Abstract:
Semiconductor packages comprising a plurality of lead fingers containing a lead intrusion at the edge of the lead fingers are described. The semiconductor packages comprise an integrated circuit chip that is connected to a die pad and is electrically connected to multiple lead fingers. One or more of the lead fingers may have a lead intrusion disposed on the external exposed lower surface of the lead finger. The lead intrusion may have a height that is about ⅕ to about ½ the height of a lead finger, a width that is about ⅕ to about 1/2 the width of a lead finger, and a depth that is about ¼ to about ¾ the length of the externally exposed lower surface of a lead finger. The lead intrusion increases the area on the lead finger that contacts a bond material, such as solder, and therefore increase the strength of the joint between the semiconductor package and an external surface to which the lead finger is connected (i.e., a PCB). The lead intrusion allows out gassing during reflow of the bond material which may reduce voiding. The lead intrusion can also increase bond joint reliability by providing longer crack propagation length.
Abstract:
A semiconductor device comprises a package substrate, a semiconductor chip, a plurality of bump electrodes and one or more dummy chips. The semiconductor chip is mounted on one surface of the package substrate. The bump electrodes are the other surface of the package substrate and electrically connected to the semiconductor chip through a wiring structure. Each of the dummy chips is mounted on a predetermined region close to a corner portion of the semiconductor chip on the one surface of the package substrate.In the semiconductor chip, the dummy chips are formed of material having the same or similar coefficient of thermal expansion as that of the semiconductor chip. Therefore the stress caused by a difference between coefficients of thermal expansion is suppressed so as to improve connection reliability.
Abstract:
A semiconductor device is provided that includes a semiconductor chip, a plurality of solder bumps that electrically couple the semiconductor chip to the outside, and a metal bump being provided on the surface of each first solder bump which is at least a part of the plurality of solder bumps and being made of a metal having a melting point higher than that of the first solder bump. The wettability of the first solder bump is improved as each metal bump serves as a core when the corresponding first solder bump melts. Thus, the connection reliability of the first solder bump can be improved.
Abstract:
A bonding pad structure is provided that includes two conductive layers and a connective layer interposing the two conductive layers. The connective layer includes a contiguous, conductive structure. In an embodiment, the contiguous conductive structure is a solid layer of conductive material. In other embodiments, the contiguous conductive structure is a conductive network including, for example, a matrix configuration or a plurality of conductive stripes. At least one dielectric spacer may interpose the conductive network. In an embodiment, the conductive density of the connective layer is between approximately 20% and 100%.
Abstract:
A semiconductor device includes two or more semiconductor devices with bond pads that are electrically connected to the same, single surface of a plurality of leads. The two or more devices may include substantially centrally located bond pads or substantially identically arranged bond pads.
Abstract:
It has been found that integrated packages having dies with at least 10 bonding pads separated by a pitch of 65 μm or less are susceptible to corrosion upon wire bonding to these pads and subsequent encapsulation in a passivating material. In particular, crevices are potentially formed between the bonding wire and bonding pad that are not passivated and that promote corrosion. Avoidance of crevice formation through, for example, appropriately choosing the bonding pad and wire configuration substantially avoids such corrosion.
Abstract:
An insulating layer having an opening from which an electrode pad of a device is exposed is formed on the surface of a semiconductor substrate having the device fabricated therein, and an external terminal pad defined by a portion of a conductor layer formed on the insulating layer is connected to the electrode pad by means of a bonding wire. Further, a conductor post is formed on the external terminal pad, and an encapsulation resin layer is formed to coat a region on the semiconductor substrate in which the conductor post is formed, and to expose a top portion of the conductor post. An external connecting terminal is bonded to the top portion of the conductor post.
Abstract:
A semiconductor package includes a substrate having contacts, and a discrete component on the substrate in electrical communication with the contacts. The package also includes a semiconductor die on the substrate in electrical communication with the contacts, and a die attach polymer attaching the die to the substrate. The die includes a recess, and the discrete component is contained in the recess encapsulated in the die attach polymer. A method for fabricating the package includes the steps of: attaching the discrete component to the substrate, placing the die attach polymer on the discrete component and the substrate, pressing the die into the die attach polymer to encapsulate the discrete component in the recess and attach the die to the substrate, and then placing the die in electrical communication with the discrete component. An electronic system includes the semiconductor package mounted to a system substrate.
Abstract:
A semiconductor device is disclosed including die bond pads which are heightened to allow wire bonding of offset stacked die even in tight offset configurations. After a first die is affixed to a substrate, one or more layers of an electrical conductor may be provided on some or all of the die bond pads of the first substrate to raise the height of the bond pads. The conductive layers may for example be conductive balls deposited on the die bond pads of the first substrate using a known wire bond capillary. Thereafter, a second die may be added, and wire bonding of the first die may be accomplished using a known wire bond capillary mounting a wire bond ball on a raised surface of a first semiconductor die bond pad.
Abstract:
An electroplating method calls for immersing a body to be plated in a plating solution containing tin and bismuth to form a tin-bismuth alloy skin layer on surfaces of the body. The plating is carried out such that a solid tin metal and a solid bismuth metal placed in the plating solution are connected to an anode and the body to be plated is connected to a cathode of a power supply.