Method of manufacturing lens, injection mold for molding of lens, and molded lens
    38.
    发明授权
    Method of manufacturing lens, injection mold for molding of lens, and molded lens 失效
    制造镜片的方法,用于模制镜片的注射模具和模制透镜

    公开(公告)号:US06210610B1

    公开(公告)日:2001-04-03

    申请号:US09101945

    申请日:1998-07-17

    IPC分类号: B29D1100

    摘要: A gate top member 23 is placed to a gate 22 opened toward the circumferential edge of a molding spectacle-lens cavity 13 formed between inserts 11 and 12. The plural gate top members 23 each having a different height are previously prepared, and attached with a bolt to be exchanged. In pilot production, it is checked for each of various lenses which opening configuration of the gate 22 can form a spectacle lens with defined great-precision by exchanging the gate top member 23 in order to obtain each gate opening configuration changed by exchanging the gate top member 23.

    摘要翻译: 门顶构件23被放置到朝向在插入件11和12之间形成的成型眼镜镜腔13的周缘开口的门22上。预先准备了各自具有不同高度的多个门顶构件23, 螺栓要交换。 在先导生产中,通过更换栅极顶部构件23来检查各种透镜中的各个透镜的打开构造可以形成具有确定的高精度的眼镜镜片,以便获得通过更换门顶部而改变的每个开口构造 会员23。

    Constant current density plating method
    39.
    发明授权
    Constant current density plating method 失效
    恒流密度电镀法

    公开(公告)号:US4120759A

    公开(公告)日:1978-10-17

    申请号:US832907

    申请日:1977-09-13

    CPC分类号: C25D21/12 Y10S204/07

    摘要: In the present plating method the bath contains an electrolyte solution having a uniform ion concentration. A common electrode, a plating electrode and a standard electrode are arranged in the bath. A direct current source is connected between the common electrode and the plating electrode. A further, constant, direct current source is connected between the common electrode and the standard electrode. A potentiometer device is arranged for detecting resistance changes between these electrodes due to variations in the ion concentration and in the mobility of the electrolyte solution between the electrodes. A control is responsive to the potentiometer device for regulating the plating current supplied by the direct current source as a function of the potential difference detected by the potentiometer device, whereby a constant plating current density is achieved.

    摘要翻译: 在本电镀方法中,浴含有具有均匀离子浓度的电解液。 浴中配置有公共电极,电镀电极和标准电极。 在公共电极和电镀电极之间连接有直流电源。 在公共电极和标准电极之间连接另外恒定的直流电源。 布置电位器装置,用于检测电极之间的电离变化,这是由于离子浓度的变化和电极间的电解质溶液的迁移率。 控制器响应于电位器装置,用于调节由直流电源提供的电镀电流作为由电位计装置检测的电位差的函数,从而实现恒定的电镀电流密度。