CIRCUIT BOARD ETCHING DEVICE AND METHOD FOR IMPROVING ETCHING FACTOR

    公开(公告)号:US20230300989A1

    公开(公告)日:2023-09-21

    申请号:US18046742

    申请日:2022-10-14

    IPC分类号: H05K3/06 H05K3/00

    摘要: A circuit board etching device for improving etching factor, comprising: a circuit board conveying device, which laterally conveys a circuit board; a circuit forming etching tank and a first etchant spraying unit, the first etchant spraying unit sprays a first etchant on the etching surface of the circuit board; and a circuit modification etching tank and a second etchant spraying unit, the second etchant spraying unit sprays a second etchant on the etching surface of the circuit board, and make the etching speed of the circuit modification etching tank slower than the etching speed of the circuit forming etching tank, whereby having the effect of improving the etching factor of the circuit board

    METHOD OF PRODUCING PRINTED CIRCUIT BOARDS
    18.
    发明公开

    公开(公告)号:US20230284391A1

    公开(公告)日:2023-09-07

    申请号:US18019104

    申请日:2021-07-15

    申请人: Gebr. Schmid GmbH

    IPC分类号: H05K3/06

    CPC分类号: H05K3/062 H05K2203/107

    摘要: A method of producing a printed circuit board includes providing a base substrate that is a film or plate, has first and second substrate sides and consists partly of an electrically non-conducting organic polymer material, where the first substrate side is covered with a capping metal layer, and regionally removing the capping metal layer, wherein regionally removing the capping metal layer includes applying a mask layer to the capping metal layer, regionally removing the mask layer by a laser so that the first substrate side is divided into at least one first subregion, in which the first substrate side is covered only with the capping metal layer, and into at least one second subregion, in which the first substrate side is covered with the capping metal layer and by the mask layer, and removing the capping metal layer in the at least one first subregion by an etching solution.

    DEVICE FOR ETCHING THE PERIPHERY EDGE OF A SUBSTRATE AND METHOD FOR CONTROLLING ETCHING THEREOF

    公开(公告)号:US20230269881A1

    公开(公告)日:2023-08-24

    申请号:US17729054

    申请日:2022-04-26

    发明人: Taek Youb LEE

    IPC分类号: H05K3/06

    摘要: The present invention relates to a substrate edge etching apparatus including: a substrate support assembly having a horizontally rotatable chuck base, chuck pins disposed on top of the chuck base to support a substrate, a purge gas inlet hole extending from an underside center of the chuck base to an interior of the chuck base in an upward and downward direction thereof, and a purge gas outlet hole extending radially from the purge gas inlet hole and then extending upwardly to penetrate top of the chuck base; a purge gas supply assembly for supplying a purge gas to the purge gas inlet hole; a chemical liquid supply unit for supplying a chemical liquid to top of the substrate; a bowl assembly having bowls surrounding the periphery of the substrate support assembly and configured to be able to ascend and descend; and a fan filter unit spaced apart from top of the substrate support assembly.