Method of making circuitized substrate
    43.
    发明授权
    Method of making circuitized substrate 有权
    制造电路化基板的方法

    公开(公告)号:US07381587B2

    公开(公告)日:2008-06-03

    申请号:US11324432

    申请日:2006-01-04

    IPC分类号: H01L21/00

    摘要: A method of making a circuitized substrate and an electrical assembly utilizing same in which the substrate is comprised of at least two sub-composites in which the dielectric material of at least one of these sub-composites is heated during bonding (e.g., lamination) to the other sufficiently to cause the dielectric material to flow into and substantially fill openings in a conductive layer for the bonded structure. Conductive thru-holes are formed within the bonded structure to couple selected ones of the structure's conductive layers. Formation of an electrical assembly is possible by positioning one or more electrical components (e.g., semiconductor chips or chip carriers) on the final structure and electrically coupling these to the structure's external circuitry.

    摘要翻译: 一种制造电路化基板的方法和使用其的电气组件,其中基板由至少两个亚复合材料构成,其中这些亚复合材料中的至少一个的介电材料在粘合(例如,层压)期间被加热到 另一个足以使电介质材料流入并基本上填充用于接合结构的导电层中的开口。 导电通孔形成在接合结构内,以耦合所选择的结构导电层。 通过将一个或多个电气部件(例如,半导体芯片或芯片载体)定位在最终结构上并将其电耦合到结构的外部电路,可以形成电组件。

    Formation of multisegmented plated through holes
    49.
    发明授权
    Formation of multisegmented plated through holes 失效
    多段电镀通孔的形成

    公开(公告)号:US06700078B2

    公开(公告)日:2004-03-02

    申请号:US10176254

    申请日:2002-06-19

    IPC分类号: H05K116

    摘要: A method and structure relating to multisegmented plated through holes. A substrate includes a dielectric layer sandwiched between a first laminate layer and a second laminate layer. A through hole is formed through the substrate. The through hole passes through nonplatable dielectric material within the dielectric layer. As a result, subsequent seeding and electroplating of the through hole results in a conductive metal plating forming at a wall of the through hole on a segment of the first laminate layer and on a segment of the second laminate layer, but not on the nonplatable dielectric material of the dielectric layer. Thus, the conductive metal plating is not continuous from the first laminate layer to the second laminate layer.

    摘要翻译: 涉及多段电镀通孔的方法和结构。 基板包括夹在第一层叠层和第二层叠层之间的电介质层。 穿过基板形成通孔。 通孔穿过介电层内的不可电介质材料。 结果,随后的通孔的接种和电镀导致在第一层压层的段上的通孔的壁上和第二层压层的段上形成导电金属电镀,而不在不可电绝缘的电介质 电介质层的材料。 因此,导电金属电镀从第一层叠层到第二层叠层不是连续的。