公开(公告)号：US20180330916A1

公开(公告)日：2018-11-15

申请号：US15776678

申请日：2015-12-25

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Arthur Malcolm BLACKBURN

IPC: H01J37/26 ,  H01J37/073

CPC classification number: H01J37/263 ,  H01J37/073 ,  H01J37/26 ,  H01J37/295 ,  H01J2237/2614 ,  H01J2237/262

Abstract: A charged particle beam device includes: a first charged particle source that generates first charged particles and irradiates a sample with the generated first charged particles; a phase plate that changes phases of the first charged particles in accordance with charged states of portions through which the first charged particles are transmitted; and a phase plate control system that controls the charging of the phase plate.

公开(公告)号：US20180254173A1

公开(公告)日：2018-09-06

申请号：US15760498

申请日：2015-09-16

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Souichi KATAGIRI ,  Keigo KASUYA

IPC: H01J41/20 ,  F04B37/02 ,  H01J41/16 ,  H01J37/073 ,  H01J37/28

CPC classification number: H01J41/20 ,  F04B37/02 ,  H01J37/073 ,  H01J37/28 ,  H01J41/16 ,  H01J2237/1825 ,  H01J2237/28

Abstract: In a vacuum apparatus including an ultrahigh vacuum evacuation pump, the ultrahigh vacuum evacuation pump is provided with a rod-shaped cathode including a non-evaporable getter alloy, a cylindrical anode disposed so as to surround the cathode, and a coil or a ring-shaped permanent magnet disposed so as to sandwich upper and lower openings of the cylindrical anode and surround the rod-shaped cathode. As a result, it is possible to reduce the size and weight of the ultrahigh vacuum evacuation pump and to dispose the vacuum evacuation pump at a desired location in the vacuum apparatus.

公开(公告)号：US09934926B2

公开(公告)日：2018-04-03

申请号：US14904945

申请日：2014-06-12

Applicant: NATIONAL UNIVERSITY CORPORATION NAGOYA UNIVERSITY

Inventor： Tomohiro Nishitani

IPC: H01J1/34 ,  H01J37/06 ,  H01J37/073

CPC classification number: H01J1/34 ,  H01J37/06 ,  H01J37/073 ,  H01J2237/06333 ,  H01J2237/2602

Abstract: The present disclosure provides a treatment device for lowering electron affinity. The treatment device is capable of performing an electron affinity (EA) surface treatment on a photocathode material or an EA surface retreatment on a photocathode. The present disclosure also provides an electron-beam device provided with the treatment device. An activation chamber is used in a treatment device for lowering electron affinity by vaporizing a surface-treatment material and uses the vaporized surface-treatment material to perform an electron-affinity lowering treatment on a photocathode material or an electron-affinity lowering retreatment on a photocathode. The activation chamber includes one or more holes through which electrons can pass.

公开(公告)号：US09873949B2

公开(公告)日：2018-01-23

申请号：US14897769

申请日：2014-06-13

Applicant: IHP GmbH-Innovations for High Performance Microelectronics/Leibniz-Institut Fur Innovative Mikroelektronik

Inventor： Wolfgang Mehr ,  Andre Wolff

IPC: B44C1/22 ,  C23F4/00 ,  H01J37/073 ,  H01J1/304 ,  H01J9/02 ,  H01J37/32 ,  B81C1/00 ,  C23C16/50 ,  H01L21/3065 ,  H01L21/308

CPC classification number: C23F4/00 ,  B81C1/00111 ,  C23C16/50 ,  H01J1/3044 ,  H01J9/025 ,  H01J37/073 ,  H01J37/32963 ,  H01J37/32981 ,  H01J2201/30411 ,  H01J2209/0226 ,  H01J2237/334 ,  H01L21/3065 ,  H01L21/3081

Abstract: A method for producing a nanotip from a tip material provides a substrate which consists of the tip material or has the material in the form of a coating, produces a mask from a mask material selected so that, in a predefined reactive ion etching process, the mask material is removed at a lower etching rate than the tip material, and carries out the reactive ion etching process in an etching chamber. The mask material is additionally selected so that a gaseous component is released therefrom during the reactive ion etching process, the gaseous component not being released from the tip material. The method further comprises detecting the gaseous component while the ion etching process is being carried out, repeatedly determining whether an amount of the gaseous component in the etching chamber reaches a predefined lower threshold, and stopping the reactive ion etching process when the lower threshold is reached.

公开(公告)号：US09570268B2

公开(公告)日：2017-02-14

申请号：US14787263

申请日：2014-04-14

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Yuta Imai ,  Takashi Ohshima ,  Hideo Morishita

IPC: H01J29/28 ,  H01J29/00 ,  H01J27/02 ,  H01J37/073 ,  H01J27/26 ,  H01J37/063 ,  H01J37/08 ,  H01J37/28 ,  H01J37/06 ,  H01J29/48 ,  H01J37/145 ,  H01J37/20

CPC classification number: H01J37/073 ,  H01J27/02 ,  H01J27/26 ,  H01J29/481 ,  H01J37/06 ,  H01J37/063 ,  H01J37/08 ,  H01J37/145 ,  H01J37/20 ,  H01J37/28 ,  H01J2237/062 ,  H01J2237/06341 ,  H01J2237/06375 ,  H01J2237/0802 ,  H01J2237/1508 ,  H01J2237/2007 ,  H01J2237/2801

Abstract: The purpose of the present invention is to provide a charged particle gun using merely an electrostatic lens, said charged particle gun being relatively small and having less aberration, and to provide a field emission-type charged particle gun having high luminance even with a high current. This charged particle gun has: a charged particle source; an acceleration electrode that accelerates charged particles emitted from the charged particle source; a control electrode, which is disposed further toward the charged particle source side than the acceleration electrode, and which has a larger aperture diameter than the aperture diameter of the acceleration electrode; and a control unit that controls, on the basis of a potential applied to the acceleration electrode, a potential to be applied to the control electrode.

Abstract translation: 本发明的目的是提供一种仅使用静电透镜的带电粒子枪，所述带电粒子枪相对较小并且具有较小的像差，并且提供即使具有高电流也具有高亮度的场致发射型带电粒子枪 。 该带电粒子枪具有：带电粒子源; 加速电极，其加速从带电粒子源发射的带电粒子; 控制电极，其设置成比加速电极更加朝向带电粒子源侧，并且具有比加速电极的开口直径大的孔径; 以及控制单元，其基于对加速电极施加的电位控制施加到控制电极的电位。

公开(公告)号：US20160233050A1

公开(公告)日：2016-08-11

申请号：US15015930

申请日：2016-02-04

Applicant: HITACHI, LTD.

Inventor： Keigo KASUYA ,  Takeshi KAWASAKI ,  Takashi OHSHIMA ,  Souichi KATAGIRI

IPC: H01J37/18 ,  H01J37/073 ,  H01J37/14

CPC classification number: H01J37/18 ,  H01J41/20 ,  H01J2237/1825

Abstract: An ion pump and a charged particle beam device each includes two opposite flat-plate cathodes, an anode with a cylindrical shape having openings that face the respective flat-plate cathodes, a voltage application unit configured to apply a potential higher than potentials of the flat-plate cathodes to the anode, a magnetic field application unit configured to apply a magnetic field along an axial direction of the cylindrical shape of the anode, and a cathode bar arranged within the anode. The surface of the cathode bar is formed with a material that forms a non-evaporative getter alloy film on the anode or the flat-plate cathodes.

Abstract translation: 离子泵和带电粒子束装置各自包括两个相对的平板阴极，具有面对各个平板阴极的开口的具有圆柱形形状的阳极;电压施加单元，被配置为施加高于平面电位的电位 阳极的板极阴极，被配置为沿着阳极的圆柱形状的轴向施加磁场的磁场施加单元和布置在阳极内的阴极棒。 阴极棒的表面由在阳极或平板阴极上形成非蒸发吸气剂合金膜的材料形成。

公开(公告)号：US20160225571A1

公开(公告)日：2016-08-04

申请号：US15094503

申请日：2016-04-08

Applicant: The Government of the United States of America, as represented by the Secretary of the Navy

Inventor： Jonathan L. Shaw ,  Jeremy Hanna

IPC: H01J1/34 ,  H01J37/073

CPC classification number: B32B9/007 ,  B23K1/0016 ,  B23K1/19 ,  B23K2103/50 ,  B32B9/04 ,  B32B9/041 ,  B32B15/043 ,  B32B37/04 ,  B32B37/12 ,  B32B37/24 ,  B32B38/0036 ,  B32B38/1858 ,  B32B2037/243 ,  B32B2037/246 ,  B32B2038/0052 ,  B32B2250/05 ,  B32B2255/205 ,  B32B2255/28 ,  B32B2309/02 ,  B32B2309/68 ,  B32B2311/00 ,  B32B2311/09 ,  B32B2311/16 ,  B32B2313/04 ,  C23C28/023 ,  C23C30/00 ,  H01J1/34 ,  H01J37/073 ,  Y10T428/12542

Abstract: A method of producing electrons via photoemission comprising providing diamond, treating a surface of the diamond by exposing it to atomic hydrogen inside an ultrahigh vacuum chamber, illuminating the surface with photons, and extracting the photoemitted electons. A chemically stable visible light photoemission electron source comprising a diamond film having a surface terminated with hydrogen and a light source.

Abstract translation: 一种通过光电子发射电子的方法，包括提供金刚石，通过将金刚石的表面暴露于超高真空室内的原子氢，用光子照射该表面，以及提取光电离电极，来处理金刚石的表面。 一种化学稳定的可见光发射电子源，包括具有用氢终止的表面的金刚石膜和光源。

公开(公告)号：US20150371813A1

公开(公告)日：2015-12-24

申请号：US14747488

申请日：2015-06-23

Applicant: EBARA CORPORATION

Inventor： Masahiro HATAKEYAMA ,  Kenichi SUEMATSU ,  Ryo TAJIMA ,  Kiwamu TSUKAMOTO ,  Kenji TERAO ,  Shoji YOSHIKAWA

IPC: H01J37/20 ,  H01J37/305 ,  H01J37/22 ,  H01J37/073 ,  H01J37/10

CPC classification number: H01J37/20 ,  H01J37/226 ,  H01J37/3005 ,  H01J37/3023 ,  H01J37/3056 ,  H01J37/3177 ,  H01J2237/24535

Abstract: A surface processing apparatus is an apparatus which performs surface processing on an inspection object 20 by irradiating the inspection object with an electron beam. A surface processing apparatus includes: an electron source 10 (including lens system that controls beam shape of electron beam) which generates an electron beam; a stage 30 on which an inspection object 20 to be irradiated with the electron beam is set; and an optical microscope 110 for checking a position to be irradiated with the electron beam. The current value of the electron beam which irradiates the inspection object 20 is set at 10 nA to 100 A.

Abstract translation: 表面处理装置是通过用电子束照射检查对象对检查对象物20进行表面处理的装置。 表面处理装置包括：产生电子束的电子源10（包括控制电子束的光束形状的透镜系统）; 设置有用电子束照射的检查对象物20的台架30; 以及用于检查用电子束照射的位置的光学显微镜110。 将检查对象物20照射的电子束的当前值设定为10nA〜100A。

公开(公告)号：US09017562B2

公开(公告)日：2015-04-28

申请号：US13726971

申请日：2012-12-26

Applicant: 38th Research Institute, China Electronics Technology Group Corporation

Inventor： Huarong Liu

IPC: C25F3/00 ,  C03C15/00 ,  C23F4/02 ,  H01J1/00 ,  H01J1/304 ,  H01J9/02 ,  H01J37/04 ,  H01J37/06 ,  H01J37/08 ,  B82Y99/00 ,  H01J27/26 ,  H01J37/073

CPC classification number: C23F4/02 ,  B82Y99/00 ,  H01J1/00 ,  H01J1/3044 ,  H01J9/025 ,  H01J27/26 ,  H01J37/04 ,  H01J37/06 ,  H01J37/073 ,  H01J37/08 ,  H01J2201/30415 ,  H01J2237/0807

Abstract: The present disclosure provides a method for manufacturing a particle source, comprising: placing a metal wire in vacuum, introducing active gas and catalyst gas, adjusting a temperature of the metal wire, and applying a positive high voltage V to the metal wire to dissociate the active gas at the surface of the metal wire, in order to generate at a peripheral surface of the head of the metal wire an etching zone in which field induced chemical etching (FICE) is performed; increasing by the FICE a surface electric field at the top of the metal wire head to be greater than the to evaporation field of the material for the metal wire, so that metal atoms at the wire apex are evaporated off; after the field evaporation is activated by the FICE, causing mutual adjustment between the FICE and the field evaporation, until the head of the metal wire has a shape of combination of a base and a tip on the base; and stopping the FICE and the field evaporation when the head of the metal wire takes a predetermine shape.

Abstract translation: 本公开提供了一种制造颗粒源的方法，包括：将金属丝放置在真空中，引入活性气体和催化剂气体，调节金属丝的温度，以及向金属丝施加正高电压V以使 在金属线的表面处的活性气体，以在金属线的头部的外周表面上产生进行场诱导化学蚀刻（FICE）的蚀刻区域; 通过FICE增加金属丝头顶部的表面电场大于金属线材料的蒸发场，使金属丝顶端的金属原子蒸发掉; 在通过FICE激活场蒸发之后，引起FICE和场蒸发之间的相互调节，直到金属丝的头部具有基部和底部的尖端的组合的形状; 并且当金属丝的头部具有预定形状时，停止FICE和场蒸发。

公开(公告)号：US20150076988A1

公开(公告)日：2015-03-19

申请号：US14485588

申请日：2014-09-12

Applicant: KLA-Tencor Corporation

Inventor： Thomas Plettner ,  Mehran Nasser-Ghodsi

IPC: H01J37/153 ,  H01J37/28 ,  H01J37/285 ,  H01J37/073 ,  H01J9/02

CPC classification number: H01J37/153 ,  B82Y15/00 ,  B82Y40/00 ,  H01J9/025 ,  H01J37/073 ,  H01J37/1471 ,  H01J37/28 ,  H01J37/285 ,  H01J2203/0216 ,  H01J2237/06375 ,  H01J2237/28 ,  H01J2237/31774 ,  Y10S977/842 ,  Y10S977/939

Abstract: A field emission device comprises one or more emitter elements, each having a high aspect ratio structure with a nanometer scaled cross section; and one or more segmented electrodes, each surrounding one of the one or more emitters. Each of the one or more segmented electrodes has multiple electrode plates. This abstract is provided to comply with rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.

Abstract translation: 场发射器件包括一个或多个发射极元件，每个发射极元件具有纳米尺度横截面的高纵横比结构; 以及一个或多个分段电极，每个围绕所述一个或多个发射器中的一个发射器。 一个或多个分段电极中的每一个具有多个电极板。 提供该摘要以符合要求抽象的规则，允许搜索者或其他读者快速确定技术公开内容的主题。 提交它的理解是，它不会用于解释或限制权利要求的范围或含义。