METHOD FOR MANUFACTURING SELF-COMPENSATING RESISTORS WITHIN AN INTEGRATED CIRCUIT
    22.
    发明申请
    METHOD FOR MANUFACTURING SELF-COMPENSATING RESISTORS WITHIN AN INTEGRATED CIRCUIT 有权
    在集成电路中制造自补偿电阻的方法

    公开(公告)号:US20050227449A1

    公开(公告)日:2005-10-13

    申请号:US10709039

    申请日:2004-04-08

    IPC分类号: H01L21/02 H01L27/08 H01L29/76

    摘要: A method for manufacturing a self-compensating resistor within an integrated circuit is disclosed. The self-compensating resistor includes a first resistor and a second resistor. The first resistor having a first resistance value is initially formed, and then the second resistor having a second resistance value is subsequently formed. The second resistor is connected in series with the first resistor. The second resistance value is less than the first resistance value, but the total resistance value of the first and second resistors lies beyond a desired target resistance range. Finally, an electric current is sent to the second resistor to change the dimension of the second resistor such that the total resistance value of the first and second resistors falls within the desired target resistance range.

    摘要翻译: 公开了一种在集成电路内制造自补偿电阻器的方法。 自补偿电阻器包括第一电阻器和第二电阻器。 初始形成具有第一电阻值的第一电阻器,然后形成具有第二电阻值的第二电阻器。 第二个电阻与第一个电阻串联。 第二电阻值小于第一电阻值,但是第一和第二电阻器的总电阻值超过期望的目标电阻范围。 最后,向第二电阻器发送电流以改变第二电阻器的尺寸,使得第一和第二电阻器的总电阻值落在期望的目标电阻范围内。

    Techniques for providing decoupling capacitance
    27.
    发明申请
    Techniques for providing decoupling capacitance 失效
    提供去耦电容的技术

    公开(公告)号:US20070035030A1

    公开(公告)日:2007-02-15

    申请号:US11201572

    申请日:2005-08-11

    IPC分类号: H01L23/48

    摘要: Techniques for electronic device fabrication are provided. In one aspect, an electronic device is provided. The electronic device comprises at least one interposer structure having one or more vias and a plurality of decoupling capacitors integrated therein, the at least one interposer structure being configured to allow for one or more of the plurality of decoupling capacitors to be selectively deactivated. In another aspect, a method of fabricating an electronic device comprising at least one interposer structure having one or more vias and a plurality of decoupling capacitors integrated therein comprises the following step. One or more of the plurality of decoupling capacitors are selectively deactivated.

    摘要翻译: 提供电子器件制造技术。 一方面,提供一种电子设备。 电子设备包括具有一个或多个通孔和集成在其中的多个去耦电容器的至少一个插入器结构,所述至少一个插入器结构被配置为允许选择性地去激活多个去耦电容器中的一个或多个。 在另一方面,一种制造电子器件的方法,包括至少一个具有一个或多个通孔的内插器结构和集成在其中的多个去耦电容器,其包括以下步骤。 选择性地去激活多个去耦电容器中的一个或多个。

    System and Device For Thinning Wafers That Have Contact Bumps
    28.
    发明申请
    System and Device For Thinning Wafers That Have Contact Bumps 有权
    具有接触碰撞的薄化晶片的系统和器件

    公开(公告)号:US20070029045A1

    公开(公告)日:2007-02-08

    申请号:US11533609

    申请日:2006-10-17

    IPC分类号: H01L21/306

    CPC分类号: H01L21/78

    摘要: In accordance with the foregoing objects and advantages, the present invention provides a fabrication device that may be used during the grinding operation of the fabrication process. The fabrication device comprises a socket plate that includes a plurality of cavities formed therein that correspond in position and number to the solder (or other conductive material) bumps formed on the front surface of a product wafer.

    摘要翻译: 根据上述目的和优点,本发明提供了可在制造过程的磨削操作期间使用的制造装置。 该制造装置包括插座板,该插座板包括形成在其中的多个空腔,其位置和数量与形成在产品晶片的前表面上的焊料(或其他导电材料)凸起相对应。