Compliant dielectric layer for semiconductor device

    公开(公告)号:US09219054B2

    公开(公告)日:2015-12-22

    申请号:US14147237

    申请日:2014-01-03

    Abstract: Systems, apparatuses, and methods provided for semiconductor devices and integrated circuit (IC) packages that include compliant dielectric layers. In a through silicon via interposer or substrate, a compliant dielectric material may be added to a surface of silicon material body to form a compliant dielectric layer. The compliant dielectric layer provides a thermal buffer and a stress buffer for a resulting IC package. The compliant dielectric material may be selected such that the coefficient of thermal expansion of the compliant dielectric material approximately matches the coefficient of thermal expansion of the circuit board on which the IC package is mounted. The compliant dielectric material may be selected such that it has a deformability that is greater than the silicon material body. Multiple sub-layers of compliant dielectric material may be used.

    PASSIVE PROBING OF VARIOUS LOCATIONS IN A WIRELESS ENABLED INTEGRATED CIRCUIT (IC)
    24.
    发明申请
    PASSIVE PROBING OF VARIOUS LOCATIONS IN A WIRELESS ENABLED INTEGRATED CIRCUIT (IC) 审中-公开
    无线使能集成电路(IC)中各种位置的被动探测

    公开(公告)号:US20150276856A1

    公开(公告)日:2015-10-01

    申请号:US14735994

    申请日:2015-06-10

    Abstract: Methods and apparatus are disclosed for wirelessly communicating among integrated circuits and/or functional modules within the integrated circuits. A semiconductor device fabrication operation uses a predetermined sequence of photographic and/or chemical processing steps to form one or more functional modules onto a semiconductor substrate. The functional modules are coupled to an integrated waveguide that is formed onto the semiconductor substrate and/or attached thereto to form an integrated circuit. The functional modules communicate with each other as well as to other integrated circuits using a multiple access transmission scheme via the integrated waveguide. One or more integrated circuits may be coupled to an integrated circuit carrier to form Multichip Module. The Multichip Module may be coupled to a semiconductor package to form a packaged integrated circuit.

    Abstract translation: 公开了用于在集成电路内的集成电路和/或功能模块之间进行无线通信的方法和装置。 半导体器件制造操作使用预定的照相和/或化学处理步骤顺序在半导体衬底上形成一个或多个功能模块。 功能模块耦合到形成在半导体衬底上和/或连接到其上以形成集成电路的集成波导。 功能模块通过集成波导使用多址传输方案彼此通信以及其他集成电路。 一个或多个集成电路可以耦合到集成电路载体以形成多芯片模块。 多芯片模块可以耦合到半导体封装以形成封装的集成电路。

    Creating a System on the Fly and Applications Thereof
    25.
    发明申请
    Creating a System on the Fly and Applications Thereof 有权
    创建一个系统及其应用程序

    公开(公告)号:US20150223275A1

    公开(公告)日:2015-08-06

    申请号:US14615866

    申请日:2015-02-06

    Abstract: Disclosed herein are systems, apparatuses, and methods for creating a system of wireless-enabled components (WECs). Such a system includes a server and a plurality of wireless-enabled component (WECs). Each WEC includes a functional resource (e.g., a processing resource and/or a memory resource) and is configured for wireless communication with the server and one or more other WECs. A first WEC is configured to wirelessly upload, to the server, an availability of the functional resource of the first WEC. The first WEC is further configured to wirelessly download, from the server, a linking resource for linking with one or more of the plurality of WECs. The plurality of WECs may be located on a single chip, on multiple chips of a single device, or on multiple chips of multiple devices.

    Abstract translation: 这里公开了用于创建无线组件(WEC)的系统的系统,设备和方法。 这样的系统包括服务器和多个无线使能分量(WEC)。 每个WEC包括功能资源(例如,处理资源和/或存储器资源),并且被配置用于与服务器和一个或多个其他WEC的无线通信。 第一WEC被配置为向服务器无线地上传第一WEC的功能资源的可用性。 第一WEC还被配置为从服务器无线地下载链接资源,用于与多个WEC中的一个或多个相关联。 多个WEC可以位于单个芯片上,在单个设备的多个芯片上,或者位于多个设备的多个芯片上。

    Semiconductor device with a vertical channel formed through a plurality of semiconductor layers
    26.
    发明授权
    Semiconductor device with a vertical channel formed through a plurality of semiconductor layers 有权
    具有通过多个半导体层形成的垂直沟道的半导体器件

    公开(公告)号:US09406793B2

    公开(公告)日:2016-08-02

    申请号:US14529959

    申请日:2014-10-31

    Abstract: Semiconductor devices and manufacturing methods are provided for making channel and gate lengths independent from lithography. Also, semiconductor devices and manufacturing methods are provided for increasing resistivity between drain and channel to allow for higher voltage operation. For example, a semiconductor device includes a first doped layer implanted in a semiconductor substrate forming one of a source or a drain and a gate metal layer disposed over the first doped layer. The semiconductor device further includes a second doped layer disposed over the gate metal forming the other the source or the drain, where the first doped layer, the gate metal layer and the second doped layer form a vertical stack of layers of the semiconductor device. The semiconductor device further includes a conduction channel formed in a trench that extends vertically through the vertical stack of layers and terminates at the semiconductor substrate.

    Abstract translation: 半导体器件和制造方法被提供用于使通道和栅极长度独立于光刻。 此外,提供半导体器件和制造方法用于增加漏极和沟道之间的电阻率,以允许更高的电压操作。 例如,半导体器件包括注入形成源极或漏极之一的半导体衬底中的第一掺杂层和设置在第一掺杂层上的栅极金属层。 半导体器件还包括设置在形成另一个源极或漏极的栅极金属上的第二掺杂层,其中第一掺杂层,栅极金属层和第二掺杂层形成半导体器件的垂直堆叠层。 所述半导体器件还包括形成在沟槽中的导电沟道,所述沟槽垂直延伸穿过所述垂直堆叠层并终止于所述半导体衬底。

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