Solar Cell and Method of Manufacturing the Same
    11.
    发明申请
    Solar Cell and Method of Manufacturing the Same 审中-公开
    太阳能电池及其制造方法

    公开(公告)号:US20110061710A1

    公开(公告)日:2011-03-17

    申请号:US12875807

    申请日:2010-09-03

    Abstract: Provided are a solar cell and a method of manufacturing the same. The method of manufacturing the solar cell includes stacking a solar cell device layer containing GaN on a sacrificial substrate, etching the solar cell device layer to expose the sacrificial substrate, thereby forming one or more solar cell devices comprising the solar cell device layer, anisotropically etching the exposed sacrificial substrate, contacting the solar cell devices to a stamping processor to remove the solar cell devices from the sacrificial substrate, and transferring the solar cell devices onto a receiving substrate. A high temperature semiconductor process may be performed on a substrate such as a silicon substrate to transfer the solar cell devices onto the substrate, thereby manufacturing flexible solar cells. Also, a large number of solar cells may be excellently aligned on a large area. In addition, economical solar cells may be manufactured.

    Abstract translation: 提供一种太阳能电池及其制造方法。 制造太阳能电池的方法包括在牺牲基板上堆叠含有GaN的太阳能电池器件层,蚀刻太阳能电池器件层以暴露牺牲基板,从而形成包括太阳能电池器件层的各个异相蚀刻的一个或多个太阳能电池器件 暴露的牺牲衬底,将太阳能电池器件接触到冲压处理器以从牺牲衬底移除太阳能电池器件,并将太阳能电池器件转移到接收衬底上。 可以在诸如硅衬底的衬底上执行高温半导体工艺以将太阳能电池器件转移到衬底上,从而制造柔性太阳能电池。 此外,大量的太阳能电池可以在大面积上优良地对准。 此外,可以制造经济的太阳能电池。

    SEMICONDUCTOR STRUCTURE AND METHOD OF FABRICATING THE SEMICONDUCTOR STRUCTURE
    12.
    发明申请
    SEMICONDUCTOR STRUCTURE AND METHOD OF FABRICATING THE SEMICONDUCTOR STRUCTURE 有权
    半导体结构和半导体结构的制作方法

    公开(公告)号:US20100207172A1

    公开(公告)日:2010-08-19

    申请号:US12704975

    申请日:2010-02-12

    Abstract: In contrast to a conventional planar CMOS technique in design and fabrication for a field-effect transistor (FET), the present invention provides an SGT CMOS device formed on a conventional substrate using various crystal planes in association with a channel type and a pillar shape of an FET, without a need for a complicated device fabrication process. Further, differently from a design technique of changing a surface orientation in each planar FET, the present invention is designed to change a surface orientation in each SGT to achieve improvement in carrier mobility. Thus, a plurality of SGTs having various crystal planes can be formed on a common substrate to achieve a plurality of different carrier mobilities so as to obtain desired performance.

    Abstract translation: 与用于场效应晶体管(FET)的设计和制造中的常规平面CMOS技术相反,本发明提供了一种SGT CMOS器件,其形成在常规基板上,该传统基板使用与通道类型和柱形 FET,而不需要复杂的器件制造工艺。 此外,与改变每个平面FET中的表面取向的设计技术不同,本发明被设计为改变每个SGT中的表面取向以实现载流子迁移率的改善。 因此,可以在公共基板上形成具有各种晶面的多个SGT,以实现多种不同的载流子迁移率,从而获得期望的性能。

    Manufacturing method for flexible device, flexible device, solar cell, and light emitting device

    公开(公告)号:US10566477B2

    公开(公告)日:2020-02-18

    申请号:US13010108

    申请日:2011-01-20

    Abstract: Provided are a method of manufacturing a flexible device and the flexible device, a solar cell, and a light emitting device. The method of manufacturing a flexible device includes providing a device layer on a sacrificial substrate, contacting a flexible substrate on one side surface of the device layer, and removing the sacrificial substrate. A large area device may be transferred onto the flexible substrate with superior alignment to realize and manufacture the flexible device. In addition, since mass production is possible, the economic feasibility may be superior. Also, when a large area solar cell having a thin thickness is manufactured, since a limitation such as twisting of a thin film of a solar cell may be effectively solved, the economic feasibility and stability may be superior.

    Light emitting diode display and method of manufacturing the same
    16.
    发明授权
    Light emitting diode display and method of manufacturing the same 有权
    发光二极管显示器及其制造方法

    公开(公告)号:US08557619B2

    公开(公告)日:2013-10-15

    申请号:US12852463

    申请日:2010-08-07

    CPC classification number: H01L21/00 H01L27/153 H01L33/0079

    Abstract: A method of manufacturing LED display is provided. The method provides a sacrificial substrate on which RGB LED device layers are formed, respectively. The method etches and patterns the LED device layer to manufacture RGB LED devices, respectively. The method removes the sacrificial substrate in a lower side of the LED device. The method contacts a stamping processor to the RGB LED devices to separate the RGB LED devices from the sacrificial substrate. The method transfers the LED device, which is attached to the stamping processor, to a receiving substrate.

    Abstract translation: 提供了一种制造LED显示器的方法。 该方法分别提供形成RGB LED器件层的牺牲基板。 该方法分别对LED器件层进行蚀刻和图案分别制造RGB LED器件。 该方法移除LED器件下侧的牺牲衬底。 该方法将冲压处理器与RGB LED器件接触,以将RGB LED器件与牺牲衬底分离。 该方法将附接到冲压处理器的LED装置传送到接收基板。

    MANUFACTURING METHOD FOR FLEXIBLE DEVICE AND FLEXIBLE DEVICE MANUFACTURED BY THE SAME
    17.
    发明申请
    MANUFACTURING METHOD FOR FLEXIBLE DEVICE AND FLEXIBLE DEVICE MANUFACTURED BY THE SAME 审中-公开
    柔性装置的制造方法及其制造的柔性装置

    公开(公告)号:US20130082361A1

    公开(公告)日:2013-04-04

    申请号:US13396302

    申请日:2012-02-14

    Abstract: Provided are a method of manufacturing a flexible device and a flexible device manufactured thereby.The method of manufacturing a flexible device according to the present disclosure includes: fabricating a device on an upper silicon layer of a silicon-on-insulator (SOI) substrate comprising a lower silicon layer, an insulation layer and the upper silicon layer stacked sequentially; adhering a second silicon substrate to the upper silicon layer; removing the lower silicon layer; transferring the upper silicon layer with the device fabricated to a flexible substrate using the second silicon substrate; and stacking a passivation layer on the flexible substrate, wherein the device is located at a position of a neutral mechanical plane of the entire device as the passivation layer is stacked.

    Abstract translation: 提供一种制造柔性装置的方法和由此制造的柔性装置。 根据本公开的制造柔性器件的方法包括:在绝缘体上硅(SOI)衬底的上硅层上制造器件,其包括依次堆叠的下硅层,绝缘层和上硅层; 将第二硅衬底粘附到所述上硅层; 去除下硅层; 使用所述第二硅衬底将所述上硅层与所制造的器件转移到柔性衬底; 以及在所述柔性基板上堆叠钝化层,其中当所述钝化层被堆叠时,所述器件位于整个器件的中性机械平面的位置。

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