overlying the semiconductor substrate, having a second terminal, and electrically connecting the source region, a third conducting structure overlying the semiconductor substrate, having a third terminal, and electrically connecting the gate, wherein the first, the second, and the third terminals are substantially coplanar, and a protection layer between the semiconductor substrate and the terminals.

    Abstract translation: 功率MOSFET封装包括具有相反的第一和第二表面的半导体衬底,具有第一导电类型,并形成漏极区,从第一表面向下延伸并具有第二导电类型的掺杂区,掺杂区中的源极区 并且具有第一导电类型,覆盖或掩埋在第一表面下方的栅极,其中栅极电介质层位于栅极和半导体衬底之间,覆盖半导体衬底的第一导电结构,具有第一端子,并且电连接漏极 区域,覆盖半导体衬底的第二导电结构,具有第二端子,并且电连接源极区域,覆盖半导体衬底的第三导电结构,具有第三端子和电连接栅极,其中第一,第二, 并且第三端子基本上共面,并且第三端子之间的保护层 e半导体衬底和端子。

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