EPITAXIAL STRUCTURE AND METHOD FOR FORMING THE SAME

    公开(公告)号:US20240128397A1

    公开(公告)日:2024-04-18

    申请号:US17989700

    申请日:2022-11-18

    CPC classification number: H01L33/0062 H01L33/06 H01L33/30 H01L33/36

    Abstract: An epitaxial structure including a first epitaxial layer, a second epitaxial layer, and an interface treatment layer is provided. The first epitaxial layer is an ohmic contact layer. The second epitaxial layer is disposed on the first epitaxial layer and is a phosphide compound layer, where a material of the second epitaxial layer is different from a material of the first epitaxial layer. The interface treatment layer contacts the first epitaxial layer and the second epitaxial layer and is located between the first epitaxial layer and the second epitaxial layer. An image contrast ratio of a transmission electron microscope (TEM) of the interface treatment layer to the first epitaxial layer and an image contrast ratio of the TEM of the interface treatment layer to the second epitaxial layer are both greater than 1.005. A method for forming an epitaxial structure is also provided.

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