公开(公告)号：US09224644B2

公开(公告)日：2015-12-29

申请号：US13726972

申请日：2012-12-26

Applicant: Intermolecular, Inc.

Inventor： Sandip Niyogi ,  Amol Joshi ,  Chi-I Lang ,  Salil Mujumdar

IPC: H01L21/768 ,  C23C14/58 ,  C23C16/455 ,  H01L21/02 ,  H01L21/3115 ,  H01L21/3215 ,  H01J37/32 ,  H01L21/28 ,  H01L29/51 ,  H01L21/67 ,  H01L21/687 ,  H01L29/66

CPC classification number: H01L21/76886 ,  C23C14/5826 ,  C23C16/45536 ,  H01J37/32357 ,  H01L21/02181 ,  H01L21/022 ,  H01L21/02323 ,  H01L21/02332 ,  H01L21/0234 ,  H01L21/28088 ,  H01L21/28185 ,  H01L21/28202 ,  H01L21/31155 ,  H01L21/3215 ,  H01L21/67207 ,  H01L21/68764 ,  H01L21/68792 ,  H01L29/517 ,  H01L29/665 ,  H01L29/6653

Abstract: Methods and apparatus for processing using a remote plasma source are disclosed. The apparatus includes an outer chamber enclosing a substrate support, a remote plasma source, and a showerhead. A substrate heater can be mounted in the substrate support. A transport system moves the substrate support and is capable of positioning the substrate. The remote plasma source may be used to provide a plasma surface treatment or as a source to incorporate dopants into a pre-deposited layer.

Abstract translation: 公开了使用远程等离子体源的处理方法和装置。 该装置包括封闭衬底支撑件，远程等离子体源和喷头的外室。 基板加热器可以安装在基板支撑件中。 运输系统移动基板支撑件并且能够定位基板。 远程等离子体源可用于提供等离子体表面处理或作为将掺杂剂掺入预沉积层的源。

公开(公告)号：US20140262749A1

公开(公告)日：2014-09-18

申请号：US13804265

申请日：2013-03-14

Applicant: Intermolecular, Inc.

Inventor： Ashish Bodke ,  Olov Karlsson ,  Kevin Kashefi ,  Chi-I Lang ,  Dipankar Pramanik ,  Hong Sheng Yang ,  Xuena Zhang

IPC: C23C14/35

CPC classification number: B01J19/0046 ,  B01J2219/0043 ,  B01J2219/00443 ,  B01J2219/00527 ,  B01J2219/00635 ,  B01J2219/0075 ,  B01J2219/00756 ,  C23C14/042 ,  C23C14/345

Abstract: Combinatorial processing of a substrate comprising site-isolated sputter deposition and site-isolated plasma processing can be performed in a same process chamber. The process chamber, configured to perform sputter deposition and plasma processing, comprises a grounded shield having at least an aperture disposed above the substrate to form a small, dark space gap to reduce or eliminate any plasma formation within the gap. The plasma processing may include plasma etching or plasma surface treatment.

Abstract translation: 包含现场分离的溅射沉积和位置分离等离子体处理的基板的组合处理可以在相同的处理室中进行。 被配置为执行溅射沉积和等离子体处理的处理室包括接地屏蔽，其具有设置在衬底上方的至少一个孔，以形成小的，较暗的空间间隙，以减少或消除间隙内的任何等离子体形成。 等离子体处理可以包括等离子体蚀刻或等离子体表面处理。

公开(公告)号：US20140231744A1

公开(公告)日：2014-08-21

申请号：US14264475

申请日：2014-04-29

Applicant: Intermolecular Inc.

Inventor： Nitin Kumar ,  Tony P. Chiang ,  Chi-I Lang ,  Zhi-Wen Wen Sun ,  Jinhong Tong

IPC: H01L45/00

CPC classification number: H01L45/145 ,  H01L27/2409 ,  H01L27/2463 ,  H01L45/04 ,  H01L45/1233 ,  H01L45/1253 ,  H01L45/146 ,  H01L45/1633

Abstract: Resistive switching memory elements are provided that may contain electroless metal electrodes and metal oxides formed from electroless metal. The resistive switching memory elements may exhibit bistability and may be used in high-density multi-layer memory integrated circuits. Electroless conductive materials such as nickel-based materials may be selectively deposited on a conductor on a silicon wafer or other suitable substrate. The electroless conductive materials can be oxidized to form a metal oxide for a resistive switching memory element. Multiple layers of conductive materials can be deposited each of which has a different oxidation rate. The differential oxidization rates of the conductive layers can be exploited to ensure that metal oxide layers of desired thicknesses are formed during fabrication.

Abstract translation: 提供电阻式开关存储器元件，其可以包含由无电金属形成的化学金属电极和金属氧化物。 电阻式开关存储器元件可以表现出双稳态，并且可以用于高密度多层存储器集成电路中。 诸如镍基材料的无电导电材料可以选择性地沉积在硅晶片或其它合适的衬底上的导体上。 无电导电材料可以被氧化以形成用于电阻式开关存储元件的金属氧化物。 可以沉积多层导电材料，每层具有不同的氧化速率。 可以利用导电层的差异氧化速率来确保在制造期间形成所需厚度的金属氧化物层。

公开(公告)号：US20140227880A1

公开(公告)日：2014-08-14

申请号：US14253712

申请日：2014-04-15

Applicant: Intermolecular, Inc.

Inventor： Sunil Shanker ,  Tony P. Chiang ,  Chi-I Lang

IPC: H01L21/02 ,  H01L21/3065

CPC classification number: H01L21/02274 ,  C23C16/0227 ,  C23C16/44 ,  C23C16/45523 ,  C23C16/45525 ,  C23C16/45536 ,  C23C16/45548 ,  C23C16/45565 ,  C23C16/45574 ,  C23C16/4586 ,  C23C16/509 ,  C23C16/5096 ,  H01J37/32091 ,  H01J37/3244 ,  H01J37/32532 ,  H01J37/32541 ,  H01J37/32568 ,  H01J37/32715 ,  H01J37/32779 ,  H01L21/3065 ,  H01L21/67069

Abstract: According to various embodiments of the disclosure, an apparatus and method for enhanced deposition and etch techniques is described, including a pedestal, the pedestal having at least two electrodes embedded in the pedestal, a showerhead above the pedestal, a plasma gas source connected to the showerhead, wherein the showerhead is configured to deliver plasma gas to a processing region between the showerhead and the substrate and a power source operably connected to the showerhead and the at least two electrodes with plasma being substantially contained in an area which corresponds with one electrode of the at least two electrodes.

Abstract translation: 根据本公开的各种实施例，描述了一种用于增强沉积和蚀刻技术的装置和方法，包括基座，具有至少两个嵌入基座的电极的基座，基座上方的喷头，连接到基座的等离子体气体源 淋浴头，其中所述喷头被构造成将等离子体气体输送到所述喷头和所述基板之间的处理区域，以及电源，其可操作地连接到所述喷头和所述至少两个电极，其中等离子体基本上包含在对应于 所述至少两个电极。

公开(公告)号：US20140170335A1

公开(公告)日：2014-06-19

申请号：US13716829

申请日：2012-12-17

Applicant: INTERMOLECULAR, INC.

Inventor： ShouQian Shao ,  Chi-I Lang ,  Jingang Su

IPC: C23C16/52

CPC classification number: C23C16/45544 ,  C23C16/04 ,  C23C16/042 ,  C23C16/45536 ,  C23C16/45565 ,  C23C16/4584 ,  C23C16/4586 ,  C23C16/50 ,  C23C16/52

Abstract: Apparatus and methods for depositing materials on a plurality of site-isolated regions on a substrate are provided. The deposition uses PECVD or PEALD. The apparatus include an inner chamber with an aperture and barrier that can be used to isolate the regions during the deposition and prevent the remaining portions of the substrate from being exposed to the deposition process. The process parameters for the deposition process are varied among the site-isolate regions in a combinatorial manner.

Abstract translation: 提供了用于在衬底上的多个位置隔离区域上沉积材料的设备和方法。 沉积使用PECVD或PEALD。 该装置包括具有开口和屏障的内室，其可以用于在沉积期间隔离区域，并且防止基板的剩余部分暴露于沉积工艺。 用于沉积过程的工艺参数以组合方式在位点隔离区域之间变化。

公开(公告)号：US20140166616A1

公开(公告)日：2014-06-19

申请号：US13717478

申请日：2012-12-17

Applicant: INTERMOLECULAR, INC.

Inventor： Sunil Shanker ,  Tony P. Chiang ,  Chi-I Lang ,  Sandip Niyogi

IPC: C23C16/50 ,  B44C1/22

CPC classification number: C23C16/50 ,  C23C16/452 ,  C23C16/45565 ,  C23C16/45574 ,  C23C16/4584

Abstract: Methods and apparatus for processing using a remote plasma source are disclosed. The apparatus includes an outer chamber, a remote plasma source, and a showerhead. Inert gas ports within the showerhead assembly can be used to alter the concentration and energy of reactive radical or reactive neutral species generated by the remote plasma source in different regions of the showerhead. This allows the showerhead to be used to apply a surface treatment to different regions of the surface of a substrate. Varying parameters such as the remote plasma parameters, the inert gas flows, pressure, and the like allow different regions of the substrate to be treated in a combinatorial manner.

Abstract translation: 公开了使用远程等离子体源的处理方法和装置。 该装置包括外室，远程等离子体源和喷头。 喷头组件内的惰性气体端口可用于改变由喷头的不同区域中的远程等离子体源产生的反应性基团或反应中性物质的浓度和能量。 这允许使用喷头来对表面的不同区域进行表面处理。 诸如远程等离子体参数，惰性气体流量，压力等的不同参数允许以组合的方式处理衬底的不同区域。

公开(公告)号：US20140144512A1

公开(公告)日：2014-05-29

申请号：US13687906

申请日：2012-11-28

Applicant: INTERMOLECULAR, INC.

Inventor： Satbir Kahlon ,  Aaron T. Francis ,  Chi-I Lang ,  Gregory P. Lim ,  Jeffrey Chih-Hou Lowe ,  Robert Anthony Sculac

IPC: B65D83/00

CPC classification number: H01L21/00 ,  H01L21/67017 ,  H01L21/6715 ,  Y10T137/0318 ,  Y10T137/0424 ,  Y10T137/86493 ,  Y10T137/87249 ,  Y10T137/87281

Abstract: Provided are methods and systems for dispensing different chemicals used for high productivity combinatorial processing. A dispense panel may include multiple inlet lines for supplying different chemicals. Each inlet line is connected to its own three-way valve that either allows the supplied chemical to flow from the inlet line towards a dispense valve connected to a dispense manifold (during dispensing of the supplied chemical) or allows another chemical to flow from the dispense valve to a waste manifold (during priming of the dispense manifold with this other chemical). Specifically, during priming a chemical supplied from its inlet line and is passed through a corresponding three-way valve and is directed to its dispense valve and then into the dispense manifold. Other dispense valves and three-way valves of the dispense panel allow this chemical to flow out of the dispense manifold, thereby priming remaining parts of the panel.

Abstract translation: 提供了用于分配用于高生产率组合处理的不同化学品的方法和系统。 分配面板可以包括用于供应不同化学品的多个入口管线。 每个入口管路连接到其自己的三通阀，其允许供应的化学品从入口管线流向连接到分配歧管的分配阀（在分配供应的化学品期间）或允许另一种化学品从分配流出 阀门到废液歧管（在使用这种其他化学品的分配歧管启动期间）。 具体来说，在从其入口管线引入化学物质并通过相应的三通阀时，被引导到其分配阀然后进入分配歧管。 分配面板的其他分配阀和三通阀允许该化学品流出分配歧管，从而引发面板的剩余部分。

公开(公告)号：US20130338305A1

公开(公告)日：2013-12-19

申请号：US13971613

申请日：2013-08-20

Applicant: Intermolecular, Inc.

Inventor： Anh Duong ,  Tony Chiang ,  Zachary M. Fresco ,  Nitin Kumar ,  Chi-I Lang ,  Jinhong Tong ,  Anna Tsizelmon

IPC: C09D129/04

CPC classification number: H01L23/5329 ,  C09D129/04 ,  H01L21/02063 ,  H01L21/02074 ,  H01L21/3105 ,  H01L21/31058 ,  H01L21/76814 ,  H01L21/7682 ,  H01L21/76826 ,  H01L21/76829 ,  H01L2221/1063 ,  H01L2924/0002 ,  H01L2924/00

Abstract: Methods of modifying a patterned semiconductor substrate are presented including: providing a patterned semiconductor substrate surface including a dielectric region and a conductive region; and applying an amphiphilic surface modifier to the dielectric region to modify the dielectric region. In some embodiments, modifying the dielectric region includes modifying a wetting angle of the dielectric region. In some embodiments, modifying the wetting angle includes making a surface of the dielectric region hydrophilic. In some embodiments, methods further include applying an aqueous solution to the patterned semiconductor substrate surface. In some embodiments, the conductive region is selectively enhanced by the aqueous solution. In some embodiments, methods further include providing the dielectric region formed of a low-k dielectric material. In some embodiments, applying the amphiphilic surface modifier modifies an interaction of the low-k dielectric region with a subsequent process.

公开(公告)号：US20130217238A1

公开(公告)日：2013-08-22

申请号：US13829290

申请日：2013-03-14

Applicant: Intermolecular, Inc.

Inventor： Thomas R. Boussie ,  Tony P. Chiang ,  Anh Duong ,  Zachary Fresco ,  Nitin Kumar ,  Chi-I Lang ,  Sandra G. Malhotra ,  Jinhong Tong

IPC: H01L21/02

CPC classification number: H01L21/02112 ,  H01L21/02123 ,  H01L21/3105 ,  H01L21/321 ,  H01L21/76834 ,  H01L21/7685

Abstract: Methods for substrate processing are described. The methods include forming a material layer on a substrate. The methods include selecting constituents of a molecular masking layer (MML) to remove an effect of variations in the material layer as a result of substrate processing. The methods include normalizing the surface characteristics of the material layer by selectively depositing the MML on the material layer.

Abstract translation: 描述基板处理方法。 所述方法包括在基底上形成材料层。 所述方法包括选择分子屏蔽层（MML）的成分以消除作为衬底处理的结果的材料层中的变化的影响。 所述方法包括通过在材料层上选择性地沉积MML来使材料层的表面特性归一化。

公开(公告)号：US20130214808A1

公开(公告)日：2013-08-22

申请号：US13849749

申请日：2013-03-25

Applicant: Intermolecular, Inc.

Inventor： Yun Wang ,  Tony P. Chiang ,  Chi-I Lang

IPC: G01R31/26

CPC classification number: G01R31/26 ,  G01N21/55 ,  G01R31/2607 ,  H02S50/10

Abstract: Measuring current-voltage (I-V) characteristics of a solar cell using a lamp that emits light, a substrate that includes a plurality of solar cells, a positive electrode attached to the solar cells, and a negative electrode peripherally deposited around each of the solar cells and connected to a common ground, an articulation platform coupled to the substrate, a multi-probe switching matrix or a Z-stage device, a programmable switch box coupled to the multi-probe switching matrix or Z-stage device and selectively articulating the probes by raising the probes until in contact with at least one of the positive electrode and the negative electrode and lowering the probes until contact is lost with at least one of the positive electrode and the negative electrode, a source meter coupled to the programmable switch box and measuring the I-V characteristics of the substrate.

Abstract translation: 使用发光灯的太阳能电池测量电流 - 电压（IV）特性，包括多个太阳能电池的基板，附着到太阳能电池的正电极和周围沉积在每个太阳能电池周围的负电极 并且连接到公共接地，耦合到衬底的关节式平台，多探针开关矩阵或Z级装置，耦合到多探针开关矩阵或Z级装置的可编程开关盒，并且选择性地将探针 通过将探针升高直到与正电极和负电极中的至少一个接触并且降低探针，直到与正电极和负电极中的至少一个接触而丢失，源计量器耦合到可编程开关盒和 测量衬底的IV特性。