公开(公告)号：US20050051512A1

公开(公告)日：2005-03-10

申请号：US10942355

申请日：2004-09-16

Applicant: Jing-Cheng Lin

Inventor： Jing-Cheng Lin

IPC: H01L21/768 ,  H01B13/00

CPC classification number: H01L21/76846 ,  H01L21/76856 ,  H01L21/76873 ,  H01L2924/0002 ,  H01L2924/00

Abstract: It is a general object of the present invention to provide an improved method of fabrication in the formation of an improved copper metal diffusion barrier layer having the structure, W/WSiN/WN, in single and dual damascene interconnect trench/contact via processing with 0.10 micron nodes for MOSFET and CMOS applications. The diffusion barrier is formed by depositing a tungsten nitride bottom layer, followed by an in situ SiH4/NH3 or SiH4/H2 soak forming a WSiN layer, and depositing a final top layer of tungsten. This invention is used to manufacture reliable metal interconnects and contact vias in the fabrication of MOSFET and CMOS devices for both logic and memory applications and the copper diffusion barrier formed, W/WSiN/WN, passes a stringent barrier thermal reliability test at 400° C. Pure single barrier layers, i.e., single layer WN, exhibit copper punch through or copper spiking during the stringent barrier thermal reliability test at 400° C.

Abstract translation: 本发明的一般目的是提供一种改进的制造方法，该方法是在单和双镶嵌互连沟槽/接触通孔加工中具有以下结构的W / WSiN / WN结构的改进的铜金属扩散阻挡层的形成 微米节点用于MOSFET和CMOS应用。 扩散阻挡层通过沉积氮化钨底层，随后形成SiH4 / NH3或SiH4 / H2浸泡形成WSiN层，并沉积钨的最终顶层形成。 本发明用于在逻辑和存储器应用的MOSFET和CMOS器件的制造中制造可靠的金属互连和接触孔，并且形成的铜扩散阻挡层W / WSiN / WN在400℃下通过严格的阻挡热可靠性测试 在400℃的严格的阻隔热可靠性试验期间，纯单层阻挡层，即单层WN，表现出铜冲穿或铜尖峰。

公开(公告)号：US06551915B2

公开(公告)日：2003-04-22

申请号：US09898980

申请日：2001-07-03

Applicant: Jing-Cheng Lin ,  Shau-Lin Shue

Inventor： Jing-Cheng Lin ,  Shau-Lin Shue

IPC: H01L2144

CPC classification number: H01L21/76828 ,  H01L21/7681 ,  H01L21/76814 ,  H01L21/76826

Abstract: Within a damascene method for forming a patterned conductor layer within an aperture defined by a patterned dielectric layer within a microelectronic fabrication, at least one of: (1) the patterned dielectric layer is thermally annealed at a temperature of from about 300 to about 450 degrees centigrade prior to forming within the aperture the patterned conductor layer; and (2) the aperture is etched with a plasma employing an etchant gas composition comprising hydrogen to form a laterally enlarged aperture prior to forming within the laterally enlarged aperture the patterned conductor layer. In accord with the method, the microelectronic fabrication is formed with decreased contact resistance and enhanced structural integrity.

公开(公告)号：US09960088B2

公开(公告)日：2018-05-01

申请号：US13290879

申请日：2011-11-07

Applicant: Yi-Chao Mao ,  Jui-Pin Hung ,  Jing-Cheng Lin ,  Shin-Puu Jeng ,  Chen-Hua Yu

Inventor： Yi-Chao Mao ,  Jui-Pin Hung ,  Jing-Cheng Lin ,  Shin-Puu Jeng ,  Chen-Hua Yu

IPC: B24B49/10 ,  H01L21/66 ,  B24B37/013 ,  B24B7/22 ,  H01L23/31

CPC classification number: H01L22/26 ,  B24B7/228 ,  B24B37/013 ,  B24B49/10 ,  H01L22/12 ,  H01L23/3114 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A method for performing grinding includes selecting a target wheel loading for wafer grinding processes, and performing a grinding process on a wafer. With the proceeding of the grinding process, wheel loadings of the grinding process are measured. The grinding process is stopped after the target wheel loading is reached. The method alternatively includes selecting a target reflectivity of wafer grinding processes, and performing a grinding process on a wafer. With a proceeding of the grinding process, reflectivities of a light reflected from a surface of the wafer are measured. The grinding process is stopped after one of the reflectivities reaches the target reflectivity.

公开(公告)号：US09620430B2

公开(公告)日：2017-04-11

申请号：US13356173

申请日：2012-01-23

Applicant: Szu Wei Lu ,  Ying-Da Wang ,  Li-Chung Kuo ,  Jing-Cheng Lin

Inventor： Szu Wei Lu ,  Ying-Da Wang ,  Li-Chung Kuo ,  Jing-Cheng Lin

IPC: H01L21/78 ,  H01L23/31 ,  H01L23/00 ,  H01L21/56 ,  H01L25/065 ,  H01L27/06

CPC classification number: H01L25/0655 ,  H01L21/561 ,  H01L21/563 ,  H01L21/565 ,  H01L21/78 ,  H01L23/3135 ,  H01L23/3178 ,  H01L23/3185 ,  H01L24/05 ,  H01L24/06 ,  H01L24/11 ,  H01L24/13 ,  H01L24/14 ,  H01L24/16 ,  H01L24/32 ,  H01L24/73 ,  H01L24/83 ,  H01L24/92 ,  H01L24/94 ,  H01L24/97 ,  H01L25/0652 ,  H01L2224/0401 ,  H01L2224/05569 ,  H01L2224/0557 ,  H01L2224/06181 ,  H01L2224/11464 ,  H01L2224/13147 ,  H01L2224/13155 ,  H01L2224/1403 ,  H01L2224/14181 ,  H01L2224/16145 ,  H01L2224/16225 ,  H01L2224/16227 ,  H01L2224/32145 ,  H01L2224/32225 ,  H01L2224/73204 ,  H01L2224/83862 ,  H01L2224/83874 ,  H01L2224/92125 ,  H01L2224/93 ,  H01L2224/94 ,  H01L2224/97 ,  H01L2225/06513 ,  H01L2225/06541 ,  H01L2924/00014 ,  H01L2924/10156 ,  H01L2924/10253 ,  H01L2924/10271 ,  H01L2924/10272 ,  H01L2924/12042 ,  H01L2924/14 ,  H01L2924/1431 ,  H01L2924/1434 ,  H01L2924/15311 ,  H01L2924/157 ,  H01L2924/181 ,  H01L2924/18161 ,  H01L2924/3511 ,  H01L2224/81 ,  H01L2924/00012 ,  H01L2224/11 ,  H01L2924/00 ,  H01L2224/05552

Abstract: A method includes bonding a first and a second package component on a top surface of a third package component, and dispensing a polymer. The polymer includes a first portion in a space between the first and the third package components, a second portion in a space between the second and the third package components, and a third portion in a gap between the first and the second package components. A curing step is then performed on the polymer. After the curing step, the third portion of the polymer is sawed to form a trench between the first and the second package components.

公开(公告)号：US09443783B2

公开(公告)日：2016-09-13

申请号：US13619877

申请日：2012-09-14

Applicant: Jing-Cheng Lin ,  Chen-Hua Yu

Inventor： Jing-Cheng Lin ,  Chen-Hua Yu

IPC: H01L23/31 ,  H01L23/498 ,  H01L23/538 ,  H01L21/56 ,  H01L25/03 ,  H01L25/00 ,  H01L21/768 ,  H01L23/00

CPC classification number: H01L25/0652 ,  H01L21/561 ,  H01L21/563 ,  H01L21/568 ,  H01L21/76898 ,  H01L23/3135 ,  H01L23/3171 ,  H01L23/49816 ,  H01L23/5389 ,  H01L24/03 ,  H01L24/05 ,  H01L24/11 ,  H01L24/13 ,  H01L24/14 ,  H01L24/81 ,  H01L24/92 ,  H01L24/96 ,  H01L25/03 ,  H01L25/0657 ,  H01L25/50 ,  H01L2224/02372 ,  H01L2224/02379 ,  H01L2224/0401 ,  H01L2224/04105 ,  H01L2224/05569 ,  H01L2224/05571 ,  H01L2224/05572 ,  H01L2224/05655 ,  H01L2224/05666 ,  H01L2224/11002 ,  H01L2224/1132 ,  H01L2224/11334 ,  H01L2224/1134 ,  H01L2224/1145 ,  H01L2224/11462 ,  H01L2224/11849 ,  H01L2224/12105 ,  H01L2224/13023 ,  H01L2224/13024 ,  H01L2224/13082 ,  H01L2224/131 ,  H01L2224/13147 ,  H01L2224/14134 ,  H01L2224/14144 ,  H01L2224/14154 ,  H01L2224/14164 ,  H01L2224/14181 ,  H01L2224/17181 ,  H01L2224/2919 ,  H01L2224/73204 ,  H01L2224/81005 ,  H01L2224/81191 ,  H01L2224/81815 ,  H01L2224/81895 ,  H01L2224/83104 ,  H01L2224/9202 ,  H01L2224/96 ,  H01L2224/97 ,  H01L2225/06513 ,  H01L2225/06517 ,  H01L2225/06524 ,  H01L2225/06527 ,  H01L2225/06541 ,  H01L2225/06562 ,  H01L2225/06568 ,  H01L2924/15787 ,  H01L2924/181 ,  H01L2924/18162 ,  H01L2924/351 ,  H01L2224/11 ,  H01L2924/00014 ,  H01L2224/03 ,  H01L2224/81 ,  H01L2924/00 ,  H01L2924/014 ,  H01L2924/0665

Abstract: A system and method for stacking semiconductor devices in three dimensions is provided. In an embodiment two or more semiconductor dies are attached to a carrier and encapsulated. Connections of the two or more semiconductor dies are exposed, and the two or more semiconductor dies may be thinned to form connections on an opposite side. Additional semiconductor dies may then be placed in either an offset or overhanging position.

Abstract translation: 提供了一种三维堆叠半导体器件的系统和方法。 在一个实施例中，将两个或更多个半导体管芯附着到载体并封装。 两个或更多个半导体管芯的连接被暴露，并且两个或更多个半导体管芯可以被薄化以在相对侧上形成连接。 然后可以将另外的半导体管芯置于偏移或悬垂位置中。

公开(公告)号：US09391000B2

公开(公告)日：2016-07-12

申请号：US13445734

申请日：2012-04-12

Applicant: Cheng-Chieh Hsieh ,  Jing-Cheng Lin

Inventor： Cheng-Chieh Hsieh ,  Jing-Cheng Lin

IPC: H01L23/473 ,  H01L21/48

CPC classification number: H01L23/473 ,  H01L21/4882 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A method includes forming a first oxide layer on a surface of an integrated heat spreader, and forming a second oxide layer on top surfaces of fins, wherein the fins are parts of a heat sink. The integrated heat spreader is bonded to the heat sink through the bonding of the first oxide layer to the second oxide layer.

Abstract translation: 一种方法包括在集成散热器的表面上形成第一氧化物层，并且在翅片的顶表面上形成第二氧化物层，其中散热片是散热片的一部分。 集成散热器通过第一氧化物层与第二氧化物层的结合而结合到散热器。

公开(公告)号：US09219016B2

公开(公告)日：2015-12-22

申请号：US13247659

申请日：2011-09-28

Applicant: Jing-Cheng Lin ,  Po-Hao Tsai

Inventor： Jing-Cheng Lin ,  Po-Hao Tsai

IPC: H05K7/00 ,  H01L21/66 ,  H01L23/00 ,  H01L23/31

CPC classification number: H01L22/32 ,  H01L23/3192 ,  H01L24/11 ,  H01L24/13 ,  H01L24/16 ,  H01L24/81 ,  H01L2224/0401 ,  H01L2224/05024 ,  H01L2224/05027 ,  H01L2224/05166 ,  H01L2224/05572 ,  H01L2224/05647 ,  H01L2224/10126 ,  H01L2224/1146 ,  H01L2224/1147 ,  H01L2224/1182 ,  H01L2224/11823 ,  H01L2224/13022 ,  H01L2224/13082 ,  H01L2224/13083 ,  H01L2224/13111 ,  H01L2224/13113 ,  H01L2224/13118 ,  H01L2224/13139 ,  H01L2224/13144 ,  H01L2224/13147 ,  H01L2224/13155 ,  H01L2224/13157 ,  H01L2224/13164 ,  H01L2224/13565 ,  H01L2224/13566 ,  H01L2224/13578 ,  H01L2224/13644 ,  H01L2224/13655 ,  H01L2224/1369 ,  H01L2224/16148 ,  H01L2224/73204 ,  H01L2224/81193 ,  H01L2224/81815 ,  H01L2224/94 ,  H01L2924/00014 ,  H01L2924/181 ,  H01L2924/01029 ,  H01L2224/81 ,  H01L2224/05552 ,  H01L2924/00

Abstract: A work piece includes a first copper-containing pillar having a top surface and sidewalls, and a first protection layer on the sidewalls, and not over the top surface, of the first copper-containing pillar. A test pad includes a second copper-containing pillar having a top surface and sidewalls. The test pad is electrically coupled to the first copper-containing pillar. A second protection layer is disposed on the sidewalls, and not over the top surface, of the second copper-containing pillar. The first and the second protection layers include a compound of copper and a polymer, and are dielectric layers.

Abstract translation: 工件包括具有顶表面和侧壁的第一含铜柱，以及第一含铜柱的侧壁而不是顶表面上的第一保护层。 测试垫包括具有顶表面和侧壁的第二含铜柱。 测试垫电耦合到第一含铜柱。 第二保护层设置在第二含铜柱的侧壁上，而不是在顶表面上。 第一和第二保护层包括铜和聚合物的化合物，并且是电介质层。

公开(公告)号：US08975183B2

公开(公告)日：2015-03-10

申请号：US13370477

申请日：2012-02-10

Applicant: Jing-Cheng Lin

Inventor： Jing-Cheng Lin

IPC: H01L21/44

CPC classification number: H01L21/561 ,  H01L21/486 ,  H01L21/568 ,  H01L23/3128 ,  H01L23/49816 ,  H01L23/49822 ,  H01L23/49827 ,  H01L25/0655 ,  H01L2224/16227 ,  H01L2224/16235 ,  H01L2224/16237 ,  H01L2224/32225 ,  H01L2224/73204 ,  H01L2224/97 ,  H01L2924/15311 ,  H01L2924/157 ,  H01L2924/18161 ,  H01L2224/83 ,  H01L2224/81

Abstract: A method for forming a semiconductor structure. A semiconductor substrate including a plurality of dies mounted thereon is provided. The substrate includes a first portion proximate to the dies and a second portion distal to the dies. In some embodiments, the first portion may include front side metallization. The second portion of the substrate is thinned and a plurality of conductive through substrate vias (TSVs) is formed in the second portion of the substrate after the thinning operation. Prior to thinning, the second portion may not contain metallization. In one embodiment, the substrate may be a silicon interposer. Further back side metallization may be formed to electrically connect the TSVs to other packaging substrates or printed circuit boards.

Abstract translation: 一种形成半导体结构的方法。 提供了包括安装在其上的多个管芯的半导体基板。 衬底包括靠近模具的第一部分和远离模具的第二部分。 在一些实施例中，第一部分可以包括前侧金属化。 衬底的第二部分变薄，并且在变薄操作之后，在衬底的第二部分中形成多个导电贯通衬底通孔（TSV）。 在变薄之前，第二部分可以不包含金属化。 在一个实施例中，衬底可以是硅插入器。 可以形成另外的背侧金属化以将TSV电连接到其他封装基板或印刷电路板。

公开(公告)号：US08871568B2

公开(公告)日：2014-10-28

申请号：US13345485

申请日：2012-01-06

Applicant: Ying-Ching Shih ,  Szu Wei Lu ,  Jing-Cheng Lin

Inventor： Ying-Ching Shih ,  Szu Wei Lu ,  Jing-Cheng Lin

IPC: H01L21/58 ,  H01L23/485 ,  H01L21/78

CPC classification number: H01L21/6835 ,  H01L21/561 ,  H01L21/568 ,  H01L23/3128 ,  H01L23/3185 ,  H01L23/49816 ,  H01L24/97 ,  H01L2221/68345 ,  H01L2221/68381 ,  H01L2224/16225 ,  H01L2224/16227 ,  H01L2224/32225 ,  H01L2224/73204 ,  H01L2224/81005 ,  H01L2224/81192 ,  H01L2224/83005 ,  H01L2224/97 ,  H01L2924/00014 ,  H01L2924/12042 ,  H01L2924/15311 ,  H01L2924/181 ,  H01L2924/18161 ,  H01L2224/81 ,  H01L2924/00 ,  H01L2224/0401 ,  H01L2224/83

Abstract: A method includes forming a dielectric layer over a substrate, forming an interconnect structure over the dielectric layer, and bonding a die to the interconnect structure. The substrate is then removed, and the dielectric layer is patterned. Connectors are formed at a surface of the dielectric layer, wherein the connectors are electrically coupled to the die.

Abstract translation: 一种方法包括在衬底上形成电介质层，在电介质层上形成互连结构，以及将管芯结合到互连结构。 然后去除衬底，并对电介质层进行图案化。 连接器形成在电介质层的表面，其中连接器电耦合到管芯。

公开(公告)号：US08866301B2

公开(公告)日：2014-10-21

申请号：US12781960

申请日：2010-05-18

Applicant: Yung-Chi Lin ,  Jing-Cheng Lin ,  Chen-Hua Yu

Inventor： Yung-Chi Lin ,  Jing-Cheng Lin ,  Chen-Hua Yu

IPC: H01L23/48 ,  H01L23/52 ,  H01L29/40 ,  H01L23/02 ,  H01L23/498 ,  H01L23/538 ,  H01L23/00 ,  H01L23/31 ,  H01L21/56 ,  H01L23/29 ,  H01L21/48

CPC classification number: H01L21/4857 ,  H01L21/4846 ,  H01L21/4853 ,  H01L21/486 ,  H01L21/56 ,  H01L21/563 ,  H01L21/565 ,  H01L21/6835 ,  H01L21/768 ,  H01L23/295 ,  H01L23/3128 ,  H01L23/49816 ,  H01L23/49822 ,  H01L23/49827 ,  H01L23/5389 ,  H01L24/03 ,  H01L24/11 ,  H01L24/19 ,  H01L24/24 ,  H01L25/0657 ,  H01L25/50 ,  H01L2221/68359 ,  H01L2224/02331 ,  H01L2224/02372 ,  H01L2224/0239 ,  H01L2224/0401 ,  H01L2224/12105 ,  H01L2224/16225 ,  H01L2224/24227 ,  H01L2224/32225 ,  H01L2224/73203 ,  H01L2224/73204 ,  H01L2225/06517 ,  H01L2225/06548 ,  H01L2225/06572 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01019 ,  H01L2924/0102 ,  H01L2924/01023 ,  H01L2924/01024 ,  H01L2924/01029 ,  H01L2924/01032 ,  H01L2924/01033 ,  H01L2924/01047 ,  H01L2924/01049 ,  H01L2924/01059 ,  H01L2924/01073 ,  H01L2924/01074 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/01327 ,  H01L2924/10253 ,  H01L2924/10329 ,  H01L2924/12042 ,  H01L2924/1305 ,  H01L2924/13091 ,  H01L2924/14 ,  H01L2924/15192 ,  H01L2924/15311 ,  H01L2924/15788 ,  H01L2924/181 ,  H01L2924/00012 ,  H01L2924/00

Abstract: A package system includes a first integrated circuit disposed over an interposer. The interposer includes at least one molding compound layer including a plurality of electrical connection structures through the at least one molding compound layer. A first interconnect structure is disposed over a first surface of the at least one molding compound layer and electrically coupled with the plurality of electrical connection structures. The first integrated circuit is electrically coupled with the first interconnect structure.

Abstract translation: 封装系统包括设置在插入器上的第一集成电路。 所述插入器包括至少一个包含穿过所述至少一个模塑复合层的多个电连接结构的模塑复合层。 第一互连结构设置在至少一个模塑复合层的第一表面上并与多个电连接结构电耦合。 第一集成电路与第一互连结构电耦合。